JPH02172041A - Manufacture of stamper for optical disk - Google Patents

Manufacture of stamper for optical disk

Info

Publication number
JPH02172041A
JPH02172041A JP32331988A JP32331988A JPH02172041A JP H02172041 A JPH02172041 A JP H02172041A JP 32331988 A JP32331988 A JP 32331988A JP 32331988 A JP32331988 A JP 32331988A JP H02172041 A JPH02172041 A JP H02172041A
Authority
JP
Japan
Prior art keywords
stamper
semiconductor
producing
resin
dielectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32331988A
Other languages
Japanese (ja)
Inventor
Mari Ichikawa
市川 真鯉
Yoshinori Miyamura
宮村 芳徳
Yumiko Anzai
由美子 安齋
Shinkichi Horigome
堀篭 信吉
Norio Ota
憲雄 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Maxell Ltd
Original Assignee
Hitachi Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Maxell Ltd filed Critical Hitachi Ltd
Priority to JP32331988A priority Critical patent/JPH02172041A/en
Publication of JPH02172041A publication Critical patent/JPH02172041A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To prolong service life of a master disk and to improve the uniformity by applying sputter etching onto a photosensitive resin of the master disk and laminating a thin film made of a dielectric substance or a semiconductor. CONSTITUTION:A dielectric substance or a semiconductor 3 is laminated onto the photosensitive resin 4 on the master disk base 5 by the sputtering. As the semiconductor 3, one of nitride such as Si3O4, oxide such as SiO2, carbide such as SiC and semiconductor such as Si or over is selected and the sputter gas, the Ar gas, or Ar and N2 or Ar and O2 in mixture is selected and the film is formed by the reactive sputtering. The thickness of the semiconductor 3 is desirably 2,000Angstrom or less. An ultraviolet curing resin 2 is coated onto the semiconductor 3, a flexible light transparent member 1 as the stamper base is overlapped to the resin 2, made flat and the ultraviolet ray 6 is radiated from the rear side of the member 1. When the member 1 is deflected, exfoliation is caused at the border layer between the resin 2 and the semiconductor 3 to attain the manufacture of the stamper. Since the exfoliated layer is the dielectric or semiconductor, no corrosion takes place, the service life of the master disk is prolonged and the uniformity is improved.

Description

【発明の詳細な説明】 [&梁上の利用分野】 本発明は多様な情報のメモリとして期待される光ディス
クの作製方法に係わり、光ディスクの母型である原盤の
長寿命化を図り、しかも情報の形成しである凹凸パター
ンの均一な平坦性の良い光ディスクを作製する上で好適
な、スタンパの作製方法に関する。
[Detailed description of the invention] [Fields of application on beams] The present invention relates to a method for manufacturing an optical disc, which is expected to serve as a memory for a variety of information. The present invention relates to a method for manufacturing a stamper suitable for manufacturing an optical disk having a uniform uneven pattern and good flatness.

[従来の技術) 従来のプロセスにおいては、第3図のように、原盤基板
5に感光性樹脂4を塗布し、光学的手段で凹凸パターン
形状を成す情報を記録させる。その後、剥離層としてA
l28を蒸着した後、紫外線硬化樹脂2を塗布し、スタ
ンパ用基板として透光性部材1を重ね合わせ、紫外線6
を照射した後。
[Prior Art] In the conventional process, as shown in FIG. 3, a photosensitive resin 4 is applied to a master substrate 5, and information in the form of a concavo-convex pattern is recorded by optical means. Then, as a release layer, A
After vapor-depositing 128, an ultraviolet curing resin 2 is applied, a transparent member 1 is superimposed as a stamper substrate, and ultraviolet ray 6 is applied.
After irradiating.

透光性基板1を撓め、紫外線硬化樹脂2とAQ8の境界
面から剥離を行い、スタンパ作製を行っていた。このよ
うな例としては、例えば特願昭59−233169があ
げられる。
The transparent substrate 1 was bent and peeled off from the interface between the ultraviolet curing resin 2 and AQ8 to produce a stamper. An example of this is Japanese Patent Application No. 59-233169.

尚、Al28のかわりにNiを用いても同様の作製を行
うことができる。
Note that the same fabrication can be performed using Ni instead of Al28.

[発明が解決しようとする課題] 上記従来技術は、スタンパ作製の剥離の際、原盤にかか
るストレスが大きいことから、数回のスタンパ作製を行
うと、原盤の剥離層(Al、Ni等)が剥がれてスタン
パ側に移ってしまい、光ディスクの作製が不可能となっ
たり、錆びや腐食が発生するという問題点があった。
[Problems to be Solved by the Invention] In the above-mentioned conventional technology, since the stress applied to the master is large during peeling during stamper production, the peeling layer (Al, Ni, etc.) of the master is damaged after the stamper is manufactured several times. There are problems in that the adhesive peels off and transfers to the stamper side, making it impossible to manufacture optical discs and causing rust and corrosion.

また、紫外線硬化樹脂を硬化させるには、可撓性を有す
る透光性材料(プラスチック、エポキシ等)からなるス
タンパ基板の裏側から紫外線を照射しなければならなか
った。これは、原盤の剥離層(Al、Ni等)が光を通
さないことによる。
Furthermore, in order to cure the ultraviolet curable resin, it was necessary to irradiate ultraviolet rays from the back side of the stamper substrate made of a flexible, transparent material (plastic, epoxy, etc.). This is because the release layer (Al, Ni, etc.) of the master does not transmit light.

このため、スタンパの材料は、透光性部材に限られてい
た。しかし、光ディスク作製時において、ディスクの剥
離はスタンパを撓めていたため、先のプラスチックやエ
ポキシでは反りが発生し易かった。このようなスタンパ
から作製した光ディスクの凹凸パターンを有する紫外線
硬化樹脂層の膜厚には、バラツキが生じることがしばし
ば起こった。
For this reason, materials for the stamper have been limited to light-transmitting members. However, during the production of optical discs, the stamper was bent when the disc was peeled off, so the plastic or epoxy used earlier was likely to warp. The thickness of an ultraviolet curable resin layer having a concavo-convex pattern of an optical disk produced from such a stamper often varies in thickness.

本発明の目的は、上記の欠点に対処するため、錆びない
材料からなる剥離層を接着性良く原盤上に形成し、原盤
の寿命を延長し、高品質な光ディスクを作製することに
ある。
In order to overcome the above-mentioned drawbacks, an object of the present invention is to form a release layer made of a non-corrosive material on a master disc with good adhesion, thereby extending the life of the master disc and producing a high-quality optical disc.

【課題を解決するための手段1 上記目的は、情報パターン付き原盤の上に、スパッタエ
ツチングを施した後、誘電体あるいは半導体からなる薄
膜を少なくとも一層以上積層することにより達成される
Means for Solving the Problems 1 The above object is achieved by sputter etching and then laminating at least one layer of a dielectric or semiconductor thin film on a master disk with an information pattern.

より具体的には、誘電体あるいは半導体の成膜時に、A
rとN2の混合ガスの雰囲気において反応性スパッタ法
を用いて接着性を向上させ、可撓性を有するスタンパ基
板に凹凸パターン形状を成す情報を形成することによっ
て達成される。
More specifically, when forming dielectric or semiconductor films, A
This is achieved by improving adhesion using a reactive sputtering method in an atmosphere of a mixed gas of r and N2, and forming information in the form of a concavo-convex pattern on a flexible stamper substrate.

さらに、平坦性・均一性の良い光ディスクを作製するた
めには、基板を強制的に撓めても、反り等の変形を生ず
る可能性の少ないAQ3Ni、Fe等の硬質な材料を使
用することが好ましい2(作用1 凹凸パターン付き原盤の感光性樹脂の上に、スパッタエ
ツチングを施し、誘電体あるいは半導体からなる薄膜(
たとえばSi3N、等)を積層したことにより、/I盤
の上に透光性の剥S層を接着性良く成膜できるようにな
った。従って、スタンパ作製中に、原盤の剥離層が剥が
れることはなくなる。
Furthermore, in order to manufacture optical discs with good flatness and uniformity, it is necessary to use hard materials such as AQ3Ni and Fe, which are less likely to cause deformation such as warping even if the substrate is forcibly bent. Preferred 2 (Action 1) Sputter etching is performed on the photosensitive resin of the master with the concavo-convex pattern to form a thin film (
For example, by laminating Si3N, etc.), it became possible to form a transparent peelable S layer with good adhesion on the /I board. Therefore, the release layer of the master will not be peeled off during stamper production.

また、原盤に積層する剥離層が光を通すため。Also, the release layer laminated to the master allows light to pass through.

従来から使用されている透光性の(プラスチック、エポ
キシ等)材料からなる基板だけでなく、不透明であって
も反り等の変形を生ずる可能性の少ない、金属材料から
なる基板(Affi3Ni等)を用いたスタンパが作製
できる。このスタンパから作製した光ディスクには、平
坦性・均一性の良い凹凸パターンが形成できる。
In addition to substrates made of conventionally used translucent materials (plastic, epoxy, etc.), we also use substrates made of metal materials (Affi3Ni, etc.) that are less likely to cause deformation such as warping even if they are opaque. A stamper using the above method can be manufactured. An uneven pattern with good flatness and uniformity can be formed on an optical disk produced using this stamper.

さらに、薄膜の成膜は、接着性向上の効果があるArと
N2あるいはArと0□の混合ガスを用いた反応性スパ
ッタ法により成膜できるので、誘電体あるいは半導体か
らなる薄膜の内部応力が低減する。これにより、温度変
化や吸湿、乾燥あるいは何らかの外力により感光性樹脂
膜に影響を与えても、薄膜に剥離などの現象が生じるこ
とはない。
Furthermore, since thin films can be formed by reactive sputtering using a mixed gas of Ar and N2 or Ar and 0□, which has the effect of improving adhesion, the internal stress of thin films made of dielectrics or semiconductors can be reduced. reduce As a result, even if the photosensitive resin film is affected by temperature change, moisture absorption, dryness, or any external force, phenomena such as peeling will not occur in the thin film.

この結果、誘電体あるいは半導体からなる薄膜を積層し
ているので、錆や腐食は発生せず、長期的に渡って保存
しても再利用が可能となり、原盤の長寿命化を図ること
ができる。
As a result, since thin films made of dielectric or semiconductor are laminated, there is no rust or corrosion, and the master can be reused even after long-term storage, extending the life of the original. .

【実施例1 以下、本発明の実施例を図を用いて説明する。[Example 1 Embodiments of the present invention will be described below with reference to the drawings.

〈実施例1〉 第1図に示すように、原盤基板5上の凹凸パターン形状
を成す情報を記録させた感光性樹脂4にスパッタエツチ
ングを施す。スパッタエツチングは、Arガスを使用し
、圧力は1.3〜2.5Pa、放電パワーを100−2
00Wで3〜5分行う。
<Example 1> As shown in FIG. 1, sputter etching is performed on the photosensitive resin 4 on which information forming the uneven pattern shape on the master substrate 5 is recorded. Sputter etching uses Ar gas, the pressure is 1.3 to 2.5 Pa, and the discharge power is 100-2.
00W for 3 to 5 minutes.

その後、誘電体あるいは半導体(たとえば5iiN4.
sio、など)3をスパッタ法により積層する。誘電体
あるいは半導体3のスパッタは、Arガスの雰囲気にお
いて、圧力1.3〜2.5Pa、放電パワーは50〜3
00Wの範囲で数分間成膜する。
Thereafter, a dielectric or semiconductor (eg 5iiN4.
sio, etc.) 3 are stacked by sputtering. Sputtering of the dielectric or semiconductor 3 is performed in an Ar gas atmosphere at a pressure of 1.3 to 2.5 Pa and a discharge power of 50 to 3 Pa.
A film is formed for several minutes in the range of 00W.

ここで、上記スパッタ膜をSi3N、等の窒化物で形成
する場合には、上記雰囲気ガスとしてArとN2を、上
記スパッタ膜をSin、等の酸化物で形成する場合には
、上記雰囲気ガスとしてArと02等の混合ガスを用い
て成膜すると、接着性の向上に効果がある。ガスの圧力
、放電パワーは、先のスパッタ条件とほぼ等しい。
Here, when the sputtered film is formed from a nitride such as Si3N, Ar and N2 are used as the atmospheric gas, and when the sputtered film is formed from an oxide such as Sin, the atmospheric gas is Forming a film using a mixed gas such as Ar and 02 is effective in improving adhesiveness. The gas pressure and discharge power are almost the same as the previous sputtering conditions.

誘電体あるいは半導体3の厚みは、感光性樹脂4の凹凸
パターンを同形状に留めておける膜厚として、2000
人以内とすることが望まれる。この時のN2量は、Ar
の3〜10%程度が好ましい。
The thickness of the dielectric or semiconductor 3 is 2000 mm, which is a film thickness that can keep the uneven pattern of the photosensitive resin 4 in the same shape.
It is desirable that the number be within the number of people. The amount of N2 at this time is Ar
It is preferably about 3 to 10%.

