JPH03137808A - Production of thin-film magnetic head - Google Patents
Production of thin-film magnetic headInfo
- Publication number
- JPH03137808A JPH03137808A JP27444689A JP27444689A JPH03137808A JP H03137808 A JPH03137808 A JP H03137808A JP 27444689 A JP27444689 A JP 27444689A JP 27444689 A JP27444689 A JP 27444689A JP H03137808 A JPH03137808 A JP H03137808A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- substrate
- gap layer
- magnetic gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 36
- 239000010410 layer Substances 0.000 claims description 89
- 239000011229 interlayer Substances 0.000 claims description 12
- 238000009413 insulation Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 abstract description 6
- 230000001070 adhesive effect Effects 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 229910000859 α-Fe Inorganic materials 0.000 abstract description 3
- 229910018605 Ni—Zn Inorganic materials 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 7
- 238000007747 plating Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［概 要〕
磁気ディスク装置に用いられる記録・再生用の薄膜磁気
ヘッドの製造方法、特に水平構造型の薄膜磁気ヘッドの
磁気ギャップの形成に関し、基板に対して磁気ギャップ
層を密着性良く安定に形成し得るようにして、製造歩留
りの向上を図ることを目的とし、
段差を有する磁性基板上に非磁性の磁気ギヤ。[Detailed Description of the Invention] [Summary] A method for manufacturing a thin film magnetic head for recording and reproducing used in a magnetic disk device, particularly regarding the formation of a magnetic gap in a horizontal structure type thin film magnetic head. A non-magnetic magnetic gear is placed on a magnetic substrate with steps, with the aim of improving manufacturing yield by stably forming layers with good adhesion.
ブ層を被着し、更に下段面上の磁気ギャップ層表面に下
部磁極用の磁性層を形成する工程と、前記磁性基板の上
段面上の磁気ギャップ層表面及び下部磁極用磁性層表面
に第−層間絶′４＆層、薄膜コイル、第二層間絶縁層を
順に積層形成した後、その上に上部磁気ヨーク層の先端
部を前記下部磁極用磁性層に、後端部を前記磁性基板の
上段面にそれぞれ接続した状態で積層形成する工程と、
前記磁性基板を下段面上の下部磁極用磁性層が露出する
までラッピング加工して、該磁性層と残置した磁性基板
からなる下部磁極及び磁気ギャップ層が露出した媒体対
向面を形成する工程とを含み構成する。a step of depositing a magnetic layer on the surface of the magnetic gap layer on the lower surface of the magnetic substrate, and forming a magnetic layer for the lower magnetic pole on the surface of the magnetic gap layer on the lower surface of the magnetic substrate; - After forming the interlayer insulation layer 4 & layer, the thin film coil, and the second interlayer insulation layer in this order, the front end of the upper magnetic yoke layer is placed on the magnetic layer for the lower magnetic pole, and the rear end is placed on the upper layer of the magnetic substrate. A step of forming layers in a state where they are connected to each other,
lapping the magnetic substrate until the lower magnetic layer for a lower magnetic pole on the lower surface is exposed to form a medium facing surface in which a lower magnetic pole and a magnetic gap layer made of the magnetic layer and the remaining magnetic substrate are exposed; Contain and compose.
本発明は磁気ディスク装置に用いられる記録・再生用の
薄膜磁気ヘッドの製造方法に係り、特に水平構造型の薄
膜磁気ヘッドの磁気ギヤ・ノブの形成に関するものであ
る。The present invention relates to a method of manufacturing a thin film magnetic head for recording and reproducing used in a magnetic disk device, and particularly relates to the formation of a magnetic gear knob of a horizontally structured thin film magnetic head.
近年、コンピュータシステムにおける外部記憶装置とし
て広く用いられている磁気ディスク装置では、高密度記
録化及び大容量化に伴って、記録再生時の磁気ディスク
面に対する磁気ヘッドスライダの浮上量は益々狭められ
、低浮上においても安定で信頼性を確保できる軽量な磁
気ヘッドスライダが要求されている。In recent years, with magnetic disk devices widely used as external storage devices in computer systems, the flying height of the magnetic head slider relative to the magnetic disk surface during recording and reproduction has become increasingly narrower as recording density and capacity have increased. There is a need for a lightweight magnetic head slider that is stable and reliable even at low flying heights.
磁気ディスク装置に用いられている磁気ヘッドスライダ
は一般にスライダの浮上面（媒体対向面）に対して垂直
な後端の面に垂直構造型の薄膜磁気ヘッドを配置した構
造が採られているため、１ｌＦ４膜磁気ヘツドの配設長
さにより、必然的にスライダの高さ（厚さ）も大きくな
り、小型、軽量な磁気ヘッドスライダを実現することが
極めて困難であった。Magnetic head sliders used in magnetic disk drives generally have a structure in which a vertically structured thin film magnetic head is disposed on the rear end surface perpendicular to the air bearing surface (medium facing surface) of the slider. Due to the length of the 11F4 film magnetic head, the height (thickness) of the slider inevitably increases, making it extremely difficult to realize a small and lightweight magnetic head slider.
このため、薄膜磁気へラドを媒体対向面に水平に配設す
る構成にして磁気ヘントスライダの高さ（厚さ）をでき
るだけ小さくした水平構造型の薄膜磁気ヘッドが提案さ
れている。しかし、かかるヘッド構成においては記録再
生の要点となる磁気ギャップの基板に対する密着性が悪
い傾向にあり、該磁気ギャップを密着性良く安定に形成
する方法が必要とされている。For this reason, a horizontally structured thin film magnetic head has been proposed in which the height (thickness) of the magnetic hent slider is made as small as possible by arranging a thin film magnetic head horizontally on the medium facing surface. However, in such a head configuration, the adhesion of the magnetic gap, which is the key point for recording and reproduction, to the substrate tends to be poor, and a method for stably forming the magnetic gap with good adhesion is needed.
従来の水平構造型の薄膜磁気ヘッドは、第３図（ａ）で
示すようにシリコン（Ｓｉ）基板１上の所定領域に下地
カーボン膜２ａとハードキュア（熱硬化）したレジスト
膜２ｂとからなる磁気ギャップ層２を形成し、該磁気ギ
ャップ層２周囲の基板１面における所定領域以外にへβ
２０３等からなる非磁性絶縁層３を形成する。A conventional horizontal structure type thin film magnetic head consists of a base carbon film 2a and a hard cured resist film 2b in a predetermined area on a silicon (Si) substrate 1, as shown in FIG. 3(a). A magnetic gap layer 2 is formed, and β is formed in a region other than a predetermined area on the surface of the substrate around the magnetic gap layer 2.
A nonmagnetic insulating layer 3 made of 203 or the like is formed.
次に前記磁気ギャップ層２及び非磁性絶縁層３上にＮｉ
−Ｆｅからなる下部磁極層４、熱硬化性樹脂材等からな
る第一層間絶縁層５、薄膜コイル６、第二層間絶縁Ｎ７
及び上部磁気ヨーク層８を順次ａ層状に形成した後、該
薄膜コイル６の端部上に！ｒ！（Ｃｕ）めっき膜からな
る端子引き出し層９を形成し、該上部磁気ヨーク層８及
び第二層間絶縁層７上にＡ １ ｚ（ｈ等からなる絶縁
保護膜１０を被着形成し、その表面を該端子引き出し層
９の端部が露出するよう平坦面に研磨仕上げしてヘッド
構成体１１を形成する。Next, Ni is deposited on the magnetic gap layer 2 and the nonmagnetic insulating layer 3.
- Lower magnetic pole layer 4 made of Fe, first interlayer insulation layer 5 made of thermosetting resin material, thin film coil 6, second interlayer insulation N7
After sequentially forming the upper magnetic yoke layer 8 in the form of an a layer, on the end of the thin film coil 6! r! A terminal lead-out layer 9 made of a (Cu) plating film is formed, and an insulating protective film 10 made of A 1 z (h, etc.) is deposited on the upper magnetic yoke layer 8 and the second interlayer insulating layer 7, and the surface thereof is The head structure 11 is formed by polishing to a flat surface so that the ends of the terminal lead-out layer 9 are exposed.
次に第３図（ｂ）に示すように該ヘッド構成体１１上の
平坦面を、予め外部接続用端子１５付の導電部材１４が
埋設されたセラミック等からなるスライダ１３に、該導
電部材１４とヘッド構成体ｌｌ側の前記端子引き出し層
９の端面とが電気的に接続されるように導電性接着剤等
により接着固定した後、前記Ｓｉ基板１のみを選択的に
エツチング除去して前記磁気ギャップ層２、下部磁極層
４の端部及び非磁性絶縁層３が露出した媒体対向面１２
を有する小型軽量な構造に形成している。Next, as shown in FIG. 3(b), the flat surface of the head structure 11 is attached to a slider 13 made of ceramic or the like in which a conductive member 14 with external connection terminals 15 is embedded in advance. and the end face of the terminal lead-out layer 9 on the side of the head structure 11 are adhesively fixed with a conductive adhesive or the like so that they are electrically connected, and then only the Si substrate 1 is selectively etched away to remove the magnetic A medium facing surface 12 where the gap layer 2, the end of the bottom pole layer 4, and the nonmagnetic insulating layer 3 are exposed.
It has a small and lightweight structure.
ところで上記した製造方法において磁気ギャップ層２は
、第４図（ａｌに示すようにＳｉ基板１上に下地用のカ
ーボン膜２ａを被着形成し、その表面にギャップ層形成
用のレジストマスクパターン２１を電子ビーム露光及び
現像工程等により形成した後、該レジストマスクパター
ン２１を介してカーボン膜２ａを例えばイオンミリング
法により選択的にバターニングし、更にパターニングさ
れたカーボン膜２ａ上のレジストマスクパターン２１を
ハードキュアして、第４図（ｂｌに示すようにカーボン
膜２ａと硬化レジス（膜２ｂとを積層した構成からなり
、その幅が０．３〜０．５μ糟、高さが数μｍの恰も薄
板を立てたような状態に設けており、しかも前記Ｓｉ基
板１に対するカーボン膜２ａの密着力が弱いため、かか
る磁気ギャップ層２が該Ｓｉ基板１との密着性に欠ける
問題があった。By the way, in the above-described manufacturing method, the magnetic gap layer 2 is formed by depositing a carbon film 2a as a base on the Si substrate 1, as shown in FIG. is formed by an electron beam exposure and development process, and then the carbon film 2a is selectively patterned by, for example, ion milling through the resist mask pattern 21, and the resist mask pattern 21 is further formed on the patterned carbon film 2a. As shown in FIG. 4 (bl), a carbon film 2a and a hardened resist (film 2b) are laminated to form a layer with a width of 0.3 to 0.5 μm and a height of several μm. Since the carbon film 2a is provided in a state similar to a thin plate standing upright, and the adhesion of the carbon film 2a to the Si substrate 1 is weak, there is a problem that the magnetic gap layer 2 lacks adhesion to the Si substrate 1.
従って、かかる磁気ギャップ層２が形成されたＳｉ基板
１上に前記非磁性絶縁層３及び下部磁極層４を被着形成
するプロセス中において、該磁気ギャップ層２が剥がれ
易（、製造歩留りが著しく低下するという欠点があった
。Therefore, during the process of depositing and forming the nonmagnetic insulating layer 3 and the lower magnetic pole layer 4 on the Si substrate 1 on which the magnetic gap layer 2 is formed, the magnetic gap layer 2 is easily peeled off (and the manufacturing yield is significantly reduced). The disadvantage was that it decreased.
本発明は上記した従来の欠点に鑑み、基板に対して磁気
ギャップ層を密着性良く安定に形成し得るようにして、
製造歩留りの向上を図った新規な水平構造型の薄膜磁気
ヘッドの製造方法を提供することを目的とするものであ
る。In view of the above-mentioned conventional drawbacks, the present invention makes it possible to stably form a magnetic gap layer with good adhesion to a substrate.
It is an object of the present invention to provide a method for manufacturing a novel horizontal structure type thin film magnetic head that improves the manufacturing yield.
本発明は上記した目的を達成するため、段差を有する磁
性基板上に非磁性の磁気ギャップ層を被着し、更に下段
面上の磁気ギャップ層表面に下部磁極用の磁性層を形成
する工程と、前記磁性基板の上段面上の磁気ギャップ層
表面及び下部磁極用磁性層表面に第一層間絶縁層、薄膜
コイル、第二層間絶縁層を順に積層形成した後、その上
に上部磁気ヨーク層の先端部を前記下部磁極用磁性層に
、後端部を前記磁性基板の上段面にそれぞれ接続した状
態で積層形成する工程と、前記磁性基板を下段面上の下
部磁極用磁性層が露出するまでラッピング加工して、該
磁性層と残雪した磁性基板からなる下部磁極及び磁気ギ
ャップ層が露出した媒体対向面を形成する工程とを含み
構成する。In order to achieve the above object, the present invention includes a step of depositing a non-magnetic magnetic gap layer on a magnetic substrate having a step, and further forming a magnetic layer for a lower magnetic pole on the surface of the magnetic gap layer on the lower surface. After forming a first interlayer insulating layer, a thin film coil, and a second interlayer insulating layer in this order on the surface of the magnetic gap layer and the surface of the lower magnetic layer on the upper surface of the magnetic substrate, an upper magnetic yoke layer is formed thereon. a step of stacking the magnetic substrate with its leading end connected to the lower magnetic layer and its rear end connected to the upper surface of the magnetic substrate, and exposing the lower magnetic layer on the lower surface of the magnetic substrate; The method includes the steps of lapping the magnetic layer and the magnetic substrate with remaining snow to form a medium facing surface in which the lower magnetic pole and the magnetic gap layer are exposed.
〔作 用］
本発明では第１図（ａ）に示すように段差を有するＮｉ
−Ｚｎ等のフェライトからなる磁性基板２１上に非磁性
の磁気ギャップ層２２を被着し、その磁気ギャップＮ２
２が被着された段差領域の下段面Ｆ上のみに下部磁極用
の磁性層２３を被着形成することにより、該磁気ギャッ
プ層２２は段差を有する磁性基板２１上の大きな表面積
に密着されるのでその密着性が向上する。[Function] In the present invention, as shown in FIG.
- A non-magnetic magnetic gap layer 22 is deposited on a magnetic substrate 21 made of ferrite such as Zn, and the magnetic gap N2 is
By depositing and forming the magnetic layer 23 for the lower magnetic pole only on the lower step surface F of the stepped region where the magnetic gap layer 22 is deposited, the magnetic gap layer 22 is closely attached to a large surface area on the magnetic substrate 21 having the steps. Therefore, the adhesion is improved.
その後、前記磁性基板２１を下部磁極用の磁性層２３が
露出するように図中のＡ−Ａ’ −点鎖線の位置までラ
ッピング加工を行って第１図（ｂｌに示すように前記磁
性層２３と残置した磁性基板２１とからなる下部磁極２
４及びその下部磁極２４間に前記磁気ギャップ層２２が
露出する媒体対向面を形成することによって、該磁気ギ
ャップ層２２が剥がれることなく安定に形成することが
できる。この結果、当該薄膜磁気ヘッドの製造歩留りが
向上する。Thereafter, the magnetic substrate 21 is lapped to the position indicated by the dashed line A-A' in the figure so that the magnetic layer 23 for the lower magnetic pole is exposed. and the remaining magnetic substrate 21.
By forming a medium facing surface where the magnetic gap layer 22 is exposed between the magnetic gap layer 4 and its lower magnetic pole 24, the magnetic gap layer 22 can be stably formed without peeling off. As a result, the manufacturing yield of the thin film magnetic head is improved.
以下図面を用いて本発明の実施例について詳細に説明す
る。Embodiments of the present invention will be described in detail below with reference to the drawings.
第２図（ａｌ及び申）は本発明に係る水平構造型の薄膜
磁気ヘッドの製造方法の一実施例を工程順に示す要部断
面図である。FIGS. 2A and 2B are cross-sectional views of essential parts showing, in order of steps, an embodiment of a method for manufacturing a horizontally structured thin film magnetic head according to the present invention.
第２図（ａ）に示すように表面に予め数μｍの段差が形
成されたＮｉ−Ｚｎ＋ Ｍｎ−Ｚｎ等のフェライトから
なる磁性基板３１上に、０．２〜０．５ｐｍの膜厚のＡ
ＪｚＣｈ、或いはＳｉＯ□等からなる非磁性の磁気ギャ
ップ層３２をスパッタリング法等により被着し、その磁
気ギャップ層３２が被着された段差領域の下段面Ｆ上の
みにＮｉ−Ｐｅからなる下部磁極用の磁性層３３をマス
クめっき法等によって形成する。As shown in FIG. 2(a), on a magnetic substrate 31 made of ferrite such as Ni-Zn+Mn-Zn, on which a step of several μm has been formed in advance on the surface, an A film with a thickness of 0.2 to 0.5 pm is deposited.
A nonmagnetic magnetic gap layer 32 made of JzCh or SiO A magnetic layer 33 is formed by mask plating or the like.
次に前記磁気ギャップ層３２及び下部磁極用の磁性層３
３上に、熱硬化性樹脂材等からなる第一層間絶縁Ｎ３４
、薄膜コイル３５、第二層間絶縁層３６及びＮｉ−Ｆｅ
からなる上部磁気ヨーク層３７を順に積層形成する。Next, the magnetic gap layer 32 and the magnetic layer 3 for the lower magnetic pole
3, a first interlayer insulation N34 made of a thermosetting resin material, etc.
, thin film coil 35, second interlayer insulating layer 36 and Ni-Fe
The upper magnetic yoke layer 37 consisting of the above is sequentially laminated.
次に前記薄膜コイル３５の端部３５ａ上にＣｕめっきに
より厚い端子引き出し層３８を形成した後、該第二層間
絶縁層３６及び上部磁気ヨーク層３７上にスパッタリン
グ法等によってＡｊ２．０３からなる絶縁保護膜３９を
形成し、その表面を該端子引き出し層３８の端部が露出
する平坦面にラッピング加工を行う。Next, after forming a thick terminal lead-out layer 38 on the end portion 35a of the thin film coil 35 by Cu plating, an insulating layer 38 made of Aj2.03 is formed on the second interlayer insulating layer 36 and the upper magnetic yoke layer 37 by sputtering or the like. A protective film 39 is formed, and its surface is lapped to a flat surface where the ends of the terminal lead-out layer 38 are exposed.
次に上記したヘッド構成体４０の平坦面を第２図（ｂ）
に示すように予め外部接続用端子４３付きの導電部材４
２が埋設されたアルミナセラミック等からなるスライダ
４１に、該導電部材４２とヘッド構成体４０例の前記端
子引き出し層３８の端面とが電気的に接続されるように
導電性接着剤等により接着固定する。Next, the flat surface of the head structure 40 described above is shown in FIG. 2(b).
As shown in FIG.
A slider 41 made of alumina ceramic or the like in which a conductive member 2 is embedded is adhesively fixed with a conductive adhesive or the like so that the conductive member 42 and the end face of the terminal lead-out layer 38 of the head structure 40 are electrically connected. do.
その後、前記磁性基板３１を第２図（１１に示すＢ−Ｂ
゛−点鎖線で示す位置までラッピング加工を行って、前
記磁性層３３と残置した磁性基板３１とからなる下部磁
極４４及びその下部磁極４４間に前記磁気ギャップＮ３
２が露出する媒体対向面４５を形成して完成させる。Thereafter, the magnetic substrate 31 is
- The lapping process is performed to the position shown by the dotted chain line, and the magnetic gap N3 is formed between the lower magnetic pole 44 made up of the magnetic layer 33 and the remaining magnetic substrate 31 and the lower magnetic pole 44.
2 is completed by forming the medium facing surface 45 where the portion 2 is exposed.
かくすれば、小型軽量で磁気ギャップ層３２が密着性良
く配設された水平構造型の薄膜磁気ヘッドを再現性良く
容易に得ることができる。In this way, it is possible to easily obtain a horizontally structured thin film magnetic head that is small and lightweight, and in which the magnetic gap layer 32 is disposed with good adhesion, with good reproducibility.
以上の説明から明らかなように、本発明に係る薄膜磁気
ヘッドの製造方法によれば、磁気ギャップ層を密着性良
く安定に形成することが可能となり、製造歩留りが向上
し、水平構造型の薄膜磁気ヘッドを再現性良く容易に得
ることができる等、実用上優れた効果を奏する。As is clear from the above description, according to the method for manufacturing a thin film magnetic head according to the present invention, it is possible to stably form a magnetic gap layer with good adhesion, the manufacturing yield is improved, and a horizontally structured thin film It has excellent practical effects, such as being able to easily obtain a magnetic head with good reproducibility.
