JPH03147507A - Perpendicular magnetic thin-film head and production thereof - Google Patents
Perpendicular magnetic thin-film head and production thereofInfo
- Publication number
- JPH03147507A JPH03147507A JP28647689A JP28647689A JPH03147507A JP H03147507 A JPH03147507 A JP H03147507A JP 28647689 A JP28647689 A JP 28647689A JP 28647689 A JP28647689 A JP 28647689A JP H03147507 A JPH03147507 A JP H03147507A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic pole
- insulating layer
- magnetic
- thin film
- interlayer insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 60
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 39
- 239000010410 layer Substances 0.000 claims abstract description 160
- 239000011229 interlayer Substances 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 239000010408 film Substances 0.000 claims description 12
- 238000005498 polishing Methods 0.000 claims description 4
- 239000011347 resin Substances 0.000 abstract description 10
- 229920005989 resin Polymers 0.000 abstract description 10
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 10
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- -1 etc. Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 10
- 239000011241 protective layer Substances 0.000 description 9
- 238000009413 insulation Methods 0.000 description 6
- 229910018605 Ni—Zn Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000008646 thermal stress Effects 0.000 description 4
- 229910000859 α-Fe Inorganic materials 0.000 description 4
- 238000005336 cracking Methods 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000008961 swelling Effects 0.000 description 3
- 229910020641 Co Zr Inorganic materials 0.000 description 2
- 229910020520 Co—Zr Inorganic materials 0.000 description 2
- 229910003271 Ni-Fe Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
垂直磁化記録方式の磁気ディスク装置、或いは磁気テー
プ装置等に用いられる垂直磁気薄膜ヘッドとその製造方
法に関し、
平坦な主磁極形成領域を形成する無機絶縁層の製造プロ
セス中における熱膨脹率差による膨れやクランク及び剥
離等を解消し、製造歩留りの向上を図ることを目的とし
、
磁性基板上に、層間絶縁層で挟まれた薄膜コイルと、該
薄膜コイルの中心部に前記磁性基板と接続した磁極接続
層と、該磁極接続層に後端部を接続し、かつ先端部を媒
体対向面に露出した主磁極とを設けたヘッド構成におい
て、上記主磁極を上側の層間絶縁層上に直接配置し、か
つ磁極先端部と磁性基板間に無機絶縁層を設けた構造及
びその製造方法、または上記主磁極と上側層間絶縁層と
の間にlO〜50μ蒙の膜厚の無機絶縁層を設けた構造
及びその製造方法、或いは上記磁極接続層が層間絶縁層
上に延在し、前記主磁極は磁極接続層上に配置され、か
つ磁極先端部と磁性基板間に無機絶縁層を設けた構造及
びその製造方法により構成する。[Detailed Description of the Invention] [Summary] This invention relates to a perpendicular magnetic thin film head used in a perpendicular magnetization recording type magnetic disk device, a magnetic tape device, etc., and a method for manufacturing the same, an inorganic insulating layer forming a flat main pole forming region. The purpose of this technology is to improve manufacturing yield by eliminating swelling, cranking, and peeling caused by differences in thermal expansion coefficients during the manufacturing process. In a head configuration including a magnetic pole connecting layer connected to the magnetic substrate in the center, and a main magnetic pole having a rear end connected to the magnetic pole connecting layer and having a tip exposed to the medium facing surface, the main magnetic pole is A structure in which an inorganic insulating layer is disposed directly on the upper interlayer insulating layer and between the magnetic pole tip and the magnetic substrate, and a method for manufacturing the same, or an inorganic insulating layer of 10 to 50 μm between the main pole and the upper interlayer insulating layer. A structure in which a thick inorganic insulating layer is provided and a method for manufacturing the same, or the magnetic pole connecting layer extends on an interlayer insulating layer, the main magnetic pole is disposed on the magnetic pole connecting layer, and there is a gap between the magnetic pole tip and the magnetic substrate. It is constructed by a structure in which an inorganic insulating layer is provided on the top and a manufacturing method thereof.
本発明は垂直磁化記録方式の磁気ディスク装置、或いは
磁気テープ装置等に用いられる垂直磁気薄膜ヘッドとそ
の製造方法に関するものである。The present invention relates to a perpendicular magnetic thin film head used in a perpendicular magnetic recording type magnetic disk device, a magnetic tape device, etc., and a method for manufacturing the same.
近年、コンビエータシステムの外部記憶装置として広く
用いられている磁気ディスク装置等においては大容量化
に伴って高性能な磁気ヘッドが要求され、この要求を満
足させるものとして高密度記録が可能な垂直磁化記録方
式の薄膜磁気ヘッドが提案され、注目されている。In recent years, high-performance magnetic heads have been required to meet the increasing capacity of magnetic disk drives, which are widely used as external storage devices in combinator systems. A magnetization recording type thin film magnetic head has been proposed and is attracting attention.
このような垂直磁気薄膜ヘッドとしては、記録再生効率
がよく、かつ安定した製造方法が必要とされる。Such a perpendicular magnetic thin film head requires a manufacturing method that has high recording and reproducing efficiency and is stable.
上記した従来の垂直磁気薄膜ヘッドは、第4図(a)に
示すようにNi−Zn、 Mn−Zn等のフェライトか
らなる磁性基板1上に、熱硬化性絶縁樹脂等からなる第
一層間絶縁層2を介して渦巻状等の薄膜コイル3と第二
層間絶縁層4を順次積層形成した後、その第一、第二層
間絶縁層2.4で被包された薄膜コイル3の中心部に前
記磁性基板1と接続するように磁極接続層5を形成し、
その上面にA l tO,l、或いはSingなどから
なる厚い無機絶縁層6を被着形成する。As shown in FIG. 4(a), the conventional perpendicular magnetic thin film head described above has a magnetic substrate 1 made of ferrite such as Ni-Zn or Mn-Zn, and a first interlayer made of thermosetting insulating resin or the like. After sequentially laminating a spiral thin film coil 3 and a second interlayer insulating layer 4 via an insulating layer 2, the center portion of the thin film coil 3 is covered with the first and second interlayer insulating layers 2.4. forming a magnetic pole connection layer 5 so as to connect with the magnetic substrate 1;
A thick inorganic insulating layer 6 made of Al or Sing is deposited on the upper surface.
次に前記磁極接続層5を含む無機絶縁層6を第三層間絶
縁層4上に2〜5μm程度の膜厚が残存するように図中
のA−A’−点鎖線で示す位置まで平坦に研磨仕上げ加
工を行う。Next, the inorganic insulating layer 6 including the magnetic pole connecting layer 5 is flattened to the position indicated by the dashed line AA' in the figure so that a film thickness of about 2 to 5 μm remains on the third interlayer insulating layer 4. Perform polishing and finishing processing.
その後、第4図(b)に示すようにその平坦面にNi−
Feからなる主磁極7を、その先端部7aは後述する媒
体対向面9に露呈するように、また後端部7bは前記磁
極接続層5と接続するように形成する。After that, as shown in FIG. 4(b), Ni-
The main magnetic pole 7 made of Fe is formed so that its leading end 7a is exposed to a medium facing surface 9, which will be described later, and its rear end 7b is connected to the magnetic pole connecting layer 5.
ここで主磁極先端7aと磁性基板1との間にも無機絶縁
N6が形成されている。そしてその後、これら主磁極7
及び無機絶縁層6上の全面に対してAlzOsからなる
絶縁保護層8を被着形成し、更に前記主磁極先端部7a
の不要長さ部分を図中の一点鎖線Bで示す位置で絶縁保
護層8、無機絶縁層6及び直下の磁性基板1と共に切除
し、その切除面を媒体対向面9とするヘッドスライダ形
状に研磨仕上げ加工を行って第4図(C)に示すように
完成させている。Here, an inorganic insulation N6 is also formed between the main pole tip 7a and the magnetic substrate 1. And after that, these main magnetic poles 7
An insulating protective layer 8 made of AlzOs is deposited on the entire surface of the inorganic insulating layer 6, and the main pole tip 7a is
The unnecessary length portion is cut off along with the insulating protective layer 8, the inorganic insulating layer 6, and the magnetic substrate 1 immediately below at the position indicated by the dashed line B in the figure, and the cut surface is polished into a head slider shape with the medium facing surface 9. Finishing is performed to complete the structure as shown in FIG. 4(C).
ところで上記したような従来の単磁極型の垂直磁気薄膜
ヘッドでは、薄膜コイル3を被覆した第二層間絶縁層4
と主磁極7との間に、平坦な主磁極形成領域を確保して
形成する主磁極7のパターン精度を向上させるために、
A f zoz或いは5iOzなどからなる2〜5μm
程度の厚さの平坦な無機絶縁層6を介在させており、こ
の無機絶縁層6は適度な硬さを有するため、研磨仕上げ
による平坦化は容易であるが、その反面、該無機絶縁層
6は有機膜からなる第二層間絶縁層4との熱膨張率の差
が大きいため、例えばその平坦な無機絶縁層6上にスパ
ッタリング法等によりNi−Feからなる主磁極7を被
着形成する等の工程中における加熱により大きな熱応力
が加わる。By the way, in the conventional single-pole type perpendicular magnetic thin film head as described above, the second interlayer insulating layer 4 covering the thin film coil 3 is
In order to improve the pattern accuracy of the main magnetic pole 7 that is formed by ensuring a flat main magnetic pole formation area between the main magnetic pole 7 and the main magnetic pole 7,
2 to 5 μm consisting of A f zoz or 5iOz, etc.
A flat inorganic insulating layer 6 with a certain thickness is interposed, and since this inorganic insulating layer 6 has an appropriate hardness, it is easy to flatten it by polishing. Since there is a large difference in coefficient of thermal expansion from the second interlayer insulating layer 4 made of an organic film, for example, the main magnetic pole 7 made of Ni-Fe is deposited and formed on the flat inorganic insulating layer 6 by sputtering or the like. Large thermal stress is applied due to heating during the process.
従って、前記無機絶縁層6の膜厚が薄ければ薄いほど前
記熱膨張率差による熱応力が該無機絶縁層6の膜強度以
上となり、第5図に示すように無機絶縁層6に膨れやク
ランク、或いは剥離等が生じ、主磁極7の形成を妨げる
といった問題があった。Therefore, the thinner the inorganic insulating layer 6 is, the more the thermal stress due to the difference in thermal expansion coefficient becomes greater than the film strength of the inorganic insulating layer 6, causing blistering and swelling in the inorganic insulating layer 6, as shown in FIG. There was a problem in that cranking or peeling occurred, which hindered the formation of the main magnetic pole 7.
本発明は上記した従来の問題点に鑑み、平坦な主磁極形
成領域を形成する無機絶縁層の製造プロセス中における
熱膨張率差による膨れやクラック及び剥離等を解消し、
製造歩留りの向上を図った新規な単磁極型の垂直磁気薄
膜ヘッド及びその製造方法を提供することを目的とする
ものである。In view of the above-mentioned conventional problems, the present invention eliminates swelling, cracking, peeling, etc. due to the difference in thermal expansion coefficient during the manufacturing process of the inorganic insulating layer that forms the flat main pole forming region,
It is an object of the present invention to provide a novel single-pole type perpendicular magnetic thin film head and a method for manufacturing the same, which improves manufacturing yield.
本発明は上記した目的を達成するため、磁性基板上に、
層間絶縁層で挟まれた薄膜コイルと、該薄膜コイルの中
心部に前記磁性基板と接続した磁極接続層と、該磁極接
続層に後端部を接続し、かつ先端部を媒体対向面に露出
した主磁極とを設けたヘッド構成において、上記主磁極
を上側の層間絶縁層上に直接配置し、かつ磁極先端部と
磁性基板間に無機絶縁層を設けた構造及びその製造方法
、または上記主磁極と上側層間絶縁層との間に10〜5
0μmの膜厚の無機絶縁層を設けた構造及びその製造方
法、或いは上記磁極接続層が層間絶縁層上に延在し、前
記主磁極は磁極接続層上に配置され、かつ磁極先端部と
磁性基板間に無機絶縁層を設けた構造及びその製造方法
により構成する。In order to achieve the above-mentioned object, the present invention has a structure in which:
A thin film coil sandwiched between interlayer insulating layers, a magnetic pole connecting layer connected to the magnetic substrate at the center of the thin film coil, a rear end connected to the magnetic pole connecting layer, and a tip exposed to the medium facing surface. In a head configuration including a main magnetic pole, the main magnetic pole is directly disposed on an upper interlayer insulating layer, and an inorganic insulating layer is provided between the tip of the magnetic pole and a magnetic substrate, and a method for manufacturing the same, or 10 to 5 between the magnetic pole and the upper interlayer insulating layer
A structure in which an inorganic insulating layer with a film thickness of 0 μm is provided and a method for manufacturing the same, or the above-mentioned magnetic pole connecting layer extends on an interlayer insulating layer, the main magnetic pole is arranged on the magnetic pole connecting layer, and the magnetic pole tip and magnetic It is constructed by a structure in which an inorganic insulating layer is provided between substrates and a manufacturing method thereof.
本発明では、■薄膜コイルを被覆した熱硬化性絶縁樹脂
等からなる層間絶縁層と主磁極間に薄い無機絶縁層を介
在させずに、該層間絶縁層上に直接主磁極を形成するこ
とにより、製造プロセス中の加熱による従来の如き薄い
無機絶縁層に膨れ、クラック、剥離等の発生がなくなる
。■また薄膜コイルを被覆した熱硬化性絶縁樹脂等から
なる層間絶縁層と主磁極間に10〜50μmの厚い無機
絶縁層を介在させた構成とすることにより、該無機絶縁
層の膜強度が製造プロセス中の加熱による熱応力以上と
なり、該無機絶縁層に膨れ、クラック、剥離等が発生す
ることはない。■更に薄膜コイルを被覆した熱硬化性絶
縁樹脂等からなる層間絶縁層と主磁極間に磁極接続層を
薄膜コイルの中心部から延在させた構成とすることによ
り、従来の如き薄い無機絶縁層に膨れ、クランク、剥離
等の発生がなく、しかも磁極接続層の延在部分と接合さ
れた主磁極の磁気抵抗が低減され記録再生効率が高めら
れる。In the present invention, (1) the main magnetic pole is formed directly on the interlayer insulating layer without interposing a thin inorganic insulating layer between the interlayer insulating layer made of thermosetting insulating resin or the like covering the thin film coil and the main magnetic pole; This eliminates the occurrence of blistering, cracking, peeling, etc. in the conventional thin inorganic insulating layer due to heating during the manufacturing process. ■Also, by having a structure in which a thick inorganic insulating layer of 10 to 50 μm is interposed between the interlayer insulating layer made of thermosetting insulating resin etc. that covers the thin film coil and the main pole, the film strength of the inorganic insulating layer can be increased. The thermal stress caused by heating during the process will be exceeded, and the inorganic insulating layer will not swell, crack, peel, etc. ■Furthermore, by creating a structure in which a magnetic pole connecting layer is extended from the center of the thin film coil between the interlayer insulation layer made of thermosetting insulating resin etc. that coats the thin film coil and the main pole, it is possible to avoid the conventional thin inorganic insulation layer. There is no occurrence of bulging, cranking, peeling, etc., and the magnetic resistance of the main pole joined to the extended portion of the magnetic pole connecting layer is reduced, increasing recording and reproducing efficiency.
以下図面を用いて本発明の実施例について詳細に説明す
る。Embodiments of the present invention will be described in detail below with reference to the drawings.
第1図(a)〜(d+は本発明に係る単磁極型の垂直磁
気薄膜ヘッドとその製造方法の第1実施例を説明するた
めの要部断面図である。FIGS. 1A to 1D+ are cross-sectional views of essential parts for explaining a first embodiment of a single-pole type perpendicular magnetic thin film head and a method of manufacturing the same according to the present invention.
先ず第1図(a)に示すように、Ni−Znフェライト
からなる磁性基板11上に熱硬化性絶縁樹脂等からなる
層間絶縁層12で挟まれた薄膜コイル13を形成し、こ
の薄膜コイル13の中心部を前記磁性基板11が露出す
るように開口してその開口部に該磁性基板11と接続し
た状態にNi−Paからなる磁極接続層14をマスクめ
っき法により形成し、更にその磁極接続層14と前記層
間絶縁層12及び露出する磁性基板11の表面にA z
、o、からなる無機絶縁層15をスパッタリング法等
により被着形成する。First, as shown in FIG. 1(a), a thin film coil 13 sandwiched between interlayer insulating layers 12 made of thermosetting insulating resin or the like is formed on a magnetic substrate 11 made of Ni-Zn ferrite. The central part of the magnetic substrate 11 is opened so that the magnetic substrate 11 is exposed, and a magnetic pole connecting layer 14 made of Ni--Pa is formed by mask plating in the opening to be connected to the magnetic substrate 11. The layer 14, the interlayer insulating layer 12 and the exposed surface of the magnetic substrate 11 are coated with Az
, o, is deposited by a sputtering method or the like.
次に該無機絶縁層15及び磁極接続!14を前記層間絶
縁層12が露出するように、図中のA−A”−点鎖線で
示す位置まで平坦に研磨仕上げ加工を行って第1図(b
)に示すように平坦面16を形成する。Next, connect the inorganic insulating layer 15 and the magnetic pole! 14 is polished flat to the position indicated by the dashed line A-A" in the figure so that the interlayer insulating layer 12 is exposed, and
) A flat surface 16 is formed as shown in FIG.
しかる後、第1図(C)に示すようにその平坦面16上
にNi−Fe、、Co−Zr、或いはFe−3tなどか
らなる主磁極17を、その先端部17aは後述する媒体
対向面19に露呈するように、また後端部17bは前記
磁極接続層14と接続するように形成する。この際、主
磁極先端部17a 、l!:磁性基板11との間には無
機絶縁層15が形成されている。そしてこの後、これら
主磁極17及び無機絶縁層15上の全面にAI!z(h
からなる絶縁保護層18を被着形成する。Thereafter, as shown in FIG. 1(C), a main magnetic pole 17 made of Ni-Fe, Co-Zr, Fe-3t, etc. is placed on the flat surface 16, and its tip 17a forms a medium facing surface to be described later. 19, and the rear end portion 17b is formed so as to be connected to the magnetic pole connecting layer 14. At this time, the main pole tips 17a, l! : An inorganic insulating layer 15 is formed between the magnetic substrate 11 and the magnetic substrate 11 . After that, AI! is applied to the entire surface of the main pole 17 and the inorganic insulating layer 15! z(h
An insulating protective layer 18 consisting of the following is deposited.
更に前記主磁極先端部17aの不要長さ部分を図中の一
点鎖線Bで示す位置で絶縁保護層18と無機絶縁層15
及び直下の磁性基板11と共に切除し、その切除面を媒
体対向面19とするヘッドスライダ形状に研磨仕上げ加
工を行って第1図(d)に示すように完成させる。Furthermore, an insulating protective layer 18 and an inorganic insulating layer 15 are formed on the unnecessary length portion of the main pole tip 17a at a position indicated by a dashed line B in the figure.
The head slider is then cut off together with the magnetic substrate 11 immediately below, and the cut surface is polished into a head slider shape with the medium facing surface 19, thereby completing the structure as shown in FIG. 1(d).
このようにして製造された薄膜ヘッドでは、薄膜コイル
13を被覆した熱硬化性絶縁樹脂等からなる層間絶縁層
12上の平坦面16に直接、主磁極17を設けているた
め、製造プロセス中に従来の如き無機絶縁層の膨れ、ク
ランク、剥離等の発生がなく主磁極17が精度よく形成
され、製造歩留が向上する。なお主磁極と薄膜コイル間
の距離が縮められるので、記録再生効率も向上する。In the thin-film head manufactured in this manner, the main pole 17 is provided directly on the flat surface 16 on the interlayer insulating layer 12 made of thermosetting insulating resin or the like that coats the thin-film coil 13, so that The main magnetic pole 17 is formed with high precision without the occurrence of blistering, cranking, peeling, etc. of the inorganic insulating layer as in the prior art, and the manufacturing yield is improved. Note that since the distance between the main pole and the thin film coil is shortened, recording and reproducing efficiency is also improved.
また、第2図(al〜(d)は本発明に係る単磁極型の
垂直磁気薄膜ヘッドとその製造方法の第2実施例を説明
するための要部断面図であり、第1図(al〜(d)と
同等部分には同一符号を付している。Further, FIGS. 2A to 2D are cross-sectional views of main parts for explaining a second embodiment of a single-pole type perpendicular magnetic thin film head and a manufacturing method thereof according to the present invention, and FIGS. Parts equivalent to those in (d) are given the same reference numerals.
本実施例では第2図(alに示すように、Ni−Znフ
ェライトからなる磁性基板ll上に熱硬化性絶縁樹脂等
からなる層間絶縁層12で挟まれた薄膜コイル13を形
成し、この薄膜コイル13の中心部を前記磁性基板11
が露出するように開口してその開口部に該磁性基板11
と接続した状態にNi−Feからなる磁極接続層21を
マスクめっき法により厚く形成し、更にその磁極接続層
21と前記層間絶縁層12及び露出する磁性基板11の
表面にA l z(hからなる無機絶縁層22を10〜
50μ請以上の膜厚にスパッタリング法等により被着形
成する。In this embodiment, as shown in FIG. 2(al), a thin film coil 13 sandwiched between interlayer insulating layers 12 made of thermosetting insulating resin or the like is formed on a magnetic substrate ll made of Ni-Zn ferrite. The center of the coil 13 is connected to the magnetic substrate 11.
is opened so that the magnetic substrate 11 is exposed, and the magnetic substrate 11 is placed in the opening.
A thick magnetic pole connecting layer 21 made of Ni--Fe is formed by mask plating in a state connected to the magnetic pole connecting layer 21, the interlayer insulating layer 12, and the exposed surface of the magnetic substrate 11. The inorganic insulating layer 22 is 10~
The film is deposited to a thickness of 50 μm or more by sputtering or the like.
次に該無機絶縁層22を前記層間絶縁層12上に10〜
50D11の膜厚が残存するように磁極接続層21も含
めて図中のA−A’−点鎖線で示す位置まで平坦に研磨
仕上げ加工を行って第2図(ロ)に示すように平坦面2
3を形成する。Next, the inorganic insulating layer 22 is placed on the interlayer insulating layer 12.
A flat surface is obtained by polishing and finishing the magnetic pole connecting layer 21, including the magnetic pole connecting layer 21, to the position indicated by the dashed line A-A' in the figure so that a film thickness of 50D11 remains, as shown in FIG. 2 (b). 2
form 3.
その後、第2図(C)に示すようにその平坦面23上に
Ni−Fe5Co−Zr、或いはFe−5iなどからな
る主磁極24を、その先端部24aは後述する媒体対向
面26に露呈するように、また後端部24bは前記磁極
接続層21と接続するように形成する。この際、主磁極
先端部24aと磁性基板11との間には無機絶縁層22
が形成されている。そしてこの後、これら主磁i24及
び無機絶縁層22上の全面に対してA 7!gosから
なる絶縁保護層25を被着形成する。Thereafter, as shown in FIG. 2(C), a main magnetic pole 24 made of Ni-Fe5Co-Zr or Fe-5i is placed on the flat surface 23, and its tip 24a is exposed to a medium facing surface 26, which will be described later. Also, the rear end portion 24b is formed so as to be connected to the magnetic pole connection layer 21. At this time, an inorganic insulating layer 22 is provided between the main pole tip 24a and the magnetic substrate 11.
is formed. After that, A7! is applied to the entire surface of the main magnet i24 and the inorganic insulating layer 22. An insulating protective layer 25 made of Goss is deposited.
更に前記主磁極先端部24aの不要長さ部分を図中の一
点鎖線Bで示す位置で絶縁保護層25と無機絶縁層22
及び直下の磁性基板11と共に切除し、その切除面を媒
体対向面26とするヘッドスライダ形状に研磨仕上げ加
工を行って第2図(d)に示すように完成させる。Further, an insulating protective layer 25 and an inorganic insulating layer 22 are formed at the unnecessary length portion of the main pole tip 24a at a position indicated by a dashed line B in the figure.
Then, the head slider is cut off together with the magnetic substrate 11 immediately below, and polished and finished into a head slider shape with the cut surface serving as the medium facing surface 26 to complete the structure as shown in FIG. 2(d).
このような構成に製造された薄膜ヘッドでは、薄膜コイ
ル13を被覆した熱硬化性絶縁樹脂等からなる層間絶縁
層12上に、製造プロセス中の加熱による熱応力以上の
膜強度を有する厚い膜厚の無機絶縁N22を設けている
ため、従来の如き製造プロセス中に従来の如き無機絶縁
層の膨れ、クラック、或いは剥離等の発生がなくその表
面に主磁極24を精度よく形成することが可能となり、
製造歩留が向上する。In a thin film head manufactured with such a configuration, a thick film having a film strength greater than the thermal stress caused by heating during the manufacturing process is formed on the interlayer insulating layer 12 made of a thermosetting insulating resin or the like that covers the thin film coil 13. Since the inorganic insulating layer N22 is provided, the main magnetic pole 24 can be formed with high accuracy on the surface of the inorganic insulating layer without the occurrence of blistering, cracking, or peeling during the conventional manufacturing process. ,
Manufacturing yield is improved.
更に、第3図(a)〜(d)は本発明に係る単磁極型の
垂直磁気薄膜ヘッドとその製造方法の第3実施例を説明
するための要部断面図であり、第1図(al〜(d)と
同等部分には同一符号を付している。Furthermore, FIGS. 3(a) to 3(d) are sectional views of main parts for explaining a third embodiment of a single-pole type perpendicular magnetic thin film head and a manufacturing method thereof according to the present invention, and FIG. Portions equivalent to those in al to (d) are given the same reference numerals.
本実施例では第3図(a)に示すように、Ni−Znフ
ェライトからなる磁性基板11上に熱硬化性絶縁樹脂等
からなる層間絶縁層12で挟まれた薄膜コイル13を形
成し、この薄膜コイル13の中心部を前記磁性基板11
が露出するように開口してその開口部上から前記薄膜コ
イル13を挟んだ層間絶縁l1112上に延在するよう
にNi−Feからなる磁極接続N31を、前記磁性基板
11と接続した状態にマスクめっき法により厚く形成す
る。なお、該磁極接続層31の層間絶縁層12上に延在
された先端部は、後述する媒体対向面36から5〜20
μm離間した位置にあることが望ましい。In this embodiment, as shown in FIG. 3(a), a thin film coil 13 sandwiched between interlayer insulating layers 12 made of thermosetting insulating resin or the like is formed on a magnetic substrate 11 made of Ni-Zn ferrite. The center of the thin film coil 13 is connected to the magnetic substrate 11.
A magnetic pole connection N31 made of Ni--Fe is connected to the magnetic substrate 11 using a mask so that the magnetic pole connection N31 made of Ni--Fe is opened so as to be exposed and extends from above the opening onto the interlayer insulation l1112 sandwiching the thin film coil 13. Formed thickly using plating method. Note that the tip of the magnetic pole connecting layer 31 extending on the interlayer insulating layer 12 is 5 to 20 mm from the medium facing surface 36, which will be described later.
It is desirable that the positions be spaced apart by μm.
更にその磁極接続層31と前記層間絶縁層12及び露出
する磁性基板11の表面にA l 203からなる無機
絶縁層32を前記磁極接続層31の膜厚と同等、または
それよりも厚くスパッタリング法等により被着形成する
。Further, an inorganic insulating layer 32 made of Al 203 is formed on the magnetic pole connecting layer 31, the interlayer insulating layer 12, and the exposed surface of the magnetic substrate 11 to a thickness equal to or thicker than that of the magnetic pole connecting layer 31 by sputtering, etc. Adhesion is formed by
次に磁極接続層31を前記層間絶縁層12上に所定の膜
厚が残存するように無機絶縁JiJ32をも含めて図中
のA−A’−点鎖線で示す位置まで平坦に研磨仕上げ加
工を行って第3図(b)に示すように平坦面33を形成
する。Next, the magnetic pole connecting layer 31 is flattened and polished to the position indicated by the dashed line AA' in the figure, including the inorganic insulating JiJ32, so that a predetermined film thickness remains on the interlayer insulating layer 12. Then, a flat surface 33 is formed as shown in FIG. 3(b).
しかる後、第3図(C)に示すようにその平坦面33上
にNt−Fe、 Co−Zr、或いはFe−3tなどか
らなる高飽和磁化、高透磁率を有する主磁極34を、そ
の先端部34aが後述する媒体対向面36に露呈するよ
うに、またその後端部34bは前記磁極接続N31と接
続するように形成する。この際、該主磁極先端部34a
と磁性基板11との間には無機絶縁層32が形成されて
いる。そしてこの後、これら主磁極34及び無機絶縁層
32上の全面にAf、O,からなる絶縁保護層35を被
着形成する。Thereafter, as shown in FIG. 3(C), a main magnetic pole 34 having high saturation magnetization and high magnetic permeability made of Nt-Fe, Co-Zr, or Fe-3t, etc. is placed on the flat surface 33 at its tip. The portion 34a is formed to be exposed to a medium facing surface 36, which will be described later, and the rear end portion 34b is formed to be connected to the magnetic pole connection N31. At this time, the main pole tip 34a
An inorganic insulating layer 32 is formed between the magnetic substrate 11 and the magnetic substrate 11 . Thereafter, an insulating protective layer 35 made of Af and O is deposited on the entire surface of the main pole 34 and the inorganic insulating layer 32.
更に前記主磁極先端部34aの不要長さ部分を図中の一
点鎖線Bで示す位置で絶縁保護層35、無機絶縁層32
及び直下の磁性基板11と共に切除し、その切除面を媒
体対向面36とするヘッドスライダ形状に研磨仕上げ加
工を行って第3図(d)に示すように完成させる。Furthermore, an insulating protective layer 35 and an inorganic insulating layer 32 are formed on the unnecessary length portion of the main pole tip 34a at a position indicated by a dashed line B in the figure.
Then, the head slider is cut off together with the magnetic substrate 11 immediately below, and polished and finished into a head slider shape with the cut surface serving as the medium facing surface 36 to complete the structure as shown in FIG. 3(d).
かかる構成に製造された薄膜ヘッドでは、層間絶縁層1
2上に延在された磁極接続層31と無機絶縁層32との
平坦面33上に直接、主磁極34を設けているため、従
来の如き製造プロセス中に無機絶縁層の膨れ、クラック
、或いは剥離等の発生がなく、その表面に主磁極34を
精度よく形成することが可能となり、製造歩留が向上す
る。また主磁極34が磁極接続層31の延在部分と接合
されることによる磁気抵抗の低減と、実効的に主磁極3
4と薄膜コイル13間の距離が縮められる等により記録
再生効率が高められる。In a thin film head manufactured with such a configuration, the interlayer insulating layer 1
Since the main magnetic pole 34 is provided directly on the flat surface 33 of the magnetic pole connecting layer 31 and the inorganic insulating layer 32 that extend on the magnetic pole connecting layer 31 and the inorganic insulating layer 32, there is no possibility that the inorganic insulating layer will bulge, crack, or form during the conventional manufacturing process. There is no occurrence of peeling, etc., and the main magnetic pole 34 can be formed on the surface with high precision, improving manufacturing yield. Furthermore, since the main magnetic pole 34 is joined to the extended portion of the magnetic pole connection layer 31, the magnetic resistance is reduced, and the main magnetic pole 34 is effectively
4 and the thin film coil 13, etc., the recording and reproducing efficiency is increased.
以上の説明から明らかなように、本発明に係る垂直磁気
薄膜ヘッドとその製造方法によれば、層間絶縁層で挟ま
れた薄膜コイル上の主磁極形成面に従来の如き製造プロ
セス中に無機絶縁層の膨れ、クラック、或いは剥離等の
発生がなく、その表面に主磁極を精度よく形成すること
が可能となり、製造歩留が向上する利点を有する。また
第1実施例及び第3実施例では記録再生効率が高められ
、高性能な垂直磁気薄膜ヘッドを得ることができる等、
実用上価れた効果を奏する。As is clear from the above description, according to the perpendicular magnetic thin film head and the manufacturing method thereof according to the present invention, inorganic insulation is formed on the main pole forming surface of the thin film coil sandwiched between interlayer insulating layers during the conventional manufacturing process. There is no occurrence of layer bulges, cracks, or peeling, and the main pole can be formed on the surface with high precision, which has the advantage of improving manufacturing yield. Furthermore, in the first and third embodiments, the recording and reproducing efficiency is increased, and a high-performance perpendicular magnetic thin film head can be obtained.
It has a practical effect.
第1図(a)〜(dlは本発明に係る単磁極型の垂直磁
気薄膜ヘッドとその製造方法の第1実
施例を説明するための要部断面図、
第2図(a)〜(ロ)は本発明に係る単磁極型の垂直磁
気薄膜ヘッドとその製造方法の第2実
施例を説明するための要部断面図、
第3図(a)〜(d)は本発明に係る単磁極型の垂直磁
気薄膜ヘッドとその製造方法の第3実
施例を説明するための要部断面図、
第4図(a)〜(C)は従来の単磁極型の垂直磁気ヘッ
ドとその製造方法を説明するための要
部断面図、
第5図は従来の単磁極型の垂直磁気ヘッドの製造上の問
題点を説明するための要部断
面図である。
第1図(a) 〜(d)から第3図(a) 〜(d)お
いて、11は磁性基板、12は層間絶縁層、13は薄膜
コイル、14.21.31は磁極接続層、15゜22.
32は無機絶縁層、16,23.33は平坦面、17.
24.34は主磁極、1B、25.35は絶縁保護層、
19.26.36は媒体対向面をそれぞれ示す。
(d)
第
図FIGS. 1(a) to (dl) are sectional views of essential parts for explaining a first embodiment of a single-pole type perpendicular magnetic thin film head and its manufacturing method according to the present invention; FIGS. 2(a) to (dl) ) is a sectional view of a main part for explaining a second embodiment of a single magnetic pole type perpendicular magnetic thin film head and a manufacturing method thereof according to the present invention, and FIGS. 3(a) to (d) are single magnetic pole type perpendicular magnetic thin film heads according to the present invention. Figures 4(a) to 4(C) are cross-sectional views of main parts for explaining a third embodiment of a conventional single-pole type perpendicular magnetic thin-film head and its manufacturing method. Fig. 5 is a cross-sectional view of main parts for explaining the manufacturing problems of a conventional single-pole type perpendicular magnetic head. Figs. 1(a) to (d) 3(a) to (d), 11 is a magnetic substrate, 12 is an interlayer insulating layer, 13 is a thin film coil, 14.21.31 is a magnetic pole connection layer, 15°22.
32 is an inorganic insulating layer, 16, 23.33 is a flat surface, 17.
24.34 is the main magnetic pole, 1B, 25.35 is the insulation protective layer,
19, 26, and 36 indicate the medium facing surfaces, respectively. (d) Figure
Claims (6)
まれた薄膜コイル(13)と、該薄膜コイル(13)の
中心部に前記磁性基板(11)と接続した磁極接続層(
14)と、該磁極接続層(14)に後端部を接続し、か
つ先端部を媒体対向面(19)に露出した主磁極(17
)とを設けたヘッド構成において、 上記主磁極(17)は、上側の層間絶縁層(12)上に
直接配置され、かつ磁極先端部と磁性基板(11)間に
無機絶縁層(15)を設けたことを特徴とする垂直磁気
薄膜ヘッド。(1) A thin film coil (13) sandwiched between interlayer insulating layers (12) on a magnetic substrate (11), and a magnetic pole connecting layer connected to the magnetic substrate (11) at the center of the thin film coil (13). (
14), and a main magnetic pole (17) whose rear end is connected to the magnetic pole connection layer (14) and whose tip is exposed to the medium facing surface (19).
), the main magnetic pole (17) is placed directly on the upper interlayer insulating layer (12), and an inorganic insulating layer (15) is provided between the magnetic pole tip and the magnetic substrate (11). A perpendicular magnetic thin film head characterized by the following.
まれた薄膜コイル(13)と、該薄膜コイル(13)の
中心部に該基板(11)と接続する磁極接続層(14)
を形成し、該層間絶縁層(12)及び磁極接続層(14
)を含む磁性基板(11)上に無機絶縁層(15)を形
成し、該無機絶縁層(15)及び磁極接続層(14)を
前記層間絶縁層(12)が露出するように平坦化研磨す
る工程と、 該平坦化した無機絶縁層(15)と層間絶縁層(12)
上に主磁極(17)を、その先端部が媒体対向面(19
)に露出し、かつ後端部を磁極接続層(14)と接続す
るように形成する工程とを含むことを特徴とする垂直磁
気薄膜ヘッドの製造方法。(2) A thin film coil (13) sandwiched between interlayer insulating layers (12) on a magnetic substrate (11), and a magnetic pole connecting layer (13) connected to the substrate (11) at the center of the thin film coil (13). 14)
The interlayer insulating layer (12) and the magnetic pole connecting layer (14) are formed.
), and the inorganic insulating layer (15) and the magnetic pole connection layer (14) are planarized and polished so that the interlayer insulating layer (12) is exposed. the flattened inorganic insulating layer (15) and the interlayer insulating layer (12);
The main pole (17) is placed on top, and its tip is placed on the medium facing surface (19).
) and forming the rear end so as to be connected to a magnetic pole connecting layer (14).
まれた薄膜コイル(13)と、該薄膜コイル(13)の
中心部に前記磁性基板(11)と接続した磁極接続層(
14)と、該磁極接続層(14)に後端部を接続し、か
つ先端部を媒体対向面(19)に露出した主磁極(17
)とを設けたヘッド構成において、 上記主磁極(24)と上側層間絶縁層(12)との間に
10〜50μmの膜厚の無機絶縁層(22)を設けて成
ることを特徴とする垂直磁気薄膜ヘッド。(3) A thin film coil (13) sandwiched between interlayer insulating layers (12) on a magnetic substrate (11), and a magnetic pole connecting layer connected to the magnetic substrate (11) at the center of the thin film coil (13). (
14), and a main magnetic pole (17) whose rear end is connected to the magnetic pole connection layer (14) and whose tip is exposed to the medium facing surface (19).
