JP3239145B2 - Method for manufacturing optical information recording medium - Google Patents
Method for manufacturing optical information recording mediumInfo
- Publication number
- JP3239145B2 JP3239145B2 JP26542692A JP26542692A JP3239145B2 JP 3239145 B2 JP3239145 B2 JP 3239145B2 JP 26542692 A JP26542692 A JP 26542692A JP 26542692 A JP26542692 A JP 26542692A JP 3239145 B2 JP3239145 B2 JP 3239145B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- annealing
- recording medium
- optical information
- information recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はプラスッチック基板を用
いた光磁気ディスク等、光情報記録媒体の製造方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical information recording medium such as a magneto-optical disk using a plastic substrate.
【0002】[0002]
【従来の技術】光磁気ディスクの製造工程は、一般にス
タンパ→基板形成→アニールによる基板内応力の緩和→
真空脱ガス→成膜→カバー層塗布というように行われて
いる。また、ハードコート層塗布工程もアニール前又は
成膜後に組み込まれているのが通常である。CDや相変
化ディスクもほぼ同様な工程で製造される。2. Description of the Related Art In general, a manufacturing process of a magneto-optical disk is performed by a stamper → substrate formation → relaxation of stress in the substrate by annealing →
Vacuum degassing → film formation → cover layer application is performed. Also, the hard coat layer coating step is usually incorporated before annealing or after film formation. CDs and phase change disks are manufactured in substantially the same process.
【0003】しかしながら、このような工程では基板形
成後に基板が吸水してしまう為、真空脱ガスに時間をか
けて脱水を充分に行わないと特に信頼性(寿命)の面で
問題が残る。また、プラスチック基板は温度によって吸
水性に差がある為、大気中での取扱時間が長くなるにつ
れて基板温度が下がり、吸水量が増し(長く置けば置く
ほど飽和するまで増加する)、真空脱ガスの時間が長く
かかるようになる。特に成形後にハードコート工程を経
てアニール→脱ガス→成膜と進む場合には、大気中放置
時間が一層長くなる。However, in such a process, since the substrate absorbs water after the substrate is formed, if the dehydration is not sufficiently performed by taking a long time for the vacuum degassing, a problem in reliability (lifetime) remains particularly. In addition, since the plastic substrate has a difference in water absorption depending on the temperature, as the handling time in the air increases, the substrate temperature decreases, the amount of water absorption increases (the longer the longer the substrate is placed, the more it is saturated), and the vacuum degassing is performed. Will take longer. In particular, when the process proceeds from annealing to degassing to film formation via a hard coat process after molding, the time of leaving in the air becomes longer.
【0004】[0004]
【発明が解決しようとする課題】本発明は基板アニール
の効果を活かし、真空脱ガス時間の短縮、延いては工程
時間の短縮により、低コストでより信頼性の高いディス
クを作製することを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to produce a low-cost and more reliable disk by shortening the vacuum degassing time and, consequently, the process time by utilizing the effect of substrate annealing. And
【0005】[0005]
【課題を解決するための手段】本発明は、基板アニール
から真空脱ガス工程に送りこむ場合において、基板と共
に脱ガスチャンバー内で基板の周辺に置かれる基板ホル
ダやマスク、マガジンを基板と同時あるいは別々にアニ
ールを行い、高温状態を保ったまま脱ガスチャンバー内
に送り込むことを特徴とする。According to the present invention, a substrate holder, a mask, and a magazine placed around a substrate in a degassing chamber together with the substrate are simultaneously or separately provided with the substrate when the substrate is transferred from the annealing to the vacuum degassing step. Is carried out, and is sent into a degassing chamber while maintaining a high temperature state.
【0006】アニール時、基板はホルダに取り付けたま
までも良く、さらにマスクも取り付けたままでも良い
が、双方が高温のまますばやく組付けることができれば
別々にアニールを行っても良い。At the time of annealing, the substrate may be left attached to the holder, and the mask may be left attached. However, if both can be quickly assembled at a high temperature, the annealing may be performed separately.
【0007】基板ホルダが大きい場合には、基板を直接
取り付ける部分だけを基板と共にアニールし、その後大
型のホルダに取り付けることも有効である。When the substrate holder is large, it is also effective to anneal only the part to which the substrate is directly attached together with the substrate, and then attach the substrate to a large holder.
【0008】さらに、基板をマガジンごと真空脱ガスチ
ャンバーに送り込み、真空雰囲気中でマガジンから取り
出してスパッタチャンバーに送り込む場合には、マガジ
ンごとアニールすることが有効である。Further, when the substrate is sent together with the magazine to the vacuum degassing chamber, taken out of the magazine in a vacuum atmosphere and sent to the sputtering chamber, it is effective to anneal the entire magazine.
【0009】その他、基板ホルダがトレイに組つけられ
ているものであればトレイも一緒にアニールし、脱ガス
チャンバーへ送る。又、基板ホルダがトレイと組つけ取
外しが可能なものであれば、基板、ホルダをアニール
後、トレイに組つけ、脱ガスチャンバーへ、あるいは基
板、ホルダを別々にアニールした後、全て組つけて脱ガ
スチャンバーへ送る。In addition, if the substrate holder is mounted on a tray, the tray is annealed together and sent to a degassing chamber. Also, if the substrate holder can be assembled and removed from the tray, after annealing the substrate and holder, assemble them into the tray, and then install them in the degas chamber or after annealing the substrate and holder separately, then assemble them all. Send to degas chamber.
【0010】[0010]
【実施例】図4に通過型スパッタ装置のトレイ、図5に
は自公転型のトレイを示す。通常は、これらのトレイに
アニール後の基板をセットして真空脱ガスチャンバーに
送り込むが、本発明ではこれらにセットした後にアニー
ルを行い、高温のまま脱ガスチャンバーに送り込む。ま
た、図1の例に示すような、基板と同等程度の大きさの
ホルダを大型トレイに取り付け得る構成とし(図2参
照)、ホルダのみアニールしても良い。この方法で排気
した場合の排気特性を図3に示す。図3は真空脱ガス時
間として初期の30分を示しているが、実際には従来2
時間、脱ガスを行わなければならなかったものが1時間
以内で充分信頼性の高いディスクを得ることができた。
なお、アニール温度は90℃、アニール時間は1.5時
間である。FIG. 4 shows a tray of a passing type sputtering apparatus, and FIG. 5 shows a self-revolving type tray. Normally, annealed substrates are set on these trays and sent to a vacuum degassing chamber. However, in the present invention, annealing is performed after setting the substrates on the trays, and the substrates are sent to the degassing chamber at a high temperature. Further, as shown in the example of FIG. 1, a configuration may be adopted in which a holder having a size similar to that of the substrate can be attached to the large tray (see FIG. 2), and only the holder may be annealed. FIG. 3 shows the exhaust characteristics when exhaust is performed by this method. FIG. 3 shows the initial 30 minutes as the vacuum degassing time.
Although it was necessary to perform degassing for a long period of time, a highly reliable disk could be obtained within one hour.
The annealing temperature is 90 ° C. and the annealing time is 1.5 hours.
【0011】[0011]
【発明の効果】本発明によれば、 (1)工程時間の短縮によりタクトアップ及びコストダ
ウンができる。 (2)基板と共にホルダも高温の為、大気中に取り出し
をした場合に基板に急激な温度変化がかからないのでひ
ずみが少ない。According to the present invention, (1) the tact time can be increased and the cost can be reduced by shortening the process time. (2) Since the temperature of the holder as well as the substrate is high, when the substrate is taken out into the atmosphere, no sharp temperature change is applied to the substrate, so that the distortion is small.
【図1】基板と同程度の大きさの基板ホルダの側断面
図。FIG. 1 is a side sectional view of a substrate holder having the same size as a substrate.
【図2】図1の基板ホルダを取り付けたトレイの側断面
図。FIG. 2 is a side sectional view of a tray to which the substrate holder of FIG. 1 is attached.
【図3】基板等の排気特性を示す図。FIG. 3 is a diagram showing exhaust characteristics of a substrate and the like.
【図4】通過型スパッタ装置のトレイの平面図。FIG. 4 is a plan view of a tray of the pass-through type sputtering apparatus.
【図5】自公転型トレイの平面図。FIG. 5 is a plan view of a self-revolving tray.
1,10 トレイ 2 ディスク(又は基板) 3 基板ホルダ 4 内マスク 5 外マスク 6 トレイ 7 円形台 8 凸部 A 基板のみアニールした場合の排気特性を示す曲線。 B 基板ホルダと共に基板をアニールした場合の排気特
性を示す曲線。1, 10 tray 2 disk (or substrate) 3 substrate holder 4 inner mask 5 outer mask 6 tray 7 circular base 8 convex portion A Curve showing exhaust characteristics when only the substrate is annealed. B Curve showing the exhaust characteristics when the substrate is annealed together with the substrate holder.
Claims (4)
空脱ガスを行った後、真空薄膜形成プロセスにより記録
層を形成してなる光情報記録媒体の製造方法において、
大気中アニール時に基板と基板ホルダを同時にアニール
することを特徴とする光情報記録媒体の製造方法。1. A method for manufacturing an optical information recording medium, comprising: annealing a plastic substrate in the air, performing vacuum degassing, and then forming a recording layer by a vacuum thin film forming process.
A method for manufacturing an optical information recording medium, wherein a substrate and a substrate holder are simultaneously annealed during annealing in air.
空脱ガスを行った後、真空薄膜形成プロセスにより記録
層を形成してなる光情報記録媒体の製造方法において、
大気中アニール時に基板と基板ホルダを別々にアニール
し、高温状態で基板をホルダにセットして脱ガスチャン
バーに送り込むことを特徴とする光情報記録媒体の製造
方法。2. A method for manufacturing an optical information recording medium, comprising: annealing a plastic substrate in the air and performing vacuum degassing, and then forming a recording layer by a vacuum thin film forming process.
A method for manufacturing an optical information recording medium, comprising annealing a substrate and a substrate holder separately during annealing in the atmosphere, setting the substrate in the holder in a high temperature state, and sending the substrate to a degassing chamber.
空脱ガスを行った後、真空薄膜形成プロセスにより記録
層を形成してなる光情報記録媒体の製造方法において、
大気中アニール時に基板を、マガジンに入れたままアニ
ールし、マガジンごと真空脱ガス工程に送ることを特徴
とする光情報記録媒体の製造方法。3. A method for manufacturing an optical information recording medium, comprising: annealing a plastic substrate in the air and performing vacuum degassing, and then forming a recording layer by a vacuum thin film forming process.
A method for producing an optical information recording medium, comprising: annealing a substrate in a magazine during annealing in the atmosphere, and sending the substrate to a vacuum degassing step together with the magazine.
方法において、マスクも同時にアニールすることを特徴
とする光情報記録媒体の製造方法。4. The method for manufacturing an optical information recording medium according to claim 1, wherein the mask is also annealed at the same time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26542692A JP3239145B2 (en) | 1992-09-08 | 1992-09-08 | Method for manufacturing optical information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26542692A JP3239145B2 (en) | 1992-09-08 | 1992-09-08 | Method for manufacturing optical information recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0689471A JPH0689471A (en) | 1994-03-29 |
JP3239145B2 true JP3239145B2 (en) | 2001-12-17 |
Family
ID=17416997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26542692A Expired - Fee Related JP3239145B2 (en) | 1992-09-08 | 1992-09-08 | Method for manufacturing optical information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3239145B2 (en) |
-
1992
- 1992-09-08 JP JP26542692A patent/JP3239145B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0689471A (en) | 1994-03-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |