JP2707760B2 - Method for manufacturing thin-film magnetic head - Google Patents
Method for manufacturing thin-film magnetic headInfo
- Publication number
- JP2707760B2 JP2707760B2 JP27444689A JP27444689A JP2707760B2 JP 2707760 B2 JP2707760 B2 JP 2707760B2 JP 27444689 A JP27444689 A JP 27444689A JP 27444689 A JP27444689 A JP 27444689A JP 2707760 B2 JP2707760 B2 JP 2707760B2
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- magnetic
- layer
- substrate
- pole
- forming
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Description
【発明の詳細な説明】 〔概 要〕 磁気ディスク装置に用いられる記録・再生用の薄膜磁
気ヘッドの製造方法、特に水平構造型の薄膜磁気ヘッド
の磁気ギャップの形成に関し、 基板に対して磁気ギャップ層を密着性良く安定に形成
し得るようにして、製造歩留りの向上を図ることを目的
とし、 段差を有する磁性基板上に非磁性の磁気ギャップ層を
被着し、更に下段面上の磁気ギャップ層表面に下部磁極
用の磁性層を形成する工程と、前記磁性基板の上段面上
の磁気ギャップ層表面及び下部磁極用磁性層表面に第一
層間絶縁層、薄膜コイル、第二層間絶縁層を順に積層形
成した後、その上に上部磁気ヨーク層の先端部を前記下
部磁極用磁性層に、後端部を前記磁性基板の上段面にそ
れぞれ接続した状態で積層形成する工程と、前記磁性基
板を下段面上の下部磁極用磁性層が露出するまでラッピ
ング加工して、該磁性層と残置した磁性基板からなる下
部磁極及び磁気ギャップ層が露出した媒体対向面を形成
する工程とを含み構成する。DETAILED DESCRIPTION OF THE INVENTION [Summary] The present invention relates to a method of manufacturing a recording / reproducing thin film magnetic head used in a magnetic disk drive, and more particularly to forming a magnetic gap of a horizontal structure type thin film magnetic head. Aiming to improve the production yield by stably forming the layer with good adhesiveness, a non-magnetic magnetic gap layer is deposited on a magnetic substrate having a step, and a magnetic gap on the lower step surface is further formed. Forming a magnetic layer for the lower pole on the layer surface; and forming a first interlayer insulating layer, a thin-film coil, and a second interlayer insulating layer on the surface of the magnetic gap layer on the upper surface of the magnetic substrate and the surface of the magnetic layer for the lower pole. Are sequentially formed and laminated, with the top end of the upper magnetic yoke layer connected to the lower pole magnetic layer and the rear end connected to the upper surface of the magnetic substrate. Board down And lapped to the bottom pole magnetic layer on the surface is exposed, the lower magnetic pole and a magnetic gap layer forms and forming a bearing surface exposed of a magnetic substrate having leaving the magnetic layer.
本発明は磁気ディスク装置に用いられる記録・再生用
の薄膜磁気ヘッドの製造方法に係り、特に水平構造型の
薄膜磁気ヘッドの磁気ギャップの形成に関するものであ
る。The present invention relates to a method for manufacturing a recording / reproducing thin film magnetic head used in a magnetic disk drive, and more particularly to forming a magnetic gap in a horizontal structure type thin film magnetic head.
近年、コンピュータシステムにおける外部記憶装置と
して広く用いられている磁気ディスク装置では、高密度
記録化及び大容量化に伴って、記録再生時の磁気ディス
ク面に対する磁気ヘッドスライダの浮上量は益々狭めら
れ、低浮上においても安定で信頼性を確保できる軽量な
磁気ヘッドスライダが要求されている。In recent years, in a magnetic disk device widely used as an external storage device in a computer system, a flying height of a magnetic head slider with respect to a magnetic disk surface during recording / reproducing has been reduced more and more along with high density recording and large capacity. There is a need for a lightweight magnetic head slider that is stable and reliable even at low flying heights.
磁気ディスク装置に用いられている磁気ヘッドスライ
ダは一般にスライダの浮上面（媒体対向面）に対して垂
直な後端の面に垂直構造型の薄膜磁気ヘッドを配置した
構造が採られているため、該薄膜磁気ヘッドの配設長さ
により、必然的にスライダの高さ（厚さ）も大きくな
り、小型、軽量な磁気ヘッドスライダを実現することが
極めて困難であった。A magnetic head slider used in a magnetic disk drive generally has a structure in which a vertical structure type thin-film magnetic head is disposed on a rear end surface perpendicular to a flying surface (media facing surface) of the slider. The height (thickness) of the slider is inevitably increased due to the disposition length of the thin-film magnetic head, and it has been extremely difficult to realize a small and lightweight magnetic head slider.
このため、薄膜磁気ヘッドを媒体対向面に水平に配設
する構成にして磁気ヘッドスライダの高さ（厚さ）をで
きるだけ小さくした水平構造型の薄膜磁気ヘッドが提案
されている。しかし、かかるヘッド構成においては記録
再生の要点となる磁気ギャップの基板に対する密着性が
悪い傾向にあり、該磁気ギャップを密着性良く安定に形
成する方法が必要とされている。Therefore, there has been proposed a horizontal structure type thin film magnetic head in which the thin film magnetic head is arranged horizontally on the medium facing surface and the height (thickness) of the magnetic head slider is made as small as possible. However, in such a head configuration, the adhesion of the magnetic gap, which is a key point of recording and reproduction, to the substrate tends to be poor, and a method for stably forming the magnetic gap with good adhesion is required.
従来の水平構造型の薄膜磁気ヘッドは、第３図（ａ）
で示すようにシリコン（Si）基板１上の所定領域に下地
カーボン膜2aとハードキュア（熱硬化）したレジスト膜
2bとからなる磁気ギャップ層２を形成し、該磁気ギャッ
プ層２周囲の基板１面における所定領域以外にAl2O3等
からなる非磁性絶縁層３を形成する。FIG. 3A shows a conventional horizontal structure type thin film magnetic head.
As shown in the figure, a base carbon film 2a and a hard-cured (thermo-cured) resist film are formed in a predetermined region on the silicon (Si) substrate 1.
2b, and a nonmagnetic insulating layer 3 made of Al 2 O 3 or the like is formed in a region other than a predetermined region on the surface of the substrate 1 around the magnetic gap layer 2.
次に前記磁気ギャップ層２及び非磁性絶縁層３上にNi
−Feからなる下部磁極層４、熱硬化性樹脂材等からなる
第一層間絶縁層５、薄膜コイル６、第二層間絶縁層７及
び上部磁気ヨーク層８を順次積層状に形成した後、該薄
膜コイル６の端部上に銅（Cu）めっき膜からなる端子引
き出し層９を形成し、該上部磁気ヨーク層８及び第二層
間絶縁層７上にAl2O3等からなる絶縁保護膜10を被着形
成し、その表面を該端子引き出し層９の端部が露出する
よう平坦面に研磨仕上げしてヘッド構成体11を形成す
る。Next, Ni is deposited on the magnetic gap layer 2 and the non-magnetic insulating layer 3.
After forming a lower magnetic pole layer 4 made of -Fe, a first interlayer insulating layer 5 made of a thermosetting resin material or the like, a thin film coil 6, a second interlayer insulating layer 7, and an upper magnetic yoke layer 8 in this order, A terminal lead layer 9 made of a copper (Cu) plating film is formed on the end of the thin film coil 6, and an insulating protective film made of Al 2 O 3 or the like is formed on the upper magnetic yoke layer 8 and the second interlayer insulating layer 7. Then, a head structure 11 is formed by polishing and polishing the surface to a flat surface so that the end of the terminal lead layer 9 is exposed.
次に第３図（ｂ）に示すように該ヘッド構成体11上の
平坦面を、予め外部接続用端子15付の導電部材14が埋設
されたセラミック等からなるスライダ13に、該導電部材
14とヘッド構成体11側の前記端子引き出し層９の端面と
が電気的に接続されるように導電性接着剤等により接着
固定した後、前記Si基板１のみの選択的にエッチング除
去して前記磁気ギャップ層２、下部磁極層４の端部及び
非磁性絶縁層３が露出した媒体対向面12を有する小型軽
量な構造に形成している。Next, as shown in FIG. 3 (b), the flat surface on the head structure 11 is attached to a slider 13 made of ceramic or the like in which a conductive member 14 with an external connection terminal 15 is embedded in advance.
After bonding and fixing with an electrically conductive adhesive or the like so that 14 and the end face of the terminal lead layer 9 on the head structure 11 side are electrically connected, only the Si substrate 1 is selectively removed by etching. The magnetic gap layer 2, the end of the lower magnetic pole layer 4, and the non-magnetic insulating layer 3 are formed in a small and lightweight structure having the medium facing surface 12 exposed.
ところで上記した製造方法において磁気ギャップ層２
は、第４図（ａ）に示すようにSi基板１上に下地用のカ
ーボン膜2aを被着形成し、その表面にギャップ層形成用
のレジストマスクパターン21を電子ビーム露光及び現像
工程等により形成した後、該レジストマスクパターン21
を介してカーボン膜2aを例えばイオンミリング法により
選択的にパターニングし、更にパターンニングされたカ
ーボン膜2a上のレジストマスクパターン21をハードキュ
アして、第４図（ｂ）に示すようにカーボン膜2aと硬化
レジスト膜2bとを積層した構成からなり、その幅が0.3
〜0.5μｍ、高さが数μｍの恰も薄板を立てたような状
態に設けており、しかも前記Si基板１に対するカーボン
膜2aの密着力が弱いため、かかる磁気ギャップ層２が該
Si基板１との密着性に欠ける問題があった。By the way, in the manufacturing method described above, the magnetic gap layer 2
As shown in FIG. 4 (a), a carbon film 2a for a base is formed on a Si substrate 1 and a resist mask pattern 21 for forming a gap layer is formed on the surface thereof by an electron beam exposure and a development process. After the formation, the resist mask pattern 21
The carbon film 2a is selectively patterned through, for example, an ion milling method, and the resist mask pattern 21 on the patterned carbon film 2a is hard-cured to form a carbon film as shown in FIG. 4 (b). 2a and the cured resist film 2b are laminated, and the width is 0.3
The magnetic gap layer 2 has a thickness of about 0.5 μm and a height of several μm, which is like a thin plate, and the carbon film 2a has a weak adhesion to the Si substrate 1.
There was a problem that the adhesion to the Si substrate 1 was lacking.
従って、かかる磁気ギャップ層２が形成されたSi基板
１上に前記非磁性絶縁層３及び下部磁極層４を被着形成
するプロセス中において、該磁気ギャップ層２が剥がれ
易く、製造歩留りが著しく低下するという欠点があっ
た。Therefore, during the process of forming the nonmagnetic insulating layer 3 and the lower magnetic pole layer 4 on the Si substrate 1 on which the magnetic gap layer 2 is formed, the magnetic gap layer 2 is easily peeled off, and the manufacturing yield is significantly reduced. Had the disadvantage of doing so.
本発明は上記した従来の欠点に鑑み、基板に対して磁
気ギャップ層を密着性良く安定に形成し得るようにし
て、製造歩留りの向上を図った新規な水平構造型の薄膜
磁気ヘッドの製造方法を提供することを目的とするもの
である。SUMMARY OF THE INVENTION In view of the above-mentioned conventional disadvantages, the present invention provides a method of manufacturing a novel horizontal structure type thin-film magnetic head capable of stably forming a magnetic gap layer with good adhesion to a substrate and improving manufacturing yield. The purpose is to provide.
本発明は上記した目的を達成するため、段差を有する
磁性基板上に非磁性の磁気ギャップ層を被着し、更に下
段面上の磁気ギャップ層表面に下部磁極用の磁性層を形
成する工程と、前記磁性基板の上段面上の磁気ギャップ
層表面及び下部磁極用磁性層表面に第一層間絶縁層、薄
膜コイル、第二層間絶縁層を順に積層形成した後、その
上に上部磁気ヨーク層の先端部を前記下部磁極用磁性層
に、後端部を前記磁性基板の上段面にそれぞれ接続した
状態で積層形成する工程と、前記磁性基板を下段面上の
下部磁極用磁性層が露出するまでラッピング加工して、
該磁性層と残置した磁性基板からなる下部磁極及び磁気
ギャップ層が露出した媒体対向面を形成する工程とを含
み構成する。In order to achieve the above object, the present invention provides a step of depositing a nonmagnetic magnetic gap layer on a magnetic substrate having a step, and further forming a magnetic layer for a lower pole on the surface of the magnetic gap layer on the lower step surface. Forming a first interlayer insulating layer, a thin-film coil, and a second interlayer insulating layer on the surface of the magnetic gap layer and the surface of the magnetic layer for the lower pole on the upper surface of the magnetic substrate in this order, and then forming the upper magnetic yoke layer thereon Forming a layer with the leading end of the lower magnetic layer connected to the lower magnetic layer and the rear end connected to the upper surface of the magnetic substrate, and exposing the lower magnetic layer of the magnetic substrate on the lower surface. Wrapping until
Forming a lower magnetic pole composed of the magnetic layer and the remaining magnetic substrate and a medium facing surface where the magnetic gap layer is exposed.
本発明では第１図（ａ）に示すように段差を有するNi
−Zn等のフェライトからなる磁性基板21上に非磁性の磁
気ギャップ層22を被着し、その磁気ギャップ層22が被着
された段差領域の下段面Ｆ上のみに下部磁極用の磁性層
23を被着形成することにより、該磁気ギャップ層22は段
差を有する磁性基板21上の大きな表面積に密着されるの
でその密着性が向上する。In the present invention, as shown in FIG.
A nonmagnetic magnetic gap layer 22 is deposited on a magnetic substrate 21 made of ferrite such as Zn, and a magnetic layer for a lower magnetic pole is formed only on the lower surface F of the step region where the magnetic gap layer 22 is deposited.
Since the magnetic gap layer 22 is adhered to the large surface area of the magnetic substrate 21 having the step by applying the adhesive 23, the adhesion is improved.
その後、前記磁性基板21を下部磁極用の磁性層23が露
出するように図中のＡ−Ａ′一点鎖線の位置までラッピ
ング加工を行って第１図（ｂ）に示すように前記磁性層
23と残置した磁性基板21とからなる下部磁極24及びその
下部磁極24間に前記磁気ギャップ層22が露出する媒体対
向面を形成することによって、該磁気ギャップ層22が剥
がれることなく安定に形成することができる。この結
果、当該薄膜磁気ヘッドの製造歩留りが向上する。Thereafter, the magnetic substrate 21 is subjected to a lapping process so that the magnetic layer 23 for the lower magnetic pole is exposed to a position indicated by a dashed line AA 'in the figure, and as shown in FIG.
By forming a lower magnetic pole 24 composed of 23 and the remaining magnetic substrate 21 and a medium facing surface where the magnetic gap layer 22 is exposed between the lower magnetic pole 24, the magnetic gap layer 22 is formed stably without peeling. be able to. As a result, the production yield of the thin-film magnetic head is improved.
以下図面を用いて本発明の実施例について詳細に説明
する。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第２図（ａ）及び（ｂ）は本発明に係る水平構造型の
薄膜磁気ヘッドの製造方法の一実施例を工程順に示す要
部断面図である。2 (a) and 2 (b) are cross-sectional views of essential parts showing one embodiment of a method of manufacturing a horizontal structure type thin film magnetic head according to the present invention in the order of steps.
第２図（ａ）に示すように表面に予め数μｍの段差が
形成されたNi−Zn,Mn−Zn等のフェライトからなる磁性
基板31上に、0.2〜0.5μｍの膜厚のAl2O3、或いはSiO2
等からなる非磁性の磁気ギャップ層32をスパッタリング
法等により被着し、その磁気ギャップ層32が被着された
段差領域の下段面Ｆ上のみにNi−Feからなる下部磁極用
の磁性層33をマスクめっき法等によって形成する。As shown in FIG. 2 (a), on a magnetic substrate 31 made of a ferrite such as Ni-Zn or Mn-Zn having a step of several μm formed on the surface in advance, Al 2 O having a thickness of 0.2 to 0.5 μm. 3 or SiO 2
A nonmagnetic magnetic gap layer 32 made of Ni-Fe or the like is deposited by a sputtering method or the like, and a magnetic layer 33 for a lower pole made of Ni-Fe is formed only on the lower surface F of the step region where the magnetic gap layer 32 is deposited. Is formed by a mask plating method or the like.
次に前記磁気ギャップ層32及び下部磁極用の磁性層33
上に、熱硬化性樹脂材等からなる第一層間絶縁層34、薄
膜コイル35、第二層間絶縁層36及びNi−Feからなる上部
磁気ヨーク層37を順に積層形成する。Next, the magnetic gap layer 32 and the magnetic layer 33 for the lower magnetic pole
A first interlayer insulating layer 34 made of a thermosetting resin material or the like, a thin-film coil 35, a second interlayer insulating layer 36, and an upper magnetic yoke layer 37 made of Ni-Fe are sequentially formed thereon.
次に前記薄膜コイル35の端部35a上にCuめっきにより
厚い端子引き出し層38を形成した後、該第二層間絶縁層
36及び上部磁気ヨーク層37上にスパッタリング法等によ
ってAl2O3からなる絶縁保護膜39を形成し、その表面を
該端子引き出し層38の端部が露出する平坦面にラッピン
グ加工を行う。Next, after forming a thick terminal lead layer 38 by Cu plating on the end 35a of the thin film coil 35, the second interlayer insulating layer
An insulating protective film 39 made of Al 2 O 3 is formed on the upper magnetic yoke layer 37 and the upper magnetic yoke layer 37 by a sputtering method or the like, and the surface of the insulating protective film 39 is subjected to lapping on a flat surface where the end of the terminal lead layer 38 is exposed.
次に上記したヘッド構成体40の平坦面を第２図（ｂ）
に示すように予め外部接続用端子43付きの導電部材42が
埋設されたアルミナセラミック等からなるスライダ41
に、該導電部材42とヘッド構成体40側の前記端子引き出
し層38の端面とが電気的に接続されるように導電性接着
剤等により接着固定する。Next, FIG. 2 (b) shows the flat surface of the head structure 40 described above.
A slider 41 made of alumina ceramic or the like in which a conductive member 42 with an external connection terminal 43 is embedded in advance as shown in FIG.
Then, the conductive member 42 is bonded and fixed with a conductive adhesive or the like so as to be electrically connected to the end surface of the terminal lead layer 38 on the head structure 40 side.
その後、前記磁性基板31を第２図（ａ）に示すＢ−
Ｂ′一点鎖線で示す位置までラッピング加工を行って、
前記磁性層33と残置した磁性基板31とからなる下部磁極
44及びその下部磁極44間に前記磁気ギャップ層32が露出
する媒体対向面45を形成して完成させる。Thereafter, the magnetic substrate 31 is moved to the B-
B 'Perform lapping to the position indicated by the dashed line,
Lower magnetic pole composed of the magnetic layer 33 and the remaining magnetic substrate 31
A medium facing surface 45 exposing the magnetic gap layer 32 is formed between the lower magnetic pole 44 and the lower magnetic pole 44 to complete the medium facing surface 45.
かくすれば、小型軽量で磁気ギャップ層32が密着性良
く配設された水平構造型の薄膜磁気ヘッドを再現性良く
容易に得ることができる。This makes it possible to easily obtain a small-sized and light-weight, horizontal-structure type thin-film magnetic head in which the magnetic gap layer 32 is disposed with good adhesion, with good reproducibility.
以上の説明から明らかなように、本発明に係る薄膜磁
気ヘッドの製造方法によれば、磁気ギャップ層を密着性
良く安定に形成することが可能となり、製造歩留りが向
上し、水平構造型の薄膜磁気ヘッドを再現性良く容易に
得ることができる等、実用上優れた効果を奏する。As is clear from the above description, according to the method of manufacturing a thin film magnetic head according to the present invention, it is possible to stably form a magnetic gap layer with good adhesion, improve the manufacturing yield, and improve the horizontal structure type thin film. Practically excellent effects such as a magnetic head can be easily obtained with good reproducibility.
第１図（ａ）及び（ｂ）は本発明の磁気ギャップ層の形
成方法を原理的に説明する要部断面図、 第２図（ａ）及び（ｂ）は本発明の水平構造型の薄膜磁
気ヘッドの製造方法を工程順に説明するための要部断面
図、 第３図（ａ）及び（ｂ）は従来の水平構造型の薄膜磁気
ヘッドの製造方法を工程順に説明するための要部断面
図、 第４図（ａ）及び（ｂ）は従来の磁気ギャップ層の形成
工程と問題点を説明するための要部断面図である。 第１図（ａ），（ｂ）及び第２図（ａ），（ｂ）におい
て、 21,31は磁性基板、22,32は磁気ギャップ層、23,33は磁
性層、34は第一層間絶縁層、35薄膜コイル、36は第二層
間絶縁層、37は上部磁気ヨーク層、38は端子引き出し
層、39は絶縁保護膜、40はヘッド構成体、41はスライ
ダ、42は導電部材、43は外部接続用端子、24,44は下部
磁極、45は媒体対向面をそれぞれ示す。1 (a) and 1 (b) are cross-sectional views of principal parts for explaining a method of forming a magnetic gap layer of the present invention in principle, and FIGS. 2 (a) and (b) are horizontal structure type thin films of the present invention. 3 (a) and 3 (b) are cross-sectional views of a main part for explaining a method of manufacturing a conventional horizontal structure type thin film magnetic head in the order of steps. FIGS. 4 (a) and 4 (b) are cross-sectional views of essential parts for explaining a conventional process of forming a magnetic gap layer and problems. 1 (a) and 1 (b) and FIGS. 2 (a) and 2 (b), reference numerals 21 and 31 denote magnetic substrates, 22 and 32 denote magnetic gap layers, 23 and 33 denote magnetic layers, and 34 denotes a first layer. Inter-layer insulating layer, 35 thin-film coil, 36 is a second interlayer insulating layer, 37 is an upper magnetic yoke layer, 38 is a terminal lead layer, 39 is an insulating protective film, 40 is a head structure, 41 is a slider, 42 is a conductive member, 43 denotes an external connection terminal, 24 and 44 denote lower magnetic poles, and 45 denotes a medium facing surface.
Claims (1)
磁気ギャップ層（32）を被着し、更に下段面上の磁気ギ
ャップ層表面に下部磁極用の磁性層（33）を形成する工
程と、 前記磁性基板（31）の上段面上の磁気ギャップ層表面及
び下部磁極用磁性層（33）表面に第一層間絶縁層（3
4）、薄膜コイル（35）、第二層間絶縁層（36）を順に
積層形成した後、その上に上部磁気ヨーク層（37）の先
端部を前記下部磁極用磁性層（33）に、後端部を前記磁
性基板（31）の上段面にそれぞれ接続した状態で積層形
成する工程と、 前記磁性基板（31）を下段面上の下部磁極用磁性層（3
3）が露出するまでラッピング加工して、該磁性層（3
3）と残置した磁性基板（31）からなる下部磁極（44）
及び磁気ギャップ層（32）が露出した媒体対向面（45）
を形成する工程とを含むことを特徴とする薄膜磁気ヘッ
ドの製造方法。A non-magnetic magnetic gap layer is deposited on a magnetic substrate having a step, and a magnetic layer for a lower pole is formed on the surface of the magnetic gap layer on a lower step surface. And forming a first interlayer insulating layer (3) on the surface of the magnetic gap layer on the upper surface of the magnetic substrate (31) and the surface of the magnetic layer for lower pole (33).
4), a thin-film coil (35) and a second interlayer insulating layer (36) are formed in this order, and then the top end of the upper magnetic yoke layer (37) is placed on the lower magnetic layer (33). Laminating the magnetic substrate (31) in a state where the end portions are respectively connected to the upper surface of the magnetic substrate (31); and connecting the magnetic substrate (31) to the lower pole magnetic layer (3
Lapping is performed until the magnetic layer (3) is exposed.
3) and the lower magnetic pole (44) consisting of the remaining magnetic substrate (31)
Medium facing surface (45) with magnetic gap layer (32) exposed
Forming a thin film magnetic head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27444689A JP2707760B2 (en) | 1989-10-20 | 1989-10-20 | Method for manufacturing thin-film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27444689A JP2707760B2 (en) | 1989-10-20 | 1989-10-20 | Method for manufacturing thin-film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03137808A JPH03137808A (en) | 1991-06-12 |
| JP2707760B2 true JP2707760B2 (en) | 1998-02-04 |
Family
ID=17541801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27444689A Expired - Lifetime JP2707760B2 (en) | 1989-10-20 | 1989-10-20 | Method for manufacturing thin-film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2707760B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013501616A (en) * | 2009-08-11 | 2013-01-17 | グラクソスミスクライン・リミテッド・ライアビリティ・カンパニー | Steam sheath for liquid dispensing nozzles |
-
1989
- 1989-10-20 JP JP27444689A patent/JP2707760B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03137808A (en) | 1991-06-12 |
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