JPH09128830A - Magneto-optical disk - Google Patents

Magneto-optical disk

Info

Publication number
JPH09128830A
JPH09128830A JP22411096A JP22411096A JPH09128830A JP H09128830 A JPH09128830 A JP H09128830A JP 22411096 A JP22411096 A JP 22411096A JP 22411096 A JP22411096 A JP 22411096A JP H09128830 A JPH09128830 A JP H09128830A
Authority
JP
Japan
Prior art keywords
substrates
magneto
substrate
optical disk
hours
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22411096A
Other languages
Japanese (ja)
Inventor
Shuichi Hashimoto
修一 橋本
Yasumasa Iwamura
康正 岩村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22411096A priority Critical patent/JPH09128830A/en
Publication of JPH09128830A publication Critical patent/JPH09128830A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve performance and productivity by forming recording media and protective films after discharging the moisture in substrates to the max. possible extent by heat treating these substrates at and for an adequate temp. and time. SOLUTION: The substrates consisting of a polycarbonate resin are heat treated for 2 to 6 hours at 100 to 120 deg.C. For example, a released gas rate (q) is proportional to t<-1> (t=discharge time) when the substrates are heat treated for two hours at 120 deg.C. The released gas rate (q) is proportional to t<-0.83> in the heat treatment for two hours at 80 deg.C. Then, the moisture remains in the substrates and the drying is insufficient in the case of the latter but the sufficient drying is resulted in the former. The films of the magneto-optical recording media are formed in a vacuum state on the substrates after the removal of the moisture in the substrates. The film formation is executed by subjecting a vacuum film forming system to a vacuum evacuation for the vacuum evacuation time determined by the heating conditions of the substrates and the number of the substrates to be formed with films, then forming the films of the magneto-optical recording media in the same manner as heretofore and, in succession, forming the protective films. As a result, the disks having the good performance are obtd, with the high productivity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は光磁気ディスクに係
り、更に詳しくはポリカーボネート樹脂を基板として用
いた、生産性に優れ、かつ、その性能の良好な光磁気デ
ィスクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-optical disk, and more particularly to a magneto-optical disk using a polycarbonate resin as a substrate, which has excellent productivity and good performance.

【0002】[0002]

【従来の技術】光磁気ディスクは、例えばガラスやPM
MA、ポリカーボネートなどのプラスチックからなる基
板に、例えばTbFeCo,GdFeCoなどの記録媒
体を蒸着やスパッタリングなどの真空製膜によって付着
させている。この光磁気記録媒体は非常に酸化されやす
いため、通常、上記製膜は10-4Pa以下の高真空下で
実施することが必要とされる。ガラス基板の場合には、
かかる真空製膜のための排気時間はそれほど問題となら
ないが、プラスチック基板の場合には、プラスチック基
板が比較的多量の水分を含むため真空製膜のための排気
に著しく時間がかかり、これが生産性を著しく悪くして
いるのが現状である。たとえばポリカーボネート(P
C)樹脂を基板として使用する場合には、この樹脂が常
温常湿で通常0.2〜0.3%の水分を含んでいるた
め、直径13cmの基板1枚を10-4Paの真空圧まで排
気するのに要する排気時間は、通常のガラス基板の場合
の約10倍もかかるという状態であった。
2. Description of the Related Art Magneto-optical disks are made of, for example, glass or PM.
A recording medium such as TbFeCo or GdFeCo is attached to a substrate made of plastic such as MA or polycarbonate by vacuum film formation such as vapor deposition or sputtering. Since this magneto-optical recording medium is very susceptible to oxidation, it is usually necessary to carry out the film formation under a high vacuum of 10 −4 Pa or less. In case of glass substrate,
The evacuation time for such vacuum film formation does not pose a problem, but in the case of a plastic substrate, the evacuation time for vacuum film formation takes a significant amount of time because the plastic substrate contains a relatively large amount of water. The current situation is that the For example, polycarbonate (P
C) When using a resin as a substrate, since this resin normally contains 0.2 to 0.3% of water at room temperature and humidity, one substrate with a diameter of 13 cm is vacuumed at a pressure of 10 -4 Pa. The exhaust time required for exhausting up to was about 10 times as long as that for a normal glass substrate.

【0003】[0003]

【発明が解決しようとする課題】従って、本発明は、前
記したポリカーボネートを基板として用いる光磁気ディ
スクを工業的に製造する場合の問題点を解決して、ポリ
カーボネートを基板として用いた、生産性に優れ、かつ
その性能の良好な光磁気ディスクを提供することを目的
とする。
Therefore, the present invention solves the problems in the industrial production of the above-mentioned magneto-optical disk using polycarbonate as a substrate, and improves productivity by using polycarbonate as a substrate. It is an object of the present invention to provide a magneto-optical disk which is excellent and has good performance.

【0004】[0004]

【課題を解決するための手段】本発明に従えば、ポリカ
ーボネート基板を90℃〜130℃の温度で2〜6時間
加熱処理して作成された光磁気ディスク用基板と、前記
光磁気ディスク用基板の加熱条件と製膜を行なう光磁気
ディスク用基板の枚数から定まる真空排気時間で真空製
膜系の真空排気を行い真空状態にした後に、前記光磁気
ディスク用基板上に前記真空状態で製膜された光磁気記
録媒体と、前記光磁気記録媒体上に前記真空状態で製膜
された保護膜と、を少なくとも備えてなる光磁気ディス
クが提供される。
According to the present invention, a magneto-optical disk substrate produced by heating a polycarbonate substrate at a temperature of 90 ° C. to 130 ° C. for 2 to 6 hours, and a substrate for the magneto-optical disk. The heating conditions and the number of magneto-optical disk substrates for film formation are set to a vacuum state after vacuum evacuation of the vacuum film-forming system for a vacuum evacuation time determined by the number of magneto-optical disk substrates to be film-formed. There is provided a magneto-optical disk comprising at least the above-described magneto-optical recording medium and a protective film formed on the magneto-optical recording medium in the vacuum state.

【0005】[0005]

【発明の実施の形態】本発明に係る光磁気ディスクに基
板として用いられるポリカーボネート樹脂としては所謂
ポリカーボネート樹脂と称される任意の樹脂を用いるこ
とができ、一般に市販されているポリカーボネート樹脂
を好適に用いることができる。
BEST MODE FOR CARRYING OUT THE INVENTION As a polycarbonate resin used as a substrate for a magneto-optical disk according to the present invention, any resin called a so-called polycarbonate resin can be used, and a commercially available polycarbonate resin is preferably used. be able to.

【0006】本発明に係る光磁気ディスクを製造するに
当っては、基板としてポリカーボネート樹脂を用いるこ
と及び光磁気記録媒体の真空製膜に先立って、前記した
如く、先ずポリカーボネート基板を約90〜130℃、
好ましくは100〜120℃の温度において約2〜6時
間、好ましくは4〜6時間加熱処理する。なお、上記加
熱処理条件は、ポリカーボネート基板の大きさが径12
〜13cm、厚さ1.2〜1.5mmの場合において適用さ
れるものであるが、基板の大きさがこれより大きかった
り、小さかったりした場合には前記加熱処理条件はそれ
に応じて若干の変更を加えた方が好ましい場合もある。
In manufacturing the magneto-optical disk according to the present invention, a polycarbonate resin is used as a substrate and prior to vacuum film formation of a magneto-optical recording medium, as described above, first, a polycarbonate substrate is made to have a thickness of about 90 to 130. ℃,
The heat treatment is preferably performed at a temperature of 100 to 120 ° C. for about 2 to 6 hours, preferably 4 to 6 hours. The heat treatment condition is that the size of the polycarbonate substrate is 12 mm.
It is applied when the thickness is -13 cm and the thickness is 1.2-1.5 mm, but when the size of the substrate is larger or smaller than this, the heat treatment conditions are slightly changed accordingly. In some cases, it may be preferable to add.

【0007】本発明に従えば、前記したように、光磁気
ディスクの製造にあたってポリカーボネート基板の排気
時間を短縮するため、ポリカーボネート基板を加熱容器
中で90℃〜130℃で2〜6時間加熱処理する。この
加熱温度および加熱時間については、最小限の時間でポ
リカーボネート基板の内部に含まれる水分を最大限に排
気させるような条件を選定することが必要である。本発
明者の知見によれば、ポリカーボネート基板の放出ガス
率(単位面積当り1秒間に放出されるガス量)qと排気
時間tとの関係は図1に示す通りである。図1のグラフ
から明らかなように、加熱処理が無い場合には、q∝t
-0.5であるが、120℃で2時間加熱処理した場合には
q∝t-1となる。一方、80℃で2時間の加熱処理では
中間のq∝t-0.83 となる。理論的には、表面吸着して
いる分子のガス放出の場合にはq∝t-1、固体内部から
の拡散による場合にはq∝t-0.5のなる関係となる(堀
越源一著、真空技術、東京大学出版会1983年発行参
照)。従って、80℃で2時間加熱処理した場合には基
板内部に水分が残存しており、乾燥が不十分であるが、
120℃で2時間加熱処理すれば、乾燥が十分であると
言える。このように、乾燥処理した基板を実際に真空装
置に入れ、排気してみることによって乾燥処理が十分か
否かを判断することができる。
According to the present invention, as described above, in order to shorten the exhaust time of the polycarbonate substrate in manufacturing the magneto-optical disk, the polycarbonate substrate is heat-treated in a heating container at 90 ° C. to 130 ° C. for 2 to 6 hours. . With respect to the heating temperature and the heating time, it is necessary to select conditions that allow the water contained in the polycarbonate substrate to be exhausted to the maximum extent in the minimum time. According to the knowledge of the present inventor, the relationship between the discharge gas rate (the amount of gas discharged per unit area per second) q of the polycarbonate substrate and the exhaust time t is as shown in FIG. As is apparent from the graph of FIG. 1, q ∝t without heat treatment
Although it is -0.5 , it becomes q∝t -1 when heat-treated at 120 ° C for 2 hours. On the other hand, the heat treatment at 80 ° C. for 2 hours gives an intermediate q∝t −0.83 . Theoretically, the relationship is q∝t -1 in the case of outgassing of molecules adsorbed on the surface, and q∝t -0.5 in the case of diffusion from the inside of a solid. Technology, see the University of Tokyo Press published in 1983). Therefore, when the heat treatment is carried out at 80 ° C. for 2 hours, moisture remains inside the substrate and the drying is insufficient.
It can be said that the drying is sufficient if the heat treatment is performed at 120 ° C. for 2 hours. As described above, it is possible to determine whether or not the drying processing is sufficient by actually putting the dried substrate in a vacuum device and exhausting the same.

【0008】次に図2は加熱温度とq∝t-xのxとの関
係を示すグラフ図である(加熱時間:2時間)。即ち、
温度90〜130℃で加熱した場合には基板の乾燥が十
分となる。なお、ポリカーボネート樹脂の熱変形温度は
135℃であるため、これ以上の温度での加熱は行なわ
なかった。
Next, FIG. 2 is a graph showing the relationship between heating temperature and x of q∝t −x (heating time: 2 hours). That is,
When heated at a temperature of 90 to 130 ° C., the substrate is sufficiently dried. Since the heat distortion temperature of the polycarbonate resin was 135 ° C, heating at a temperature higher than this was not performed.

【0009】このように、本発明に係る光磁気ディスク
を製造するにあたっては、先ず第一の工程でポリカーボ
ネート基板を90〜130℃の温度で2〜6時間加熱処
理してポリカーボネート基板中に含まれる水分を除去
し、次いで第二の工程として、基板上に真空状態で光磁
気記録媒体を製膜する。この製膜に際しては、真空製膜
系を光磁気ディスク用基板の加熱条件と製膜を行なう光
磁気ディスク基板の枚数から定まる真空排気時間で真空
排気を行ない、従前の方法と同様にして光磁気記録媒体
を製膜し、続いて保護膜を光磁気記録媒体上に製膜す
る。
As described above, in manufacturing the magneto-optical disk according to the present invention, first, in the first step, the polycarbonate substrate is heat-treated at a temperature of 90 to 130 ° C. for 2 to 6 hours to be contained in the polycarbonate substrate. Water is removed, and then, as a second step, a magneto-optical recording medium is formed on the substrate in a vacuum state. In this film formation, the vacuum film formation system is evacuated at a vacuum evacuation time determined by the heating conditions of the magneto-optical disk substrate and the number of magneto-optical disk substrates for film formation. A recording medium is formed into a film, and then a protective film is formed on the magneto-optical recording medium.

【0010】[0010]

【実施例】以下、具体的な実施例としてポリカーボネー
ト基板を本発明に従って前処理した場合と、しない場合
とについて、光磁気ディスクを作製した例を示す。
EXAMPLES As concrete examples, examples of producing magneto-optical discs will be shown with and without pretreatment of a polycarbonate substrate according to the present invention.

【0011】例1 ポリカーボネート樹脂ペレット(三菱化成工業(株)製
ノバレクス7020AD2)を用い、これを樹脂温度3
50℃及び金型温度105℃で射出成形して直径130
mm×厚さ1.2mmの円板状基板を得た。次に、この基板
6枚を温度120℃で2時間加熱前処理した後、真空ス
パッタ装置に入れ、室温にてクライオポンプで排気(排
気量:4000リットル/秒)したところ、約1時間で
所望の真空度である5×10-5Paに達した。これに対
し、比較例として、温度120℃で2時間の上記前処理
を実施しなかった以外は上と同様にして実施を行なった
ところ、所望の真空度である5×10-5Paに到達する
のに約11時間要した。この結果から本発明によれば高
い生産性でポリカーボネートを基板として用いた光磁気
ディスクが得られることが明らかである。
Example 1 Polycarbonate resin pellets (Novarex 7020AD2 manufactured by Mitsubishi Kasei Co., Ltd.) were used, and the resin temperature was 3
Diameter 130 after injection molding at 50 ℃ and mold temperature 105 ℃
A disk-shaped substrate having a size of mm × thickness of 1.2 mm was obtained. Next, these 6 substrates were pre-heated at a temperature of 120 ° C. for 2 hours, placed in a vacuum sputtering apparatus, and then evacuated by a cryopump at room temperature (displacement: 4000 liters / second). The vacuum degree of 5 × 10 −5 Pa was reached. On the other hand, as a comparative example, when the same procedure as above was carried out except that the above pretreatment was not carried out at a temperature of 120 ° C. for 2 hours, a desired vacuum degree of 5 × 10 −5 Pa was reached. It took about 11 hours to do. From this result, it is apparent that the present invention can provide a magneto-optical disk using polycarbonate as a substrate with high productivity.

【0012】なお、本発明の実施例に従って処理した上
記基板に常法に従って、保護膜(SiN3 :100mm
厚)、記録媒体(Tb−Fe−Co合金:100mm厚)
及び保護膜(SiN3 :100mm厚)をこの順にスパッ
タ製膜して光磁気ディスクを製造した。得られた光磁気
ディスクの性能は良好であった。
A protective film (SiN 3 : 100 mm) was formed on the substrate treated according to the embodiment of the present invention by a conventional method.
Thickness), recording medium (Tb-Fe-Co alloy: 100 mm thickness)
Then, a protective film (SiN 3 : 100 mm thick) was sputtered in this order to manufacture a magneto-optical disk. The performance of the obtained magneto-optical disk was good.

【0013】例2 例1で用いたのと同じ、直径130cm、厚さ1.2mmの
ポリカーボネート基板を容積66リットルの真空容器に
入れ先ず排気量610リットル/min のロータリーポン
プで10Paまで吸引し、次に排気量4200リットル
/秒のクライオポンプで排気し、基板枚数と1×10-4
Paまで排気するのに要する時間を調べた。得られた結
果を図3に示す。
Example 2 The same polycarbonate substrate as used in Example 1 having a diameter of 130 cm and a thickness of 1.2 mm was placed in a vacuum container having a volume of 66 liters, and it was first sucked up to 10 Pa by a rotary pump having an exhaust volume of 610 liters / min. Next, it was evacuated by a cryopump with a displacement of 4200 liters / second, and the number of substrates and 1 × 10 −4
The time required to exhaust to Pa was examined. FIG. 3 shows the obtained results.

【0014】図3のグラフ図においては、基板を80℃
で2時間加熱前処理した場合と120℃で2時間加熱前
処理した場合とを比較した。図3の結果から明らかなよ
うに、120℃処理では基板枚数と排気時間が比例する
のに対し、80℃処理では比例していない。すなわち基
板を十分乾燥させないと排気時間は定まらなくなってし
まう。このように、q∝t-1が成りたつような場合に排
気時間と基板枚数は比例する。
In the graph of FIG. 3, the substrate is at 80 ° C.
The case where the heating pretreatment was performed for 2 hours at 120 ° C. and the case where the heating pretreatment was performed at 120 ° C. for 2 hours were compared. As is clear from the results of FIG. 3, the number of substrates and the exhaust time are proportional in the 120 ° C. treatment, but not in the 80 ° C. treatment. That is, if the substrate is not sufficiently dried, the evacuation time cannot be determined. In this way, when q∝t −1 holds, the exhaust time is proportional to the number of substrates.

【0015】[0015]

【発明の効果】以上説明した様に、本発明に従えば、ポ
リカーボネートを基板とした、性能の良好な光磁気ディ
スクを著しく高い生産性で得ることができる。
As described above, according to the present invention, it is possible to obtain a magneto-optical disk having a polycarbonate as a substrate and having a good performance with extremely high productivity.

【図面の簡単な説明】[Brief description of the drawings]

【図1】ポリカーボネート基板の放出ガス率qと排気時
間との関係を示したグラフ図である。
FIG. 1 is a graph showing a relationship between a discharge gas rate q of a polycarbonate substrate and an exhaust time.

【図2】ポリカーボネート基板の加熱温度とq∝t-x
xとの関係を示すグラフ図である。
FIG. 2 is a graph showing a relationship between a heating temperature of a polycarbonate substrate and x of q∝t −x .

【図3】例2に示したポリカーボネート基板枚数と放出
ガス率qとの関係を示すグラフ図である。
FIG. 3 is a graph showing the relationship between the number of polycarbonate substrates shown in Example 2 and the released gas rate q.

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01F 41/20 H01F 41/20 Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI Technical display area H01F 41/20 H01F 41/20

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ポリカーボネート基板を90℃〜130
℃の温度で2〜6時間加熱処理して作成された光磁気デ
ィスク用基板と、 前記光磁気ディスク用基板の加熱条件と製膜を行なう光
磁気ディスク用基板の枚数から定まる真空排気時間で真
空製膜系の真空排気を行い真空状態にした後に、前記光
磁気ディスク用基板上に前記真空状態で製膜された光磁
気記録媒体と、 前記光磁気記録媒体上に前記真空状態で製膜された保護
膜と、を少なくとも備えてなることを特徴とする光磁気
ディスク。
1. A polycarbonate substrate at 90 ° C. to 130 ° C.
A magneto-optical disk substrate produced by heat treatment at a temperature of 2 ° C. for 2 to 6 hours, and a vacuum evacuation time determined by the heating conditions of the magneto-optical disk substrate and the number of magneto-optical disk substrates for film formation. After the film forming system is evacuated to a vacuum state, the magneto-optical recording medium is formed on the magneto-optical disk substrate in the vacuum state, and the magneto-optical recording medium is formed on the magneto-optical recording medium in the vacuum state. A protective film, and a magneto-optical disk.
JP22411096A 1996-08-26 1996-08-26 Magneto-optical disk Pending JPH09128830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22411096A JPH09128830A (en) 1996-08-26 1996-08-26 Magneto-optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22411096A JPH09128830A (en) 1996-08-26 1996-08-26 Magneto-optical disk

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP62317582A Division JP2619444B2 (en) 1987-12-17 1987-12-17 Optical disc manufacturing method

Publications (1)

Publication Number Publication Date
JPH09128830A true JPH09128830A (en) 1997-05-16

Family

ID=16808699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22411096A Pending JPH09128830A (en) 1996-08-26 1996-08-26 Magneto-optical disk

Country Status (1)

Country Link
JP (1) JPH09128830A (en)

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