JPH0471259B2 - - Google Patents
Info
- Publication number
- JPH0471259B2 JPH0471259B2 JP1653484A JP1653484A JPH0471259B2 JP H0471259 B2 JPH0471259 B2 JP H0471259B2 JP 1653484 A JP1653484 A JP 1653484A JP 1653484 A JP1653484 A JP 1653484A JP H0471259 B2 JPH0471259 B2 JP H0471259B2
- Authority
- JP
- Japan
- Prior art keywords
- reflective film
- digital signal
- disk
- signal recording
- resin substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003068 static effect Effects 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000007664 blowing Methods 0.000 claims description 6
- 230000008030 elimination Effects 0.000 claims 2
- 238000003379 elimination reaction Methods 0.000 claims 2
- 239000011347 resin Substances 0.000 description 18
- 229920005989 resin Polymers 0.000 description 18
- 239000000758 substrate Substances 0.000 description 17
- 230000005611 electricity Effects 0.000 description 8
- 239000000428 dust Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
- G11B23/0064—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material
- G11B23/0078—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material information structure layers using metallic or dielectric coatings
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、ビデオデイスク、デイジタルオーデ
イオデイスク（例えばコンパクトデイスク）、静
止画、文書フアイルなどのデイジタル信号記録再
生デイスクの製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing digital signal recording and reproducing disks such as video disks, digital audio disks (eg, compact disks), still images, document files, and the like.
従来例の構成とその問題点
この種のデイジタル信号記録再生デイスクは、
その情報密度が極めて大きいことや、Ｓ／Ｎ、ダ
イナミツクレンジが大きいことなど情報媒体とし
て有望視され、ビデオデイスクやデイジタルオー
デイオデイスクとして商品化されている。Conventional structure and its problems This type of digital signal recording/reproducing disk is
Due to its extremely high information density and large S/N and dynamic range, it is seen as a promising information medium, and has been commercialized as video discs and digital audio discs.
第１図に一般的なデイジタルオーデイオデイス
クであるコンパクトデイスクの概要を示す。これ
はPCM変換されたデイジタル信号が樹脂基板に
ピツト列状に記録され、半導体レーザにより再生
されるものである。第１図において１はデイスク
全体、２は樹脂基板、３は樹脂基板２の表面に形
成されたピツト列状のデイジタル信号、４はその
表面に形成された反射膜、５は反射膜上にコーテ
イングされた保護膜、６はデイスク読取面からの
再生用の半導体レーザである。 FIG. 1 shows an overview of a compact disk, which is a common digital audio disk. In this system, a PCM-converted digital signal is recorded in a pit array on a resin substrate, and then reproduced by a semiconductor laser. In Fig. 1, 1 is the entire disk, 2 is a resin substrate, 3 is a digital signal in the form of a pit row formed on the surface of the resin substrate 2, 4 is a reflective film formed on the surface, and 5 is a coating on the reflective film. 6 is a semiconductor laser for reproduction from the disk reading surface.
ここで、反射膜４はデイジタル信号３を半導体
レーザ６により再生する場合に照射光を反射させ
るために必要なものである。 Here, the reflective film 4 is necessary for reflecting the irradiated light when the digital signal 3 is reproduced by the semiconductor laser 6.
第２図に真空蒸着法を用いた従来の反射膜作成
方法を示す。 FIG. 2 shows a conventional method for forming a reflective film using a vacuum evaporation method.
真空容器７の中に樹脂基板２を第２図ｂに示す
トレイ８の上に並べ、フイラメント９を加熱する
ことにより、Alなどの金属を樹脂基板２の表面
に蒸着することにより反射膜４を作成する。 The reflective film 4 is formed by arranging the resin substrates 2 on the tray 8 shown in FIG. create.
この場合、一般的には樹脂基板の表面には静電
気によるホコリの付着や、水分の付着などにより
ピンホールが発生したり、除湿が完全でない場合
にはAlが酸化して反射率の低下が生じ、膜質が
悪化し高温多湿の環境下（例えば40℃、95％な
ど）において膜質が劣化し反射膜としての機能を
果たさないなどの問題点を有していた。 In this case, pinholes generally occur on the surface of the resin substrate due to static electricity and moisture, and if dehumidification is not complete, Al oxidizes and the reflectance decreases. However, there were problems in that the film quality deteriorated and it did not function as a reflective film in a high temperature and high humidity environment (for example, 40°C, 95%).
発明の目的
本発明はこれらの問題点を解消するものであ
り、樹脂基板の表面に付着した静電気によるホコ
リや、水分を除去し、ピンホールの無い膜質の優
れた反射膜を作成することのできるデイジタル信
号記録再生デイスクの製造方法を提供するもので
ある。Purpose of the Invention The present invention is intended to solve these problems, and is capable of removing dust caused by static electricity and moisture adhering to the surface of a resin substrate, and creating a reflective film with excellent film quality and no pinholes. A method of manufacturing a digital signal recording/reproducing disk is provided.
発明の構成
本発明は、静電除去、ガスブロー、乾燥の３つ
の機能を有する装置を設け、上記装置内を順次工
程にしたがつて、または同時工程により複数枚の
デイスクを収納した容器を通過させたのちに反射
膜を作成することにより、デイジタル信号記録再
生デイスクを製造するものである。Structure of the Invention The present invention provides a device having the three functions of static electricity removal, gas blowing, and drying, and allows a container containing a plurality of disks to pass through the device sequentially or simultaneously. By subsequently forming a reflective film, a digital signal recording/reproducing disk is manufactured.
実施例の説明
第３図に本発明のデイスク信号記録再生デイス
クの製造方法の一実施例を示す。装置を説明する
ために第３図ａには装置全体の断面図、第３図ｂ
には樹脂基板２を収納する容器１０に置いた場合
の平面図を示す。DESCRIPTION OF EMBODIMENTS FIG. 3 shows an embodiment of the method for manufacturing a disk signal recording/reproducing disk of the present invention. To explain the device, Fig. 3a is a sectional view of the entire device, and Fig. 3b is a sectional view of the entire device.
2 shows a plan view when the resin substrate 2 is placed in a container 10 for storing it.
本発明の製造方法に用いる装置１１には、コロ
ナ放電によるイオン発生により樹脂基板２に付着
した静電気を除去する装置１２を有する静電除去
室１３と、樹脂基板２に付着したほこりを除去す
るためのガス噴出装置１４を有するガスフロー室
１５と、樹脂基板２の表面に付着した水分を除去
するための赤外線乾燥装置１６を有する乾燥室１
７とを備え、これらの３つの工程を複数枚の樹脂
基板２を収納した容器１０が、上記装置１１を通
過したのちにスパツタリング法などにより反射膜
が作成される。 The apparatus 11 used in the manufacturing method of the present invention includes a static electricity removal chamber 13 having a device 12 for removing static electricity adhering to the resin substrate 2 due to ion generation by corona discharge, and a static electricity removal chamber 13 for removing dust adhering to the resin substrate 2. a gas flow chamber 15 having a gas ejection device 14; and a drying chamber 1 having an infrared drying device 16 for removing moisture attached to the surface of the resin substrate 2.
7, and after these three steps are carried out, a container 10 containing a plurality of resin substrates 2 passes through the device 11, and then a reflective film is formed by sputtering or the like.
第４図は本発明の他の実施例を示し、装置の機
構を説明するため第４図ａにはその断面図、第４
図ｂにはその側面図を示す。 FIG. 4 shows another embodiment of the present invention, and to explain the mechanism of the device, FIG. 4a is a sectional view thereof, and FIG.
Figure b shows its side view.
複数の樹脂基板２を収納した容器１８に対し、
イオンを発生させて樹脂基板２に付着した静電気
を除去する装置１９と、樹脂基板２に付着したホ
コリを除去するためのガス噴出装置２０と、樹脂
基板の表面に付着した水分を除去するための赤外
線ヒーターによる乾燥装置２１とを１つの容器２
２内に設け、この容器２２を通過したのちにスパ
ツタリング法などにより反射膜が作成されデイジ
タル信号記録再生デイスクが製造される。 For the container 18 containing a plurality of resin substrates 2,
A device 19 for generating ions to remove static electricity adhering to the resin substrate 2, a gas blowing device 20 for removing dust adhering to the resin substrate 2, and a device 19 for removing moisture adhering to the surface of the resin substrate 2. A drying device 21 using an infrared heater and a container 2
After passing through the container 22, a reflective film is formed by sputtering or the like, and a digital signal recording/reproducing disk is manufactured.
反射膜作成方法としては、真空蒸着、スパツタ
リング、電子ビーム蒸着、イオンプレーテイング
などの物理蒸着が適している。 Physical vapor deposition such as vacuum evaporation, sputtering, electron beam evaporation, and ion plating is suitable as a method for forming the reflective film.
発明の効果
以上のように本発明は、静電除去、ガスブロ
ー、乾燥の３つの工程を有する装置を設け、上記
装置内を順次工程にしたがつて、または同時に、
複数枚のデイスクを収納した容器を通過したのち
に反射膜を作成するものであるから、デイスク表
面にホコリの付着が無いためピンホールの少ない
膜が得られ、しかもデイスクの表面に付着した水
分を除去することにより酸化物の少ない膜質の優
れた反射膜を作成することができる。Effects of the Invention As described above, the present invention provides an apparatus having the three steps of static electricity removal, gas blowing, and drying, and sequentially or simultaneously performs the steps in the apparatus.
Since the reflective film is created after passing through a container containing multiple discs, there is no dust adhering to the disc surface, resulting in a film with fewer pinholes. By removing it, a reflective film with excellent film quality and less oxide can be created.
また、本発明によれば複数のデイスクを同時に
処理することができ、反射膜作成装置の直前の工
程であるため自動化や量産化が図れる。このため
信頼性の高い良質の反射膜を有するデイジタル信
号記録再生デイスクを安価に量産することができ
るという効果がある。 Furthermore, according to the present invention, a plurality of disks can be processed at the same time, and since the process is performed immediately before the reflective film forming apparatus, automation and mass production can be achieved. Therefore, there is an effect that digital signal recording/reproducing disks having a highly reliable and high-quality reflective film can be mass-produced at low cost.
第１図ａ，ｂ，ｃは一般的なデイジタル信号記
録再生デイスクの平面図、断面図および要部拡大
図、第２図ａ，ｂは従来のデイジタル信号記録再
生デイスクの反射膜作成装置の断面図および樹脂
基板の取付けの状態を示す平面図、第３図ａ，ｂ
は本発明の一実施例を示す断面図および樹脂基板
の取付け状態を示す平面図、第４図ａ，ｂは本発
明の他の実施例を示す断面図および側面図であ
る。
１……デイスク、２……樹脂基板、３……デイ
ジタル信号、４……反射膜、５……保護膜、６…
…半導体レーザ、１０，１８……樹脂基板収納容
器、１１……装置全体、１２，１９……静電除去
装置、１３……静電除去室、１４，２０……ガス
噴出装置、１５……ガスブロー室、１６，２１…
…乾燥装置、１７……乾燥室。
Figures 1a, b, and c are a plan view, sectional view, and enlarged view of essential parts of a general digital signal recording/reproducing disk, and Figures 2a, b are a cross section of a conventional reflective film forming device for a digital signal recording/reproducing disk. Figure and top view showing the state of attachment of the resin board, Figures 3a and b
4A and 4B are a sectional view and a side view showing another embodiment of the present invention, respectively. FIG. DESCRIPTION OF SYMBOLS 1... Disk, 2... Resin substrate, 3... Digital signal, 4... Reflective film, 5... Protective film, 6...
... Semiconductor laser, 10, 18 ... Resin substrate storage container, 11 ... Entire device, 12, 19 ... Static removal device, 13 ... Static removal chamber, 14, 20 ... Gas blowing device, 15 ... Gas blow room, 16, 21...
...Drying device, 17...Drying room.
Claims (1)
程を有する装置を設け、上記装置内を順次工程に
したがつて、複数枚のデイスクを収納した容器が
通過したのちに反射膜を作成することを特徴とす
るデイジタル信号記録再生デイスクの製造方法。 ２ 除電、ガスプロー、乾燥の３つの工程が同時
に組み合わされた装置を設け、上記装置内をデイ
スクが通過したのちに反射膜を設けることを特徴
とするデイジタル信号記録再生デイスクの製造方
法。[Scope of Claims] 1. A device having three independent processes of static elimination, gas blowing, and drying is provided, and as the steps are sequentially carried out in the device, a reflective film is formed after a container containing a plurality of disks passes through the device. A method for manufacturing a digital signal recording/reproducing disk, characterized by producing a digital signal recording/reproducing disk. 2. A method for manufacturing a digital signal recording/reproducing disk, characterized in that a device is provided in which the three steps of static elimination, gas blowing, and drying are combined simultaneously, and a reflective film is provided after the disk passes through the device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1653484A JPS60160039A (en) | 1984-01-31 | 1984-01-31 | Production of digital signal recording and reproducing disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1653484A JPS60160039A (en) | 1984-01-31 | 1984-01-31 | Production of digital signal recording and reproducing disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60160039A JPS60160039A (en) | 1985-08-21 |
| JPH0471259B2 true JPH0471259B2 (en) | 1992-11-13 |
Family
ID=11918928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1653484A Granted JPS60160039A (en) | 1984-01-31 | 1984-01-31 | Production of digital signal recording and reproducing disc |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60160039A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19850832C5 (en) * | 1998-11-04 | 2005-10-06 | Singulus Technologies Ag | Method for connecting substrate halves of optical data carriers |
-
1984
- 1984-01-31 JP JP1653484A patent/JPS60160039A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60160039A (en) | 1985-08-21 |
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