JPH01292645A - Production of information recording medium - Google Patents
Production of information recording mediumInfo
- Publication number
- JPH01292645A JPH01292645A JP12064888A JP12064888A JPH01292645A JP H01292645 A JPH01292645 A JP H01292645A JP 12064888 A JP12064888 A JP 12064888A JP 12064888 A JP12064888 A JP 12064888A JP H01292645 A JPH01292645 A JP H01292645A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- plastic substrate
- magneto
- information recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000004033 plastic Substances 0.000 claims abstract description 17
- 230000000694 effects Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 abstract description 11
- 239000011241 protective layer Substances 0.000 abstract description 7
- 230000007423 decrease Effects 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 abstract description 2
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 239000010408 film Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000011253 protective coating Substances 0.000 description 3
- 238000005336 cracking Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002991 molded plastic Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、プラスチック基板を用いた情報記録媒体の製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an information recording medium using a plastic substrate.
[従来の技術]
従来、プラスチック基板を用いた情報記録媒体を製造す
る際には、成形したプラスチック基板を無変形状態で保
持し、これの上に情報記録機能を有する膜構造体を蒸着
法やスパッタリング法、スピンコード法等によって、成
膜していた。[Prior Art] Conventionally, when manufacturing information recording media using plastic substrates, a molded plastic substrate is held in an undeformed state, and a film structure having an information recording function is deposited on it using a vapor deposition method or the like. The film was formed by sputtering method, spin code method, etc.
[発明が解決しようとする課題〕
ところが、蒸着法やスパッタリング法、スピンコード法
等によって形成した膜は、一般に内部応力が発生する。[Problems to be Solved by the Invention] However, internal stress generally occurs in films formed by vapor deposition, sputtering, spin-coding, or the like.
このため、基板上に膜構造体を形成すると、膜中に発生
した内部応力により膜形成後にプラスチック基板が変形
して、反りを生じたり、基板の弾性変形に伴い発生する
復元力と平衡状態をとって残留する膜の内部応力のため
に、膜割れや膜はがれが起こる等の問題があった。For this reason, when a film structure is formed on a substrate, the internal stress generated in the film may deform the plastic substrate after the film is formed, resulting in warping, or the equilibrium state with the restoring force generated due to the elastic deformation of the substrate. There have been problems such as film cracking and film peeling due to residual internal stress in the film.
本発明は、上記問題点を解決するために成されたもので
あり、その目的は、基板の変形および膜構造中の残留内
部応力が少なく、信頼性の高い情報記録媒体の製造方法
を提供することにある。The present invention has been made to solve the above problems, and its purpose is to provide a method for manufacturing a highly reliable information recording medium with less deformation of the substrate and less residual internal stress in the film structure. There is a particular thing.
上記の目的は、プラスチック基板上に情報記録機能を有
する膜構造体を設けることにより情報記録媒体を製造す
る方法において、膜構造体中に発生する内部応力を緩和
する方向に復元作用が働くようプラスチック基板に外力
を加えて弾性変形状態に堡持し、かかる弾性変形状態の
プラスチック基板の上に膜構造体を形成した後、外力を
除去し、プラスチック基板を復元させることにより達成
できる。The above purpose is to provide a method for manufacturing an information recording medium by providing a film structure having an information recording function on a plastic substrate, in which the plastic material has a restoring effect in the direction of relieving the internal stress generated in the film structure. This can be achieved by applying an external force to the substrate to keep it in an elastically deformed state, forming a membrane structure on the plastic substrate in the elastically deforming state, and then removing the external force and restoring the plastic substrate.
上記外力を加えるには、平板状の基板を保持するディス
クホルダーとして、表面が凹状または凸状のものを用い
ること等の方法により、なしつる。To apply the external force, a method such as using a disk holder with a concave or convex surface to hold the flat substrate is used.
以下、本発明を実施例によって、さらに詳細に説明する
。Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例1
第3図に示すような光磁気ディスクを以下に述べる方法
で作製した。Example 1 A magneto-optical disk as shown in FIG. 3 was manufactured by the method described below.
射出成形したφ130闘の平板状のポリカーボネート基
板1上に、下地保護層2、光磁気記録層3、上地保護層
4を順次スパッタリング法により、成膜した。このとき
、上、下地保護層2.4は、材料として窒化シリコンを
用い、これを0、IPaのArガス雰囲気中で成膜して
、各々1000Aの膜厚とした。A base protective layer 2, a magneto-optical recording layer 3, and a top protective layer 4 were sequentially formed on an injection-molded flat polycarbonate substrate 1 having a diameter of 130 mm by a sputtering method. At this time, the upper and base protective layers 2.4 were formed using silicon nitride as a material in an Ar gas atmosphere of 0.0 IPa, and each had a film thickness of 1000 A.
光磁気記録層3は、材料としてTb−Fe非晶質合金薄
膜を用い、二次元同時スパッタ法により成膜し、800
Aの膜厚とした。The magneto-optical recording layer 3 was formed by a two-dimensional simultaneous sputtering method using a Tb-Fe amorphous alloy thin film as a material.
The film thickness was set to A.
ここで、成膜時のポリカーボネート基板は、第1図に示
すような形状に弾性変形させて保持しておいた。即ち、
ディスク支持テーブル6、センターマスク7、および外
周マスク8を主構成部品とするディスクホルダー5によ
り、平板状のポリカーボネート基板lを、基板中心部で
の接平面に対する、基板端部(r=65mm)における
変位量で定義した反り量が5mmになるように基板の成
膜面側に凹型の反りをもたせた固定しておいた。この状
態で、上記したように各膜を成膜し積層すると、膜中に
強い圧縮応力が生じる。この内部応力は、基板に対して
、膜構造体が膨張しようとする方向、即ち、基板を成膜
面側に凸型に変形させようとする方向に作用する。また
、膜中の圧縮応力は、膜自体が膨張すると、膨張に伴な
って減少し緩和される。Here, during film formation, the polycarbonate substrate was held while being elastically deformed into the shape shown in FIG. That is,
A flat polycarbonate substrate l is held at the edge of the substrate (r=65 mm) with respect to the tangential plane at the center of the substrate by a disk holder 5 whose main components include a disk support table 6, a center mask 7, and an outer peripheral mask 8. The substrate was fixed with a concave warp on the film-forming surface side so that the amount of warpage defined by the amount of displacement was 5 mm. In this state, when each film is formed and laminated as described above, strong compressive stress is generated in the film. This internal stress acts on the substrate in a direction in which the film structure tends to expand, that is, in a direction in which the substrate is deformed into a convex shape toward the film-forming surface. Furthermore, when the film itself expands, the compressive stress in the film decreases and is relaxed as the film expands.
さて、上記の方法で成膜された光磁気ディスクをディス
クホルダー5から解放し復元させると、膜構造体は成膜
直後の状態に比して膨張し、内部応力が□緩和される。Now, when the magneto-optical disk formed by the above method is released from the disk holder 5 and restored, the film structure expands compared to the state immediately after the film formation, and the internal stress is relaxed.
こうして製造された光磁気ディスク単板の、前述した定
義による反り量を測定すると、10μmはど膜面側に凸
型に反っていた。When the amount of warpage of the single plate of the magneto-optical disk manufactured in this manner was measured as defined above, it was found that 10 μm was warped in a convex shape on the outer surface side.
比較例1
比較用に、ポリカーボネート基板1を無変形状態で保持
して各膜を成膜した他は、実施例1と同様の材料、方法
で同様の構成の光磁気ディスクを製造したところ、反り
量は膜面側凸型に150μmであった。Comparative Example 1 For comparison, a magneto-optical disk with the same configuration was manufactured using the same materials and method as in Example 1, except that each film was formed while holding the polycarbonate substrate 1 in an undeformed state. The amount was 150 μm in the convex shape on the membrane surface side.
(耐久試験)
更に、実施例1および比較例1の光磁気ディスクを60
℃、相対湿度90%の恒温恒湿槽に投入し、1000時
間の耐久試験を行なったところ、比較例1の光磁気ディ
スクは、膜面全体に膜割れが発生したが、実施例1の光
磁気ディスクは外観上全く変化が見られなかった。(Durability test) Furthermore, the magneto-optical disks of Example 1 and Comparative Example 1 were
When the magneto-optical disk of Comparative Example 1 was placed in a constant temperature and humidity chamber at 90% relative humidity and subjected to a 1,000-hour durability test, film cracking occurred on the entire surface of the magneto-optical disk, but the optical disk of Example 1 did not. No change was observed in the appearance of the magnetic disk.
実施例2
実施例1で作製した光磁気ディスクを、紫外線硬化型樹
脂で以下のように保護コートした。Example 2 The magneto-optical disk produced in Example 1 was protective coated with an ultraviolet curable resin as follows.
光磁気ディスクの成膜面側に未硬化樹脂を通常の方法で
スピンコードした後、この光磁気ディスク9を第2図に
示すような形状に弾性変形させて保持した。即ち、ディ
スクホルダー5により、基板の成膜面側に凸型に10J
Imはどの反りをもった実施例1のディスクを、更に3
mm程度の反りをもたせた状態に弾性変形させて排気孔
10による真空チャックで固定した。この状態で、塗布
済みの紫外線硬化型樹脂を紫外線11で硬化させると、
保護コート層の硬化収縮により保護コート層中に収縮し
ようとする引張応力が発生する。この内部応力は保護コ
ート層の収縮に伴なって、減少し緩和される。After spin-coding uncured resin on the film-forming surface of the magneto-optical disk using a conventional method, the magneto-optical disk 9 was held while being elastically deformed into the shape shown in FIG. That is, the disk holder 5 holds a convex 10J on the film forming surface side of the substrate.
Im further tested the disk of Example 1 with which warp by 3
It was elastically deformed into a state with a warp of about mm and then fixed using a vacuum chuck with an exhaust hole 10. In this state, when the applied UV curable resin is cured with UV 11,
Due to curing and shrinkage of the protective coat layer, tensile stress that tends to shrink is generated in the protective coat layer. This internal stress is reduced and relaxed as the protective coating layer shrinks.
上記の方法で保護コート層を形成した光磁気ディスクを
ディスクホルダー5から開放し復元させると保護コート
層は、形成直後の状態に比して収縮し、内部応力が緩和
される。When the magneto-optical disk on which the protective coat layer has been formed by the above method is released from the disk holder 5 and restored, the protective coat layer contracts compared to the state immediately after formation, and the internal stress is relaxed.
こうして製造された、保護コート層で膜面が被覆された
光磁気ディスクの反り量を測定したが、測定精度内で反
りは測定されなかった。The amount of warpage of the thus manufactured magneto-optical disk whose film surface was coated with a protective coating layer was measured, but no warp was measured within the measurement accuracy.
比較例2
比較用に、実施例1の光磁気ディスクに未硬化樹脂を塗
布した後、外力を加えずに、そのままの状態で硬化させ
た保護コート層付き光磁気ディスクを製造したところ、
反り量はコート面側に凹型に100μmであった・
〔発明の効果〕
以上詳細に説明したように、本発明の情報記録媒体の製
造方法によれば、プラスチック基板上に形成された膜構
造体の内部応力を低減させることができ、情報記録媒体
の耐環境性を向上させることができるばかりでなく、基
板の反りを低下させることができる。Comparative Example 2 For comparison, a magneto-optical disk with a protective coating layer was manufactured by applying an uncured resin to the magneto-optical disk of Example 1 and then curing it in that state without applying any external force.
The amount of warpage was 100 μm in the concave shape on the coated surface side. [Effects of the Invention] As explained in detail above, according to the method for manufacturing an information recording medium of the present invention, the film structure formed on the plastic substrate The internal stress of the substrate can be reduced, and the environmental resistance of the information recording medium can be improved, as well as the warpage of the substrate can be reduced.
