JPS61170743A - フオトマスクブランクの製造法 - Google Patents

フオトマスクブランクの製造法

Info

Publication number
JPS61170743A
JPS61170743A JP60011817A JP1181785A JPS61170743A JP S61170743 A JPS61170743 A JP S61170743A JP 60011817 A JP60011817 A JP 60011817A JP 1181785 A JP1181785 A JP 1181785A JP S61170743 A JPS61170743 A JP S61170743A
Authority
JP
Japan
Prior art keywords
photomask blank
light
chromium nitride
sputtering
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60011817A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0414340B2 (enExample
Inventor
Takehiro Taihichi
対比地　武博
Hiroaki Noda
博明 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP60011817A priority Critical patent/JPS61170743A/ja
Publication of JPS61170743A publication Critical patent/JPS61170743A/ja
Publication of JPH0414340B2 publication Critical patent/JPH0414340B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60011817A 1985-01-25 1985-01-25 フオトマスクブランクの製造法 Granted JPS61170743A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60011817A JPS61170743A (ja) 1985-01-25 1985-01-25 フオトマスクブランクの製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60011817A JPS61170743A (ja) 1985-01-25 1985-01-25 フオトマスクブランクの製造法

Publications (2)

Publication Number Publication Date
JPS61170743A true JPS61170743A (ja) 1986-08-01
JPH0414340B2 JPH0414340B2 (enExample) 1992-03-12

Family

ID=11788345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60011817A Granted JPS61170743A (ja) 1985-01-25 1985-01-25 フオトマスクブランクの製造法

Country Status (1)

Country Link
JP (1) JPS61170743A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05297570A (ja) * 1992-04-20 1993-11-12 Toppan Printing Co Ltd フォトマスクブランクの製造方法
JPH083737A (ja) * 1994-06-20 1996-01-09 Tosoh Corp 窒化クロムスパッタリングターゲット

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140874A (enExample) * 1974-10-04 1976-04-06 Toppan Printing Co Ltd
JPS57151945A (en) * 1981-03-17 1982-09-20 Hoya Corp Photomask blank and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140874A (enExample) * 1974-10-04 1976-04-06 Toppan Printing Co Ltd
JPS57151945A (en) * 1981-03-17 1982-09-20 Hoya Corp Photomask blank and its manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05297570A (ja) * 1992-04-20 1993-11-12 Toppan Printing Co Ltd フォトマスクブランクの製造方法
JPH083737A (ja) * 1994-06-20 1996-01-09 Tosoh Corp 窒化クロムスパッタリングターゲット

Also Published As

Publication number Publication date
JPH0414340B2 (enExample) 1992-03-12

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees