JPS62294174A - Apparatus for producing optical disk - Google Patents
Apparatus for producing optical diskInfo
- Publication number
- JPS62294174A JPS62294174A JP13659986A JP13659986A JPS62294174A JP S62294174 A JPS62294174 A JP S62294174A JP 13659986 A JP13659986 A JP 13659986A JP 13659986 A JP13659986 A JP 13659986A JP S62294174 A JPS62294174 A JP S62294174A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chamber
- vacuum
- main
- main vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 12
- 239000011347 resin Substances 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 abstract description 6
- 239000004417 polycarbonate Substances 0.000 abstract description 3
- 229920000515 polycarbonate Polymers 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 239000010408 film Substances 0.000 description 31
- 239000010409 thin film Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
産業上の利用分野
本発明はビデオディスク、ディジタルオーディオディス
ク（例えばコンパクトディスク）、静止画、文書ファイ
ルなどのディジタル信号を記録、再生または消去可能な
光ディスクの製造装置に関するものである。[Detailed Description of the Invention] 3. Detailed Description of the Invention Industrial Application Field The present invention is capable of recording, reproducing, or erasing digital signals such as video discs, digital audio discs (e.g., compact discs), still images, document files, etc. The present invention relates to an optical disc manufacturing apparatus.
従来の技術
一般に光ディスクはその情報密度が極めて大きいことや
、Ｓ／Ｎ比も大きく、ノイズが少ないことなどから情報
媒体として有望視され、ビデオディスクやディジタルオ
ーディオディスクとして商品化され、ディジタル信号を
記録、再生する光ディスクとしても近年研究開発が行わ
れている。Conventional technology In general, optical discs are considered promising as information media due to their extremely high information density, high S/N ratio, and low noise, and have been commercialized as video discs and digital audio discs, which record digital signals. In recent years, research and development has also been conducted on optical discs for playback.
第４図に従来の一般的なディジタルオーディオディスク
であるコンパクトディスクの概要を示す。FIG. 4 shows an overview of a compact disc, which is a conventional general digital audio disc.
これはＰＣＭ変換されたディジタル信号が樹脂基板にピ
ット列状に記録され半導体レーザによシ再生されるもの
である。In this method, a PCM-converted digital signal is recorded in a pit array on a resin substrate and reproduced by a semiconductor laser.
第４図において、１はディスク、２は樹脂基板、３は樹
脂基板２に刻まれたビット列状のディジタル信号部、４
はその表面に形成された反射膜、５は反射膜４にコーテ
ィングされた保護膜、６は保護膜５に設けられたレーベ
ル印刷膜、７は再生用の半導体レーザ光である。In FIG. 4, 1 is a disk, 2 is a resin substrate, 3 is a bit string-shaped digital signal part carved on the resin substrate 2, and 4
5 is a reflective film formed on the surface thereof, 5 is a protective film coated on the reflective film 4, 6 is a label printing film provided on the protective film 5, and 7 is a semiconductor laser beam for reproduction.
反射膜４はディジタル信号を再生するため、保護膜５は
反射膜を保護するため、レーベル印刷膜６はディスクを
識別するため各々必要なものである。The reflective film 4 is necessary for reproducing digital signals, the protective film 5 is necessary for protecting the reflective film, and the label printing film 6 is necessary for identifying the disc.
従来の反射膜または記録膜を形成する光ディスりの製造
装置についてのべる。第２図に基板上に反射膜または記
録膜を形成する従来の薄膜形成装置の断面図を示す。８
は薄膜成形装置の真空室であシ、９はその真空排気装置
である。蒸着源１０がヒータ１１の加熱により真空蒸着
され、基板２に反射膜または記録膜が形成される。This article describes a conventional optical disc manufacturing apparatus that forms a reflective film or a recording film. FIG. 2 shows a cross-sectional view of a conventional thin film forming apparatus for forming a reflective film or a recording film on a substrate. 8
9 is a vacuum chamber of the thin film forming apparatus, and 9 is its evacuation device. The evaporation source 10 performs vacuum evaporation by heating with the heater 11, and a reflective film or a recording film is formed on the substrate 2.
次に、別の種類の従来の反射膜または記録膜を形成する
光ディスクの製造装置についてのべる。Next, another type of conventional optical disk manufacturing apparatus for forming a reflective film or a recording film will be described.
第３図にこの装置の断面図を示す。２つの予備真空室１
２と１つの主真空蒸着室１３より構成され、各々の真空
室には独立した真空排気装置１４が設けられている。予
備真空室１２にて真空排気され、主真空蒸着室１３にて
蒸着源１ｏがヒータ１１の加熱によシ真空蒸着され、基
板２に反射膜または記録膜が形成される。FIG. 3 shows a sectional view of this device. 2 pre-vacuum chambers 1
2 and one main vacuum deposition chamber 13, and each vacuum chamber is provided with an independent evacuation device 14. The preliminary vacuum chamber 12 is evacuated, and the evaporation source 1o is vacuum-deposited in the main vacuum evaporation chamber 13 by heating with the heater 11, thereby forming a reflective film or a recording film on the substrate 2.
発明が解決しようとする問題点
しかしながら上記のような構成では、ディスク基板は一
般的にボリカーポネー）（ＰＣ）やアクルリ（ＰＭＭＡ
）などの樹脂であるため、基板表面に水分（Ｈ２Ｏ）や
酸素（０゜）などが吸着される。Problems to be Solved by the Invention However, in the above configuration, the disk substrate is generally made of Polycarbonate (PC) or Acrylic (PMMA).
), moisture (H2O), oxygen (0°), etc. are adsorbed onto the substrate surface.
これが主真空室に入ることにより、主真空室内でのＨＯ
や０２濃度が高くなシ、クライオポンプなどで構成され
た真空排気装置は短期間でダメージを受は排気能力が低
下し正常な真空装置として動作しないなどの問題点を有
していた。By entering the main vacuum chamber, HO in the main vacuum chamber
Vacuum evacuation equipment made up of cryopumps and the like, which contain high concentrations of 02 and 02, have been damaged in a short period of time, resulting in a reduction in their evacuation capacity and the problem that they no longer operate as normal vacuum equipment.
本発明は上記問題点に鑑み、光ディスクを量産性よく安
価に製造することのできる光ディスクの製造装置を提供
するものである。SUMMARY OF THE INVENTION In view of the above-mentioned problems, the present invention provides an optical disc manufacturing apparatus that can manufacture optical discs with good mass productivity and at low cost.
問題点を解決するための手段
上記問題点を解決するために本発明の光ディスク製造装
置は２室以上の真空室と、１室の主真空室とによシ構成
され、上記予備真空室には各々独立した真空排気装置を
備えるとともに、上記主真空蒸着室には２基以上の主真
空排気装置を備えたものである。Means for Solving the Problems In order to solve the above problems, the optical disc manufacturing apparatus of the present invention is constructed of two or more vacuum chambers and one main vacuum chamber, and the preliminary vacuum chamber includes: Each of them is provided with an independent evacuation device, and the main vacuum deposition chamber is provided with two or more main evacuation devices.
作 用
本発明は上記した構成によって、予備真空室にて基板上
に付着したＨ２Ｏ，０２などの不純物を排気し、主真空
室にて蒸着を行なう。しかも、主真空室において基板か
らのＨ２Ｏ，０２などの影響を受けても正常な膜形成が
可能なように２基以上の主真空排気装置を設けている。Operation According to the present invention, impurities such as H2O and 02 attached to the substrate are evacuated in the preliminary vacuum chamber, and vapor deposition is performed in the main vacuum chamber, using the above-described configuration. Furthermore, two or more main vacuum exhaust devices are provided so that normal film formation can be performed even if the main vacuum chamber is affected by H2O, 02, etc. from the substrate.
これにより一方の主真空排気装置がダメージを被っても
、他方の主真空排気装置において正常な膜形成が行える
。膜形成後、次の予備真空室を通じて基板が大気に取出
され、基板上に反射膜または記録膜を連続的に安定して
形成することができる。As a result, even if one main evacuation device is damaged, normal film formation can be performed in the other main evacuation device. After film formation, the substrate is taken out to the atmosphere through the next preliminary vacuum chamber, and a reflective film or a recording film can be continuously and stably formed on the substrate.
実施例
以下本発明の一実施例の光ディスク製造装置について、
図面を参照しながら説明する。Example Below, regarding an optical disc manufacturing apparatus according to an example of the present invention,
This will be explained with reference to the drawings.
第１図は本発明の光ディスク製造装置１６の断面図を示
すものである。第１図において１６は予備真空室（１）
、１７は予備真空室（１）１６用の真空排気装置（１）
、１８は予備真空室（２）、１９は予備真空室（２）１
８用の真空排気装置（２）、２ｏは主真空蒸着室、２１
は主真空蒸着室２０用の主真空排気装置（１）、２２は
同主真空排気装＃（２）、２３はスパッター用ターゲッ
トである。FIG. 1 shows a sectional view of an optical disc manufacturing apparatus 16 of the present invention. In Figure 1, 16 is the preliminary vacuum chamber (1)
, 17 is a preliminary vacuum chamber (1) and a vacuum exhaust device for 16 (1)
, 18 is the preliminary vacuum chamber (2), 19 is the preliminary vacuum chamber (2) 1
Vacuum exhaust system (2) for 8, 2o is the main vacuum deposition chamber, 21
2 is a main evacuation device (1) for the main vacuum evaporation chamber 20, 22 is the main evacuation device #(2), and 23 is a sputtering target.
基板２が、予備真空室（１）１６に入り、真空排気装置
（１）１７により排気されたのち、主真空蒸着室２ｏに
入れられる。ここで通常は主真空排気装置（１）２１に
よシ真空に排気されたのち、ターゲット２３により基板
２上にアルミニウムＣＡＩ）反射膜が形成される。次に
、反射膜の形成された基板は予備真空室（２）１８に入
シ、大気に取出される。The substrate 2 enters the preliminary vacuum chamber (1) 16, is evacuated by the evacuation device (1) 17, and then enters the main vacuum deposition chamber 2o. Usually, after being evacuated to vacuum by the main vacuum evacuation device (1) 21, an aluminum CAI) reflective film is formed on the substrate 2 by a target 23. Next, the substrate on which the reflective film has been formed enters the preliminary vacuum chamber (2) 18 and is taken out to the atmosphere.
その後、予備真空室（２）１８は真空排気装置（２Ｘ９
によシ真空に排気される。この工程によシ順次基板上に
Ａ７反射膜が形成される。After that, the preliminary vacuum chamber (2) 18 is equipped with a vacuum exhaust device (2X9
It is then evacuated to a vacuum. Through this process, an A7 reflective film is sequentially formed on the substrate.
しかしながら、基板は一般的にはポリカーボネート（Ｐ
Ｃ）やアクリル（ＰＭＭＡ）などの樹脂製であるため、
その表面に水分（Ｈ２Ｏ）、酸素（０２）などの不純物
が大量に付着している。また、近年高排気速度を得るた
めにクライオポンプが一般的に主真空排気装置として使
用されているが、これは前述のＨ２Ｏや０２などには極
めてダメージを受は易く大量のＨ２Ｏ，０２などにょシ
その排気能力が低下し寿命に到る。この場合に、主真空
排気装置（２）２２に切り替えれば時間のロスなく本製
造装置は正常に動作することができる。この間に主真空
排気装置（１）の排気能力再生を行えば、次に主真空排
気装置（２）に寿命が来ても、主真空排気装置（１）で
正常動作が可能となる。このように本発明の光ディスク
製造装置によれば、安定して連続的に反射膜または記録
膜の形成ができる。However, the substrate is generally made of polycarbonate (P
Since it is made of resin such as C) and acrylic (PMMA),
A large amount of impurities such as moisture (H2O) and oxygen (02) adhere to its surface. In addition, in recent years, cryopumps have generally been used as the main vacuum evacuation device to obtain high pumping speeds, but cryopumps are extremely susceptible to damage from the aforementioned H2O and 02, and are used in large quantities. Its exhaust capacity decreases and its life reaches the end. In this case, by switching to the main evacuation device (2) 22, the manufacturing apparatus can operate normally without any loss of time. If the evacuation capacity of the main evacuation device (1) is regenerated during this time, even if the main evacuation device (2) reaches the end of its life next time, the main evacuation device (1) will be able to operate normally. As described above, according to the optical disc manufacturing apparatus of the present invention, a reflective film or a recording film can be formed stably and continuously.
発明の効果
以上のように本発明は、２室以上の予備真空室と、１室
の主真空蒸着室とにより構成され、上記予備真空室には
各々独立した真空排気装置を備えるとともに、上記主真
空蒸着室には２基以上の主真空排気装置を設けることに
より、一方の主真空排気装置が基板より持込みの不純物
によりダメージを受けても、他方の主真空排気装置に切
替えることにより正常動作が可能となる。このように、
本光ディスク製造装置は時間のロスなく安定して連続的
に、反射膜または記録膜を形成することができるので、
安価に大量に光ディスクを提供することができる。Effects of the Invention As described above, the present invention is composed of two or more preliminary vacuum chambers and one main vacuum deposition chamber, each of the preliminary vacuum chambers is equipped with an independent evacuation device, and the main vacuum chamber is equipped with an independent evacuation device. By installing two or more main evacuation devices in a vacuum deposition chamber, even if one main evacuation device is damaged by impurities brought in from the substrate, normal operation can be maintained by switching to the other main evacuation device. It becomes possible. in this way,
This optical disc manufacturing apparatus can form reflective films or recording films stably and continuously without any time loss.
Optical discs can be provided in large quantities at low cost.
第１図は本発明の一実施例における光ディスク製造装置
の断面図、第２図は従来の光ディスクの薄膜形成装置の
断面図、第３図は他の従来の光ディスクの薄膜形成装置
の断面図、第４図（ａ） 、 （ｂ） 。
（Ｃ）は光ディスクの一種であるディジタルオーディオ
ディスクの各々平面図、断面図、および要部拡大図であ
る。
１・・・・・・ディスク、２・・・・・・基板、１５・
・・・・・光ディスク製造装置、１６・・・・・・予備
真空室（１）、１７・・・・・・真空排気装置（１）、
１８・・・・・・予備真空室（２）、１９・・・・・・
真空排気装置（２）、２ｏ・・・・・・主真空蒸着室、
２１・・・・・・主真空排気装置（１）、２２・・・・
・・主真空排気装置（２）、２３・・・・・・ターゲッ
ト。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名２−
１０仮
−ＬΣ−−−えディスク袈ｕ」【
１６−−−子倫Ｘ空宣（１）
２０−’（：妻上滲澹菫
２１°−−１！し５Ｅ−丁イト賃ａミク【（ブ２２２−
−一 ・、 、 ＜２）２３−ｍ−り−外
、ト
第 ２ 図
第３図FIG. 1 is a sectional view of an optical disk manufacturing apparatus according to an embodiment of the present invention, FIG. 2 is a sectional view of a conventional optical disk thin film forming apparatus, and FIG. 3 is a sectional view of another conventional optical disk thin film forming apparatus. Figure 4 (a), (b). (C) is a plan view, a sectional view, and an enlarged view of essential parts of a digital audio disc, which is a type of optical disc. 1... Disc, 2... Board, 15.
...Optical disc manufacturing equipment, 16...Preliminary vacuum chamber (1), 17...Evacuation device (1),
18...Preliminary vacuum chamber (2), 19...
Vacuum exhaust device (2), 2o... Main vacuum deposition chamber,
21... Main vacuum exhaust device (1), 22...
・・Main vacuum exhaust system (2), 23...Target. Name of agent: Patent attorney Toshio Nakao and 1 other person2-
10 Kari-LΣ---E disk kesu" [ 16--- Child line X empty declaration (1) 20-' (B222-
-1 ・, , <2) 23-m-ri-outside, g Fig. 2 Fig. 3
Claims (1)
り構成され、上記予備真空室には各々独立した真空排気
装置を備えるとともに、上記主真空蒸着室には２基以上
の主真空排気装置を備えたことを特徴とし、基板上に反
射膜または記録膜を形成する光ディスク製造装置。Consisting of two or more preliminary vacuum chambers and one main vacuum deposition chamber, each of the preliminary vacuum chambers is equipped with an independent evacuation device, and the main vacuum deposition chamber is equipped with two or more main vacuum evacuation units. An optical disc manufacturing apparatus for forming a reflective film or a recording film on a substrate, characterized by being equipped with an exhaust device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136599A JPH0762249B2 (en) | 1986-06-12 | 1986-06-12 | Optical disk manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136599A JPH0762249B2 (en) | 1986-06-12 | 1986-06-12 | Optical disk manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62294174A true JPS62294174A (en) | 1987-12-21 |
| JPH0762249B2 JPH0762249B2 (en) | 1995-07-05 |
Family
ID=15179065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61136599A Expired - Fee Related JPH0762249B2 (en) | 1986-06-12 | 1986-06-12 | Optical disk manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762249B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0426762A (en) * | 1990-05-17 | 1992-01-29 | Rohm Co Ltd | Rotary introducing mechanism in vacuum vessel |
| US5753089A (en) * | 1995-06-28 | 1998-05-19 | Balzers Aktiengesellschaft | Sputter coating station |
| JP2011106000A (en) * | 2009-11-19 | 2011-06-02 | Showa Denko Kk | Inline-type vacuum film-forming apparatus and method for producing magnetic recording medium |
| CN102758190A (en) * | 2011-04-28 | 2012-10-31 | 日东电工株式会社 | Vacuum film formation method and laminate obtained by the method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS438448Y1 (en) * | 1964-07-27 | 1968-04-15 | ||
| JPS5814337A (en) * | 1981-07-17 | 1983-01-27 | Pioneer Electronic Corp | Continuous metallizing device for material to be treated such as disc |
-
1986
- 1986-06-12 JP JP61136599A patent/JPH0762249B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS438448Y1 (en) * | 1964-07-27 | 1968-04-15 | ||
| JPS5814337A (en) * | 1981-07-17 | 1983-01-27 | Pioneer Electronic Corp | Continuous metallizing device for material to be treated such as disc |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0426762A (en) * | 1990-05-17 | 1992-01-29 | Rohm Co Ltd | Rotary introducing mechanism in vacuum vessel |
| US5753089A (en) * | 1995-06-28 | 1998-05-19 | Balzers Aktiengesellschaft | Sputter coating station |
| JP2011106000A (en) * | 2009-11-19 | 2011-06-02 | Showa Denko Kk | Inline-type vacuum film-forming apparatus and method for producing magnetic recording medium |
| CN102758190A (en) * | 2011-04-28 | 2012-10-31 | 日东电工株式会社 | Vacuum film formation method and laminate obtained by the method |
| US9523147B2 (en) | 2011-04-28 | 2016-12-20 | Nitto Denko Corporation | Vacuum film formation method and laminate obtained by the method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0762249B2 (en) | 1995-07-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |