JPS61178187U - - Google Patents

Info

Publication number
JPS61178187U
JPS61178187U JP1985063546U JP6354685U JPS61178187U JP S61178187 U JPS61178187 U JP S61178187U JP 1985063546 U JP1985063546 U JP 1985063546U JP 6354685 U JP6354685 U JP 6354685U JP S61178187 U JPS61178187 U JP S61178187U
Authority
JP
Japan
Prior art keywords
chamber
exhaust
annular
substrates
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985063546U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985063546U priority Critical patent/JPS61178187U/ja
Priority to KR1019860003137A priority patent/KR900001231B1/ko
Priority to US06/856,938 priority patent/US4750505A/en
Publication of JPS61178187U publication Critical patent/JPS61178187U/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)

Description

【図面の簡単な説明】
第１図ないし第３図は本考案に係る回転乾燥装
置を示し、第１図は第１の実施例による縦断面図
、第２図は第１図の―矢視平面図、第３図は
第２の実施例による縦断面図、第４図は従来技術
に係る回転乾燥装置の縦断面図である。 １……チヤンバー、２……乾燥室、３……蓋体
、４……取入口、５……排気ダクト、６……回転
体、７……基板収納ケース、７ａ……基板、８…
…環状遮蔽板、９……ノズル、１１……ケースホ
ルダ、１３……天板、１４……回転体の上側開口
、１６……環状排気用スリツト、１７……排気チ
ヤンバー、１８……連結ダクト、１９……除塵フ
イルタ。

Claims (1)

  1. 【実用新案登録請求の範囲】 １ チヤンバー上の蓋体に取入口を、チヤンバー
    所要部に強制排気手段と連結された排気ダクトを
    それぞれ設け、チヤンバー内には回転体と、この
    回転体の上側外周に可及的に近接させてチヤンバ
    ーの蓋体に環状遮蔽板を配設して乾燥室を形成し
    、上記回転体には乾燥すべき基板を収納した基板
    収納ケースを複数個装着し、この回転体を回転さ
    せて基板を乾燥するように構成した基板の回転乾
    燥装置において、 前記環状遮蔽板の外側に環状排気用スリツトを
    有する排気チヤンバーを設け、この排気チヤンバ
    ーを強制排気手段に連結したことを特徴とする基
    板の回転乾燥装置。 ２ 環状排気用スリツトを有する排気チヤンバー
    が蓋体と一体に形成された実用新案登録請求の範
    囲第１項に記載した基板の回転乾燥装置。 ３ 環状排気用スリツトを有する排気チヤンバー
    が乾燥室を形成するチヤンバーの上側内周部に形
    成された実用新案登録請求の範囲第１項に記載し
    た基板の回転乾燥装置。
JP1985063546U 1985-04-26 1985-04-26 Pending JPS61178187U (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1985063546U JPS61178187U (ja) 1985-04-26 1985-04-26
KR1019860003137A KR900001231B1 (ko) 1985-04-26 1986-04-23 기판의 회전 건조 장치
US06/856,938 US4750505A (en) 1985-04-26 1986-04-25 Apparatus for processing wafers and the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985063546U JPS61178187U (ja) 1985-04-26 1985-04-26

Publications (1)

Publication Number Publication Date
JPS61178187U true JPS61178187U (ja) 1986-11-06

Family

ID=13232331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985063546U Pending JPS61178187U (ja) 1985-04-26 1985-04-26

Country Status (3)

Country Link
US (1) US4750505A (ja)
JP (1) JPS61178187U (ja)
KR (1) KR900001231B1 (ja)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5169408A (en) * 1990-01-26 1992-12-08 Fsi International, Inc. Apparatus for wafer processing with in situ rinse
US6375741B2 (en) * 1991-03-06 2002-04-23 Timothy J. Reardon Semiconductor processing spray coating apparatus
US5238503A (en) * 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
KR100230694B1 (ko) * 1992-05-18 1999-11-15 다카시마 히로시 기판세정처리장치
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
DE69420474T2 (de) * 1993-06-30 2000-05-18 Applied Materials Inc Verfahren zum Spülen und Auspumpen einer Vakuumkammer bis Ultra-Hoch-Vakuum
US5608943A (en) * 1993-08-23 1997-03-11 Tokyo Electron Limited Apparatus for removing process liquid
US5475892A (en) * 1993-10-29 1995-12-19 Texas Instruments Incorporated Semiconductor wafer particle extractor
US5417768A (en) * 1993-12-14 1995-05-23 Autoclave Engineers, Inc. Method of cleaning workpiece with solvent and then with liquid carbon dioxide
US5509431A (en) * 1993-12-14 1996-04-23 Snap-Tite, Inc. Precision cleaning vessel
US5672212A (en) * 1994-07-01 1997-09-30 Texas Instruments Incorporated Rotational megasonic cleaner/etcher for wafers
US5958146A (en) * 1994-11-14 1999-09-28 Yieldup International Ultra-low particle semiconductor cleaner using heated fluids
US5849104A (en) * 1996-09-19 1998-12-15 Yieldup International Method and apparatus for cleaning wafers using multiple tanks
US5571337A (en) * 1994-11-14 1996-11-05 Yieldup International Method for cleaning and drying a semiconductor wafer
US5634978A (en) * 1994-11-14 1997-06-03 Yieldup International Ultra-low particle semiconductor method
US5772784A (en) 1994-11-14 1998-06-30 Yieldup International Ultra-low particle semiconductor cleaner
US6264752B1 (en) 1998-03-13 2001-07-24 Gary L. Curtis Reactor for processing a microelectronic workpiece
US6350319B1 (en) 1998-03-13 2002-02-26 Semitool, Inc. Micro-environment reactor for processing a workpiece
US6413436B1 (en) 1999-01-27 2002-07-02 Semitool, Inc. Selective treatment of the surface of a microelectronic workpiece
US20050217707A1 (en) * 1998-03-13 2005-10-06 Aegerter Brian K Selective processing of microelectronic workpiece surfaces
US6318385B1 (en) 1998-03-13 2001-11-20 Semitool, Inc. Micro-environment chamber and system for rinsing and drying a semiconductor workpiece
US6423642B1 (en) 1998-03-13 2002-07-23 Semitool, Inc. Reactor for processing a semiconductor wafer
US6632292B1 (en) 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
TW452828B (en) * 1998-03-13 2001-09-01 Semitool Inc Micro-environment reactor for processing a microelectronic workpiece
US6047717A (en) * 1998-04-29 2000-04-11 Scd Mountain View, Inc. Mandrel device and method for hard disks
US6062239A (en) * 1998-06-30 2000-05-16 Semitool, Inc. Cross flow centrifugal processor
US6125863A (en) * 1998-06-30 2000-10-03 Semitool, Inc. Offset rotor flat media processor
US6432214B2 (en) 1998-07-10 2002-08-13 Semitool, Inc. Cleaning apparatus
US6492284B2 (en) 1999-01-22 2002-12-10 Semitool, Inc. Reactor for processing a workpiece using sonic energy
US6548411B2 (en) 1999-01-22 2003-04-15 Semitool, Inc. Apparatus and methods for processing a workpiece
US6511914B2 (en) 1999-01-22 2003-01-28 Semitool, Inc. Reactor for processing a workpiece using sonic energy
US7217325B2 (en) * 1999-01-22 2007-05-15 Semitool, Inc. System for processing a workpiece
US6806194B2 (en) * 1999-01-22 2004-10-19 Semitool. Inc. Apparatus and methods for processing a workpiece
US6680253B2 (en) 1999-01-22 2004-01-20 Semitool, Inc. Apparatus for processing a workpiece
US6216710B1 (en) 1999-02-05 2001-04-17 Caterpillar Inc. Method and apparatus for removing quench oil from a permeable metal part
US7438788B2 (en) 1999-04-13 2008-10-21 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
EP1192298A4 (en) 1999-04-13 2006-08-23 Semitool Inc APPENDIX FOR THE ELECTROCHEMICAL TREATMENT OF A WORKPIECE
US7264698B2 (en) 1999-04-13 2007-09-04 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US6774056B2 (en) * 1999-11-10 2004-08-10 Semitool, Inc. Sonic immersion process system and methods
US6286231B1 (en) 2000-01-12 2001-09-11 Semitool, Inc. Method and apparatus for high-pressure wafer processing and drying
AU2001282879A1 (en) * 2000-07-08 2002-01-21 Semitool, Inc. Methods and apparatus for processing microelectronic workpieces using metrology
JP3662484B2 (ja) * 2000-08-09 2005-06-22 エム・エフエスアイ株式会社 ウェット処理方法及びウェット処理装置
JP2002079201A (ja) * 2000-09-07 2002-03-19 Showa Kogyosho:Kk 筒状被清掃体の清掃装置
KR100689808B1 (ko) * 2000-12-07 2007-03-08 삼성전자주식회사 반도체소자 제조용 웨트 스테이션의 스핀 드라이어
US20050061676A1 (en) * 2001-03-12 2005-03-24 Wilson Gregory J. System for electrochemically processing a workpiece
AU2002322587A1 (en) * 2001-07-16 2003-03-03 Semitool, Inc. Apparatus for processing a workpiece
EP1481114A4 (en) * 2001-08-31 2005-06-22 Semitool Inc DEVICE AND METHOD FOR ELECTROCHEMICAL PROCESSING OF MICROELECTRONIC WORKPIECES
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7371022B2 (en) 2004-12-22 2008-05-13 Sokudo Co., Ltd. Developer endpoint detection in a track lithography system
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
KR102042635B1 (ko) 2012-07-02 2019-11-08 삼성전자주식회사 매엽식 건조 장치 및 이를 포함하는 매엽식 세정 시스템
CN106716605B (zh) * 2014-09-30 2021-06-08 芝浦机械电子株式会社 基板处理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190031A (ja) * 1982-04-30 1983-11-05 Toshiba Corp 半導体ウエハ清浄乾燥装置
JPH08210480A (ja) * 1995-02-06 1996-08-20 Unisia Jecs Corp 自動変速機の変速動作開始時期検出装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2893410A (en) * 1952-07-17 1959-07-07 Cornell Dubilier Electric Washing electrolytic capacitor sections
JPS5212576A (en) * 1975-07-21 1977-01-31 Hitachi Ltd Wafer washing drying device
US4445281A (en) * 1980-04-23 1984-05-01 Seiichiro Aigoo Dehydrating drier
US4316750A (en) * 1981-01-16 1982-02-23 Western Electric Company, Inc. Apparatus and method for cleaning a flux station of a soldering system
US4421131A (en) * 1982-01-19 1983-12-20 Auvil Jr Raymond G Cleaning apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190031A (ja) * 1982-04-30 1983-11-05 Toshiba Corp 半導体ウエハ清浄乾燥装置
JPH08210480A (ja) * 1995-02-06 1996-08-20 Unisia Jecs Corp 自動変速機の変速動作開始時期検出装置

Also Published As

Publication number Publication date
KR860008594A (ko) 1986-11-17
KR900001231B1 (ko) 1990-03-05
US4750505A (en) 1988-06-14

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