JPS61167945A - 光可溶化組成物 - Google Patents

光可溶化組成物

Info

Publication number
JPS61167945A
JPS61167945A JP60008766A JP876685A JPS61167945A JP S61167945 A JPS61167945 A JP S61167945A JP 60008766 A JP60008766 A JP 60008766A JP 876685 A JP876685 A JP 876685A JP S61167945 A JPS61167945 A JP S61167945A
Authority
JP
Japan
Prior art keywords
compound
acid
present
compounds
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60008766A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0545024B2 (enrdf_load_stackoverflow
Inventor
Toshiaki Aoso
利明 青合
Akira Umehara
梅原 明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP60008766A priority Critical patent/JPS61167945A/ja
Publication of JPS61167945A publication Critical patent/JPS61167945A/ja
Publication of JPH0545024B2 publication Critical patent/JPH0545024B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
JP60008766A 1985-01-21 1985-01-21 光可溶化組成物 Granted JPS61167945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60008766A JPS61167945A (ja) 1985-01-21 1985-01-21 光可溶化組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60008766A JPS61167945A (ja) 1985-01-21 1985-01-21 光可溶化組成物

Publications (2)

Publication Number Publication Date
JPS61167945A true JPS61167945A (ja) 1986-07-29
JPH0545024B2 JPH0545024B2 (enrdf_load_stackoverflow) 1993-07-08

Family

ID=11702030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60008766A Granted JPS61167945A (ja) 1985-01-21 1985-01-21 光可溶化組成物

Country Status (1)

Country Link
JP (1) JPS61167945A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167946A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 着色光可溶化組成物
JPS61169836A (ja) * 1985-01-22 1986-07-31 Fuji Photo Film Co Ltd 光可溶化組成物
JP2008266331A (ja) * 2004-04-05 2008-11-06 Alnylam Pharmaceuticals Inc オリゴヌクレオチドの合成および精製に使用する方法および反応試薬
US20140295332A1 (en) * 2011-12-28 2014-10-02 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167946A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 着色光可溶化組成物
JPS61169836A (ja) * 1985-01-22 1986-07-31 Fuji Photo Film Co Ltd 光可溶化組成物
JP2008266331A (ja) * 2004-04-05 2008-11-06 Alnylam Pharmaceuticals Inc オリゴヌクレオチドの合成および精製に使用する方法および反応試薬
US20140295332A1 (en) * 2011-12-28 2014-10-02 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
US9188862B2 (en) * 2011-12-28 2015-11-17 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Also Published As

Publication number Publication date
JPH0545024B2 (enrdf_load_stackoverflow) 1993-07-08

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees