JPH07235092A - Magneto-optical disk manufacturing device - Google Patents

Magneto-optical disk manufacturing device

Info

Publication number
JPH07235092A
JPH07235092A JP2100794A JP2100794A JPH07235092A JP H07235092 A JPH07235092 A JP H07235092A JP 2100794 A JP2100794 A JP 2100794A JP 2100794 A JP2100794 A JP 2100794A JP H07235092 A JPH07235092 A JP H07235092A
Authority
JP
Japan
Prior art keywords
chamber
carrier
substrate
film
magneto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2100794A
Other languages
Japanese (ja)
Inventor
Tokuo Igari
徳夫 猪狩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP2100794A priority Critical patent/JPH07235092A/en
Publication of JPH07235092A publication Critical patent/JPH07235092A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enable a magneto-optical disk having a high magnetic characteristics to be effectively manufactured by releasing gas contained in a substrate and carrier in a degasification chamber and carrying in the carrier to a film-forming chamber as it is. CONSTITUTION:The carrier 1 holding the substrate, a substrate holder and a mask, is transported by a transfer line 2 and supplied to a charging chamber 4 through a sluice valve 3. After the carrier 1 is transported, the charging chamber 4 is evacuated to a specified degree of the vacuum. Thereafter, the carrier 1 is transported to the degasification chamber 7. In the degasification chamber, degasification of the substrate, substrate holder, etc., is carried out, and the carrier 1 upon the completion of degasification is sent to the film- forming chamber 10. In the film-forming chamber 10, particles in a target 13a are sputtered by a sputtering cathode 12a to form a thin film which is a component of the target 13a on the substrate. When the film formation is completed, the carrier 1 is sent to a discharging chamber 15 through the sluice valve 14.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光磁気ディスクの製造装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-optical disk manufacturing apparatus.

【0002】[0002]

【従来の技術】近年、記録媒体にレーザ光を照射して情
報を記録・再生する光学式記録再生装置が広く用いられ
ているが、その中でも磁気光学効果を利用した光磁気デ
ィスク装置は、記録内容の書換が可能であることに加え
て、一度記録した内容を消去せずに、新しい情報を上書
きするいわゆるオーバーライトが可能であることから、
その用途が急速に広がりつつある。光磁気ディスク装置
に用いられる光磁気ディスクとしては、ポリカーボネー
ト樹脂、アクリル樹脂、アモルファスオレフィン樹脂等
からなる基板上に、蒸着法、スパッタリング法などによ
って希土類金属、遷移金属等からなるアモルファス合金
薄膜、誘電体保護膜、Al反射膜などからなる記録膜を
形成し、さらに紫外線硬化樹脂層を積層することにより
構成されたものが一般的である。
2. Description of the Related Art In recent years, an optical recording / reproducing apparatus for irradiating a recording medium with a laser beam to record / reproduce information has been widely used. Among them, a magneto-optical disk apparatus utilizing a magneto-optical effect is used for recording. In addition to being able to rewrite the contents, it is possible to overwrite so-called new information without erasing the contents once recorded, so-called overwrite,
Its uses are rapidly expanding. The magneto-optical disk used in the magneto-optical disk device is a substrate made of polycarbonate resin, acrylic resin, amorphous olefin resin, etc., on which an amorphous alloy thin film made of a rare earth metal, a transition metal or the like is deposited by a vapor deposition method, a sputtering method or the like, a dielectric. It is generally constituted by forming a recording film made of a protective film, an Al reflective film and the like, and further laminating an ultraviolet curable resin layer thereon.

【0003】上記記録膜の成膜時には、成膜室が外部か
ら汚染されないことが要求され、このため成膜室内が高
真空状態に保たれる必要がある。一方、成膜のために基
板を大気から真空下に送り込む仕込室においては、酸化
による記録膜の劣化をできるだけ抑えること、基板ホル
ダー、マスク等から構成されるキャリアおよび基板に含
まれる水分を充分に除去すること、さらには、成形時に
発生した基板の応力を緩和させるために加熱等の前処理
を行うことが必要である。これらの条件を満たし、ま
た、高い生産効率を達成する装置として、成形工程、成
膜工程および一般に紫外線硬化樹脂を塗布することによ
る保護膜コート工程等をモノラインとして構成した連続
式製造装置が知られている。すでにAlの反射層一層の
みから構成される再生専用型の光ディスク、例えばコン
パクトディスク(CD),CD−ROM,レーザーディ
スク(LD)などの製造には、モノラインによる製造装
置を用いることが一般的である。
When the recording film is formed, it is required that the film forming chamber is not contaminated from the outside, and therefore the film forming chamber must be kept in a high vacuum state. On the other hand, in the preparation chamber where the substrate is sent from the atmosphere to a vacuum for film formation, the deterioration of the recording film due to oxidation is suppressed as much as possible, and the carrier including the substrate holder and the mask and the moisture contained in the substrate are sufficiently contained. It is necessary to remove and further perform pretreatment such as heating in order to relieve the stress of the substrate generated at the time of molding. As a device that satisfies these conditions and achieves high production efficiency, a continuous manufacturing device that is configured as a monoline, such as a molding process, a film forming process, and a protective film coating process by applying an ultraviolet curable resin, is generally known. Has been. It is common to use a monoline manufacturing apparatus to manufacture a read-only optical disk, such as a compact disk (CD), a CD-ROM, or a laser disk (LD), which is already composed of only one reflective layer of Al. Is.

【0004】[0004]

【発明が解決しようとする課題】希土類−遷移金属アモ
ルファス合金薄膜の記録膜を有する光磁気ディスクは、
基板のプラスチック中に水分が多く含まれていると、記
録膜等の成膜時に真空下でガス成分が多量に放出され、
記録膜の特性が低下することがある。そこで、記録膜の
成膜前に真空乾燥機等を用いて、成形基板を長時間真空
下に置くことによる前処理を行うことが一般的である。
また、光磁気ディスクに使用される基板に成形時に発生
した内部応力が残留すると、成形基板の複屈折が大きく
なり、このまま記録膜を成膜すると記録特性が低下する
ことがある。そこで、成形基板を大気中に長時間放置し
たり、加熱処理などの前処理をしてから成膜することが
一般的である。さらに、成膜時に必要となる基板ホルダ
ー、マスク等についてもガス成分を放出させるために、
前処理をすることが多い。以上のように前処理を行うこ
ととすると、光磁気ディスクを製造するための装置が大
型化するのみならず、装置を設置するクリーンルームも
巨大化し、投資コストが上昇するばかりか、生産のラン
ニングコストも高くなる。
A magneto-optical disk having a recording film of a rare earth-transition metal amorphous alloy thin film,
When the plastic of the substrate contains a large amount of water, a large amount of gas components are released under vacuum during the formation of a recording film,
The characteristics of the recording film may deteriorate. Therefore, it is common to perform a pretreatment by placing the molded substrate under vacuum for a long time using a vacuum dryer or the like before forming the recording film.
Further, if the internal stress generated during molding remains on the substrate used for the magneto-optical disk, the birefringence of the molded substrate increases, and if the recording film is formed as it is, the recording characteristics may deteriorate. Therefore, it is common to leave the molded substrate in the atmosphere for a long time or to perform a pretreatment such as a heat treatment before forming the film. In addition, in order to release the gas components from the substrate holder, mask, etc., which are required during film formation,
Often pre-processed. If the pretreatment is performed as described above, not only the apparatus for manufacturing the magneto-optical disk becomes large, but also the clean room in which the apparatus is installed becomes huge, and not only the investment cost rises but also the running cost of production. Will also be higher.

【0005】本発明は上記の課題に鑑みてなされたもの
で、特性の優れた光磁気ディスクを効率的に製造するた
めの装置を提供することを目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide an apparatus for efficiently manufacturing a magneto-optical disk having excellent characteristics.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成する本
発明の光磁気ディスクの製造装置は、基板を保持するキ
ャリアを大気圧から高真空まで減圧する仕込室と、仕込
室を経由したキャリアが搬入され、高真空下で基板およ
びキャリアに含まれるガスを放出させる脱ガス室と、脱
ガス室を経由したキャリアが搬入され、基板に記録膜を
形成する成膜室とを備えることを特徴とする。
A magneto-optical disk manufacturing apparatus according to the present invention which achieves the above-mentioned object, comprises a charging chamber for reducing the pressure of a carrier holding a substrate from atmospheric pressure to high vacuum, and a carrier passing through the charging chamber. And a deposition chamber for releasing the gas contained in the substrate and the carrier under high vacuum, and a deposition chamber for loading the carrier via the degassing chamber and forming a recording film on the substrate. And