この後、誘電体あるいは半導体3の上に、AI8外線硬
化樹脂2を塗布した後、スタンパ用基板として可撓性を
有する透光性部材(プラスチック、エポキシ等)1を先
の樹脂2に重ね合わせ平坦にし。
After that, an AI8 external radiation curing resin 2 is applied on the dielectric or semiconductor 3, and then a flexible light-transmitting member (plastic, epoxy, etc.) 1 is superimposed on the resin 2 as a stamper substrate. Make it flat.

紫外ff16を透光性部材1の裏面から照射する。透光
性基板1を撓めると、紫外線硬化樹脂2と誘電体あるい
は半導体3の境界層で剥離が生じ、スタンパ作製が行え
る。
Ultraviolet ff16 is irradiated from the back surface of the transparent member 1. When the transparent substrate 1 is bent, peeling occurs at the boundary layer between the ultraviolet curing resin 2 and the dielectric or semiconductor 3, allowing the stamper to be manufactured.

このようにして1作製したスタンパには原盤剥離層の剥
がれもなく、上記のスタンパ作製は少なくとも10回以
上行うことができる。
One stamper produced in this way has no peeling of the master release layer, and the above stamper production can be repeated at least 10 times.

また、誘電体あるいは半導体材料としては、Si3N、
等の窒化物、5i02等の酸化物、SiC等の炭化物、
Si等の半金属物、のいずれかを使用しても同様の効果
を得ることができる。ただし、積層した後の原盤の透過
率は、紫外線硬化樹脂が紫外線によって硬化することの
できる範囲以内に設定する必要がある。
In addition, as dielectric or semiconductor materials, Si3N,
Nitrides such as, oxides such as 5i02, carbides such as SiC,
A similar effect can be obtained by using any one of semi-metallic materials such as Si. However, the transmittance of the master after lamination must be set within a range in which the ultraviolet curable resin can be cured by ultraviolet rays.

さらに、上記の2種類以上の材料を重ねて積層すること
もできる。この場合、多層膜の総厚みは、先に述べたよ
うに2000人以内とする。
Furthermore, two or more of the above materials can also be laminated. In this case, the total thickness of the multilayer film is 2000 or less, as described above.

〈実施例2〉 原盤に透明な剥離層を積層できるため、原盤を通しての
紫外線照射が可能となった。従って、反り等変形の可能
性の少ない不透明でS質な材料を利用したスタンパ作製
が形成できる。
<Example 2> Since a transparent release layer could be laminated on the master disc, it became possible to irradiate ultraviolet rays through the master disc. Therefore, a stamper can be manufactured using an opaque S-quality material that is less likely to undergo deformation such as warping.

第2図に示すように、紫外線硬化樹脂2が塗布しである
不透明部材(たとえば厚さ2mmのAQ基板)7の上に
、感光性樹脂4上に誘電体あるいは半導体3が積層しで
ある原盤基板5を重ね合わせ、紫外線硬化樹脂2を平坦
にした後、紫外線6を原盤の裏面から照射する。その後
、実施例1と同様にスタンパ基板である不透明部材7を
撓めて剥離を行う。
As shown in FIG. 2, a master disc is formed by laminating a dielectric or semiconductor 3 on a photosensitive resin 4 on an opaque member (for example, an AQ substrate with a thickness of 2 mm) 7 coated with an ultraviolet curing resin 2. After the substrates 5 are stacked and the ultraviolet curing resin 2 is made flat, ultraviolet rays 6 are irradiated from the back side of the master. Thereafter, as in Example 1, the opaque member 7, which is the stamper substrate, is bent and peeled off.

このようにして作製したスタンパから作製した光ディス
クには、均一性の良い情報パターンが形成されている。
An information pattern with good uniformity is formed on the optical disc manufactured from the stamper thus manufactured.

また、このスタンパを用いて光ディスクを作製しても、
スタンパに反りが生じることはなくなった。
Furthermore, even if an optical disc is made using this stamper,
The stamper no longer warps.

上記のスタンパ用不透光性基板としては、AQの他に3
Ni、Fe等も使用できるが、いずれも可撓性を有する
基板とする。
In addition to AQ, there are three types of non-transparent substrates for stampers mentioned above.
Although Ni, Fe, etc. can also be used, either of them should be a flexible substrate.

尚、光ディスクの膜厚均一化を図るには、スタンパ用不
透明基板の厚みは0.5〜3mm以下であることが望ま
しい。0.5mm以下であると。
In order to make the film thickness of the optical disc uniform, it is desirable that the thickness of the opaque substrate for the stamper is 0.5 to 3 mm or less. It is 0.5 mm or less.

光ディスクの膜厚にバラツキが見られ、6mm以上であ
るとスタンパの可撓性が失われ、光ディスクの剥離の際
に支障をきたす。
Variations in the film thickness of the optical disc are observed, and if the film thickness is 6 mm or more, the flexibility of the stamper is lost, causing problems when peeling off the optical disc.

[発明の効果1 本発明によれば、光ディスク用スタンパ作製方法におい
て、剥離層を凹凸パターンの記録しである感光性樹脂の
一ヒに、接着性良く形成できるようになった。また、剥
離層が誘電体あるいは半導体であるため、錆びや腐食の
発生を防ぐことができ、原盤の長寿命化を達成できた。
[Effects of the Invention 1] According to the present invention, in the method for producing a stamper for an optical disc, it has become possible to form a release layer with good adhesion on the photosensitive resin on which the concavo-convex pattern is recorded. Furthermore, since the release layer is made of a dielectric or a semiconductor, it is possible to prevent rust and corrosion from occurring, making it possible to extend the life of the master.

これによって、従来は1枚の原盤からのスタンパの作製
枚数は、2.3枚程度であったのに対し、10枚以上の
作製が可能になった。
As a result, while conventionally the number of stampers produced from one master was about 2.3, it has become possible to produce 10 or more stampers.

さらに、原盤の剥離層を不透光から透明にすることがで
きたので、反り等変形の可能性の少ない硬質な可撓性基
板のスタンバ作製が可能となったため、スタンバが反る
ようなことはなくなり、均一性の良い情報パターンを持
つ光ディスクの作製が容易になった。
Furthermore, since we were able to change the release layer of the master from opaque to transparent, it became possible to create a standby board with a hard flexible substrate that is less likely to warp or otherwise deform. This has made it easier to produce optical discs with highly uniform information patterns.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は1本発明の光ディスクスタンバの作製方法の第
1の実施例を示す断面図、第2図は第2の実施例を示す
断面図、第3図は従来の光ディスクスタンパの作製方法
を示す断面図である。 符号の説明 1・・・透光性部材 2・・・紫外線硬化樹脂 3・・誘電体あるいは半導体 4・・・感光性樹脂 5・・・原盤基板 6・・・紫外線 7・・・不透明部材 8・・・AQ 第1図 第3図 第2図
FIG. 1 is a cross-sectional view showing a first embodiment of the method for manufacturing an optical disk stamper of the present invention, FIG. 2 is a cross-sectional view showing the second example, and FIG. 3 is a cross-sectional view showing a conventional method for manufacturing an optical disk stamper. FIG. Explanation of symbols 1... Transparent member 2... Ultraviolet curing resin 3... Dielectric or semiconductor 4... Photosensitive resin 5... Master substrate 6... Ultraviolet light 7... Opaque member 8 ...AQ Figure 1 Figure 3 Figure 2

Claims (1)

【特許請求の範囲】 1、原盤基板と、該原盤基板上に光学的手段により凹凸
パターン形状を成す情報を記録させた感光性樹脂膜に、
スパッタエッチングを施した後、誘電体あるいは半導体
からなる薄膜をスパッタ法により積層する工程と、紫外
線硬化樹脂を塗布する工程と、スタンパ用部材を該樹脂
に重ねる工程と、該樹脂に紫外線を照射し、該樹脂を上
記原盤から剥離することを特徴とする光ディスク用スタ
ンパの作製方法。 2、請求項第1項記載の光ディスク用スタンパの作製方
法において、誘電体あるいは半導体の材料として、Si
_3N_4等の窒化物、SiO_2等の酸化物、SiC
等の炭化物、Si等の半金属物質の中から少なくとも1
種類以上を積層することを特徴とする光ディスク用スタ
ンパの作製方法。 3、請求項第1項記載の光ディスク用スタンパの作製方
法において、スパッタ法により誘電体あるいは半導体か
らなる薄膜を積層する際、スパッタガスは、Arガス雰
囲気中か、もしくはArとN_2、あるいはArとO_
2等の混合ガス雰囲気中で、反応性スパッタ法を用いて
成膜することを特徴とする光ディスク用スタンパの作製
方法。 4、請求項第1項記載の光ディスク用スタンパの作製方
法において、スタンパ用部材として、可撓性を有する透
光性材料からなる基板(プラスチック、エポキシ等)、
あるいは不透明な材料からなる基板(Al、Ni、Fe
等)を使用することを特徴とする光ディスク用スタンパ
の作製方法。 5、請求項第1項記載の光ディスク用スタンパの作製方
法において、スタンパ用部材の基板厚さは0.5〜5m
mの範囲であることを特徴とする光ディスク用スタンパ
の作製方法。
[Scope of Claims] 1. A master substrate, and a photosensitive resin film on which information forming a concavo-convex pattern is recorded by optical means on the master substrate,
After performing sputter etching, there are a step of laminating a thin film made of dielectric or semiconductor by sputtering, a step of applying an ultraviolet curable resin, a step of stacking a stamper member on the resin, and a step of irradiating the resin with ultraviolet rays. . A method for producing a stamper for an optical disc, which comprises peeling off the resin from the master disc. 2. In the method for producing a stamper for an optical disk according to claim 1, Si is used as the dielectric or semiconductor material.
Nitride such as _3N_4, oxide such as SiO_2, SiC
At least one of carbides such as, metalloid substances such as Si, etc.
A method for producing an optical disc stamper, characterized by laminating more than one type of stamper. 3. In the method for producing a stamper for an optical disk according to claim 1, when laminating thin films made of dielectric or semiconductor by sputtering, the sputtering gas is in an Ar gas atmosphere, or in a combination of Ar and N_2, or Ar and N_2. O_
1. A method for producing a stamper for an optical disk, the method comprising forming a film using a reactive sputtering method in a mixed gas atmosphere such as No. 2. 4. In the method for producing a stamper for an optical disk according to claim 1, the stamper member is a substrate made of a flexible light-transmitting material (plastic, epoxy, etc.);
Alternatively, a substrate made of an opaque material (Al, Ni, Fe
etc.) A method for producing a stamper for an optical disc. 5. In the method for producing a stamper for an optical disk according to claim 1, the substrate thickness of the stamper member is 0.5 to 5 m.
1. A method for producing an optical disc stamper, characterized in that the stamper is in the range of m.
JP32331988A 1988-12-23 1988-12-23 Manufacture of stamper for optical disk Pending JPH02172041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32331988A JPH02172041A (en) 1988-12-23 1988-12-23 Manufacture of stamper for optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32331988A JPH02172041A (en) 1988-12-23 1988-12-23 Manufacture of stamper for optical disk

Publications (1)

Publication Number Publication Date
JPH02172041A true JPH02172041A (en) 1990-07-03

Family

ID=18153464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32331988A Pending JPH02172041A (en) 1988-12-23 1988-12-23 Manufacture of stamper for optical disk

Country Status (1)

Country Link
JP (1) JPH02172041A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2671657A1 (en) * 1991-01-16 1992-07-17 Digipress Sa Optical disc or pressing die for the manufacture of such discs
FR2701152A1 (en) * 1993-02-03 1994-08-05 Digipress Sa A method of manufacturing a master disk for producing a pressing matrix including optical discs, pressing matrix obtained by this method and optical disc obtained from this pressing die.
US6454970B1 (en) * 1998-10-14 2002-09-24 Amic Ab And Gyros Ab Matrix, method of producing and using the matrix and machine including the matrix

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2671657A1 (en) * 1991-01-16 1992-07-17 Digipress Sa Optical disc or pressing die for the manufacture of such discs
FR2701152A1 (en) * 1993-02-03 1994-08-05 Digipress Sa A method of manufacturing a master disk for producing a pressing matrix including optical discs, pressing matrix obtained by this method and optical disc obtained from this pressing die.
US6454970B1 (en) * 1998-10-14 2002-09-24 Amic Ab And Gyros Ab Matrix, method of producing and using the matrix and machine including the matrix
US7182890B2 (en) 1998-10-14 2007-02-27 Gyros Patent Ab Matrix and method of producing said matrix

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