第１図（ａ）及び（ｂ）は本発明の磁気ギャップ層の形
成方法を原理的に説明する要部断面図、第２図（ａ）及
び山）は本発明の水平構造型の薄膜磁気ヘッドの製造方
法を工程順に説明す
るための要部断面図、
第３図（ａｌ及び（ｂ）は従来の水平構造型の薄膜磁気
ヘッドの製造方法を工程順に説明する
ための要部断面図、
第４図（ａ）及び（ｂ）は従来の磁気ギャップ層の形成
工程と問題点を説明するための要部断
面図である。FIGS. 1(a) and (b) are cross-sectional views of essential parts for explaining the principle of the method of forming a magnetic gap layer of the present invention, and FIG. 3(a) and 3(b) are cross-sectional views of main parts for explaining a method for manufacturing a conventional horizontal structure type thin film magnetic head in order of steps; FIGS. 4(a) and 4(b) are sectional views of essential parts for explaining the conventional process of forming a magnetic gap layer and the problems involved.
Claims (1)
プ層（３２）を被着し、更に下段面上の磁気ギャップ層
表面に下部磁極用の磁性層（３３）を形成する工程と、 前記磁性基板（３１）の上段面上の磁気ギャップ層表面
及び下部磁極用磁性層（３３）表面に第一層間絶縁層（
３４）、薄膜コイル（３５）、第二層間絶縁層（３６）
を順に積層形成した後、その上に上部磁気ヨーク層（３
７）の先端部を前記下部磁極用磁性層（３３）に、後端
部を前記磁性基板（３１）の上段面にそれぞれ接続した
状態で積層形成する工程と、 前記磁性基板（３１）を下段面上の下部磁極用磁性層（
３３）が露出するまでラッピング加工して、該磁性層（
３３）と残置した磁性基板（３１）からなる下部磁極（
４４）及び磁気ギャップ層（３２）が露出した媒体対向
面（４５）を形成する工程とを含むことを特徴とする薄
膜磁気ヘッドの製造方法。[Claims] A nonmagnetic magnetic gap layer (32) is deposited on a magnetic substrate (31) having a step, and a magnetic layer (33) for a lower magnetic pole is further formed on the surface of the magnetic gap layer on the lower surface. a step of forming a first interlayer insulating layer (
34), thin film coil (35), second interlayer insulation layer (36)
After forming layers in order, an upper magnetic yoke layer (3
7) forming a layer with the tip end connected to the lower magnetic layer (33) and the rear end connected to the upper surface of the magnetic substrate (31); Magnetic layer for the bottom pole on the surface (
Lapping is performed until the magnetic layer (33) is exposed.
33) and the lower magnetic pole (31) made up of the remaining magnetic substrate (31).
44) and forming a medium facing surface (45) in which the magnetic gap layer (32) is exposed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27444689A JP2707760B2 (en) | 1989-10-20 | 1989-10-20 | Method for manufacturing thin-film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27444689A JP2707760B2 (en) | 1989-10-20 | 1989-10-20 | Method for manufacturing thin-film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03137808A true JPH03137808A (en) | 1991-06-12 |
| JP2707760B2 JP2707760B2 (en) | 1998-02-04 |
Family
ID=17541801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27444689A Expired - Lifetime JP2707760B2 (en) | 1989-10-20 | 1989-10-20 | Method for manufacturing thin-film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2707760B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120141655A1 (en) * | 2009-08-11 | 2012-06-07 | Clarke Allan J | Vapor sheath for liquid dispensing nozzle |
-
1989
- 1989-10-20 JP JP27444689A patent/JP2707760B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120141655A1 (en) * | 2009-08-11 | 2012-06-07 | Clarke Allan J | Vapor sheath for liquid dispensing nozzle |
| US8986777B2 (en) * | 2009-08-11 | 2015-03-24 | GlaxoSmithKline, LLC | Vapor sheath for liquid dispensing nozzle |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2707760B2 (en) | 1998-02-04 |
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