【0007】本発明の光磁気ディスクの製造装置におい
ては、記録膜の酸化を防止して、高い磁気特性を得るた
め、脱ガス室の真空度としては0.5Pa以下であるこ
とが好ましく、脱ガス室から成膜室に搬入される際の基
板およびキャリアの含水率は1000ppm以下である
ことが好ましい。
In the magneto-optical disk manufacturing apparatus of the present invention, the degree of vacuum in the degassing chamber is preferably 0.5 Pa or less in order to prevent oxidation of the recording film and obtain high magnetic characteristics. The water content of the substrate and the carrier when loaded into the film forming chamber from the gas chamber is preferably 1000 ppm or less.

【0008】[0008]

【作用】本発明では、基板が取り付けられたキャリアを
大気圧から高真空まで減圧する仕込室と成膜室との間に
高い真空度に保たれた脱ガス室が設けられており、脱ガ
ス室で基板およびキャリアに含まれるガスを放出させ、
そのままキャリアが成膜室に搬入されることから、成膜
時の基板に含まれる水分量が少なく、また成膜中に基板
から放出されるガスが少ないため成膜に必要とされる真
空度を得るために成膜室を排気する時間が短時間で済
み、しかも成膜時の記録膜の酸化が防止される。
In the present invention, the degassing chamber maintained at a high degree of vacuum is provided between the deposition chamber for depressurizing the carrier to which the substrate is attached from atmospheric pressure to high vacuum and the film forming chamber. The gas contained in the substrate and carrier is released in the chamber,
Since the carrier is carried into the film formation chamber as it is, the amount of water contained in the substrate during film formation is small, and since the gas released from the substrate during film formation is small, the degree of vacuum required for film formation is reduced. The time required to evacuate the film forming chamber for obtaining the film is short, and oxidation of the recording film during film formation is prevented.

【0009】[0009]

【実施例】本発明の光磁気ディスクの製造装置の一例と
してインラインスパッタ装置の構成を図1に示す。射出
成形法等により得られた基板と基板ホルダーおよび内外
周部に非成膜領域を形成するマスクを保持したキャリア
1が搬送ライン2によって送られ、仕切バルブ3より仕
込室4へ供給される。仕込室4には、真空ポンプ(図示
しない)と連結した排気口5があり、キャリア1が搬入
された後に大気圧から所定の真空度まで排気される。そ
の後、キャリア1は仕込室4の前方の仕切バルブ6より
脱ガス室7へ送られる。脱ガス室7には排気口8があ
り、真空ポンプ(図示しない)により所定の真空度が保
持されている。この脱ガス室で基板、基板ホルダー等の
脱ガスが行われ、脱ガスが完了したキャリア1がスリッ
ト9を経て成膜室10へ送られる。成膜室10には排気
口11があり、真空ポンプ(図示しない)により排気さ
れ、所定の真空度に保たれている。成膜室10では、ス
パッタカソード12aによってターゲット13aの粒子
がスパッタリングされ、基板にターゲット13aの成分
の薄膜が成膜される。なお、スパッタカソード12bお
よびターゲット13bは、ターゲット交換のために設け
られた予備部材である。また、図1では成膜室を1つの
み図示しているが、光磁気ディスクの記録膜を構成する
層の数に応じて複数の成膜室を設ける必要がある。成膜
が完了すれば、キャリア1は仕切バルブ14を経て取り
出し室15へ送られる。取り出し室15には、排気口1
6があり、真空ポンプ(図示しない)により予め所定の
真空度に保持されている。キャリアが供給された取り出
し室15の内部を大気圧に戻した後、基板が仕切バルブ
17から外部へ取り出される。
FIG. 1 shows the configuration of an in-line sputtering apparatus as an example of the magneto-optical disk manufacturing apparatus of the present invention. A carrier 1 holding a substrate obtained by injection molding or the like, a substrate holder, and a mask for forming a non-film-forming region on the inner and outer peripheral portions is sent by a transfer line 2 and supplied from a partition valve 3 to a charging chamber 4. The charging chamber 4 has an exhaust port 5 connected to a vacuum pump (not shown), and after the carrier 1 is loaded, it is exhausted from atmospheric pressure to a predetermined vacuum degree. After that, the carrier 1 is sent to the degassing chamber 7 from the partition valve 6 in front of the charging chamber 4. The degassing chamber 7 has an exhaust port 8 and a predetermined vacuum degree is maintained by a vacuum pump (not shown). The substrate, the substrate holder, and the like are degassed in the degassing chamber, and the carrier 1 that has been degassed is sent to the film forming chamber 10 through the slit 9. The film forming chamber 10 has an exhaust port 11, which is evacuated by a vacuum pump (not shown) to maintain a predetermined degree of vacuum. In the film forming chamber 10, the particles of the target 13a are sputtered by the sputter cathode 12a to form a thin film of the component of the target 13a on the substrate. The sputter cathode 12b and the target 13b are preliminary members provided for replacing the target. Although only one film forming chamber is shown in FIG. 1, it is necessary to provide a plurality of film forming chambers according to the number of layers forming the recording film of the magneto-optical disk. When the film formation is completed, the carrier 1 is sent to the take-out chamber 15 via the partition valve 14. In the take-out chamber 15, the exhaust port 1
6 is provided and is held at a predetermined vacuum degree in advance by a vacuum pump (not shown). After returning the inside of the take-out chamber 15 to which the carrier is supplied to the atmospheric pressure, the substrate is taken out from the partition valve 17 to the outside.

【0010】以上、インラインスパッタ装置について説
明したが、本発明の光磁気ディスクの製造装置としては
通過式、回転式、枚葉式等のいずれでも良い。
Although the in-line sputtering apparatus has been described above, the magneto-optical disk manufacturing apparatus of the present invention may be of a passage type, a rotary type, a single-wafer type or the like.

【0011】[0011]

【発明の効果】本発明の光磁気ディスクの製造装置によ
れば、高い磁気特性を有する光磁気ディスクを効率的に
製造することができる。
According to the magneto-optical disk manufacturing apparatus of the present invention, a magneto-optical disk having high magnetic characteristics can be efficiently manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光磁気ディスクの製造装置の一例を示
す構成図である。
FIG. 1 is a configuration diagram showing an example of a magneto-optical disk manufacturing apparatus of the present invention.

【符号の説明】[Explanation of symbols]

1 キャリア 2 搬送ライン 4 仕込室 7 脱ガス室 10 成膜室 1 Carrier 2 Transfer Line 4 Preparation Room 7 Degassing Room 10 Film Forming Room

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基板を保持するキャリアを大気圧から高
真空まで減圧する仕込室と、仕込室を経由したキャリア
が搬入され、高真空下で基板およびキャリアに含まれる
ガスを放出させる脱ガス室と、脱ガス室を経由したキャ
リアが搬入され、基板に記録膜を形成する成膜室とを備
えることを特徴とする光磁気ディスクの製造装置。
1. A charging chamber for reducing the pressure of a carrier holding a substrate from atmospheric pressure to high vacuum, and a degassing chamber for discharging the gas contained in the substrate and the carrier under high vacuum into which the carrier is loaded. And a film forming chamber for forming a recording film on a substrate into which a carrier is loaded via a degassing chamber.
JP2100794A 1994-02-18 1994-02-18 Magneto-optical disk manufacturing device Pending JPH07235092A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2100794A JPH07235092A (en) 1994-02-18 1994-02-18 Magneto-optical disk manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2100794A JPH07235092A (en) 1994-02-18 1994-02-18 Magneto-optical disk manufacturing device

Publications (1)

Publication Number Publication Date
JPH07235092A true JPH07235092A (en) 1995-09-05

Family

ID=12043022

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2100794A Pending JPH07235092A (en) 1994-02-18 1994-02-18 Magneto-optical disk manufacturing device

Country Status (1)

Country Link
JP (1) JPH07235092A (en)

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