JPS61170916A - Production of magnetic head - Google Patents

Production of magnetic head

Info

Publication number
JPS61170916A
JPS61170916A JP1008685A JP1008685A JPS61170916A JP S61170916 A JPS61170916 A JP S61170916A JP 1008685 A JP1008685 A JP 1008685A JP 1008685 A JP1008685 A JP 1008685A JP S61170916 A JPS61170916 A JP S61170916A
Authority
JP
Japan
Prior art keywords
wafer
magnetic head
protective film
pattern
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1008685A
Other languages
Japanese (ja)
Inventor
Masaomi Naito
内藤 雅臣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1008685A priority Critical patent/JPS61170916A/en
Publication of JPS61170916A publication Critical patent/JPS61170916A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers

Abstract

PURPOSE:To improve the adhesive property by placing a protective glass plate on a protruding pattern provided on a protective film, and pressing the plate on the pattern. CONSTITUTION:Many thin film magnetic head patterns 9 are formed on a wafer 1 consisting, for example, of a ceramic, etc., and a protective film 10 is formed thereon by sputtering Al, etc. Alumina, SiO2, etc. are vapor-deposited on the film 10 to provide a protruding pattern 14 having specified height, a protective glass plate 12 is set on the protruding pattern 14, and then an adhesive (a resin 13) is filled. A weight 17 is placed on a cut pattern 16, and the adhesive is cured in a furnace to form a solid adhered film. The wafer protective film 10 formed in not affected by the thickness distribution of the protective film where the central part is thick and both ends are thin, the adhesive is uniformly distributed between the protective glass plate 12 and the wafer 1 because of the protruding pattern 14, and the thickness of the resin 13 is made uniform to improve the adhesive strength.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気装置に搭載される磁気ヘッドの製造におい
て、ウェハー上に設けられた保護膜表面に突起パターン
を一定高さに作成することにより、保護ガラス板の接着
膜厚を均一にするようにした磁気ヘッドの製造方法に関
する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is applied to manufacturing a magnetic head mounted on a magnetic device by creating a protrusion pattern at a constant height on the surface of a protective film provided on a wafer. , relates to a method of manufacturing a magnetic head in which the adhesive film thickness of a protective glass plate is made uniform.

磁気装置は磁気ヘッドを搭載し、該磁気ヘッドにより記
録媒体上に情報を書き込み/読み出しを行っている。
A magnetic device is equipped with a magnetic head, and the magnetic head writes/reads information onto/from a recording medium.

上記磁気ヘッドは、例えば第3図に示すようなものがあ
る。第3図は薄膜磁気ヘッドの構成を説明する断面斜視
図である。
For example, there is a magnetic head as shown in FIG. 3. FIG. 3 is a cross-sectional perspective view illustrating the structure of the thin film magnetic head.

図において、磁気ヘッドAはセラミック等よりなる基板
1上に下部磁性層2、導電層よりなるコイル3、上部磁
性層5及び絶縁物4を積層し、さらに先端に読み/書き
する為のギャップ6を有する。さらに保護の為、表面に
保護ガラス7を接着剤8で接着している。
In the figure, a magnetic head A has a lower magnetic layer 2, a coil 3 made of a conductive layer, an upper magnetic layer 5, and an insulator 4 laminated on a substrate 1 made of ceramic or the like, and further has a gap 6 at the tip for reading/writing. has. For further protection, a protective glass 7 is bonded to the surface with an adhesive 8.

磁気ヘッドAが保護ガラス7により保護されるので、保
護ガラス7は磁気ヘッドAの使用中、或いは製造過程で
剥がれないよう強固に接着されることが望まれる。
Since the magnetic head A is protected by the protective glass 7, it is desirable that the protective glass 7 be firmly adhered so that it will not peel off during the use of the magnetic head A or during the manufacturing process.

