JPS6297149A - Optical disk and its production - Google Patents

Optical disk and its production

Info

Publication number
JPS6297149A
JPS6297149A JP60236351A JP23635185A JPS6297149A JP S6297149 A JPS6297149 A JP S6297149A JP 60236351 A JP60236351 A JP 60236351A JP 23635185 A JP23635185 A JP 23635185A JP S6297149 A JPS6297149 A JP S6297149A
Authority
JP
Japan
Prior art keywords
layer
transparent
substrate
resin
recording layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60236351A
Other languages
Japanese (ja)
Inventor
Katsutaro Ichihara
勝太郎 市原
Noburo Yasuda
安田 修朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60236351A priority Critical patent/JPS6297149A/en
Publication of JPS6297149A publication Critical patent/JPS6297149A/en
Pending legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To obtain an optical disk which is free from exfoliation even after resting at the under a high temp. and high humidity and has high long-term reliability by providing a tightly adhered layer consisting of a mixture composed of a photosetting resin and transparent inorg. material between a transparent resin substrate and recording layer. CONSTITUTION:The tightly adhered layer 21 consisting of the material mixture composed of the photosetting resin and transparent dielectric material is provided between the transparent resin substrate 1 as represented by a polymethyl methacrylate, polycarbonate, epoxy, etc. and the recording layer 3 consisting of a metal, semiconductor, metallic compd., etc., which cause an optical change by the irradiation of light. The formation of the tightly adhered layer is executed by uniformly coating the photosetting resin having about several 10 - several 100[Cp] viscosity in the environment where light is shielded onto the substrate, installing the transparent resin substrate in a thin film forming device and irradiating near UV - blue visible light to the uncured photosetting resin layer to cure the photosetting resin simultaneously with deposition of the transparent inorg. material by sputtering vapor deposition or vacuum deposition on the uncured photosetting resin layer.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、半導体レーザ等の光ビームを照射して情報の
記録・再生を行なう光ディスクに関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an optical disc on which information is recorded and reproduced by irradiation with a light beam from a semiconductor laser or the like.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

半導体レーザを代表とする光ビームを照射して情報の記
録・再生を行なう光ディスクは、(1)1ビット当りの
記録エリアが、光ビームのスポット径(〜1μmφ)と
同程度であるので、記録密度が極めて高い、(11)情
報の記録・再生を非接触で行なうので、ヘッドによって
媒体を摩耗する事がない。
Optical discs record and reproduce information by irradiating them with a light beam, typically a semiconductor laser. (1) The recording area per bit is about the same as the spot diameter of the light beam (~1 μmφ); The density is extremely high. (11) Since information is recorded and reproduced without contact, there is no wear of the medium by the head.

(iD〜数100m5+ecの高速アクセスが容易であ
る、といった利点から、次世代の周辺メモリーの主流と
して期待されている。このような元ディスクは基本的に
ディスク基板と、光ビームの照射によって何らかの光学
的変化を生ずる記録層とからなっている。何らかの光学
的変化としては、記録用レーザ光の照射によって、(i
)照射部が変形(孔、ふくらみ)シ、変形部の反射率が
未変形部のそれと異なる。(i+)@射部が相変化を起
こし、相変化部の反射率が、未相変化部のそれと異なる
。 (iii)照射部の磁化が反転し、反転部の偏力の
状態が未反転部のそれと異なる、といったタイプがあげ
られる。上記した何れのタイプにおいても、記録・再生
用の光ビームは、基板を介して記録層上に照射する方式
が実用的である。これは、記録層の空気面側にはゴミや
埃りが付着するので、空気面側から記録層上に光ビーム
を照射すると、数多くのエラーを発生するのに対して、
記録層の基板面側には、ディスク製造者が十分な注意を
払えば、ゴミの介入を防止できるという事と、基板の記
録層の設けられていない側の面上では、光ビームはデフ
ォーカスであるので、この面上に付着したゴミや埃りは
エラーの原因とはなりにくいとiう事の2つの理由によ
っている。しかるに、光ディスクの基板には、透明であ
る事が要求され、さらに、ノイズレベルを低くする上で
はなるべく複屈折率の小さい事が要求されている。又、
ディスク面上の所定の位置に迅速に光ヘッドを移動して
所望の情報を記録・再生する上では、元ヘッドをガイド
する為のグループが必要であり、このグループは記録層
に設けるよりは、あらかじめ基板面上に設けられる万が
、記録層形成技術の立場からは、はるかに技術的に有利
である。上記した3つの基本的要求(透明・低複屈折率
−グループ成型性)を同時に満足する基板材料は、ポリ
メチルメタクリレート。
(Due to the advantages of easy high-speed access of iD to several 100m5+EC, it is expected to become the mainstream of next-generation peripheral memory.Such original disks are basically made of a disk substrate and some kind of optical It consists of a recording layer that causes optical changes.Some optical changes include (i)
) The irradiated part is deformed (holes, bulges), and the reflectance of the deformed part is different from that of the undeformed part. The (i+)@ radiation part undergoes a phase change, and the reflectance of the phase change part is different from that of the non-phase change part. (iii) There is a type in which the magnetization of the irradiated part is reversed and the biased force state of the reversed part is different from that of the non-reversed part. In any of the above-mentioned types, it is practical to irradiate the recording layer with the recording/reproducing light beam through the substrate. This is because dirt and dust adhere to the air side of the recording layer, so if a light beam is irradiated onto the recording layer from the air side, many errors will occur.
If the disc manufacturer pays sufficient attention to the substrate side of the recording layer, it is possible to prevent dust from entering the substrate, and on the side of the substrate where the recording layer is not provided, the light beam is defocused. Therefore, dirt and dust attached to this surface are unlikely to cause errors for two reasons. However, the substrate of an optical disk is required to be transparent, and furthermore, in order to lower the noise level, it is also required to have as low a birefringence as possible. or,
In order to quickly move the optical head to a predetermined position on the disk surface to record and reproduce desired information, a group is required to guide the original head, and this group is not provided in the recording layer. Even if it is provided on the substrate surface in advance, it is far more technically advantageous from the standpoint of recording layer formation technology. Polymethyl methacrylate is a substrate material that simultaneously satisfies the three basic requirements mentioned above (transparency, low birefringence, and group formability).

ポリカーボネイト、エポキシ等を代表とする透明樹脂材
料である。しかしながら、この様な透明樹脂材料は、無
機系材料との密着性は甚だ乏しいので、金属もしくは金
属化合物の系統からなる記録層を透明Vli脂基根基板
上着良く形成するのは極めて困難であるのが現状である
。例えば、現在、消去可能型光ディスクの記録層として
最も期待されている希土類−遷移金属非晶質フェリ磁性
膜(以下RE−TM膜と略記する)等も、透明樹脂基板
との密着性が乏しく、これがRE−TM光ディスクの実
用化を遅らせている1つの原因となっている。
Transparent resin materials such as polycarbonate and epoxy. However, since such transparent resin materials have extremely poor adhesion with inorganic materials, it is extremely difficult to form a recording layer made of a metal or metal compound well on a transparent Vli lipid-based substrate. is the current situation. For example, rare earth-transition metal amorphous ferrimagnetic films (hereinafter abbreviated as RE-TM films), which are currently most promising as recording layers for erasable optical discs, have poor adhesion to transparent resin substrates. This is one of the reasons for delaying the practical application of RE-TM optical discs.

〔発明の目的〕[Purpose of the invention]

本発明は上記した従来技術の問題点に鑑みてなされたも
のであり、ポリメチルメタクリレート。
The present invention was made in view of the problems of the prior art described above, and uses polymethyl methacrylate.

ポリカーボネイト、エポキシ等を代表とする光デイスク
基板上に、密着性良く、金属もしくは金属化合物等の系
統からなる記録層を形成する技術を提供する事を目的と
している。
The purpose of this invention is to provide a technology for forming a recording layer made of a metal or metal compound with good adhesion on an optical disk substrate typically made of polycarbonate, epoxy, or the like.

〔発明の概要〕[Summary of the invention]

本発明の光ディスクは、ポリメチルメタクリレート、ポ
リカーボネート、エポキシ等を代表とする透明樹脂基板
と、光ビームの照射によって光学的変化を起こす金属(
RE−TM膜、形状記憶合金膜等)、半導体、金属化合
物等からなる記録層とを具備し、前記透明樹脂基板と記
録層との間に光硬化型ml脂と透明誘電体との混合物質
からなる密着層を備えた事を特徴としており、光硬化型
樹脂としては、近紫外線〜青色可視光(約250朋〜4
50朋)の光を照射する事によって硬化する。メチルメ
タクリレート系もしくはエポキシ系等の樹脂が使用でき
、透明無機材料としては、  Si3N4.AIN。
The optical disc of the present invention consists of a transparent resin substrate typically made of polymethyl methacrylate, polycarbonate, epoxy, etc., and a metal (metallic material) that causes an optical change when irradiated with a light beam.
RE-TM film, shape memory alloy film, etc.), a semiconductor, a recording layer made of a metal compound, etc., and a mixed material of a photocurable ML resin and a transparent dielectric between the transparent resin substrate and the recording layer. It is characterized by having an adhesive layer made of
It is cured by irradiation with light of 50 mm). Resins such as methyl methacrylate or epoxy can be used, and transparent inorganic materials include Si3N4. A.I.N.

5i02.SiO,ZnO,CaF2.MgF2等の誘
電体の他、ITO。
5i02. SiO, ZnO, CaF2. In addition to dielectric materials such as MgF2, ITO.

5n02等の透明導電体等広く用いる事ができる。A wide variety of transparent conductors such as 5n02 can be used.

又、前記密着層を形成する手段としては、未硬化の光硬
化型樹脂中に、仏間無機材料の粉練を混合して、透明樹
脂基板上に塗付し、その後、光を照射して光硬化型樹脂
を硬化せしむる方法が先ずあげられるが、この方法では
、光硬化型樹脂の粘度を制御するのが難かしいので塗付
の際にむらを発生し易いという欠点と、透明無機物質の
粉練は一般゛的に〜数μmとその粒径が大きいので、記
録再生州党ビームを乱反射してしまいメモリー動作上好
ましくないという欠点がある。しかるに好ましい製造方
法としては、粘度が数10〜数100 (Cp)程度の
光硬化型樹脂を光を逍弊した環境にて一様に塗付した後
に、透明樹脂基板を薄膜形成装置中に設置し、未硬化の
光硬化型樹脂層に透明無機材料をスパッタリング蒸着も
しくは真空蒸着しながら同時に近紫外〜青色可視の光を
照射して光硬化型−指を硬化せしむる方法があげられる
In addition, as a means for forming the adhesive layer, powdered Butsuma inorganic material is mixed in an uncured photocurable resin, and the mixture is applied onto a transparent resin substrate, and then light is irradiated to form the adhesive layer. The first method is to harden the photocurable resin, but this method has the drawback that it is difficult to control the viscosity of the photocurable resin, which tends to cause unevenness during application, and that transparent inorganic materials Since the particle size of the powder is generally large, about several micrometers, it has the disadvantage that it diffusely reflects the recording/reproducing beam, which is unfavorable for memory operation. However, a preferred manufacturing method is to uniformly apply a photocurable resin with a viscosity of several tens to several hundreds of Cp in an environment that is exposed to light, and then place the transparent resin substrate in a thin film forming apparatus. Another method is to harden the photocurable finger by sputtering or vacuum depositing a transparent inorganic material on the uncured photocurable resin layer and simultaneously irradiating near ultraviolet to blue visible light.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、ポリメチルメタクリレート。 According to the invention, polymethyl methacrylate.

ポリカーボネイト、エポキシ等の透明ml脂よりなる元
ディスク基板上に、金属、半導体、金属化合物等の薄膜
を密着性良く形成できるので、高温高湿下に放置しても
剥離を起こぎない、長期信頼性の高い光ディスクが提供
できる。
A thin film of metal, semiconductor, metal compound, etc. can be formed with good adhesion on the original disk substrate made of transparent ml resin such as polycarbonate or epoxy, so it will not peel off even if left under high temperature and high humidity, ensuring long-term reliability. We can provide optical discs with high performance.

〔発明の実施例〕[Embodiments of the invention]

以下、図面を参照して本発明の光ディスクを詳細に説明
する。
Hereinafter, the optical disc of the present invention will be explained in detail with reference to the drawings.

(実施例−1〉 第1図は本発明の光ディスクの一実施例の構成断面図、
第2図は1本発明に対する比較例として実施した従来技
術の光ディスクの構成断面図である。第1図、第2図を
通じて(1)はグループ付きポリカーボネイト基板、c
!υは、光硬化型樹脂(エポキシ系)と透明誘電体(S
i3N4)との混合密着層、(〃はSi3N4下地層、
(3)はTbCo記録層、14)はSi3N4干渉層、
(5)はAI反射j口である。第3図は、第1図及びに
第2図の光ディスクの製造に使用した装置の一実施例の
概念図である。第3図において、(6)は真空容器、(
7)は基板ホルダ、(8)は基板、(9)は基板回転ジ
グ、(1〔はスパッタ源、aQはRF電源。
(Example-1) Fig. 1 is a cross-sectional view of the configuration of an embodiment of the optical disc of the present invention.
FIG. 2 is a sectional view of the structure of a conventional optical disc implemented as a comparative example with respect to the present invention. In Figures 1 and 2, (1) is a polycarbonate substrate with groups, c
! υ is the photocurable resin (epoxy type) and transparent dielectric (S
i3N4) mixed adhesion layer, (〃 is Si3N4 base layer,
(3) is a TbCo recording layer, 14) is a Si3N4 interference layer,
(5) is the AI reflection. FIG. 3 is a conceptual diagram of one embodiment of the apparatus used for manufacturing the optical discs shown in FIGS. 1 and 2. FIG. In Figure 3, (6) is a vacuum container, (
7) is a substrate holder, (8) is a substrate, (9) is a substrate rotating jig, (1 is a sputtering source, and aQ is an RF power source.

aQはシャッター、 (13は紫外線(254朋)ラン
プハウス、■はラング電源、(tsはガス供給系、aQ
は排気系である。第1図の本発明の光ディスクは第3図
の構成の装置を用いて以上の手順で作成した。
aQ is the shutter, (13 is the ultraviolet (254)) lamp house, ■ is the Lang power supply, (ts is the gas supply system, aQ
is the exhaust system. The optical disc of the present invention shown in FIG. 1 was produced using the apparatus having the configuration shown in FIG. 3 using the above procedure.

先ず、グループ付ポリカーボネイト板上に、暗室中でエ
ポキシ系光硬化樹脂をスピンコードして、0.3μm厚
みの光硬化型ml脂層を設けた基板(8)を第3図に示
す真空容器(6)に設置し、排気系OeIによって容器
(6)を減圧し、ガス供給系霞より10チN2分圧比の
N2−Ar混合ガスを5(mTorr)導入した。次に
シャッターazを閉じた状態でRF1t!源αυをS 
i 3N4ターゲツトの収納されたスバータ源α1に投
入しブレ・スパッタを5分間行ない、ターゲット表面を
清浄とした。ジグ(9)を動作して基板ホルダー(7)
を60 (rpn)で回転し、シャッター02を開くと
同時にラング電源0着をオンして紫外線ランプ(13を
点灯した。ラングα3の出力は、基板(8)の上に設け
られたエポキシ系光硬化型樹脂が硬化するまでの時間が
10分間となる様に設定し、又Si3N4ターゲットへ
の投入電力は、毎分50X厚さに相当するS i 3N
4が光硬化型樹脂層中へ入射する様に設定し、1゜分間
の憂バッタリングと光照射とを同時に行ない密着層Qυ
を得た。次に、密着weυあ設けられた基板(1)を異
なるスパッタ装置に設置し、密着層表面を300WのR
Fパワーで5分間スパッタエツチング処理してその表面
を清浄とした後に、 TbCo記録層250X、 Si
3N4干渉層z5oX’AA! 反射Nj toooA
のスパッタリング成膜を連続して行ない、本発明の元デ
ィスクサンプル(第1図)を得た。従来の光ディスク(
第2図)サンプルは、従来技術に基づいてグループ付き
ポリカーボネイト基板上に、Si3N4下地層1000
Aを形成し、この下地層表面をスパッタエツチング処理
した後に、TbCo記録層25 oX 、 Si3N4
干渉層25oX、A1反射層の順に積層した。このよう
にして得られた本発明の光ディスクと従来の光ディスク
を65℃−90%R−H,24Hrs←常温I Hr 
X 4サイクルの加速劣化試験に供した。
First, a substrate (8) on which a 0.3 μm thick photocurable ML fat layer was provided by spin-coding an epoxy photocurable resin on a grouped polycarbonate plate in a dark room was placed in a vacuum container (as shown in Fig. 3). 6), the pressure of the container (6) was reduced by the exhaust system OeI, and 5 (mTorr) of N2-Ar mixed gas with a partial pressure ratio of 10 inches of N2 was introduced from the gas supply system Kasumi. Next, with shutter az closed, RF1t! source αυ
The sample was put into the svarter source α1 containing the i3N4 target, and blur sputtering was performed for 5 minutes to clean the target surface. Move the jig (9) and attach the substrate holder (7)
was rotated at 60 (rpn), and at the same time the shutter 02 was opened, the rung power supply 0 was turned on to light the ultraviolet lamp (13). The time required for the hardening resin to harden was set to 10 minutes, and the power input to the Si3N4 target was set to 50X thickness per minute.
4 is set so that it enters into the photocurable resin layer, and the adhesion layer Qυ
I got it. Next, the substrate (1) provided with the adhesion layer was placed in a different sputtering device, and the surface of the adhesion layer was heated to an R of 300W.
After cleaning the surface by sputter etching with F power for 5 minutes, the TbCo recording layer 250X, Si
3N4 interference layer z5oX'AA! Reflection Nj toooA
Sputtering film formation was performed continuously to obtain the original disk sample of the present invention (FIG. 1). Conventional optical disc (
Figure 2) The sample was prepared using a Si3N4 underlayer 1000 on a grouped polycarbonate substrate based on the prior art.
After forming A and sputter etching the surface of this underlayer, a TbCo recording layer 25oX, Si3N4
A 25oX interference layer and an A1 reflective layer were laminated in this order. The thus obtained optical disc of the present invention and the conventional optical disc were heated at 65°C-90%RH, 24Hrs←room temperature IHr.
It was subjected to an accelerated deterioration test of 4 cycles.

第4図はその結果である。第4図−(a)が加速劣化後
の本発明の光ディスクの表面状態、第4図−(b)が加
速劣化後の従来の光ディスクの表面状態である。第4図
より明らかな如く、本発明0元ディスクは加速劣化後も
良好な表面状態を保持しているのに対し、従来の光ディ
スクは筋状もしくは亀甲状の多数の剥離部を発生してい
る。
Figure 4 shows the results. FIG. 4-(a) shows the surface state of the optical disc of the present invention after accelerated deterioration, and FIG. 4-(b) shows the surface state of the conventional optical disc after accelerated deterioration. As is clear from Fig. 4, the zero-source disc of the present invention maintains a good surface condition even after accelerated deterioration, whereas the conventional optical disc has many striped parts in the form of stripes or hexagonal shells. .

(比較例−2〉 実施例−1中には、比較例−1として、透明樹脂基板上
に5hN4下地層を有する光ディスクの実施例を述べた
が、 Si3N4以外の膜の場合でも、本発明の密着層
のないものについてはυ口速劣・化試験後全て剥離を起
こした。第2図と同一の構造で、下地層(社)としてS
i3N4膜の他に発明者等は、5iOzS10.ZnS
、AIN、TiO2,CaF2.ITOを用いて1元デ
ィスクを試作したが、加速劣化後の状態は全て第4図−
(b)に示したものと同様となった。父、実施例−1中
に示したSi3N4と上記した下地層は透明誘電体CI
TOは透明導電体)であるが、ml脂基板上に記録層を
直接成膜したサンプルも試作して評価した。第5図はそ
の実施例の構成図でるる。第5図において、(1)はグ
ループ付ポリカーボネイト基板。
(Comparative Example 2) In Example 1, an example of an optical disk having a 5hN4 underlayer on a transparent resin substrate was described as Comparative Example 1, but even in the case of a film other than Si3N4, the present invention can be applied. For those without an adhesion layer, all peeling occurred after the υ mouth aging/deterioration test.The structure was the same as that shown in Figure 2, and S was used as the base layer.
In addition to the i3N4 membrane, the inventors have also developed a 5iOzS10. ZnS
, AIN, TiO2, CaF2. We made a prototype of a single-source disk using ITO, and the state after accelerated deterioration is shown in Figure 4.
The result was similar to that shown in (b). Father, the Si3N4 shown in Example-1 and the underlayer described above are transparent dielectric CI.
Although TO is a transparent conductor), a sample in which a recording layer was directly formed on a ml resin substrate was also prototyped and evaluated. FIG. 5 is a block diagram of this embodiment. In FIG. 5, (1) is a polycarbonate substrate with groups.

(31)は記録層であり、記録層としては、例えば光磁
気効果を利用するTbCo膜、形状記憶効果を利用する
CuM膜、結晶構造変化を利用する5eTe 、結晶構
造変化を利用するI nSbのいずれをも使用できる。
(31) is a recording layer, and examples of the recording layer include, for example, a TbCo film that uses magneto-optical effect, a CuM film that uses shape memory effect, 5eTe that uses crystal structure change, and InSb that uses crystal structure change. Either can be used.

記録層はスパッタ装置を用いて形成した。各れの記録層
を有する光ディスクにおいても、加速劣化後においては
、第4図−(b)と同様に、記録層が基板から剥離して
しまう事が判った。
The recording layer was formed using a sputtering device. It was found that in the optical discs having each of the recording layers, the recording layer peeled off from the substrate after accelerated deterioration, as shown in FIG. 4-(b).

〈実施例−2〉 上記比較例に使用した記録層を用いて本発明の元ディス
クを実施した。第6図はその実施例の構成図である。第
6図において(1)はグループ付ポリカーボネイト基板
、Cυはエポキシ光硬化ml脂とSi3N4との混合密
着層、  (3t)は比較例−2に示した記録層である
。密着層形成は@3図に示した装置により行なうた。こ
れらの光ディスクを加速劣化試験に供した結果、エポキ
シ光硬化樹脂と513N4との混合密着層を設けた本発
明の元ディスクは。
<Example 2> An original disc of the present invention was produced using the recording layer used in the above comparative example. FIG. 6 is a block diagram of this embodiment. In FIG. 6, (1) is a polycarbonate substrate with groups, Cυ is a mixed adhesion layer of epoxy photocurable ml fat and Si3N4, and (3t) is the recording layer shown in Comparative Example-2. The adhesion layer was formed using the apparatus shown in Figure 3. As a result of subjecting these optical discs to accelerated deterioration tests, the original disc of the present invention was found to have a mixed adhesive layer of epoxy photocuring resin and 513N4.

全ての記録層材料に対して剥離を呈さす、第4図−(a
)に示したもの同様に、表面の変質は皆無であった。
Figure 4-(a) exhibits delamination for all recording layer materials.
), there was no alteration of the surface.

〈実施例−3〉 実施例1〜2では、エポキシ系光硬化型樹脂とSi3N
4との組皐合わせからなる混合密着層について述べたが
、透明無機材料として、 Si3N4の他にA6!N、
5tOz、ZnS、CaFz 、ITOを用いて実施例
−1と同様に混合密着層の形成を第3図の装置により行
なって、その密着性を粘着テープによるビールオフテス
トによって評価した所、ポリカーボネイト。
<Example-3> In Examples 1 and 2, epoxy photocurable resin and Si3N
As mentioned above, the mixed adhesion layer consisting of A6!4 and A6! N,
A mixed adhesion layer was formed using 5tOz, ZnS, CaFz, and ITO in the same manner as in Example 1 using the apparatus shown in FIG. 3, and its adhesion was evaluated by a beer-off test using an adhesive tape.

ポリメチルメタクリレート、エポキシの各基板上の混合
密着層共、剥離は起こらなかった。又、光硬化型樹脂と
してメチルメタクリレート系のものを使用し九場合も密
着性は良好であり九。
No peeling occurred in the mixed adhesive layers on the polymethyl methacrylate and epoxy substrates. Also, when a methyl methacrylate type resin was used as the photocurable resin, the adhesion was good.

く比較例−3〉 実施例1〜3では、光硬化型−指と透明無機材料との混
合密着層を形成する手段が、未硬化の光硬化型樹脂の上
に、透、明無機材料をスパッタリング形成しながら、同
時に光を照射してなるものについて述べたが、比較の為
に、硬化後の光硬化型樹脂層上に、透明無機材料をスパ
ッタリング形成した下地層を第3図の装置で形成して、
その下地層の上にTbCo膜をスパッタ成膜して65℃
−90チR,H,中で加速劣化した所、第4図−(b)
同様多数の亀甲状剥離を呈した。この事から、硬化後の
光硬化型樹脂層上に透明無機材料をスパッタした場合に
は、樹脂層と無機材料は何ら混合しわう事がないので明
確な界面を形成し何ら密着力の向上がないのに対し、本
発明の未硬化の光硬化型樹脂層上に、透明無機材料をス
パッタリングして同時に光照射した場合には、スパッタ
粒子が樹脂層内部に入り込み、界面近 に、光硬化型樹
脂と透明無機材料との混合層が形成され、しかるに大幅
な密着かつ向上があるものと判断できる。
Comparative Example 3 In Examples 1 to 3, the means for forming a mixed adhesion layer of a photocurable finger and a transparent inorganic material was to apply a transparent, clear inorganic material on an uncured photocurable resin. We have described a product formed by sputtering and irradiating light at the same time, but for comparison, we used the apparatus shown in Figure 3 to create a base layer in which a transparent inorganic material was formed by sputtering on a photocurable resin layer after curing. form,
A TbCo film was sputtered on top of the base layer at 65°C.
Figure 4-(b)
Similarly, numerous hectic detachments were observed. From this, when a transparent inorganic material is sputtered onto a photocurable resin layer after curing, the resin layer and inorganic material do not mix and wrinkle in any way, forming a clear interface and improving adhesion. On the other hand, when a transparent inorganic material is sputtered on the uncured photocurable resin layer of the present invention and light is irradiated at the same time, the sputtered particles penetrate into the resin layer and the photocurable resin layer is deposited near the interface. It can be determined that a mixed layer of resin and transparent inorganic material is formed, and that adhesion and adhesion are significantly improved.

〈実施例−4〉 実施例1〜3では、混合密着層を形成する手段として、
未硬化の光硬化型樹脂層上に、透明有機材料をスパッタ
リングと同時に光を照射してなるものについて述べたが
、その他に、未硬化の光硬化型樹脂中に透明無機材料の
粉体を混合してから基板上にスピンコードする等の方法
によっても、混合密着層は形成できる。発明者等は、エ
ポキシ系の光硬化型(支)脂液中にSi3N4の粉練を
混合し。
<Example-4> In Examples 1 to 3, as a means for forming the mixed adhesion layer,
In addition to sputtering a transparent organic material on an uncured photocurable resin layer and irradiating it with light at the same time, there are other methods of mixing transparent inorganic material powder into an uncured photocurable resin. The mixed adhesion layer can also be formed by a method such as spin-coating the mixture onto the substrate. The inventors mixed powdered Si3N4 into an epoxy-based photocurable resin liquid.

しかる後に、ポリカーボネイト基板上にスピンコードシ
て254 nmのHgランプを照射して混合密着層を作
成し、ビールオフテストを行なった所。
Thereafter, a mixed adhesion layer was created by irradiating the polycarbonate substrate with a 254 nm Hg lamp using a spin code, and a beer-off test was conducted.

5i02混合比50VoJチ以下の範囲では剥離が全く
くみられなかった。又、この混合密着層上にTbC。
No peeling was observed when the 5i02 mixing ratio was 50VoJ or less. Moreover, TbC is placed on this mixed adhesion layer.

膜をスパッタ成膜して、65℃−90SR,)L中で加
速劣化した所、筋状の剥離は殆んど発生しなかった。し
かしながら、大面積に亘る均一性は、実l@例−1で述
べた混合密着層には劣っていた。又、833 nmの波
長の光に対する透過率も、実施例−1の混合fE着り一
が85%でありたのに対し、実施例−4ではSi3N4
混合比20チチで60% 、 5iaN4混合比50V
oA’%で40チと低下し、光メモリー動作上は、実施
例−1の手法が優れている事が明らかとなった。
When the film was formed by sputtering and subjected to accelerated deterioration in 65° C.-90SR, ), almost no streak-like peeling occurred. However, the uniformity over a large area was inferior to that of the mixed adhesion layer described in Example 1. Furthermore, the transmittance for light with a wavelength of 833 nm was 85% for the mixed fE in Example-1, whereas in Example-4, Si3N4
Mixing ratio 20%, 60%, 5iaN4 mixing ratio 50V
The oA'% decreased to 40 inches, and it became clear that the method of Example 1 was superior in terms of optical memory operation.

本発明の光硬化型樹脂と透明無機材料との混合密着層は
、その層厚に関わらず、密着力の格段の向上が望めるが
、基板にあらかじめ設けられているグループの形状を保
持する上では、密着層厚はなるべく薄い方がよく、厚く
とも0.5μm、好ましくは0.3μm以下とするのが
良い。
The mixed adhesion layer of the photocurable resin and transparent inorganic material of the present invention can be expected to significantly improve adhesion regardless of the layer thickness, but it is difficult to maintain the shape of the groups pre-prepared on the substrate. The thickness of the adhesion layer should be as thin as possible, and should be at most 0.5 μm, preferably 0.3 μm or less.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の光ディスクの一実を部側の構成図、第
2図は従来の光ディスクの一実施例の構成図、第3図は
本発明の光ディスクの製造を実施した装置の一実施例の
概念図、第4図は本発明の光ディスクと従来の光ディス
クの加速劣化テスト後の表面状態を示す金属4組織を表
わした図、第5図は従来の光ディスクの他の実施例の構
成図、第6図は本発明の元ディスクの他の実施例の構成
図でろる。 1・・・透明ml脂基板、21・・・密着層、22・・
・下地層、3,31・・・記録層、4・・・干渉層、5
・・・反射層、6・・・真空容器、7・・・基板ホルダ
、8・・・基板、9・・・回転ジグ、10・・・スパッ
タ源、11・・・電源。 12・・・シャッター、13・・・ラング、14・・・
ランプ電源、15・・・ガス供給系、16・・・排気系
。 代理人 弁理士 則 近 憲 佑 同    竹 花 喜久男 第2図 第8図 第4図
Fig. 1 is a block diagram of an optical disc of the present invention, Fig. 2 is a block diagram of an embodiment of a conventional optical disc, and Fig. 3 is an implementation of an apparatus for manufacturing the optical disc of the present invention. A conceptual diagram of an example, FIG. 4 is a diagram showing four metal structures showing the surface condition after accelerated deterioration tests of the optical disc of the present invention and a conventional optical disc, and FIG. 5 is a diagram of the configuration of another example of the conventional optical disc. , FIG. 6 is a block diagram of another embodiment of the original disk of the present invention. 1... Transparent ml fat substrate, 21... Adhesive layer, 22...
・Underlying layer, 3, 31... Recording layer, 4... Interference layer, 5
. . . Reflective layer, 6 . Vacuum container, 7 . Substrate holder, 8 . 12...shutter, 13...lung, 14...
Lamp power supply, 15... gas supply system, 16... exhaust system. Agent Patent Attorney Noriyuki Chika Yudo Kikuo Takehana Figure 2 Figure 8 Figure 4

Claims (2)

【特許請求の範囲】[Claims] (1)透明樹脂基板と、光ビームの照射によって光学的
変化を生ずる記録層とを具備し、前記透明樹脂基板と記
録層との間に、光硬化型樹脂と透明無機材料との混合物
質からなる密着層を設けたことを特徴とする光ディスク
(1) A transparent resin substrate and a recording layer that causes an optical change upon irradiation with a light beam, and a mixture of a photocurable resin and a transparent inorganic material is provided between the transparent resin substrate and the recording layer. An optical disc characterized by being provided with an adhesive layer.
(2)透明樹脂基板に未硬化の光硬化型樹脂層を塗付し
た後、この光硬化型樹脂層を塗付した透明樹脂基板上に
透明誘電体をスパッタリング蒸着若しくは真空蒸着する
とともに光を照射して光硬化型樹脂層を硬化させて密着
層を形成し、この密着層上に光ビームの照射によって光
学的変化を生ずる記録層を形成することを特徴とする光
ディスクの製造方法。
(2) After applying an uncured photocurable resin layer to a transparent resin substrate, a transparent dielectric material is sputtered or vacuum deposited on the transparent resin substrate coated with this photocurable resin layer and irradiated with light. A method of manufacturing an optical disc, comprising: curing a photocurable resin layer to form an adhesive layer; and forming a recording layer that causes an optical change upon irradiation with a light beam on the adhesive layer.
JP60236351A 1985-10-24 1985-10-24 Optical disk and its production Pending JPS6297149A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60236351A JPS6297149A (en) 1985-10-24 1985-10-24 Optical disk and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60236351A JPS6297149A (en) 1985-10-24 1985-10-24 Optical disk and its production

Publications (1)

Publication Number Publication Date
JPS6297149A true JPS6297149A (en) 1987-05-06

Family

ID=16999517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60236351A Pending JPS6297149A (en) 1985-10-24 1985-10-24 Optical disk and its production

Country Status (1)

Country Link
JP (1) JPS6297149A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0974416A1 (en) 1998-07-20 2000-01-26 La Soudure Autogene Francaise Arc welding nozzle with particular diameter and thickness
JP2003525774A (en) * 2000-02-21 2003-09-02 ギーゼッケ ウント デフリエント ゲーエムベーハー Multi-layer card with embedded security element with relief structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0974416A1 (en) 1998-07-20 2000-01-26 La Soudure Autogene Francaise Arc welding nozzle with particular diameter and thickness
JP2003525774A (en) * 2000-02-21 2003-09-02 ギーゼッケ ウント デフリエント ゲーエムベーハー Multi-layer card with embedded security element with relief structure

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