), characterized in that an inorganic insulating layer (22) with a thickness of 10 to 50 μm is provided between the main pole (24) and the upper interlayer insulating layer (12). Magnetic thin film head.
まれた薄膜コイル(13)と、該薄膜コイル(13)の
中心部に該基板(11)と接続する磁極接続層(21)
を形成し、該層間絶縁層(12)及び磁極接続層(21
)を含む磁性基板(11)上に無機絶縁層(22)を厚
く形成し、その無機絶縁層(22)を10〜50μmの
膜厚分残すように前記磁極接続層(21)と共に平坦化
研磨する工程と、該平坦化した無機絶縁層(22)と磁
極接続層(21)上に主磁極(24)を、その先端部が
媒体対向面(26)に露出するように形成する工程とを
含むことを特徴とする垂直磁気薄膜ヘッドの製造方法。(4) A thin film coil (13) sandwiched between interlayer insulating layers (12) on a magnetic substrate (11), and a magnetic pole connecting layer (13) connected to the substrate (11) at the center of the thin film coil (13). 21)
, and the interlayer insulating layer (12) and the magnetic pole connecting layer (21
) A thick inorganic insulating layer (22) is formed on the magnetic substrate (11) containing the magnetic pole connecting layer (21), and the inorganic insulating layer (22) is planarized and polished to leave a film thickness of 10 to 50 μm. and a step of forming a main magnetic pole (24) on the flattened inorganic insulating layer (22) and the magnetic pole connecting layer (21) so that its tip is exposed to the medium facing surface (26). A method of manufacturing a perpendicular magnetic thin film head, comprising:
まれた薄膜コイル(13)と、該薄膜コイル(13)の
中心部に前記磁性基板(11)と接続した磁極接続層(
14)と、該磁極接続層(14)に後端部を接続し、か
つ先端部を媒体対向面(19)に露出した主磁極(17
)とを設けたヘッド構成において、 上記磁極接続層(31)は層間絶縁層(12)上に延在
し、前記主磁極(34)は磁極接続層(31)上に配置
され、磁極先端部と磁性基板(11)間に無機絶縁層(
32)を設けたことを特徴とする垂直磁気薄膜ヘッド。(5) A thin film coil (13) sandwiched between interlayer insulating layers (12) on a magnetic substrate (11), and a magnetic pole connecting layer connected to the magnetic substrate (11) at the center of the thin film coil (13). (
14), and a main magnetic pole (17) whose rear end is connected to the magnetic pole connection layer (14) and whose tip is exposed to the medium facing surface (19).
), the magnetic pole connecting layer (31) extends on the interlayer insulating layer (12), the main magnetic pole (34) is arranged on the magnetic pole connecting layer (31), and the magnetic pole tip part An inorganic insulating layer (
32) A perpendicular magnetic thin film head characterized in that it is provided with:
まれた薄膜コイル(13)と、該層間絶縁層(12)上
から薄膜コイル(13)の中心部に該基板(11)と接
続するように磁極接続層(31)を形成する工程と、該
磁極接続層(31)を含む基板(11)上に無機絶縁層
(32)を形成し、その磁極接続層(31)を所定の膜
厚分残すように前記無機絶縁層(32)と共に平坦化研
磨する工程と、 該平坦化した磁極接続層(31)と無機絶縁層(32)
上に主磁極(34)を、その先端部が媒体対向面(36
)に露出するように形成する工程とを含むことを特徴と
する垂直磁気薄膜ヘッドの製造方法。(6) A thin film coil (13) sandwiched between interlayer insulating layers (12) on a magnetic substrate (11), and a thin film coil (13) sandwiched between the interlayer insulating layers (12) and the center of the thin film coil (13) on the magnetic substrate (11). ), forming an inorganic insulating layer (32) on the substrate (11) including the magnetic pole connecting layer (31); a step of planarizing and polishing the magnetic pole connecting layer (31) and the inorganic insulating layer (32) together with the inorganic insulating layer (32) so as to leave a predetermined film thickness;
The main pole (34) is placed on top, and its tip is placed on the medium facing surface (36).
) A method of manufacturing a perpendicular magnetic thin film head, comprising the step of forming the head so as to expose the head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28647689A JPH03147507A (en) | 1989-11-01 | 1989-11-01 | Perpendicular magnetic thin-film head and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28647689A JPH03147507A (en) | 1989-11-01 | 1989-11-01 | Perpendicular magnetic thin-film head and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03147507A true JPH03147507A (en) | 1991-06-24 |
Family
ID=17704888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28647689A Pending JPH03147507A (en) | 1989-11-01 | 1989-11-01 | Perpendicular magnetic thin-film head and production thereof |
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Country | Link |
---|---|
JP (1) | JPH03147507A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05128446A (en) * | 1991-10-30 | 1993-05-25 | Sharp Corp | Thin-film magnetic head and production of the same |
US7245454B2 (en) | 2003-05-15 | 2007-07-17 | Tdk Corporation | Magnetic head for vertical magnetic recording including main pole layer having varying width and thickness, head gimbal assembly, and hard disk drive |
-
1989
- 1989-11-01 JP JP28647689A patent/JPH03147507A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05128446A (en) * | 1991-10-30 | 1993-05-25 | Sharp Corp | Thin-film magnetic head and production of the same |
US7245454B2 (en) | 2003-05-15 | 2007-07-17 | Tdk Corporation | Magnetic head for vertical magnetic recording including main pole layer having varying width and thickness, head gimbal assembly, and hard disk drive |
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