JPS61176764U - - Google Patents
Info
- Publication number
- JPS61176764U JPS61176764U JP6025385U JP6025385U JPS61176764U JP S61176764 U JPS61176764 U JP S61176764U JP 6025385 U JP6025385 U JP 6025385U JP 6025385 U JP6025385 U JP 6025385U JP S61176764 U JPS61176764 U JP S61176764U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- observation window
- ion
- shutter
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000992 sputter etching Methods 0.000 claims 2
- 238000011109 contamination Methods 0.000 claims 1
- 230000002265 prevention Effects 0.000 claims 1
- 238000005286 illumination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6025385U JPS61176764U (enrdf_load_stackoverflow) | 1985-04-24 | 1985-04-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6025385U JPS61176764U (enrdf_load_stackoverflow) | 1985-04-24 | 1985-04-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61176764U true JPS61176764U (enrdf_load_stackoverflow) | 1986-11-04 |
Family
ID=30587427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6025385U Pending JPS61176764U (enrdf_load_stackoverflow) | 1985-04-24 | 1985-04-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61176764U (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0792062A (ja) * | 1993-03-04 | 1995-04-07 | Natl Res Inst For Metals | 透過型電子顕微鏡用薄膜試料のその場作製および観察 方法並びにその装置 |
| JP2010080382A (ja) * | 2008-09-29 | 2010-04-08 | Jeol Ltd | 薄膜試料作成装置 |
-
1985
- 1985-04-24 JP JP6025385U patent/JPS61176764U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0792062A (ja) * | 1993-03-04 | 1995-04-07 | Natl Res Inst For Metals | 透過型電子顕微鏡用薄膜試料のその場作製および観察 方法並びにその装置 |
| JP2010080382A (ja) * | 2008-09-29 | 2010-04-08 | Jeol Ltd | 薄膜試料作成装置 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU1182595A (en) | Fluxless soldering pretreating system and method using fluorine-containing plasma | |
| ES2065126T3 (es) | Luminaria para crear un haz primario y un haz secundario. | |
| JPS61176764U (enrdf_load_stackoverflow) | ||
| AU559918B2 (en) | Mass spectrometer pyrolysis inlet system | |
| FR2378923A2 (fr) | Perfectionnement aux necropoles | |
| JPH065418Y2 (ja) | 超高真空導入用ランプハウジング | |
| CN218565307U (zh) | 一种无边框式方形壁灯 | |
| JPS59126774A (ja) | 気相金属堆積装置 | |
| JPS61176763U (enrdf_load_stackoverflow) | ||
| JP2004504495A5 (enrdf_load_stackoverflow) | ||
| JPS59152560U (ja) | 試料装置 | |
| JPS59111327A (ja) | 試料交換装置 | |
| TW250499B (en) | Device and process for multiple plasma source ion coating | |
| JPH0343231Y2 (enrdf_load_stackoverflow) | ||
| JPH0487155U (enrdf_load_stackoverflow) | ||
| JPH047557Y2 (enrdf_load_stackoverflow) | ||
| JPS5962662U (ja) | 電子線装置 | |
| JPS6176675U (enrdf_load_stackoverflow) | ||
| RU93052969A (ru) | Устройство для нанесения вакуумно-плазменных покрытий | |
| JPS6387760U (enrdf_load_stackoverflow) | ||
| JPS6423869U (enrdf_load_stackoverflow) | ||
| JPS5784548A (en) | Device for exhausting gas contained in light emission tube | |
| JPS6314145U (enrdf_load_stackoverflow) | ||
| FR2603832A1 (fr) | Installation pour la manipulation d'un objet sous atmosphere controlee | |
| WO1997000519A3 (en) | Electrostatic accelerated-recirculating fusion neutron/proton source |