第1図は本発明の実施例1を実施する場合の成膜時にお
ける、基板の保持状態を示す略断面図、第2図は本発明
の実施例2を実施する場合の紫外線照射時における、デ
ィスクの保持状態を示す略断面図、第3図は本発明の一
実施例により製造された情報記録媒体の模式断面図であ
る。
に基板 2:下地保護層
3:光磁気記録層 4:上地保護層
5:ディスクホルダー
6:ディスク支持テーブル
7:センターマスク 8:外周マスク
9:未硬化樹脂を塗布した状態の光磁気ディスク
10:真空チャック用排気孔
11:照射紫外線FIG. 1 is a schematic cross-sectional view showing the holding state of the substrate during film formation in the case of implementing Example 1 of the present invention, and FIG. FIG. 3 is a schematic cross-sectional view of an information recording medium manufactured according to an embodiment of the present invention. Substrate 2: Base protective layer 3: Magneto-optical recording layer 4: Upper protective layer 5: Disk holder 6: Disk support table 7: Center mask 8: Perimeter mask 9: Magneto-optical disk 10 coated with uncured resin : Vacuum chuck exhaust hole 11: Irradiation ultraviolet rays
Claims (1)
体を設けることにより情報記録媒体を製造する方法にお
いて、膜構造体中に発生する内部応力を緩和する方向に
復元作用が働くようプラスチック基板に外力を加えて弾
性変形状態に保持し、かかる弾性変形状態のプラスチッ
ク基板の上に膜構造体を形成した後、外力を除去し、プ
ラスチック基板を復元させることを特徴とする情報記録
媒体の製造方法。1) In a method of manufacturing an information recording medium by providing a film structure having an information recording function on a plastic substrate, an external force is applied to the plastic substrate so that a restoring effect acts in the direction of relieving the internal stress generated in the film structure. A method for producing an information recording medium, which comprises: applying and holding the plastic substrate in an elastically deformed state, forming a film structure on the elastically deformed plastic substrate, and then removing an external force to restore the plastic substrate to its original state.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12064888A JP2571819B2 (en) | 1988-05-19 | 1988-05-19 | Manufacturing method of information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12064888A JP2571819B2 (en) | 1988-05-19 | 1988-05-19 | Manufacturing method of information recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01292645A true JPH01292645A (en) | 1989-11-24 |
JP2571819B2 JP2571819B2 (en) | 1997-01-16 |
Family
ID=14791428
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12064888A Expired - Fee Related JP2571819B2 (en) | 1988-05-19 | 1988-05-19 | Manufacturing method of information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2571819B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997018342A1 (en) * | 1995-11-13 | 1997-05-22 | Balzers Aktiengesellschaft | Coating process and suitable substrate holder |
EP0962548A2 (en) * | 1998-06-01 | 1999-12-08 | Sharp Kabushiki Kaisha | Method for deposition of a stressed film |
CN107498896A (en) * | 2017-08-15 | 2017-12-22 | 珠海市春生五金工业有限公司 | The internal stress minimizing technology and method for paint spraying of plastic product |
-
1988
- 1988-05-19 JP JP12064888A patent/JP2571819B2/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997018342A1 (en) * | 1995-11-13 | 1997-05-22 | Balzers Aktiengesellschaft | Coating process and suitable substrate holder |
US5738729A (en) * | 1995-11-13 | 1998-04-14 | Balzers Aktiengesellschaft | Coating chamber, accompanying substrate carrier, vacuum evaporation and coating method |
CH692000A5 (en) * | 1995-11-13 | 2001-12-31 | Unaxis Balzers Ag | Coating chamber, substrate carrier therefor, method of vacuum deposition and coating methods. |
EP0962548A2 (en) * | 1998-06-01 | 1999-12-08 | Sharp Kabushiki Kaisha | Method for deposition of a stressed film |
JPH11345807A (en) * | 1998-06-01 | 1999-12-14 | Sharp Corp | Stress load film and manufacturing method therefor |
EP0962548A3 (en) * | 1998-06-01 | 2001-07-25 | Sharp Kabushiki Kaisha | Method for deposition of a stressed film |
CN107498896A (en) * | 2017-08-15 | 2017-12-22 | 珠海市春生五金工业有限公司 | The internal stress minimizing technology and method for paint spraying of plastic product |
Also Published As
Publication number | Publication date |
---|---|
JP2571819B2 (en) | 1997-01-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |