JPH0689471A - Production of optical information recording medium - Google Patents

Production of optical information recording medium

Info

Publication number
JPH0689471A
JPH0689471A JP26542692A JP26542692A JPH0689471A JP H0689471 A JPH0689471 A JP H0689471A JP 26542692 A JP26542692 A JP 26542692A JP 26542692 A JP26542692 A JP 26542692A JP H0689471 A JPH0689471 A JP H0689471A
Authority
JP
Japan
Prior art keywords
substrate
annealing
recording medium
optical information
information recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26542692A
Other languages
Japanese (ja)
Other versions
JP3239145B2 (en
Inventor
Masashi Nakazawa
政志 中沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP26542692A priority Critical patent/JP3239145B2/en
Publication of JPH0689471A publication Critical patent/JPH0689471A/en
Application granted granted Critical
Publication of JP3239145B2 publication Critical patent/JP3239145B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To shorten vacuum degassing time, that is, to shorten process time and to obtain a high durable diskc by simultaneously annealing a substrate and a substrate holder at the time of annealing in the air. CONSTITUTION:When the substrate is sent from the annealing stage of substrate to a vacuum degassing stage, the substrate holder 3 placed at vicinity to the substrate 2 in the degassing chamber is annealed together with or separately from the substrate 2, and sent to the degassing chamber while keeping it at a high temp. At the time of annealing, the substrate 2 may be mounted as it is to the substrate holder 3, moreover, mask 4 and 5 may be mounted. But if both masks can be mounted quickly while being kept at a high temp., they may be annealed seperately.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はプラスッチック基板を用
いた光磁気ディスク等、光情報記録媒体の製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical information recording medium such as a magneto-optical disk using a plastic substrate.

【0002】[0002]

【従来の技術】光磁気ディスクの製造工程は、一般にス
タンパ→基板形成→アニールによる基板内応力の緩和→
真空脱ガス→成膜→カバー層塗布というように行われて
いる。また、ハードコート層塗布工程もアニール前又は
成膜後に組み込まれているのが通常である。CDや相変
化ディスクもほぼ同様な工程で製造される。
2. Description of the Related Art The manufacturing process of a magneto-optical disk is generally a stamper → substrate formation → relaxation of stress in the substrate by annealing →
Vacuum degassing → film formation → cover layer coating is performed. Further, the hard coat layer coating step is usually incorporated before annealing or after film formation. A CD and a phase change disk are manufactured by almost the same process.

【0003】しかしながら、このような工程では基板形
成後に基板が吸水してしまう為、真空脱ガスに時間をか
けて脱水を充分に行わないと特に信頼性(寿命)の面で
問題が残る。また、プラスチック基板は温度によって吸
水性に差がある為、大気中での取扱時間が長くなるにつ
れて基板温度が下がり、吸水量が増し(長く置けば置く
ほど飽和するまで増加する)、真空脱ガスの時間が長く
かかるようになる。特に成形後にハードコート工程を経
てアニール→脱ガス→成膜と進む場合には、大気中放置
時間が一層長くなる。
However, in such a process, since the substrate absorbs water after the substrate is formed, a problem remains particularly in reliability (lifetime) unless the vacuum degassing takes a long time to sufficiently perform dehydration. In addition, since the plastic substrate has different water absorption depending on the temperature, the substrate temperature decreases as the handling time in the atmosphere becomes longer, and the water absorption increases (the longer it is placed, the more it saturates), and the vacuum degassing occurs. Will take longer. In particular, when the process proceeds in the order of annealing → degassing → film formation through a hard coat process after molding, the time of standing in the air becomes longer.

【0004】[0004]

【発明が解決しようとする課題】本発明は基板アニール
の効果を活かし、真空脱ガス時間の短縮、延いては工程
時間の短縮により、低コストでより信頼性の高いディス
クを作製することを目的とする。
DISCLOSURE OF THE INVENTION The present invention aims to produce a more reliable disk at a low cost by utilizing the effect of substrate annealing and shortening the vacuum degassing time and eventually the process time. And

【0005】[0005]

【課題を解決するための手段】本発明は、基板アニール
から真空脱ガス工程に送りこむ場合において、基板と共
に脱ガスチャンバー内で基板の周辺に置かれる基板ホル
ダやマスク、マガジンを基板と同時あるいは別々にアニ
ールを行い、高温状態を保ったまま脱ガスチャンバー内
に送り込むことを特徴とする。
According to the present invention, a substrate holder, a mask and a magazine, which are placed around a substrate in a degassing chamber together with the substrate, are simultaneously or separately provided with the substrate when the substrate is sent from the substrate annealing to the vacuum degassing step. It is characterized in that it is annealed and is fed into the degassing chamber while maintaining a high temperature.

【0006】アニール時、基板はホルダに取り付けたま
までも良く、さらにマスクも取り付けたままでも良い
が、双方が高温のまますばやく組付けることができれば
別々にアニールを行っても良い。
At the time of annealing, the substrate may be attached to the holder or the mask may be attached. However, if both can be quickly assembled at high temperature, they may be annealed separately.

【0007】基板ホルダが大きい場合には、基板を直接
取り付ける部分だけを基板と共にアニールし、その後大
型のホルダに取り付けることも有効である。
When the substrate holder is large, it is effective to anneal only the portion to which the substrate is directly attached together with the substrate and then attach it to a large holder.

【0008】さらに、基板をマガジンごと真空脱ガスチ
ャンバーに送り込み、真空雰囲気中でマガジンから取り
出してスパッタチャンバーに送り込む場合には、マガジ
ンごとアニールすることが有効である。
Further, when the substrate is sent together with the magazine to the vacuum degassing chamber, taken out from the magazine in a vacuum atmosphere and sent into the sputtering chamber, it is effective to anneal the magazine together.

【0009】その他、基板ホルダがトレイに組つけられ
ているものであればトレイも一緒にアニールし、脱ガス
チャンバーへ送る。又、基板ホルダがトレイと組つけ取
外しが可能なものであれば、基板、ホルダをアニール
後、トレイに組つけ、脱ガスチャンバーへ、あるいは基
板、ホルダを別々にアニールした後、全て組つけて脱ガ
スチャンバーへ送る。
In addition, if the substrate holder is attached to the tray, the tray is annealed together and sent to the degassing chamber. If the substrate holder can be attached to and removed from the tray, anneal the substrate and holder and then assemble them to the tray and anneal them to the degassing chamber or anneal the substrate and holder separately and then assemble them all. Send to degassing chamber.

【0010】[0010]

【実施例】図4に通過型スパッタ装置のトレイ、図5に
は自公転型のトレイを示す。通常は、これらのトレイに
アニール後の基板をセットして真空脱ガスチャンバーに
送り込むが、本発明ではこれらにセットした後にアニー
ルを行い、高温のまま脱ガスチャンバーに送り込む。ま
た、図1の例に示すような、基板と同等程度の大きさの
ホルダを大型トレイに取り付け得る構成とし(図2参
照)、ホルダのみアニールしても良い。この方法で排気
した場合の排気特性を図3に示す。図3は真空脱ガス時
間として初期の30分を示しているが、実際には従来2
時間、脱ガスを行わなければならなかったものが1時間
以内で充分信頼性の高いディスクを得ることができた。
なお、アニール温度は90℃、アニール時間は1.5時
間である。
EXAMPLE FIG. 4 shows a tray of a passage type sputtering apparatus, and FIG. 5 shows a rotation type tray. Usually, the annealed substrate is set on these trays and sent to the vacuum degassing chamber, but in the present invention, after being set on these trays, annealing is performed and the substrates are sent to the degassing chamber at a high temperature. Alternatively, as shown in the example of FIG. 1, a holder having the same size as the substrate can be attached to the large tray (see FIG. 2), and only the holder may be annealed. FIG. 3 shows the exhaust characteristic when exhausted by this method. Although FIG. 3 shows the initial vacuum degassing time of 30 minutes, it is actually 2
Although the gas had to be degassed for a time, a sufficiently reliable disk could be obtained within one hour.
The annealing temperature is 90 ° C. and the annealing time is 1.5 hours.

【0011】[0011]

【発明の効果】本発明によれば、 (1)工程時間の短縮によりタクトアップ及びコストダ
ウンができる。 (2)基板と共にホルダも高温の為、大気中に取り出し
をした場合に基板に急激な温度変化がかからないのでひ
ずみが少ない。
According to the present invention, (1) the tact time can be increased and the cost can be reduced by shortening the process time. (2) Since the holder as well as the substrate has a high temperature, the substrate is not subject to a sudden temperature change when taken out into the atmosphere, so that the strain is small.

【図面の簡単な説明】[Brief description of drawings]

【図1】基板と同程度の大きさの基板ホルダの側断面
図。
FIG. 1 is a side sectional view of a substrate holder having the same size as a substrate.

【図2】図1の基板ホルダを取り付けたトレイの側断面
図。
FIG. 2 is a side sectional view of a tray to which the substrate holder of FIG. 1 is attached.

【図3】基板等の排気特性を示す図。FIG. 3 is a diagram showing exhaust characteristics of a substrate and the like.

【図4】通過型スパッタ装置のトレイの平面図。FIG. 4 is a plan view of a tray of a passage type sputtering device.

【図5】自公転型トレイの平面図。FIG. 5 is a plan view of a self-revolving tray.

【符号の説明】[Explanation of symbols]

1,10 トレイ 2 ディスク(又は基板) 3 基板ホルダ 4 内マスク 5 外マスク 6 トレイ 7 円形台 8 凸部 A 基板のみアニールした場合の排気特性を示す曲線。 B 基板ホルダと共に基板をアニールした場合の排気特
性を示す曲線。
1, 10 trays 2 disk (or substrate) 3 substrate holder 4 inner mask 5 outer mask 6 tray 7 circular table 8 convex portion A A curve showing the exhaust characteristic when only the substrate is annealed. B curve showing the exhaust characteristic when the substrate is annealed together with the substrate holder.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 プラスチック基板を大気中アニール、真
空脱ガスを行った後、真空薄膜形成プロセスにより記録
層を形成してなる光情報記録媒体の製造方法において、
大気中アニール時に基板と基板ホルダを同時にアニール
することを特徴とする光情報記録媒体の製造方法。
1. A method of manufacturing an optical information recording medium, comprising: forming a recording layer by a vacuum thin film forming process after annealing a plastic substrate in the atmosphere and performing vacuum degassing,
A method for manufacturing an optical information recording medium, characterized in that a substrate and a substrate holder are simultaneously annealed at the time of annealing in the atmosphere.
【請求項2】 プラスチック基板を大気中アニール、真
空脱ガスを行った後、真空薄膜形成プロセスにより記録
層を形成してなる光情報記録媒体の製造方法において、
大気中アニール時に基板と基板ホルダを別々にアニール
し、高温状態で基板をホルダにセットして脱ガスチャン
バーに送り込むことを特徴とする光情報記録媒体の製造
方法。
2. A method for manufacturing an optical information recording medium, which comprises forming a recording layer by a vacuum thin film forming process after annealing a plastic substrate in the air and performing vacuum degassing,
A method of manufacturing an optical information recording medium, characterized in that a substrate and a substrate holder are separately annealed during annealing in the air, and the substrate is set in the holder at a high temperature and sent to a degassing chamber.
【請求項3】 プラスチック基板を大気中アニール、真
空脱ガスを行った後、真空薄膜形成プロセスにより記録
層を形成してなる光情報記録媒体の製造方法において、
大気中アニール時に基板を、マガジンに入れたままアニ
ールし、マガジンごと真空脱ガス工程に送ることを特徴
とする光情報記録媒体の製造方法。
3. A method for manufacturing an optical information recording medium, which comprises forming a recording layer by a vacuum thin film forming process after annealing a plastic substrate in the atmosphere and performing vacuum degassing.
A method for manufacturing an optical information recording medium, characterized in that the substrate is annealed in a magazine during annealing in the atmosphere and is sent to a vacuum degassing process together with the magazine.
【請求項4】 請求項1又は2の光情報記録媒体の製造
方法において、マスクも同時にアニールすることを特徴
とする光情報記録媒体の製造方法。
4. The method of manufacturing an optical information recording medium according to claim 1, wherein the mask is also annealed at the same time.
【請求項5】 中央部及び外周部に基板を載置し、かつ
基板内周マスク及び基板外周マスクを取り付けうる凸部
を有する円形台からなる基板ホルダを複数個、取り付け
取外し可能に設けたことを特徴とする基板トレイ。
5. A plurality of substrate holders, each of which is mounted on and detachable from the central portion and the outer peripheral portion, and is composed of a circular base having a convex portion to which the inner and outer peripheral substrate masks can be attached Substrate tray characterized by.
JP26542692A 1992-09-08 1992-09-08 Method for manufacturing optical information recording medium Expired - Fee Related JP3239145B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26542692A JP3239145B2 (en) 1992-09-08 1992-09-08 Method for manufacturing optical information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26542692A JP3239145B2 (en) 1992-09-08 1992-09-08 Method for manufacturing optical information recording medium

Publications (2)

Publication Number Publication Date
JPH0689471A true JPH0689471A (en) 1994-03-29
JP3239145B2 JP3239145B2 (en) 2001-12-17

Family

ID=17416997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26542692A Expired - Fee Related JP3239145B2 (en) 1992-09-08 1992-09-08 Method for manufacturing optical information recording medium

Country Status (1)

Country Link
JP (1) JP3239145B2 (en)

Also Published As

Publication number Publication date
JP3239145B2 (en) 2001-12-17

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