JPH0245325B2 - - Google Patents

Info

Publication number
JPH0245325B2
JPH0245325B2 JP61041246A JP4124686A JPH0245325B2 JP H0245325 B2 JPH0245325 B2 JP H0245325B2 JP 61041246 A JP61041246 A JP 61041246A JP 4124686 A JP4124686 A JP 4124686A JP H0245325 B2 JPH0245325 B2 JP H0245325B2
Authority
JP
Japan
Prior art keywords
water
resist
pattern
film
soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61041246A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61179440A (ja
Inventor
Masaru Sasako
Masataka Endo
Kenichi Takeyama
Noboru Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61041246A priority Critical patent/JPS61179440A/ja
Publication of JPS61179440A publication Critical patent/JPS61179440A/ja
Publication of JPH0245325B2 publication Critical patent/JPH0245325B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61041246A 1986-02-26 1986-02-26 パターン形成方法 Granted JPS61179440A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61041246A JPS61179440A (ja) 1986-02-26 1986-02-26 パターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61041246A JPS61179440A (ja) 1986-02-26 1986-02-26 パターン形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP59078868A Division JPS60223121A (ja) 1984-04-19 1984-04-19 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS61179440A JPS61179440A (ja) 1986-08-12
JPH0245325B2 true JPH0245325B2 (enrdf_load_stackoverflow) 1990-10-09

Family

ID=12603080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61041246A Granted JPS61179440A (ja) 1986-02-26 1986-02-26 パターン形成方法

Country Status (1)

Country Link
JP (1) JPS61179440A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0335238A (ja) * 1989-06-30 1991-02-15 Matsushita Electric Ind Co Ltd マスクパターン検証方法
JP2009105218A (ja) * 2007-10-23 2009-05-14 Toshiba Corp パターン形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5955019A (ja) * 1982-09-24 1984-03-29 Oki Electric Ind Co Ltd 微細パタ−ン形成方法
JPS59168637A (ja) * 1983-03-15 1984-09-22 Nec Corp 微細パタ−ンの形成方法

Also Published As

Publication number Publication date
JPS61179440A (ja) 1986-08-12

Similar Documents

Publication Publication Date Title
KR970004447B1 (ko) 반사방지막 제조 방법 및 이를 이용한 반도체 장치의 제조 방법
US4745042A (en) Water-soluble photopolymer and method of forming pattern by use of the same
US4362809A (en) Multilayer photoresist process utilizing an absorbant dye
US5614336A (en) Phase shift layer-containing photomask, and its production and correction
JP2829555B2 (ja) 微細レジストパターンの形成方法
KR100675782B1 (ko) 비 흡수 레티클 및 이를 제조하는 방법
TWI638226B (zh) 附阻劑層之基底、其製造方法、光罩基底及壓印用模基底、以及轉印用光罩、壓印用模及彼等之製造方法
US4777111A (en) Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
JPH0244139B2 (enrdf_load_stackoverflow)
JPH0367261B2 (enrdf_load_stackoverflow)
JP2008129080A (ja) 上面反射防止膜用組成物、およびそれを用いたパターン形成方法
JPH0245325B2 (enrdf_load_stackoverflow)
JPS60203941A (ja) 多層ホトレジスト処理方法
US5648199A (en) Method of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist film
JP3837279B2 (ja) フォトレジストパターン形成方法及び半導体素子の製造方法
JPH08152716A (ja) ネガ型レジスト及びレジストパターンの形成方法
BE1014248A3 (fr) Procede de production d'une impression de circuit utilisee pour la fabrication d'un dispositif semi-conducteur.
JPH0376744B2 (enrdf_load_stackoverflow)
JPH0376740B2 (enrdf_load_stackoverflow)
JPH02971A (ja) レジストパターンの形成方法
JPS6186745A (ja) パタ−ン形成有機膜
JPH01238659A (ja) パターン形成方法
JPS59168637A (ja) 微細パタ−ンの形成方法
JP2674058B2 (ja) パターン形成方法
JPH0416106B2 (enrdf_load_stackoverflow)