JPS6120059B2 - - Google Patents
Info
- Publication number
- JPS6120059B2 JPS6120059B2 JP5920078A JP5920078A JPS6120059B2 JP S6120059 B2 JPS6120059 B2 JP S6120059B2 JP 5920078 A JP5920078 A JP 5920078A JP 5920078 A JP5920078 A JP 5920078A JP S6120059 B2 JPS6120059 B2 JP S6120059B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- signal recording
- recording medium
- silicon
- silicon monoxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 22
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000008961 swelling Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
【発明の詳細な説明】
この発明は光学方式ビデオデイスク等に用いる
信号記録媒体の改良と、その改良した信号記録媒
体を用いたビデオ信号等の記録方法に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in signal recording media used in optical video discs and the like, and a method for recording video signals and the like using the improved signal recording media.
従来、光学方式ビデオデイスク等に用いられる
信号記録媒体は、例えば、第1図Aに示すよう
に、基板1の上に金属膜2およびレジスト3を塗
布して形成されている。このような信号記録媒体
にビデオ情報を記録する方法としては、ホトレジ
ストを使用する方法やヒート・モード法等が知ら
れている。 Conventionally, a signal recording medium used for an optical video disk or the like is formed by coating a metal film 2 and a resist 3 on a substrate 1, for example, as shown in FIG. 1A. Known methods for recording video information on such signal recording media include a method using photoresist and a heat mode method.
上述の信号記録方法において、ホトレジストを
使用する方法は、第1図Bに示すように基板1に
塗布したレジストに対し、例えば記録する信号に
よつて変調した光または電子ビームを照射して露
光し、現像、エツチング(または金属メツキ)工
程を経て第1図Cに示すような信号を記録した原
盤を作成していた。また、ヒート・モード法は、
基板1に蒸着(またはスパツタ)された金属薄膜
へ、記録する信号によつて変調されたレーザビー
ムにより、溶融または蒸発せしめ、ビデオ情報を
記録し、既知の方法により読み出し光の1/4波長
の深さのピツトを作成していた。 In the above-mentioned signal recording method, the method using photoresist involves exposing the resist coated on the substrate 1 by irradiating it with light or electron beam modulated according to the signal to be recorded, as shown in FIG. 1B. , development, and etching (or metal plating) processes to create a master disk on which signals such as those shown in FIG. 1C were recorded. In addition, the heat mode method
A thin metal film deposited (or sputtered) on the substrate 1 is melted or evaporated by a laser beam modulated by the signal to be recorded, recording video information, and then using a known method to record video information at a wavelength of 1/4 of the readout light. I was creating a depth pit.
しかし、これらの従来の方法は次のような欠点
や問題点がある。すなわち、ホトレジストを使用
する方法の場合は、1μ程度の解像度を持つよう
に基板全面(例えばLPレコードの大きさ300φ)
に均一に塗布することは技術的には可能であるが
多くの困難さがあり、また塵埃の影響が大きく、
従つて、クリーン・ルーム等の大きな設備を必要
とする。更に、ヒート・モード法の場合は、溶
融、蒸発した金属がピツトの周辺に盛り上がりや
付着を生じ、記録した情報の読み出しの際にノイ
ズの原因の一つとなる。更に、ピツト周辺の盛り
上りや付着を少なくするために金属膜を薄くすれ
ば、読み出し光の1/4波長の深さにするために、
レジストを使用したりして多くの工程を必要とす
る欠点がある。 However, these conventional methods have the following drawbacks and problems. In other words, in the case of a method using photoresist, the entire surface of the substrate (for example, the size of an LP record, 300φ) has a resolution of about 1μ.
Although it is technically possible to apply the coating uniformly, there are many difficulties and the influence of dust is large.
Therefore, large facilities such as a clean room are required. Furthermore, in the case of the heat mode method, melted and evaporated metal builds up or adheres to the periphery of the pit, which becomes one of the causes of noise when reading recorded information. Furthermore, if the metal film is made thinner to reduce swelling and adhesion around the pit, the depth can be reduced to 1/4 wavelength of the readout light.
It has the disadvantage of requiring many steps such as the use of resist.
この発明は、上述したような従来技術の欠点、
問題点を除去した光学方式ビデオデイスク等に用
いる信号記録媒体およびその記録媒体を用いたビ
デオ信号等の記録方法を提供することを目的とす
るものである。 This invention solves the above-mentioned drawbacks of the prior art,
It is an object of the present invention to provide a signal recording medium for use in optical video discs, etc., which eliminates problems, and a method for recording video signals, etc. using the recording medium.
以下図面に基づき、この発明に係る信号記録媒
体および信号記録方法の実施例を説明する。 Embodiments of a signal recording medium and a signal recording method according to the present invention will be described below based on the drawings.
第2図に示す信号記録媒体は、この発明の第一
の実施例を示す断面側面図で、基板1の表面にシ
リコン層4を設けるとともにそのシリコン層の表
面に膜厚が数百オングストロームの一酸化シリコ
ン層5を設け、このシリコン層4と一酸化シリコ
ン層5の二層構造の膜厚を情報の読み出し光の1/
4波長程度に設定して形成している。 The signal recording medium shown in FIG. 2 is a cross-sectional side view showing the first embodiment of the present invention, in which a silicon layer 4 is provided on the surface of a substrate 1, and the surface of the silicon layer has a film thickness of several hundred angstroms. A silicon oxide layer 5 is provided, and the thickness of the two-layer structure of the silicon layer 4 and silicon monoxide layer 5 is set to 1/1 of the information readout light.
It is formed by setting about 4 wavelengths.
第4図に示す信号記録媒体は、この発明の第二
の実施例を示す断面側面図で、基板1の表面に金
属膜6、シリコン層4、一酸化シリコン層5の3
層が形成され、この場合ピツトの深さのコントロ
ールは金属膜6で行なうことができる。 The signal recording medium shown in FIG. 4 is a cross-sectional side view showing a second embodiment of the present invention. The signal recording medium shown in FIG.
A layer is formed, in which case the depth of the pits can be controlled by means of a metal film 6.
この発明の信号記録媒体に用いた一酸化シリコ
ンは、蒸発し易い物質ではあるが、膜厚が薄く透
明なために、光の吸収が少なく、またこのような
シリコン物質の代りに他の金属を使用した場合、
金属の部分が先に溶融して一酸化シリコンと金属
とは剥離してしまうおそれがあるが、シリコン層
と一酸化シリコンの2層膜は、接着性が極めて良
く、良好な結果が得られた。更に、一酸化シリコ
ンは金属に比較して熱伝導率が小さくスポツト径
も小さくすることが可能となる特長がある。 The silicon monoxide used in the signal recording medium of this invention is a material that evaporates easily, but because it is thin and transparent, it absorbs little light, and other metals can be used in place of the silicon material. If you use
There is a risk that the metal part will melt first and the silicon monoxide and metal will separate, but the two-layer film of the silicon layer and silicon monoxide has extremely good adhesion and good results were obtained. . Furthermore, silicon monoxide has a lower thermal conductivity than metals and has the advantage that the spot diameter can be made smaller.
次に第2図に示すこの発明の第一の実施例にお
いて述べた信号記録媒体を用いてビデオ情報等を
記録する場合の一例を第3図に基づき説明する。 Next, an example of recording video information etc. using the signal recording medium described in the first embodiment of the present invention shown in FIG. 2 will be explained based on FIG. 3.
まず、第3図Aに示すシリコン層4および一酸
化シリコン層5の2層膜からなる信号記録媒体の
一酸化シリコン層5に対して第3図Bで示すよう
光変調器で変調されたレーザービーム8を照射し
一酸化シリコン層5を溶融、蒸発して情報の書き
込みを行なう。この場合、一酸化シリコンは蒸発
しやすい物質であるから昇華する。次に第3図C
に示すように一酸化シリコン層5が溶融、蒸発し
た部分に対応するシリコン層4を、例えば水酸化
カリウム溶液などを用いてエツチングを行なう。
この時、ピツト周辺の多少の盛り上がりや付着物
も同時に溶解される。更に、第3図Dで示すよう
に、エレクトロホーミング法でレプリカのとれる
例えば、ニツケル、クロムなどの金属膜7を表面
に薄く蒸着して形成し、これをマスター盤とする
ことができる。 First, a laser modulated by an optical modulator as shown in FIG. 3B is applied to the silicon monoxide layer 5 of a signal recording medium consisting of a two-layer film of a silicon layer 4 and a silicon monoxide layer 5 shown in FIG. 3A. A beam 8 is irradiated to melt and evaporate the silicon monoxide layer 5 to write information. In this case, silicon monoxide is a substance that evaporates easily, so it sublimes. Next, Figure 3C
As shown in FIG. 3, the silicon layer 4 corresponding to the portion where the silicon monoxide layer 5 has been melted and vaporized is etched using, for example, a potassium hydroxide solution.
At this time, some swelling and deposits around the pit are also dissolved at the same time. Furthermore, as shown in FIG. 3D, a metal film 7 of, for example, nickel or chromium, from which a replica can be taken by electrohoming, is deposited thinly on the surface, and this can be used as a master disc.
したがつて、この発明に係る記録方法によれ
ば、(1)ピツト周辺の盛り上がりや付着物を除去で
きる、(2)ピツトの深さのコンロールが容易であ
る、(3)工程が削減できる、(4)ホトレジストを使用
しないために大きな設備を必要としないという特
長がある。 Therefore, according to the recording method of the present invention, (1) swelling and deposits around the pits can be removed, (2) the depth of the pits can be easily controlled, and (3) the number of steps can be reduced. (4) Since it does not use photoresist, it has the advantage of not requiring large equipment.
第1図A,B,Cは従来の光学方式ビデオデイ
スク等に用いる信号記録媒体の構造を示す断面側
面図である。第2図はこの発明に係る信号記録媒
体の第一の実施例を示す断面側面図、第3図A〜
Dは第2図に示す信号記録媒体を用いてビデオ情
報等を記録する工程を示す断面側面図、第4図は
この発明に係る信号記録媒体の第二の実施例を示
す断面側面図である。
1…基板、4…シリコン層、5…一酸化シリコ
ン層、6…金属膜、7…金属膜。
1A, B, and C are cross-sectional side views showing the structure of a signal recording medium used in a conventional optical video disk or the like. FIG. 2 is a cross-sectional side view showing a first embodiment of the signal recording medium according to the present invention, and FIGS.
D is a cross-sectional side view showing the process of recording video information etc. using the signal recording medium shown in FIG. 2, and FIG. 4 is a cross-sectional side view showing a second embodiment of the signal recording medium according to the present invention. . DESCRIPTION OF SYMBOLS 1...Substrate, 4...Silicon layer, 5...Silicon monoxide layer, 6...Metal film, 7...Metal film.
Claims (1)
シリコン層との二層膜を有する信号記録媒体に照
射して上記酸化シリコン層を蒸発せしめる過程
と、前記蒸発した酸化シリコン層に対応する位置
の上記シリコン層をエツチングする過程とからな
るこことを特徴とする信号記録方法。1. A process of irradiating a signal recording medium having a two-layer film of a silicon oxide layer and a silicon layer with a light beam such as a laser beam to evaporate the silicon oxide layer, and evaporating the silicon oxide layer at a position corresponding to the evaporated silicon oxide layer. A signal recording method comprising the steps of etching a silicon layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5920078A JPS54151006A (en) | 1978-05-18 | 1978-05-18 | Signal recording medium and signal recording method for optical video disk or like |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5920078A JPS54151006A (en) | 1978-05-18 | 1978-05-18 | Signal recording medium and signal recording method for optical video disk or like |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60209581A Division JPS61105742A (en) | 1985-09-21 | 1985-09-21 | Signal recording system medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54151006A JPS54151006A (en) | 1979-11-27 |
JPS6120059B2 true JPS6120059B2 (en) | 1986-05-20 |
Family
ID=13106538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5920078A Granted JPS54151006A (en) | 1978-05-18 | 1978-05-18 | Signal recording medium and signal recording method for optical video disk or like |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54151006A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04312964A (en) * | 1991-04-02 | 1992-11-04 | Mitsubishi Electric Corp | Semiconductor device |
JPH05206314A (en) * | 1991-11-12 | 1993-08-13 | Nec Corp | Semiconductor device |
-
1978
- 1978-05-18 JP JP5920078A patent/JPS54151006A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04312964A (en) * | 1991-04-02 | 1992-11-04 | Mitsubishi Electric Corp | Semiconductor device |
JPH05206314A (en) * | 1991-11-12 | 1993-08-13 | Nec Corp | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS54151006A (en) | 1979-11-27 |
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