〔従来の技術〕[Conventional technology]

従来、磁気ヘッドの保護ガラス7の接着は第4図に示す
ようにウェハー(基板)l上にスパッタ技術、エツチン
グ技術を駆使して、薄膜磁気ヘッドパターン9を多数作
成している。薄膜磁気ヘッドパターン9を保護する為、
その上にスパッタによりアルミナ等の保護膜10を付け
、さらにその上にウェハー1の両端にスペーサ11を置
き、上に保護ガラス12を載せ樹脂13で接着している
Conventionally, the protective glass 7 of the magnetic head is bonded by forming a large number of thin film magnetic head patterns 9 on a wafer (substrate) l by making full use of sputtering and etching techniques, as shown in FIG. In order to protect the thin film magnetic head pattern 9,
A protective film 10 made of alumina or the like is applied thereon by sputtering, spacers 11 are placed on both ends of the wafer 1, and a protective glass 12 is placed on top and bonded with resin 13.

上記のように形成したウェハーを図示しないが、機械加
工で切断され個々に分離し、仕上げ加工が施され磁気ヘ
ッドが形成される。
Although not shown in the drawings, the wafer formed as described above is cut by mechanical processing, separated into individual pieces, and subjected to finishing processing to form a magnetic head.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来、磁気へノドの保護ガラスを1から2龍厚スパツタ
で形成することは膨大な時間を要するので、ウェハー上
にアルミナ等の保護膜9を薄くスパッタで形成し、該ウ
ェハー(ウェハー径3)′)1の両端にプラス千ツクの
スペーサ11を置き、上に保護カラス板12を樹脂13
で接着していた。
Conventionally, it takes an enormous amount of time to form the protective glass for the magnetic head by sputtering with a thickness of 1 to 2 mm, so a thin protective film 9 of alumina or the like is formed on the wafer by sputtering. ') Place a plastic spacer 11 on both ends of 1, and place a protective glass plate 12 on top of the resin 13.
It was glued on.

ところが、保護膜10がスパッタで形成されるので、第
5図のように中心が厚く両側が薄(なる。
However, since the protective film 10 is formed by sputtering, it is thick at the center and thin at both sides, as shown in FIG.

従ってその両端にスペーサ11を置き、その上に保護ガ
ラス仮12 (0,4mm厚)を載せ樹脂13で接着す
ると、中心の樹脂が薄くなる(中心で2μm厚と薄い)
。その為保護ガラス12の接着が中心で弱くなり(接着
の樹脂厚が5μm以下になると剥離し易い)、ウェハー
を機械加工で個々に切断分離し、仕上げ加工を施す過程
で剥離するという問題点があった。
Therefore, if spacers 11 are placed on both ends of the spacer, and a temporary protective glass 12 (0.4 mm thick) is placed on top of it and bonded with resin 13, the resin at the center becomes thin (2 μm thick at the center).
. As a result, the adhesiveness of the protective glass 12 becomes weak at the center (it tends to peel off when the resin thickness of the adhesive is less than 5 μm), and this causes problems such as peeling off during the process of cutting and separating the wafers individually by mechanical processing and applying finishing processing. there were.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は基板上に形成した磁気へノドパターンの保
護膜上に一定高さの突起パターンを設け、該突起パター
ン上に保護ガラス板を載せ加圧し、樹脂接着する本発明
の磁気ヘッドの製造方法により解決される。
The above problem can be solved by manufacturing the magnetic head of the present invention in which a protrusion pattern of a certain height is provided on the protective film of the magnetic nodal pattern formed on the substrate, a protective glass plate is placed on the protrusion pattern, pressure is applied, and resin is bonded. Solved by method.

〔作用〕[Effect]

即ち、ウェハー保護膜上に突起パターンを作成し、その
上に保護ガラスを載せて樹脂接着することにより、ウェ
ハー保護膜分布(中心が厚く、両端が薄い)が影響し、
中心の樹脂が薄くなることなく均一な厚さとなる。突起
パターンもスパッタ等で形成しているので、スペーサ接
着と異なり接着性が改善され、ウェハーを切断し個々に
分離し仕上げ加工を施す過程で剥離するはない。
That is, by creating a protrusion pattern on the wafer protective film, placing the protective glass on top and bonding it with resin, the distribution of the wafer protective film (thick in the center and thin at both ends) is affected.
The resin in the center has a uniform thickness without becoming thin. Since the protrusion pattern is also formed by sputtering or the like, the adhesion is improved, unlike spacer adhesion, and there is no peeling during the process of cutting the wafer, separating it into individual pieces, and applying finishing processing.

〔実施例〕                    
  −以下、本発明の要旨を図面により具体的に説明す
る。
〔Example〕
- Hereinafter, the gist of the present invention will be specifically explained with reference to the drawings.

第1図(イ)(ロ)は本発明の1実施例を示す図で、(
イ)は平面図、(ロ)は断面図、第2図は本発明の突起
パターンの拡大図である。なお、企図を通し共通する符
合は同一対象物である。
FIGS. 1(A) and 1(B) are diagrams showing one embodiment of the present invention.
(a) is a plan view, (b) is a sectional view, and FIG. 2 is an enlarged view of the protrusion pattern of the present invention. Note that common symbols throughout the plan are the same object.

図において、セラミック等よりなるウェハー(基板)■
上にスパッタ技術、エツチング技術を駆使して、薄膜磁
気ヘッドパターン9を多数作成し、その上にアルミナ等
をスパッタし保護膜10を形成し、その上にアルミナ、
5IO2等を蒸着して一定高さの突起パターン14を設
け、該突起パターン14上に保護ガラス板12を冶具1
5を用いてセツティングし、その後接若剤(樹脂13)
を充填する。切断パターン16上に100gr位のウェ
イト17を載せ、120℃でIH程度の炉内硬化を行う
ことにより、強固な接着膜が形成される。
In the figure, a wafer (substrate) made of ceramic etc.
A large number of thin film magnetic head patterns 9 are formed on top of the pattern by making full use of sputtering technology and etching technology, and a protective film 10 is formed by sputtering alumina or the like on top of the pattern.
A protrusion pattern 14 of a constant height is provided by vapor-depositing 5IO2, etc., and a protective glass plate 12 is placed on the protrusion pattern 14 using a jig 1.
5 and then apply adhesive (resin 13).
Fill it. A strong adhesive film is formed by placing a weight 17 of about 100 gr on the cutting pattern 16 and curing it in an IH oven at 120°C.

上記のようにウェハー保護膜10上に突起パターン14
を作成したことによって、スパッタにより形成されたウ
ェハー保護膜10の中心が厚く、両端が薄いと云う保護
膜分布に影響されることなく、保護ガラス仮12と基v
i(ウェハー)1の間が突起パターン14により均一に
なり、樹脂13厚が一定になるので接着強度が向上する
As described above, the protrusion pattern 14 is formed on the wafer protective film 10.
By creating a wafer protective film 10 formed by sputtering, the protective glass temporary 12 and the base v are not affected by the protective film distribution, which is thick at the center and thin at both ends.
The distance between the i (wafers) 1 is made uniform by the protrusion pattern 14, and the thickness of the resin 13 becomes constant, so that the adhesive strength is improved.

またウェハー保護膜lo上に蒸着により突起パターン1
4を形成しているので接着が強く、従来のスペーサのよ
うな接着性が悪いことはない。
In addition, a protrusion pattern 1 is formed by vapor deposition on the wafer protective film lo.
4, the adhesion is strong and does not have poor adhesion like conventional spacers.

従って、ウェハーを機械加工で切断し個々に分離し仕上
げ加工を施す過程で、剥離するということがなくなる。
Therefore, there is no possibility of delamination during the process of cutting the wafer by machining, separating the wafers into individual pieces, and applying finishing processes.

なお、上記突起の形成をウェハー1上に形成されている
磁気ヘッド18を個々に切断する為の切断用マーカ(図
では4つの点で示し、1個の磁気ヘッド18のみで、他
は省略) 19を、一定高さにメ。
In addition, the formation of the above-mentioned protrusions is performed using a cutting marker for individually cutting the magnetic heads 18 formed on the wafer 1 (indicated by four points in the figure, only one magnetic head 18 is shown, and the others are omitted). 19 to a certain height.

キしても同様である。The same thing applies if you press the button.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によればウェハー保護膜上
に突起パターンを形成したことにより、ウェハー保護膜
分布の影響をうけずに、保護ガラスを均一に接着出来、
ウェハー加工時、又保護ガラスの加工時の剥離を防ぐこ
とが出来る。
As explained above, according to the present invention, by forming the protrusion pattern on the wafer protective film, the protective glass can be bonded uniformly without being affected by the wafer protective film distribution.
Peeling during wafer processing or protective glass processing can be prevented.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(イ)(ロ)は本発明の1実施例を示す図で、(
イ)は平面図、(ロ)は断面図、第2図は本発明の突起
パターンの拡大図、第3図は薄膜磁気ヘッドの構成を説
明する断面斜視図、 第4図は従来の磁気ヘッドの保護ガラス7の接着方法を
説明する断面図、 第5図はウェハー上の保護膜10形成状態を説明する断
面図である。 図において、 1はウェハー、 9は薄膜磁気ヘッド、 10は保護膜、 12は保護ガラス板、 13は樹脂、 14は突起パターン、 15は冶具、 16は切断パターン、 17はウェイト、 18は磁気ヘッド、 孫どZ yfI5  図
FIGS. 1(A) and 1(B) are diagrams showing one embodiment of the present invention.
A) is a plan view, (B) is a cross-sectional view, FIG. 2 is an enlarged view of the protrusion pattern of the present invention, FIG. 3 is a cross-sectional perspective view explaining the structure of a thin-film magnetic head, and FIG. 4 is a conventional magnetic head. FIG. 5 is a cross-sectional view illustrating a method of adhering the protective glass 7 on the wafer. FIG. In the figure, 1 is a wafer, 9 is a thin film magnetic head, 10 is a protective film, 12 is a protective glass plate, 13 is a resin, 14 is a projection pattern, 15 is a jig, 16 is a cutting pattern, 17 is a weight, and 18 is a magnetic head , SondoZ yfI5 Figure

Claims (1)

【特許請求の範囲】[Claims] 基板上に形成された磁気ヘッドパターン上に保護膜を設
け、該保護膜上に保護ガラス板を接着する工程において
、前記保護膜上に一定高さの突起パターンを設け、該突
起パターン上に前記保護ガラス板を載せ加圧し、樹脂接
着することを特徴とする磁気ヘッドの製造方法。
In the step of providing a protective film on a magnetic head pattern formed on a substrate and bonding a protective glass plate onto the protective film, a protrusion pattern of a certain height is provided on the protective film, and the protrusion pattern is placed on the protrusion pattern. A method of manufacturing a magnetic head, characterized by placing a protective glass plate on it, applying pressure, and bonding it with resin.
JP1008685A 1985-01-23 1985-01-23 Production of magnetic head Pending JPS61170916A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1008685A JPS61170916A (en) 1985-01-23 1985-01-23 Production of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1008685A JPS61170916A (en) 1985-01-23 1985-01-23 Production of magnetic head

Publications (1)

Publication Number Publication Date
JPS61170916A true JPS61170916A (en) 1986-08-01

Family

ID=11740527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1008685A Pending JPS61170916A (en) 1985-01-23 1985-01-23 Production of magnetic head

Country Status (1)

Country Link
JP (1) JPS61170916A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6218814U (en) * 1985-07-17 1987-02-04

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6218814U (en) * 1985-07-17 1987-02-04

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