JPH06162579A - Method and device for production of optical information recording medium - Google Patents

Method and device for production of optical information recording medium

Info

Publication number
JPH06162579A
JPH06162579A JP30554992A JP30554992A JPH06162579A JP H06162579 A JPH06162579 A JP H06162579A JP 30554992 A JP30554992 A JP 30554992A JP 30554992 A JP30554992 A JP 30554992A JP H06162579 A JPH06162579 A JP H06162579A
Authority
JP
Japan
Prior art keywords
film
polymer compound
substrate
compound film
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP30554992A
Other languages
Japanese (ja)
Inventor
Yoshihiro Ikari
喜博 碇
Norihito Tamura
礼仁 田村
Toshiaki Yasui
俊明 泰井
Naoyuki Kikuchi
直幸 菊池
Takayuki Goto
隆行 後藤
Masashi Yoshihiro
昌史 吉弘
Norio Ota
憲雄 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Holdings Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP30554992A priority Critical patent/JPH06162579A/en
Publication of JPH06162579A publication Critical patent/JPH06162579A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To improve durability for repeated reproducing of an optical information recording medium by improving chemical stability of a polymer compd. film as a base coating film. CONSTITUTION:A substrate with a substrate carrier bed 34 is housed in a first film forming room 12 which is evacuated to a vacuum to form a high-molecular compd. film by sputtering on the substrate. Then, the substrate with the substrate carrier bed 34 is housed in a polymer stabilizing room 13 where electric power is supplied to a UV lamp 22 and/or a heater 23 to irradiate the polymer compd. film already formed with UV rays at room temp. or in a heated state. By this method, reaction of unreacted component such as an active low mol.wt. component and free radicals included in the high-molecular compd. film is promoted to stabilize the high-molecular compd. film. Then, the substrate with the carrier bed 34 is housed in a second film forming room 14 where a recording film is formed by sputtering on the high-molecular compd. film.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光情報記録媒体の製造
方法及び製造装置に係り、特に、基体上に真空成膜され
る高分子化合物膜の安定化処理方法、及び基体上に所望
の薄膜を真空成膜する装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing an optical information recording medium, and more particularly to a method for stabilizing a polymer compound film vacuum-deposited on a substrate and a desired method on the substrate. The present invention relates to a vacuum film forming apparatus for thin films.

【0002】[0002]

【従来の技術】従来より、基体上に担持された記録膜に
レーザビームなどの記録用ビームを照射し、例えば映像
や音声、それに電子計算機のデータやファクシミリ信号
などをリアルタイムで記録することのできる光情報記録
媒体として、前記基体上に高分子化合物膜を成膜し、該
高分子化合物膜上に前記記録膜を積層したものがある。
2. Description of the Related Art Conventionally, a recording film carried on a substrate can be irradiated with a recording beam such as a laser beam to record, for example, video and audio, data of a computer and facsimile signals in real time. As an optical information recording medium, there is one in which a polymer compound film is formed on the substrate and the recording film is laminated on the polymer compound film.

【0003】前記高分子化合物膜としては、ポリテトラ
フルオロエチレンが一例として挙げられる。また前記記
録膜としては、例えば追記型の場合、Te−Se合金、
Te−Se−Pbなどの低融点合金が多く用いられる。
これらの膜は、一般に、例えば真空蒸着、ガス中蒸着、
化学蒸着、イオンビーム蒸着、電子ビーム蒸着、スパッ
タリング、反応性スパッタリング、イオンビームスパッ
タリング、イオンプレーティング、プラズマ重合などの
真空成膜法によって成膜されている。
An example of the polymer compound film is polytetrafluoroethylene. As the recording film, for example, in the case of a write-once type, a Te-Se alloy,
A low melting point alloy such as Te-Se-Pb is often used.
These films are generally formed, for example, by vacuum deposition, vapor deposition in gas,
The film is formed by a vacuum film forming method such as chemical vapor deposition, ion beam evaporation, electron beam evaporation, sputtering, reactive sputtering, ion beam sputtering, ion plating, and plasma polymerization.

【0004】ところで、光情報記録媒体には、その性質
上、情報の長期保存性に優れること及び繰り返し再生に
対する耐久性に優れることが特に要求される。従来よ
り、前記構成の光情報記録媒体にあっては、情報の長期
保存性を改善する技術として、例えば特公昭61−20
932号公報に記載されているように、記録膜成膜後、
記録膜に加熱処理や紫外線照射処理を施すことによっ
て、記録膜の表面に薄い酸化膜(不動態膜)を生成し、
記録膜の化学的安定性を改善するという技術が知られて
いる。
By the way, the optical information recording medium is particularly required to have excellent long-term storability of information and excellent durability against repeated reproduction due to its properties. Conventionally, in the optical information recording medium having the above-mentioned structure, as a technique for improving the long-term storage stability of information, for example, Japanese Patent Publication No. 61-20
As described in Japanese Patent No. 932, after forming a recording film,
A thin oxide film (passive film) is generated on the surface of the recording film by subjecting the recording film to heat treatment or ultraviolet irradiation treatment,
A technique of improving the chemical stability of a recording film is known.

【0005】[0005]

【発明が解決しようとする課題】しかるに、前記技術
は、情報の長期保存性の改善には有効であるが、繰り返
し再生に対する耐久性については効果がない。本願発明
者らの研究によると、真空成膜された高分子化合物膜に
は、しばしば活性な低分子量成分やフリーラジカルが含
まれており、記録又は再生動作を繰り返すごとにその熱
的影響によってこれらの成分が高分子化合物膜の表面や
内部、それに該膜と基体との界面、あるいは該膜と記録
膜等他の膜との界面において反応しあい反応生成物を生
じるために高分子化合物膜が経時的に変質し、その結
果、再生信号のキャリア対雑音比(C/N)や再生信号
振幅が経時的に劣化あるいは低下することが判った。し
たがって、繰り返し再生に対する光情報記録媒体の耐久
性を高めるためには、真空成膜された高分子化合物膜中
に存在する活性な低分子量成分やフリーラジカルを予め
低減又は除去する必要がある。本発明はかかる知見に基
づいてなされたものであって、その目的は、繰り返し再
生に対する耐久性が高い光情報記録媒体を提供すること
にある。
However, the above technique is effective in improving the long-term storage stability of information, but is ineffective in durability against repeated reproduction. According to the research conducted by the inventors of the present application, a vacuum-deposited polymer compound film often contains active low-molecular weight components and free radicals. Components react with each other at the surface or inside of the polymer compound film, at the interface between the film and the substrate, or at the interface between the film and another film such as a recording film to generate a reaction product. It was found that the carrier-to-noise ratio (C / N) of the reproduced signal and the reproduced signal amplitude deteriorated or decreased with time as a result. Therefore, in order to increase the durability of the optical information recording medium against repeated reproduction, it is necessary to reduce or remove active low molecular weight components and free radicals existing in the vacuum-formed polymer compound film in advance. The present invention has been made based on such findings, and an object thereof is to provide an optical information recording medium having high durability against repeated reproduction.

【0006】[0006]

【課題を解決するための手段】本発明は、上記の目的を
達成するため、光情報記録媒体の製造方法に関して、基
体上に高分子化合物膜を真空成膜する工程を含む光情報
記録媒体の製造方法において、前記基体上に前記高分子
化合物膜を真空成膜したのち、前記高分子化合物膜中に
含まれる活性な未反応成分の反応を促進する高分子安定
化処理を施すという方法をとった。
In order to achieve the above-mentioned object, the present invention relates to a method for manufacturing an optical information recording medium, including an optical information recording medium including a step of forming a polymer compound film on a substrate in vacuum. In the manufacturing method, the polymer compound film is vacuum-deposited on the substrate, and then a polymer stabilization treatment is carried out to accelerate the reaction of active unreacted components contained in the polymer compound film. It was

【0007】高分子安定化処理としては、高分子化合物
膜に紫外線を照射し、そのエネルギーによって高分子化
合物膜中に含まれる低分子量成分あるいはフリーラジカ
ルの反応を促進するという方法をとることもできるし、
あるいは高分子化合物膜を加熱下で紫外線を照射し、そ
れらのエネルギーによって高分子化合物膜中に含まれる
低分子量成分あるいはフリーラジカルの反応を促進する
という方法をとることもできる。また、この高分子安定
化処理を施す手順としては、基体上に高分子化合物膜を
真空成膜しつつ、これと同時に行なうこともできるし、
基体上に高分子化合物膜を真空成膜したのち、当該高分
子化合物膜上に記録膜を成膜する以前に行なうこともで
きる。さらには、基体上に高分子化合物膜を真空成膜
し、かつ当該高分子化合物膜上に記録膜を成膜したのち
に行なうこともできる。紫外線の照射は、高分子化合物
膜に直接行なう方がより有効であるが、基体が透明体に
よって形成される場合には、基体側から行なうこともで
きる。高分子安定化処理を高分子化合物膜の真空成膜後
に行なう場合には、真空成膜装置内で当該高分子安定化
処理を行なうこともできるし、真空成膜装置から取り出
したのちに別の装置を用いて行なうこともできる。
As the polymer stabilization treatment, a method of irradiating the polymer compound film with ultraviolet rays and accelerating the reaction of low molecular weight components or free radicals contained in the polymer compound film by its energy can also be used. Then
Alternatively, a method of irradiating the polymer compound film with ultraviolet rays while heating and promoting the reaction of low molecular weight components or free radicals contained in the polymer compound film by their energy can be adopted. In addition, as a procedure for performing the polymer stabilization treatment, it is possible to perform the polymer compound film on the substrate in a vacuum while simultaneously performing it.
It can also be performed after vacuum-forming the polymer compound film on the substrate and before forming the recording film on the polymer compound film. Further, it may be carried out after forming the polymer compound film on the substrate in vacuum and forming the recording film on the polymer compound film. It is more effective to directly irradiate the polymer compound film with the ultraviolet rays, but when the substrate is formed of a transparent body, it can be irradiated from the side of the substrate. When the polymer stabilization treatment is performed after the vacuum deposition of the polymer compound film, the polymer stabilization treatment can be performed in the vacuum film forming apparatus, or after taking out from the vacuum film forming apparatus, another polymer stabilization treatment can be performed. It can also be performed using a device.

【0008】なお、本発明は、ディスク状、カード状、
テープ状など、任意の形態の光情報記録媒体に適用でき
る。したがって、前記基体としては、所望とする光情報
記録媒体の種類に応じて、硬質のディスク状又はカード
状の透明基板、それにフレキシブルなテープ状のベース
フィルムなどを用いることができる。また、基体材料と
しては、例えばアクリル樹脂、ポリスチレン樹脂、ポリ
カーボネート樹脂、エポキシ樹脂、ポリアミド樹脂、ポ
リイミド樹脂、ポリエチレン樹脂などの有機物、又は例
えばガラスなどの無機物、それにこれらの複合材料など
を用いることができる。
The present invention has a disk shape, a card shape,
It can be applied to any form of optical information recording medium such as a tape. Therefore, as the substrate, a hard disk-shaped or card-shaped transparent substrate, a flexible tape-shaped base film, or the like can be used depending on the type of the desired optical information recording medium. As the base material, for example, an organic material such as an acrylic resin, a polystyrene resin, a polycarbonate resin, an epoxy resin, a polyamide resin, a polyimide resin, a polyethylene resin, or an inorganic material such as glass, or a composite material thereof can be used. .

【0009】また、本発明は、いわゆる孔あけ形、窪み
形成形、気泡形成形、光磁気形、相変化形など、公知に
属する全ての記録方式の光情報記録媒体に適用できる。
前記高分子化合物膜及び記録膜等の成膜方法としては、
例えば真空蒸着、ガス中蒸着、化学蒸着、イオンビーム
蒸着、電子ビーム蒸着、スパッタリング、反応性スパッ
タリング、イオンビームスパッタリング、イオンプレー
ティング、プラズマ重合などの真空成膜法が好適であ
る。
Further, the present invention can be applied to optical information recording media of all known recording systems such as so-called hole forming type, pit forming type, bubble forming type, magneto-optical type and phase change type.
As a method for forming the polymer compound film and the recording film,
For example, vacuum deposition methods such as vacuum deposition, vapor deposition in gas, chemical vapor deposition, ion beam vapor deposition, electron beam vapor deposition, sputtering, reactive sputtering, ion beam sputtering, ion plating, and plasma polymerization are suitable.

【0010】一方、光情報記録媒体の製造装置に関して
は、成膜室内に、該成膜室によって成膜される高分子化
合物膜中に含まれる未反応成分の反応を促進する高分子
安定化処理装置を組み込む構成とすることもできるし、
成膜室と、これと別体をなし、前記成膜室によって高分
子化合物膜が成膜された基体を収納して、該高分子化合
物膜中に含まれる未反応成分の反応を促進する高分子安
定化処理室とを備える構成とすることもできる。前記成
膜室としては、前記した各種の真空成膜法を実行する各
種の真空成膜装置を用いることができ、また前記高分子
安定化処理装置としては、紫外線照射装置又は紫外線照
射装置と加熱装置との組合せを用いることができる。
On the other hand, regarding an apparatus for manufacturing an optical information recording medium, a polymer stabilizing treatment for promoting reaction of unreacted components contained in a polymer compound film formed in the film forming chamber is provided in the film forming chamber. It can be configured to incorporate the device,
A film forming chamber, which is separate from the film forming chamber, accommodates the substrate on which the polymer compound film is formed by the film forming chamber, and promotes reaction of unreacted components contained in the polymer compound film. It may be configured to include a molecular stabilization processing chamber. As the film forming chamber, it is possible to use various vacuum film forming apparatuses that execute the above-mentioned various vacuum film forming methods, and as the polymer stabilization processing device, an ultraviolet irradiation device or an ultraviolet irradiation device and a heating device are used. A combination with the device can be used.

【0011】[0011]

【作用】真空成膜された高分子化合物膜に紫外線を照射
すると、当該膜中に存在する活性な低分子量成分やフリ
ーラジカルの反応が促進され、当該膜の化学的安定性が
向上する。このため、記録や再生を繰り返しても、それ
によって前記高分子化合物膜が変質しにくく、再生信号
のキャリア対雑音比(C/N)の劣化や再生信号振幅の
低下が抑制される。よって、光情報記録媒体の繰り返し
再生に対する耐久性を改善できる。
When the vacuum-formed polymer compound film is irradiated with ultraviolet rays, the reaction of active low molecular weight components and free radicals present in the film is promoted, and the chemical stability of the film is improved. For this reason, even if recording and reproduction are repeated, the polymer compound film is unlikely to deteriorate, and deterioration of the carrier-to-noise ratio (C / N) of the reproduction signal and decrease of the reproduction signal amplitude are suppressed. Therefore, durability against repeated reproduction of the optical information recording medium can be improved.

【0012】[0012]

【実施例】まず、本発明に係る光情報記録媒体製造方法
を説明するに先立ち、光情報記録媒体の製造に適用され
る真空成膜装置の一例を説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, prior to explaining the optical information recording medium manufacturing method according to the present invention, an example of a vacuum film forming apparatus applied to the manufacture of an optical information recording medium will be described.

【0013】図3は、実施例に係る真空成膜装置の構成
図であって、この図に示すように、本例の真空成膜装置
は、予備排気室11と、第1膜形成室12と、高分子安
定化処理室13と、第2膜形成室14と、取り出し室1
5とを備えており、予備排気室11と第1膜形成室1
2、第1膜形成室12と高分子安定化処理室13、高分
子安定化処理室13と第2膜形成室14、第2膜形成室
14と取り出し室15とが夫々バッファ16〜19を介
して連結されている。
FIG. 3 is a block diagram of a vacuum film forming apparatus according to the embodiment. As shown in FIG. 3, the vacuum film forming apparatus of this embodiment has a preliminary evacuation chamber 11 and a first film forming chamber 12. A polymer stabilization treatment chamber 13, a second film formation chamber 14, and a take-out chamber 1
5, the preliminary exhaust chamber 11 and the first film forming chamber 1 are provided.
2, the first film formation chamber 12 and the polymer stabilization treatment chamber 13, the polymer stabilization treatment chamber 13 and the second film formation chamber 14, the second film formation chamber 14 and the take-out chamber 15 respectively buffers 16-19. Are connected through.

【0014】前記予備排気室11と第1膜形成室12と
第2膜形成室14とには、夫々真空ポンプ20が接続さ
れており、各室内11,12,14の真空度を適宜調整
できるようになっている。また、前記第1膜形成室12
と第2膜形成室14とには、夫々スパッタガス源21が
接続されており、各室内12,14のスパッタガス圧を
適宜調整できるようになっている。さらに、これら各膜
形成室12,14内には、ターゲット12a,14a及
び対向電極12b,14bなど、スパッタ成膜に必要な
装置が内装されている。一方、高分子安定化処理室13
内には、紫外線ランプ22及び加熱装置23が内装され
ている。
A vacuum pump 20 is connected to each of the preliminary evacuation chamber 11, the first film forming chamber 12, and the second film forming chamber 14 so that the degree of vacuum in each chamber 11, 12, 14 can be adjusted appropriately. It is like this. In addition, the first film forming chamber 12
A sputtering gas source 21 is connected to each of the second film forming chamber 14 and the second film forming chamber 14 so that the sputtering gas pressure in each chamber 12, 14 can be adjusted appropriately. Further, in each of the film forming chambers 12 and 14, devices necessary for sputtering film formation such as targets 12a and 14a and counter electrodes 12b and 14b are installed. On the other hand, the polymer stabilization processing chamber 13
Inside, an ultraviolet lamp 22 and a heating device 23 are installed.

【0015】前記各室11〜15の搬入口と搬出口とに
は、夫々ゲートバルブ24〜33が設けられ、室内の気
密が確保されている。また、前記予備排気室11には、
成膜開始前、前記ゲートバルブ25〜33及びバッファ
16〜19を介して後続の各室内12〜15に移送可能
な基板搬送台34が内装されている。
Gate valves 24 to 33 are provided at the carry-in entrance and the carry-out exit of each of the chambers 11 to 15 to ensure airtightness in the room. Further, in the preliminary exhaust chamber 11,
Before the start of film formation, a substrate transfer table 34 is installed which can be transferred to the subsequent chambers 12 to 15 via the gate valves 25 to 33 and the buffers 16 to 19.

【0016】以下、前記のように構成された真空成膜装
置の使用方法について説明する。まず、真空ポンプ20
を駆動して第1膜形成室12及び第2膜形成室14を所
定の真空度まで真空引きしたのち、予備排気室11に光
情報記録媒体のもとになる基板を内装してこれを基板搬
送台34に取り付け、予備排気室11を所定の真空度ま
で真空引きする。
Hereinafter, a method of using the vacuum film forming apparatus having the above structure will be described. First, the vacuum pump 20
Is driven to evacuate the first film forming chamber 12 and the second film forming chamber 14 to a predetermined degree of vacuum, and then the pre-evacuation chamber 11 is internally provided with a substrate serving as an optical information recording medium. It is attached to the carrier 34 and the preliminary exhaust chamber 11 is evacuated to a predetermined vacuum degree.

【0017】真空引き終了後、ゲートバルブ26,27
を開閉して、基板を基板搬送台34とともに第1膜形成
室12内に収納する。ここで、真空ポンプ20を駆動し
つつスパッタガス源21から第1膜形成室12内に導入
されるスパッタガス量を調整し、室内のスパッタガス圧
が所定圧かつ定常状態になった段階で、対向電極12b
に通電し、高分子ターゲット12aからのスパッタ粒子
を所定膜厚になるまで基板上に堆積させる。
After the evacuation is completed, the gate valves 26 and 27
Is opened and closed to store the substrate in the first film forming chamber 12 together with the substrate transfer table 34. Here, while the vacuum pump 20 is being driven, the amount of sputter gas introduced from the sputter gas source 21 into the first film forming chamber 12 is adjusted, and when the sputter gas pressure in the chamber reaches a predetermined pressure and a steady state, Counter electrode 12b
Is energized to deposit sputtered particles from the polymer target 12a on the substrate until a predetermined film thickness is obtained.

【0018】第1の成膜が終了したのち、ゲートバルブ
28,29を開閉して、基板を基板搬送台34とともに
高分子安定化処理室13内に収納する。ここで、紫外線
ランプ22及び/又は加熱装置23に通電し、先に成膜
された高分子化合物膜に常温又は加熱状態で紫外線を照
射する。これによって、高分子化合物膜中に含まれる活
性な低分子量成分やフリーラジカル等の未反応成分の反
応を促進し、高分子化合物膜を安定化する。
After the first film formation is completed, the gate valves 28 and 29 are opened and closed to store the substrate in the polymer stabilization processing chamber 13 together with the substrate transfer table 34. Here, the ultraviolet lamp 22 and / or the heating device 23 is energized to irradiate the previously formed polymer compound film with ultraviolet light at room temperature or in a heated state. This promotes the reaction of active low molecular weight components and unreacted components such as free radicals contained in the polymer compound film, and stabilizes the polymer compound film.

【0019】高分子化合物膜の安定化処理が終了したの
ち、ゲートバルブ30,31を開閉して、基板を基板搬
送台34とともに第2膜形成室14内に収納する。ここ
で、真空ポンプ20を駆動しつつスパッタガス源21か
ら第2膜形成室14内に導入されるスパッタガス量を調
整し、室内のスパッタガス圧が所定圧かつ定常状態にな
った段階で、対向電極14bに通電し、記録膜用ターゲ
ット14aからのスパッタ粒子を所定膜厚になるまで基
板上に堆積させる。
After the stabilization process of the polymer compound film is completed, the gate valves 30 and 31 are opened and closed to store the substrate in the second film forming chamber 14 together with the substrate transfer table 34. Here, while the vacuum pump 20 is being driven, the amount of sputter gas introduced from the sputter gas source 21 into the second film forming chamber 14 is adjusted, and when the sputter gas pressure in the chamber becomes a predetermined pressure and a steady state, The counter electrode 14b is energized to deposit the sputtered particles from the recording film target 14a on the substrate until the film has a predetermined thickness.

【0020】記録膜形成後、ゲートバルブ32を開閉し
て、基板を基板搬送台34とともに取り出し室15内に
一旦収納し、最後に、ゲートバルブ33を開閉して、製
品である光情報記録媒体を取り出し室15から取り出
す。
After the recording film is formed, the gate valve 32 is opened and closed to temporarily store the substrate in the take-out chamber 15 together with the substrate transfer table 34, and finally the gate valve 33 is opened and closed to produce an optical information recording medium as a product. Is taken out from the take-out chamber 15.

【0021】次に、本発明に係る光情報記録媒体の製造
方法の一例を、図1に基づいて説明する。図1は実施例
に係る光情報記録媒体の要部拡大断面図であって、透明
基板1のプリフォーマットパターン形成面2に下地膜3
が被着され、該下地膜3上に記録膜4が積層された構成
になっている。
Next, an example of a method of manufacturing the optical information recording medium according to the present invention will be described with reference to FIG. FIG. 1 is an enlarged cross-sectional view of an essential part of an optical information recording medium according to an embodiment, in which a base film 3 is formed on a preformat pattern forming surface 2 of a transparent substrate 1.
Is deposited, and the recording film 4 is laminated on the base film 3.

【0022】この光情報記録媒体の製造に際しては、ま
ず射出成形法によって、片面に所望のプリフォーマット
パターン2を有する直径が5.25インチのポリカーボ
ネート基板1を成形した。当該基板1の形状、作製手
順、及び成形装置、それにプリフォーマットパターン2
の構成及び配列等については、公知に属する事項であ
り、かつ本発明の要旨でもないので説明を省略する。
In manufacturing this optical information recording medium, first, a polycarbonate substrate 1 having a desired preformat pattern 2 and having a diameter of 5.25 inches is molded on one surface by injection molding. The shape of the substrate 1, the manufacturing procedure, the molding apparatus, and the preformat pattern 2
The configuration and arrangement of the above are matters that are publicly known and are not the gist of the present invention, and thus the description thereof will be omitted.

【0023】次に、作製されたポリカーボネート基板1
を前記した真空成膜装置の予備排気室11から第1膜形
成室12へと順次収納し、第1膜形成室12にてポリカ
ーボネート基板1のプリフォーマットパターン形成面2
に、ポリテトラフルオロエチレン下地膜3を約400
(Å)の膜厚にスパッタリングした。該下地膜3の成膜
条件は、ターゲットがポリテトラフルオロエチレン、ス
パッタガスがアルゴン、スパッタガス圧が4×10~
3(mbar)、投入電圧が高周波450(W)とし
た。
Next, the produced polycarbonate substrate 1
Are sequentially stored from the preliminary exhaust chamber 11 of the vacuum film forming apparatus to the first film forming chamber 12, and the preformat pattern forming surface 2 of the polycarbonate substrate 1 is stored in the first film forming chamber 12.
In addition, about 400 of polytetrafluoroethylene base film 3
Sputtering was performed to a film thickness of (Å). The film forming conditions of the base film 3 are as follows: target is polytetrafluoroethylene, sputter gas is argon, and sputter gas pressure is 4 × 10 to
The applied voltage was 3 (mbar) and the applied voltage was high frequency 450 (W).

【0024】次に、ポリテトラフルオロエチレン下地膜
3が成膜されたポリカーボネート基板1を高分子安定化
処理室13内に移送し、常温下で下地膜3側から強度が
30(mW/cm2 )の紫外線を30(分間)照射し
た。
Next, the polycarbonate substrate 1 on which the polytetrafluoroethylene undercoating film 3 is formed is transferred into the polymer stabilization treatment chamber 13, and the strength is 30 (mW / cm 2) from the undercoating film 3 side at room temperature. 30) for 30 minutes.

【0025】さらに、紫外線照射処理が完了したポリカ
ーボネート基板1を第2膜形成室14内に移送し、ポリ
テトラフルオロエチレン下地膜3上にPb−Te−Se
の記録膜4を約210(Å)の膜厚にスパッタリング
し、図1に示す光ディスクを作製した。記録膜4の成膜
条件は、ターゲットがPb−Te−Se合金、スパッタ
ガスがアルゴン、スパッタガス圧が5×10~3(mba
r)、投入電圧が高周波370(W)とした。
Further, the polycarbonate substrate 1 which has been subjected to the ultraviolet irradiation treatment is transferred into the second film forming chamber 14 and Pb-Te-Se is formed on the polytetrafluoroethylene base film 3.
The recording film 4 of No. 1 was sputtered to a film thickness of about 210 (Å) to manufacture the optical disk shown in FIG. The conditions for forming the recording film 4 are as follows: the target is Pb-Te-Se alloy, the sputter gas is argon, and the sputter gas pressure is 5 × 10 3 (mba).
r) and the applied voltage was high frequency 370 (W).

【0026】図2に、前記実施例に係る光ディスクの繰
り返し再生に対する耐久性試験結果を、比較例に係る光
ディスクとともに掲げる。このグラフ図においては、横
軸に試験時間が、縦軸に再生信号のC/N比が目盛られ
ており、実施例品のデータが丸印で、比較例品のデータ
が三角印で表示されている。比較例に係る光ディスク
は、ポリカーボネート基板1のプリフォーマットパター
ン形成面2に、ポリテトラフルオロエチレン下地膜3を
スパッタリングしたのち、該下地膜3に紫外線照射処理
を施すことなく、直ちにPb−Te−Se記録膜4をス
パッタリングしたもので、その他については実施例に係
る光ディスクと同様に構成されている。
FIG. 2 shows the durability test results for the repeated reproduction of the optical disc according to the above-mentioned example, together with the optical disc according to the comparative example. In this graph, the horizontal axis represents the test time, and the vertical axis represents the C / N ratio of the reproduced signal. The data of the example product is indicated by a circle and the data of the comparative example is indicated by a triangle. ing. In the optical disk according to the comparative example, after the polytetrafluoroethylene base film 3 was sputtered on the preformat pattern forming surface 2 of the polycarbonate substrate 1, the base film 3 was immediately exposed to Pb-Te-Se without being subjected to ultraviolet irradiation treatment. The recording film 4 is formed by sputtering, and the other parts are configured similarly to the optical disc according to the embodiment.

【0027】試験条件は、以下のとおりである。すなわ
ち、実施例及び比較例の光ディスクを毎分1000回転
の回転速度で回転駆動しつつ、光ヘッドより記録が行な
われないパワーレベルに保持された半導体レーザビーム
を照射し、光ディスクにプリフォーマットされたトラッ
キング用の溝と光スポットの中心とが常に一致するよう
に光ヘッドを駆動した。またこれとともに、レーザビー
ムがPb−Te−Se記録膜上に焦点を結ぶように自動
焦点あわせを行なった。その後、半導体レーザビームの
パワーを6.7(mW)の記録レベルに切り換え、Pb
−Te−Se記録膜に8T信号を記録した。次に、半導
体レーザビームのパワーを再度記録が行なわれない再生
レベルに切り換え、記録直後から3000時間経過時ま
での再生信号のC/N比の変化を測定した。
The test conditions are as follows. That is, while the optical discs of Examples and Comparative Examples were rotationally driven at a rotational speed of 1000 rpm, a semiconductor laser beam kept at a power level at which recording was not performed by the optical head was irradiated to preformat the optical discs. The optical head was driven so that the tracking groove and the center of the light spot were always aligned. At the same time, automatic focusing was performed so that the laser beam focused on the Pb-Te-Se recording film. After that, the power of the semiconductor laser beam is switched to the recording level of 6.7 (mW), and Pb
An 8T signal was recorded on the -Te-Se recording film. Next, the power of the semiconductor laser beam was switched to a reproduction level at which recording was not performed again, and the change in the C / N ratio of the reproduction signal from immediately after recording until 3000 hours elapsed was measured.

【0028】図2から明らかなように、比較例品は10
(分間)連続的に同一トラックに対する再生動作を繰り
返すと、再生信号のC/N比が約2(dB)も低下する
のに対して、実施例品は同一条件のもとでほとんどC/
N比が劣化しない。また、比較例品は約200(分間)
経過時では再生信号のC/N比が約2.7(dB)も低
下するのに対して、実施例品は約0.5(dB)の低下
に止まる。かように、本実施例品は、繰り返し再生に対
する耐久性が高い。
As is apparent from FIG. 2, the comparative example product is 10
When the reproducing operation for the same track is continuously repeated (for a minute), the C / N ratio of the reproduced signal is lowered by about 2 (dB), whereas the example products are almost C / N ratio under the same condition.
The N ratio does not deteriorate. In addition, the comparative example product is about 200 (minutes)
While the C / N ratio of the reproduced signal decreases by about 2.7 (dB) with the lapse of time, the example product stops at about 0.5 (dB). As described above, the product of this example has high durability against repeated reproduction.

【0029】なお、前記実施例においては、常温におい
て紫外線を照射したが、加熱しつつ紫外線の照射を行な
うと、より短時間の処理で同様の効果が得られる。ま
た、前記実施例では、高分子化合物膜に直接紫外線を照
射したが、基体が透明体をもって形成される場合には基
体側から照射することができる。
In the above-mentioned embodiment, the ultraviolet rays are irradiated at room temperature, but if the ultraviolet rays are irradiated while heating, the same effect can be obtained in a shorter treatment time. Further, in the above-mentioned Examples, the polymer compound film was directly irradiated with ultraviolet rays, but when the substrate is formed of a transparent body, it can be irradiated from the side of the substrate.

【0030】[0030]

【発明の効果】以上説明したように、本発明によると、
基板上に高分子化合物膜を真空成膜したのち、この高分
子化合物膜に常温又は加熱状態で紫外線を照射し、当該
膜中に存在する活性な低分子量成分やフリーラジカル等
の反応を促進して、当該膜の化学的安定性を向上したの
で、記録や再生を繰り返しても高分子化合物膜が変質し
にくく、再生信号のキャリア対雑音比(C/N)の劣化
や再生信号振幅の低下が抑制され、光情報記録媒体の繰
り返し再生に対する耐久性が改善される。
As described above, according to the present invention,
After vacuum-forming a polymer compound film on a substrate, the polymer compound film is irradiated with ultraviolet rays at room temperature or under heating to accelerate the reaction of active low molecular weight components and free radicals present in the film. Since the chemical stability of the film is improved, the polymer compound film is less likely to deteriorate even after repeated recording and reproduction, and the carrier-to-noise ratio (C / N) of the reproduced signal is deteriorated and the reproduced signal amplitude is decreased. Is suppressed, and durability against repeated reproduction of the optical information recording medium is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例に係る光情報記録媒体の要部拡大断面図
である。
FIG. 1 is an enlarged cross-sectional view of a main part of an optical information recording medium according to an example.

【図2】繰り返し再生に対する耐久性試験結果を示すグ
ラフ図である。
FIG. 2 is a graph showing a result of a durability test against repeated reproduction.

【図3】実施例に係る真空成膜装置の構成図である。FIG. 3 is a configuration diagram of a vacuum film forming apparatus according to an embodiment.

【符号の説明】[Explanation of symbols]

1 基板 2 プリフォーマットパターン 3 下地膜 4 記録膜 11 予備排気室 12 第1膜形成室 13 高分子安定化処理室 14 第2膜形成室 15 取り出し室 16〜19 バッファ 20 真空ポンプ 21 スパッタガス源 22 紫外線ランプ 23 加熱装置 24〜33 ゲートバルブ 34 基板搬送台 DESCRIPTION OF SYMBOLS 1 Substrate 2 Preformat pattern 3 Underlayer film 4 Recording film 11 Preliminary exhaust chamber 12 First film forming chamber 13 Polymer stabilization treatment chamber 14 Second film forming chamber 15 Extraction chamber 16-19 Buffer 20 Vacuum pump 21 Sputtering gas source 22 Ultraviolet lamp 23 Heating device 24 to 33 Gate valve 34 Substrate carrier

───────────────────────────────────────────────────── フロントページの続き (72)発明者 菊池 直幸 大阪府茨木市丑寅一丁目1番88号 日立マ クセル株式会社内 (72)発明者 後藤 隆行 大阪府茨木市丑寅一丁目1番88号 日立マ クセル株式会社内 (72)発明者 吉弘 昌史 大阪府茨木市丑寅一丁目1番88号 日立マ クセル株式会社内 (72)発明者 太田 憲雄 大阪府茨木市丑寅一丁目1番88号 日立マ クセル株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Naoyuki Kikuchi 1-88, Torora, Ibaraki City, Osaka Prefecture Hitachi Maxell Co., Ltd. (72) Inventor Takayuki Goto 1-88, Torora, Ibaraki City, Osaka Prefecture Hitachi Within Maxell Co., Ltd. (72) Inventor Masafumi Yoshifumi 1-88, Tora-Tora, Ibaraki-shi, Osaka Hitachi Maxell Co., Ltd. (72) Inventor Norio Ohta 1-88 Tora-Tora, Ibaraki-shi, Osaka Hitachi Maxell Within the corporation

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 基体上に高分子化合物膜を真空成膜する
工程を含む光情報記録媒体の製造方法において、前記基
体上に前記高分子化合物膜を真空成膜したのち、前記高
分子化合物膜中に含まれる未反応成分の反応を促進する
高分子安定化処理を施すことを特徴とする光情報記録媒
体の製造方法。
1. A method for manufacturing an optical information recording medium, comprising the step of vacuum-depositing a polymer compound film on a substrate, wherein the polymer compound film is vacuum-deposited on the substrate, and then the polymer compound film is formed. A method for producing an optical information recording medium, which comprises subjecting a polymer stabilizing treatment for accelerating a reaction of unreacted components contained therein.
【請求項2】 請求項1において、前記高分子安定化処
理が、前記高分子化合物膜に紫外線を照射し、そのエネ
ルギーによって前記高分子化合物膜中に含まれる低分子
量成分あるいはフリーラジカルの反応を促進する処理で
あることを特徴とする光情報記録媒体の製造方法。
2. The polymer stabilization treatment according to claim 1, wherein the polymer compound film is irradiated with ultraviolet rays, and the energy of the polymer compound reaction causes a reaction of a low molecular weight component or a free radical contained in the polymer compound film. A method of manufacturing an optical information recording medium, characterized in that the process is a accelerating process.
【請求項3】 請求項1において、前記高分子安定化処
理が、前記高分子化合物膜を加熱下で紫外線を照射し、
それらのエネルギーによって前記高分子化合物膜中に含
まれる低分子量成分あるいはフリーラジカルの反応を促
進する処理であることを特徴とする光情報記録媒体の製
造方法。
3. The polymer stabilization treatment according to claim 1, wherein the polymer compound film is irradiated with ultraviolet rays while being heated,
A method for producing an optical information recording medium, which is a process for promoting the reaction of a low molecular weight component or a free radical contained in the polymer compound film by the energy thereof.
【請求項4】 請求項2又は3において、前記紫外線照
射を、前記基体上への前記高分子化合物膜の真空成膜を
行ないつつ、これと同時に行なうことを特徴とする光情
報記録媒体の製造方法。
4. The manufacturing of an optical information recording medium according to claim 2, wherein the ultraviolet irradiation is performed simultaneously with vacuum formation of the polymer compound film on the substrate. Method.
【請求項5】 請求項2又は3において、前記紫外線照
射を、前記基体上に前記高分子化合物膜を真空成膜した
のち、当該高分子化合物膜上に記録膜を成膜する以前
に、前記基体側及び高分子化合物膜側のうちの少なくと
もいずれか一方側から行なうことを特徴とする光情報記
録媒体の製造方法。
5. The method according to claim 2 or 3, wherein the ultraviolet irradiation is performed after vacuum-depositing the polymer compound film on the substrate and before forming a recording film on the polymer compound film. A method for manufacturing an optical information recording medium, which is performed from at least one of a substrate side and a polymer compound film side.
【請求項6】 請求項2又は3において、前記紫外線照
射を、前記基体上に前記高分子化合物膜を真空成膜し、
かつ当該高分子化合物膜上に記録膜を成膜したのちに、
前記基体側から行なうことを特徴とする光情報記録媒体
の製造方法。
6. The ultraviolet irradiation according to claim 2, wherein the polymer compound film is vacuum-deposited on the substrate,
And after forming a recording film on the polymer compound film,
A method for manufacturing an optical information recording medium, which is performed from the side of the substrate.
【請求項7】 成膜室内に、該成膜室によって成膜され
る高分子化合物膜中に含まれる未反応成分の反応を促進
する高分子安定化処理装置が組み込まれていることを特
徴とする光情報記録媒体の製造装置。
7. A polymer stabilizing treatment device for accelerating the reaction of unreacted components contained in the polymer compound film formed by the film forming chamber is incorporated in the film forming chamber. Optical information recording medium manufacturing apparatus.
【請求項8】 成膜室と、該成膜室によって高分子化合
物膜が成膜された基体を収納し、前記高分子化合物膜中
に含まれる未反応成分の反応を促進する高分子安定化処
理室とを備えたことを特徴とする光情報記録媒体の製造
装置。
8. A polymer stabilization that accommodates a film forming chamber and a substrate on which a polymer compound film is formed by the film forming chamber, and promotes reaction of unreacted components contained in the polymer compound film. An apparatus for manufacturing an optical information recording medium, comprising: a processing chamber.
JP30554992A 1992-11-16 1992-11-16 Method and device for production of optical information recording medium Withdrawn JPH06162579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30554992A JPH06162579A (en) 1992-11-16 1992-11-16 Method and device for production of optical information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30554992A JPH06162579A (en) 1992-11-16 1992-11-16 Method and device for production of optical information recording medium

Publications (1)

Publication Number Publication Date
JPH06162579A true JPH06162579A (en) 1994-06-10

Family

ID=17946501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30554992A Withdrawn JPH06162579A (en) 1992-11-16 1992-11-16 Method and device for production of optical information recording medium

Country Status (1)

Country Link
JP (1) JPH06162579A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT406756B (en) * 1998-12-21 2000-08-25 Johannes Dr Heitz FLUOROPOLYMER COATINGS WITH GOOD LIABILITY AND GOOD ABRASION RESISTANCE FOR USE IN MEDICINE AND A METHOD FOR THEIR PRODUCTION

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT406756B (en) * 1998-12-21 2000-08-25 Johannes Dr Heitz FLUOROPOLYMER COATINGS WITH GOOD LIABILITY AND GOOD ABRASION RESISTANCE FOR USE IN MEDICINE AND A METHOD FOR THEIR PRODUCTION

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