JPS6370943A - Production of optical recording medium - Google Patents

Production of optical recording medium

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Publication number
JPS6370943A
JPS6370943A JP21645286A JP21645286A JPS6370943A JP S6370943 A JPS6370943 A JP S6370943A JP 21645286 A JP21645286 A JP 21645286A JP 21645286 A JP21645286 A JP 21645286A JP S6370943 A JPS6370943 A JP S6370943A
Authority
JP
Japan
Prior art keywords
film
recording medium
sputter etching
recording
boundary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21645286A
Other languages
Japanese (ja)
Inventor
Akira Shioda
明 潮田
Kenichi Uchiumi
研一 内海
Yasuyuki Goto
康之 後藤
Iwao Tsugawa
津川 岩雄
Nagaaki Etsuno
越野 長明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21645286A priority Critical patent/JPS6370943A/en
Publication of JPS6370943A publication Critical patent/JPS6370943A/en
Pending legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To prevent the deterioration of a recording medium after repetition of recording and erasing of optical information by forming an underlying film on the recording medium, then subjecting the surface thereof to sputter etching to remove an oxide film, etc., thereby improving and uniformizing the adhesiveness of the recording medium. CONSTITUTION:The underlying film 12, the recording medium film 14 and a protective film 15 for said recording medium film are successively formed on a substrate 10. The boundary 13 of the underlying film is subjected to the sputter etching prior to the formation of the film 14 and while the vacuum at the time of the sputter etching is maintained, the film 14 is formed. The natural oxide layer formed on the surface of the underlying film and the impurities, etc., sticking thereto are completely removed if the underlying film is subjected to the sputter etching in the above-mentioned manner, by which the boundary of the underlying film of the recording medium is uniformized. Since the formation of the recording medium to be formed is continuously executed under the same vacuum conditions, the at mospheric pollution of the boundary is obviated and the adhesive power of the boundary is improved.

Description

【発明の詳細な説明】 〔(概要〕 光情報の記録に用いる光ディスクの製造に係り。[Detailed description of the invention] 〔(overview〕 Involved in the manufacture of optical discs used for recording optical information.

記録媒体の下地膜形成後、その表面をスパックエツチン
グして酸化膜等を除去することによって。
After forming the base film of the recording medium, the surface is spack-etched to remove the oxide film, etc.

該記録媒体の密着性とその均賞化を図り、光情報の記録
、消去を操り返す記録媒体の劣化を抑止するものである
The purpose is to improve the adhesion of the recording medium and to improve its adhesion, and to prevent deterioration of the recording medium due to repeated recording and erasure of optical information.

〔産業上の利用分野〕[Industrial application field]

本発明は、光集束のビームパワーあるいは照射時間の異
なるパルスを基板上の記録媒体に照射して、光学的に異
なる二つの安定状態を形成する光デイスク媒体に係り、
特に光学的情報の記録・消去を反復して用いる記録媒体
の製造方法に関する。
The present invention relates to an optical disk medium that forms two optically different stable states by irradiating a recording medium on a substrate with pulses having different focused beam powers or irradiation times,
In particular, the present invention relates to a method of manufacturing a recording medium in which optical information is repeatedly recorded and erased.

係る光デイスク媒体は、記憶密度が106〜107(b
it /cnりにも達し、従来の磁気記録装置より一桁
近い高密度記録が可能なことから、今後のコンピュータ
用大容量記憶ディスクとして期待されている。
Such optical disc media have a storage density of 106 to 107 (b
It is expected to be used as a mass storage disk for computers in the future because it is capable of recording at an order of magnitude higher density than conventional magnetic recording devices.

〔従来の技術〕[Conventional technology]

従来の記録媒体の膜構成と、記録媒体膜を形成する真空
成膜装置の概要を説明する。
The film structure of a conventional recording medium and the outline of a vacuum film forming apparatus for forming a recording medium film will be explained.

光透過性のかつ平坦性の優れるガラス等の担体基板を用
い、先ずその表面を真空蒸着法またはスパッタ法によっ
て記録媒体膜の下地膜として。
Using a carrier substrate such as glass that is transparent and has excellent flatness, its surface is first used as a base film for a recording medium film by vacuum evaporation or sputtering.

1IIBO,5nOz、Ti0z等の金属酸化膜、ある
いは硫化亜鉛膜ZnSを厚さ80nm程度成膜する。
A metal oxide film such as 1IIBO, 5nOz, TiOz, or a zinc sulfide film ZnS is formed to a thickness of about 80 nm.

続いて、記録媒体膜として1例えばインジウニム・アン
チモンIn−5bの合金薄膜を厚さ略60nm程度成膜
する。
Subsequently, a thin alloy film of, for example, indium antimony In-5b is formed to a thickness of about 60 nm as a recording medium film.

更に、In4b媒体膜の保護膜として、 ZnS等を厚
さ50nm程度に成膜する。
Further, as a protective film for the In4b medium film, a film of ZnS or the like is formed to a thickness of about 50 nm.

このように下地膜、記録媒体膜、保護膜を順次膜付けし
たディスクは、相変化型の書き換え可能な光記憶ディス
クとして期待されている。
A disk in which a base film, a recording medium film, and a protective film are sequentially applied in this manner is expected to be used as a phase change type rewritable optical storage disk.

第2図は記録媒体成膜装置の高周波(Radio Fr
equency、 RPと略記する)スパッタエツチン
グ装置の簡略断面図である。
Figure 2 shows the radio frequency (Radio Fr.
1 is a simplified cross-sectional view of a sputter etching apparatus (abbreviated as RP).

図において、ペルジャー20内は真空系に連接する排気
孔23により一旦排気された後、ガス導入孔24より電
離用のアルゴン行等が適宜圧力に充填される。成膜対象
のディスク基板10はカソード21に装着され、これと
対面するアノード22側は、単または複数のスパッタタ
ーゲット源26,27.例えばIn−3b源あるいはZ
nS源等が配置される。・そしてペルジャー20内空間
をRP源によってプラズマ励起すれば、電離Arガスに
よって例えばターゲット源26の金属イオンは基板10
上に衝突することによって薄膜11が形成される。但し
、この場合。
In the figure, the inside of the Pel jar 20 is once evacuated through an exhaust hole 23 connected to a vacuum system, and then filled with an ionizing argon line or the like to an appropriate pressure through a gas introduction hole 24. The disk substrate 10 to be film-formed is attached to the cathode 21, and the anode 22 side facing the cathode 21 is provided with one or more sputter target sources 26, 27 . For example, In-3b source or Z
An nS source etc. are arranged. - Then, if the space inside the Pelger 20 is plasma-excited by the RP source, the metal ions of the target source 26 will be transferred to the substrate 10 by the ionized Ar gas.
A thin film 11 is formed by the impact on the top. However, in this case.

他方のクーゲット′rA27はシャッタにより閉止状態
とされる。
The other cuget 'rA27 is closed by a shutter.

〔発明が解決しようとする門扉点〕[Gateway point that the invention attempts to solve]

前記のように下地膜、記録媒体膜、保護膜を積み重ねて
形成された光記録媒体を例えば、大容量外部記憶装置等
に使用するさい、具備すべき一特性として、記録信号の
ノイズレベルが所定のレベル以下であること、また記録
、消去の反復使用に対してノイズレベルが安定している
ことが要請される。然しなから、従来の記録媒体は、光
情報の記25大ならびに消去の反復回数に比例して、記
録信号の再生CN比(キャリア対ノイズ比)が低下する
所謂、長期使用中における劣化がある。
When an optical recording medium formed by stacking a base film, a recording medium film, and a protective film as described above is used, for example, in a large-capacity external storage device, one characteristic that must be provided is that the noise level of the recording signal is at a predetermined level. It is required that the noise level be below the noise level, and that the noise level be stable against repeated use of recording and erasing. However, conventional recording media suffer from so-called deterioration during long-term use, in which the reproduced CN ratio (carrier-to-noise ratio) of the recorded signal decreases in proportion to the number of repetitions of recording and erasing optical information. .

〔問題点を解決するための手段〕[Means for solving problems]

本発明では、第1図の光記録媒体の成膜基板断面図に示
すように、基板(10)上に下地膜(12) 、記録媒
体膜(14)、該記録媒体膜の保護膜(15)を順次成
膜する前記記録媒体膜(14)の成膜前に、下地膜界面
(13)をスパッタエツチングする手段と、該スパッタ
エツチング時における真空を保持したままで記録媒体膜
(14)を成膜する手段を含んで形成する光記録媒体の
製造方法として前記の問題点を解決したものである。
In the present invention, as shown in the cross-sectional view of a film-forming substrate for an optical recording medium in FIG. 1, a base film (12), a recording medium film (14), and a protective film (15 ) before the formation of the recording medium film (14), a means for sputter etching the base film interface (13), and a means for sputter etching the recording medium film (14) while maintaining the vacuum during the sputter etching. This method solves the above-mentioned problems as a method for manufacturing an optical recording medium including a means for forming a film.

〔作用〕[Effect]

下地膜のスパッタエツチングにより、下地膜表面に生成
された自然酸化層や付着した不純物等が完全に取り除か
れ、記録媒体の下地膜界面が均質化する。然も、スパッ
タエツチング後、成膜される記録媒体は、同一の真空条
件下で継続して行われるので界面の大気汚染がなく、界
面の密着力が向上する。
Sputter etching of the base film completely removes the natural oxide layer generated on the surface of the base film and the attached impurities, thereby homogenizing the base film interface of the recording medium. However, after sputter etching, the film is formed on the recording medium continuously under the same vacuum conditions, so there is no atmospheric contamination of the interface, and the adhesion of the interface is improved.

かくして従来2問題とされた光信号の記録と消去を反復
して行う書き換え可能な光記憶媒体の劣化がなくなり、
安定な光デイスク基板が提供可能となる。
In this way, the deterioration of rewritable optical storage media that involves repeated recording and erasing of optical signals, which were two problems in the past, is eliminated.
A stable optical disk substrate can be provided.

〔実施例〕〔Example〕

第1図は本発明の詳細な説明する光記録媒体の成■t1
基板断面図である。
FIG. 1 shows the formation of an optical recording medium t1 for explaining the details of the present invention.
FIG. 3 is a cross-sectional view of the substrate.

第2図スパッタエツチング装置を用いて、 Arガスの
充填圧力約10−’Torrの条件下において、下地膜
12メして硫化亜鉛ZnSを厚さ略80nm程度スパン
タ成膜する。次いで、スパッタターゲット源ZnSをシ
ャターにより閉止して前記硫化亜鉛ZnS膜表面13を
Arガスを用いて20分間スパッタエツチングする。こ
の時、 RF源25より印加するパワーは50ワットと
される。
Using a sputter etching apparatus as shown in FIG. 2, zinc sulfide ZnS is spun-formed to a thickness of about 80 nm on the base film 12 under conditions of an Ar gas filling pressure of about 10-' Torr. Next, the sputter target source ZnS is closed with a shutter, and the zinc sulfide ZnS film surface 13 is sputter etched using Ar gas for 20 minutes. At this time, the power applied from the RF source 25 is 50 watts.

その直後、同装置の真空を破ることなく、スパッタター
ゲットをIn・sb源側に切り替え、記録媒体膜14と
してインジウーム(In)とアンンチモン(sb)の合
金膜1n4oSb6oを厚さ60nm程度スパッタ成膜
する。
Immediately thereafter, without breaking the vacuum of the same apparatus, the sputtering target is switched to the In/sb source side, and an alloy film of indium (In) and antimony (sb) 1n4oSb6o is sputtered to a thickness of about 60 nm as the recording medium film 14. .

更に記録媒体膜14の保護膜15としてZnSを厚さ略
50nm程度スパック成膜する。
Further, as a protective film 15 for the recording medium film 14, ZnS is spun-formed to a thickness of approximately 50 nm.

第3図は前記実施例より得られた光記録媒体と、従来の
同じ積層構成になる媒体(点線)との記録・消去の繰り
返し回数(N)に対するCN比の劣化特性を調査した本
発明の効果を示す実測特性図である。
FIG. 3 shows the deterioration characteristics of the CN ratio with respect to the number of recording/erasing repetitions (N) of the optical recording medium obtained in the above example and a conventional medium with the same laminated structure (dotted line) of the present invention. It is an actual measurement characteristic diagram showing the effect.

光記録媒体への記録は、ディスク基板の周速14m/s
、記録周波数6M1lz、記録レーザーパワー8mW。
Recording on the optical recording medium is performed at a circumferential speed of the disk substrate of 14 m/s.
, recording frequency 6M1lz, recording laser power 8mW.

また記録の消去レーザーパワー4mW、測定バンド幅3
0kt+zの条件を付与して計測されたものである。
Also, recording erasure laser power 4mW, measurement bandwidth 3
This was measured under the condition of 0kt+z.

実測特性によれば、界面処理の無い従来の光記録媒体は
有りの媒体に比べて繰り返しの初期においてCN比が約
3dB低い。これはノイズレベルが3dB高いためであ
る。その後、記録・消去の繰り返し回数が増すにつれて
点線特性は著しく低下するにかかわらず界面処理がされ
た本発明の光記録媒体は安定な特性であることが6’f
f i=される。
According to the measured characteristics, the CN ratio of a conventional optical recording medium without interface treatment is about 3 dB lower than that of a medium with interface treatment at the initial stage of repetition. This is because the noise level is 3 dB higher. After that, as the number of repetitions of recording and erasing increases, the dotted line characteristics deteriorate significantly, but the optical recording medium of the present invention that has been subjected to the interface treatment has stable characteristics.
f i = done.

このように記録媒体膜の下地膜界面の清浄化処理の導入
によってノイズレベルが低下し、かつ記録・消去の繰り
返しによるノイズレベルが増加を抑止することができる
In this way, by introducing the cleaning treatment for the base film interface of the recording medium film, the noise level can be reduced, and it is possible to prevent the noise level from increasing due to repeated recording and erasing.

〔発明の効果〕〔Effect of the invention〕

以上から明らかなように本発明光記録媒体の製造方法に
よれば、記録媒体の下地膜界面が清浄化されるにより該
媒体の基板密着性が向上すると共にその均質化が図られ
、大容量記憶ディスクとしての所定のCN比が取得され
ることになる。
As is clear from the above, according to the method for manufacturing an optical recording medium of the present invention, the interface of the base film of the recording medium is cleaned, thereby improving the adhesion of the medium to the substrate and making it homogeneous. A predetermined CN ratio for the disc will be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の詳細な説明するための光記録媒体の成
膜基板断面図。 第2図は記録媒体成膜装置の簡略断面図。 第3図は記録・消去繰り返し回数(N)と再生CN比の
関係特性図である。 図中110はディスク基板。 12は下地膜、13は界面。 14は記録媒体膜、15は保護i1父 第 1 図 1乙・tネj糸ろトl(、ワしVlの局略誼dDZ第 
2 図
FIG. 1 is a sectional view of a film-forming substrate of an optical recording medium for explaining the present invention in detail. FIG. 2 is a simplified cross-sectional view of the recording medium film forming apparatus. FIG. 3 is a characteristic diagram showing the relationship between the number of recording/erasing repetitions (N) and the reproduction CN ratio. In the figure, 110 is a disk substrate. 12 is a base film, and 13 is an interface. 14 is the recording medium film, 15 is the protection i1 father 1.
2 Figure

Claims (1)

【特許請求の範囲】[Claims] 基板(10)上に下地膜(12)、記録媒体膜(14)
、該記録媒体膜の保護膜(15)を成膜するに当たり、
記録媒体膜(14)の下地膜界面(13)をスパッタエ
ッチングする手段と、前記スパッタエッチング時の真空
を保持した状態で記録媒体膜(14)を成膜する手段を
含んで形成することを特徴とする光記録媒体の製造方法
Base film (12) and recording medium film (14) on the substrate (10)
, in forming the protective film (15) of the recording medium film,
The recording medium film (14) is formed by including means for sputter etching the base film interface (13) of the recording medium film (14) and means for forming the recording medium film (14) while maintaining the vacuum during the sputter etching. A method for manufacturing an optical recording medium.
JP21645286A 1986-09-12 1986-09-12 Production of optical recording medium Pending JPS6370943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21645286A JPS6370943A (en) 1986-09-12 1986-09-12 Production of optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21645286A JPS6370943A (en) 1986-09-12 1986-09-12 Production of optical recording medium

Publications (1)

Publication Number Publication Date
JPS6370943A true JPS6370943A (en) 1988-03-31

Family

ID=16688736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21645286A Pending JPS6370943A (en) 1986-09-12 1986-09-12 Production of optical recording medium

Country Status (1)

Country Link
JP (1) JPS6370943A (en)

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