JPS61167903A - Coating method of synthetic resin optical parts - Google Patents

Abstract

PURPOSE:To maintain the accuracy of the forming shape of synthetic resin optical parts and to make possible high adhesion by subjecting the surface of said parts to cleaning and pretreatment then forming an Si film as the 1st layer on the parts and forming the film of SiOx as an antireflection film thereon. CONSTITUTION:The surface of the synthetic resin optical parts 1 is subjected to the 1st cleaning 2 and are put into a dryer by which the parts are annealed 10. The annealed parts are thereafter subjected to the 2nd cleaning 11. The parts are then put into a vacuum deposition chamber 19 and after the inside thereof is evacuated to a high vacuum, a reactive gas such as O2 is introduced therein and the surface is physically bombarded by plasma to remove the moisture sticking thereto and to reform the surface. Si is reactively deposited by evaporation on the surface in an atmosphere of the reactive gas such as O2 and thereafter three-layered coating films are constituted on the Si film. The formation of the functional optical film having good adhesiveness and cracking resistance on the surface of the synthetic resin optical parts is thus made possible.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a coating method for coating the surface of a synthetic resin optical component used in an optical system such as a camera.

Conventional techniques for coating the surface of optical parts made of synthetic resin include the following.

(1) Polymethyl methacrylate (PMMA) molded by injection compression molding is immersed in a solvent that solubilizes water, the water on the PMMA surface layer is removed, and the PMMA surface layer is washed with a fluorocarbon-based solvent, followed by thermosetting. A method for forming an organic node coat film by coating approximately 2# of S1-based cured film.

(2) The injection compression molded PMMA is washed in the same manner as in (1) above, and then about 0.1
Means of μ coating.

(3) Set the dried PMMA plate in the chamber and evacuate the chamber to 0. 5 x 10-'
RF (Radio Fr.
equen-cy) ion plating (high frequency ion plating) to discharge RFll [cuff 0W,
Ion bombardment is performed by applying DC-500V on the bias side. The first half nd = 500 nm is base coated in RF ion plating at an evaporation rate of 50 nm/i, and the second half nd = 500 nm is base coated by vacuum evaporation. After that, as the first layer (from the PMMA side), an anti-reflection film was deposited with SiO at 120 nm/-w by continuous vacuum deposition.
=λ/4 (λ==500 nm), the second layer is R
3 x 10"-' Ol with F ion plating
T'orr, RF power 50W, bias side DC-1
was applied at V, coated with Zn at 10 nm/i, and coated with ZnO2
, nd = λ/2 (λ = 500 nm), and the third layer is vacuum-deposited SiO with a thickness of 50 nm/i, nd = = λ/4.
(λ=500 nm): 7.

(4) MgF on the PMMA substrate, n,1=λ,/4
(λ, = 400 nm) as the first layer (from the base material side)
coated with S10. on the second layer. nd=λt/8(λ
2=160 nm, also λ, 〉λ,) means for coating.

However, each of the above conventional means has the following problems and is not satisfactory as a means for coating synthetic resin optical parts.

That is, an antireflection film (λ=78
Even if a reflectance of 0 to 820 nm (with a reflectance of 0.5 or less) is formed, the adhesion is extremely poor using the conventional means described above, which causes microcracks to occur in environmental tests, resulting in a significant decrease in durability. I was disappointed. In addition, as a means to solve this problem, there is a method of applying a primer coat between the surface of the synthetic resin optical component and the antireflection film, but in such a case, the thickness of the primer coat becomes thicker, and the synthetic resin becomes thicker. Analyzing the problems of the above-mentioned conventional technology, we find that anti-reflection coatings have poor adhesion and microscopic properties. Cracks (film peeling) cannot be treated as a separate causative factor, and are thought to be caused by the interrelationship between (1) the physical properties of the surface of the synthetic resin optical component and (2) the physical properties of the coating film itself. That is, the factors in (1) above include: (1) factors due to the correlation between surface hardness, surface elastic stress, and molecular orientation of synthetic resin optical components and surface stress, (2) factors due to water absorption of the optical component surface and surface layer, (2) Since it is a low-temperature coating, a surface layer with an amorphous film is generated, and the bonding energy is reduced due to the low ion energy of that surface layer and the optical component surface layer. In addition, the factors for (2) above include: ■ Factors due to the growth of the amorphous film during low-temperature coating and differences in the linear expansion coefficient of the synthetic resin and the anti-reflection film; ■ Bonding strength between atoms in the amorphous film during low-temperature coating. There is a factor that results in low-density film growth due to a decrease in .

Due to the above-mentioned factors, each of the above-mentioned conventional technologies had problems such as poor adhesion between the synthetic resin optical component and the coating film coated on its surface, resulting in microcracks etc. occurring during environmental resistance tests. be.

Purpose of the Invention The present invention has been made in view of the above-mentioned prior art, and is a method of coating the surface of a synthetic resin optical component with an anti-reflection film or the like while maintaining molding shape accuracy and with high adhesion. An object of the present invention is to provide a coating method for a synthetic resin optical component that is moisturized.

Summary of the invention The present invention cleans the surface of optical components made of synthetic resin.

The above object of the present invention is achieved by providing a coating method in which, after pretreatment, a coating is formed as a first layer, and then a coating of 5iO1 (x is 1 or more) is formed as an antireflection coating. This is what I am trying to do.

Embodiments Hereinafter, embodiments of the present invention will be described in detail using drawings as necessary.

Figure @1 shows a flowchart of the steps of the coating method according to the present invention, and the following description will be made according to this process diagram.

1st step First, the surface of the synthetic resin optical component 1 is subjected to a first cleaning 2.

As shown in FIG. 2, this first cleaning 2 first removes oils and fats that have adhered to the surface of the synthetic resin optical component 1.

Remove dust, moisture, etc. using ultrasonic cleaning 3 containing alkaline or neutral detergent. Next, the product is thoroughly washed 4 with overflow ultrasonic washing using tap water (city water) or the like containing an alkali or neutral detergent. Then, cleaning 5 with a solvent such as isopropyl alcohol or ethanol is performed to drain water.

This solvent may deteriorate the synthetic resin surface by solvent shock, that is, melting the surface or causing cracks to occur, depending on the persimmon type of synthetic resin, so the temperature is below 15°C.

The immersion time is about 1 minute. Next, remove the solvent such as inopropyl alcohol or ethyl alcohol. Note that, as long as the handling conditions for the solvent can be maintained for a short period of time, this immersion treatment may be replaced by solvent cleaning in addition to ultrasonic cleaning.

Next, a first Freon cleaning 6 is performed to remove solvents such as isopropyl alcohol, and at the same time, a second Freon cleaning 7 is performed to completely remove solvents such as isopropyl alcohol. Be careful not to bring it into the Freon steam cleaning at 50°C. In addition, 1.
In the second Freon cleaning 6.7, immersion treatment is performed, but in the first Freon cleaning 6, it is necessary to remove solvents such as isopropyl alcohol in a short period of time without destroying the Freon cleaning effect. For example, Freon cleaning including ultrasonic cleaning may be used.

1st. When the second Freon cleaning 6.7 is completed, Freon steam cleaning 8 is performed, and the synthetic resin optical component 1 is wiped off to complete the cleaning 9.

In addition, regarding the part indicated by 2a in Figure 2, (1
) Ultrasonic cleaning containing surfactant + Freon.

(2) (Ultrasonic cleaning with surfactant + Freon) →
(9-Freon immersion in ethanol or ultrasonic cleaning) Replacement may also be performed, and is an effective cleaning method, especially to avoid water as much as possible.

Second step: When the first cleaning 2 is completed, the cleaned synthetic resin optical component 1 is placed in a dryer and dried at 60°C to 70°C for 3 to 5 HR5.
Heat annealing treatment 10 is performed. This causes solvent shock on the surface of the synthetic resin optical component 1.

Surface distortion that is likely to occur as a result of molding or the like can be removed. In slow cooling, natural cooling is performed to prevent the formation of heat sinks.

Third Step After the annealing treatment 10 is completed, a second cleaning 11 is performed as shown in FIGS. 1 and 3. This second cleaning 11 is to remove dust (m machine objects) that may adhere in the dryer, and the first Freon cleaning 12 performs ultrasonic cleaning containing Freon, and the second Freon immersion cleaning is performed in Freon cleaning 13, followed by Freon steam cleaning 14 and cleaning completion 15.

If the inside of the dryer is clean, this step is not necessary.

Each of the above steps is a coating pretreatment step, and when the above pretreatment step is completed, coating processing is performed according to the coating processing step shown at 16 in FIG. 1.

Fourth Step In this step, the surface of the synthetic resin optical component 1 is modified, and this step will be explained using the flowchart section 17 in FIG. 1 and the coating device 18 shown in FIG. 4.

In this step, the inside of the vacuum evaporation chamber 19 is 1 to 2×10 −
' A high vacuum evacuation process section 20 that evacuates to a high vacuum of Torr or more, and a gas inlet 21 that pumps O2 etc.
Synthesis is performed by a process section 22 that introduces a reactive gas such as O2 introduced at 10-4 Torr, an RF or AC plasma generation process section 24 that generates plasma by applying a high frequency wave to the ion bombardment electrode 23, and a press spatter using plasma. It consists of a plasma-based press battering process section 25 that physically strikes the surface of a resin optical component (object to be coated) to remove attached moisture and perform surface modification treatment.

Figure 5 shows the injection molded acrylic resin surface. A graph diagram of spectral reflectance characteristics after ion bombardment with ions is shown. Graph 26 shown by a dashed line in the figure is for 5 minutes of ion bombardment, and graph 27 shown by a long broken line is for 3 minutes.
Graph 28 shown by a solid line shows the measurement results without ion bombardment. In the figure, the horizontal axis indicates wavelength (nm), and the vertical axis indicates spectral reflectance (regret).

5th step In this step, S is added as the first layer to the synthetic resin optical component 1 base material.
The coating is performed by vacuum evaporation of the L film, and this process will be explained using the flowchart section 29 in FIG. 1 and the coating tvt 1o shown in FIG.

This process consists of a process section 30 that stops the plasma after ion bombarding the surface of the synthetic resin optical component in the vacuum evaporation chamber 19 shown in Figure 4 (C), and a process section 30 that stops the plasma, and a reaction of O7, etc. while leaving the introduced gas, O1, etc., as it is. A process section 31 for introducing a reactive gas, and an electron gun hearth 3 using an electron gun 32 in the atmosphere.
The process part 34 melts Si put into a carbon liner set at 3 and performs reactive vapor deposition. The thickness of the Si vapor-deposited film is 5 to 30 nm in terms of mechanical thickness.

The atmosphere and conditions when depositing Si are related to the surface shape accuracy maintenance characteristics of the synthetic resin optical component due to heat in vacuum. In other words, the thermal temperature (the surface temperature of synthetic resin optical parts and influences the Si film) is a condition that assists Si film growth, and this affects the adhesion of the Si film to the surface of synthetic resin optical parts and the toughness of the Si film. , Si
It acts to improve properties such as the hardness of the film, the hardness of the Si film, and the abrasion resistance of the Si film.

However, depending on the type of optical component made of synthetic resin, it may not be possible to heat the dome heater 35, so it is necessary to pour the liquid when setting the temperature with the dome heater 35. That is, when setting the temperature in the heating dome heater 35, it is necessary to fully consider the heat received during the formation of the Si film (including radiant heat) and the heat received during the coating of the anti-reflection film. This is because the surface of the synthetic resin optical component is subjected to stress deformation due to thermal deformation of the optical component and stress (compressive or tensile stress) generated in the Si transfer film upon receiving heat. Therefore, even if heating is performed, it may be heated at any temperature as long as the enclosure does not cause stress deformation, and the crack resistance in heat cycle tests due to heating can be improved.

In this example, the set temperature was set to 30°C, and the heating was performed until the formation of the St film, and then the heating was stopped and the 02
S is an adhesive film (adhesive layer) formed by reactive vapor deposition in an atmosphere.
i-coating has been completed.

Then, the process proceeds to the step of coating an antireflection film on this coating 51 using any coating means.

6th Step This step is a coating treatment step 3B in which a functional optical film (antireflection film, reflection enhancing film) shown at the bottom of FIG. 1 is coated on the Sl film formed in the 5th step. It is coated.

As shown in FIG. 6, the functional optical film (antireflection coating) is coated on the Si film 37, which is an adhesive layer, and this functional optical film 38 consists of three layers of coating films. It is composed of 39, 40, and 41K. Note that 42 indicates ion bombardment (RF
, CD or AC).

Next, a method for forming the three layers of coating films 39, 40, and 41 will be explained. A vacuum deposition chamber 1 is placed on the surface of a synthetic resin optical component (injection molded acrylic resin) 1.
After forming the St coating in the same vacuum, it was coated with the St coating again in the same vacuum. Gas pressure 8X to-s~3X 1O-4To
rr high frequency plasma is generated via the RF electrode 23.

Next, the optical thin film material Si044, which is the evaporation source installed in the resistance heating source 43, is evaporated, and the gas pressure of the sealed O2 is 8.
Mechanical film thickness 45 nm at X 10-' to 3 X 10-' Torr, evaporation rate 0.2 to 0.5 nm for 7 seconds
, a first layer coating 39 having a refractive index of 1.476 is formed.

Next, the optical thin film material 46 is connected to the resistance heating source 45 as an evaporation source.
The degree of vacuum is 1~2X by vacuum evaporation without gas filling.
A second layer coating 40 having a mechanical thickness of 40 nm and a refractive index of 1.98 is formed at a pressure of 10-' Torr or higher and a deposition rate of 2 to 3 nm/sec.

Finally K, as the final layer, 0 again. Gas pressure of 8X10”～
A high frequency plasma of 3 x 10-' Torr is generated at the RF electrode 23, and the optical thin film material SiO44, which is an evaporation source set in the resistance heating source 43, is evaporated,
Mechanical film thickness 160 nm at a deposition rate of 2-3 nm/s
.

A third layer coating 41 having a refractive index of 1.98 is formed.

Functional optical films with the above three-layer film structure (e.g. anti-reflection!1)
All coating processing is completed by coating the Si film 37 with the thickness 38.After coating is completed, slow cooling is performed for 10 to 20 minutes, and after air leakage, the coated synthetic resin optical parts are removed. Put it out.

FIG. 7 shows the spectral reflectance characteristics of the functional optical film (for example, antireflection film) 38 having the three-layer structure shown in FIG. In the figure, a graph 47 shown by a solid line shows the spectral reflectance in this example, where the horizontal shelf is the wavelength (nm) and the vertical axis is the spectral reflectance (ch).

As is clear from the graph, the wavelength λ = 780-820n
It can be seen that in the region of m, the spectral reflectance (chi) is 0.5 coefficient or less.

In addition, in Fig. 4, 48 indicates the vacuum exhaust port, 4g.
The dome is indicated by .

In addition, the results of a durability test of the synthetic resin optical parts coated by this method and those of the conventional coating are shown in the table below.

In the margin below, the composition of the conventional coating film used for comparison is:
This is mJ shown in FIG. That is, in the figure, SO indicates a SiO coating formed on the surface of the synthetic resin optical component 1 in RF plasma, 51 indicates an SIO coating formed by vacuum evaporation without gas inclusion, and 52 indicates an SIO coating formed by vacuum evaporation without gas inclusion. Shown are O and R
This is a SiO film formed in F Plas i.

In the table, the O mark in the heat cycle test (5 cycles) and the high temperature, high humidity test indicates no cracks, and the X mark indicates the occurrence of cracks. Further, in the adhesion test (K), an O mark indicates no peeling, a Δ mark indicates partial peeling, and an X mark indicates complete peeling.

From the above comparison table, the effects of this example are as follows.

(1) The film coated on the surface of a synthetic resin optical component by this method shows no cracks even in environmental tests (heat cycle, high temperature, high humidity test) and has good crack resistance.

(2) The coating film on the surface of a synthetic resin optical component obtained by this method has extremely good adhesion to the synthetic resin optical component substrate as compared to the coating film of the prior art.

(3) The coating film (antireflection film) on the surface of a synthetic resin optical component obtained by this method has optical properties such that the spectral reflectance is 0.5 cm or less at wavelength λ: 78o to 820 nm, and It is also possible to maintain the precision of the molded shape of the optical component.

In the above embodiment, as shown in FIG. 6, the coating film 40 of the three coating films 39, 40, and 41 was deposited at a deposition rate of 2 to 3 nm/sec to form a film with a refractive index of 1.98. Although a film was formed on
If it is formed on a film with a refractive index of 1.85 at m/sec, the wavelength λ=780 to 820 as shown by the dashed line graph 4g in FIG.
The spectral reflectance in nm can be set to approximately 0.5, and the maximum spectral reflectance at 0.5% or less can be obtained.

The conditions for forming the other coating films 39 and 41 are the same as those in the previous embodiment.

Effects of the Invention As described above, according to the present invention, a functional optical film having good adhesion and crack resistance against environmental tests can be formed on the surface of a synthetic resin optical component. It is something that can be done.

[Brief explanation of drawings]

Figure 1 is a process diagram of the method according to the present invention, Figures 2 and 3 are
The figure is a detailed process diagram of the main parts of Figure 1, Figure 4 is a cross-sectional explanatory diagram of the equipment that coats the surface of synthetic resin optical parts, and Figure 5 is ion bombardment of the surface of synthetic resin optical parts with O and ions. Graph showing spectral reflectance after processing, No. 6
The figure is a cross-sectional view of a coating film coated using the method according to the present invention, FIG. 7 is a graph showing the spectral reflectance of the coating film of FIG. 6, and FIG. 8 is a cross-sectional view of a coating film according to the prior art. . 1... Synthetic resin optical component 2.11... Cleaning process 10... Annealing process type 17... Pre-treatment process section 29... Si here -Ting process 3B...
...Functional Optical Film Coating Process Department Figure 5 Wavelength Figure 7 Wavelength Amendment to Procedures (Voluntary) September 5, 1985 Mr. Michibe Uga, Commissioner of the Patent Office -
1. Indication of s Patent Application No. 7865 of 1985 2. Name of the invention Coating method for synthetic resin optical parts 3. Relationship to the case of the person making the amendment Patent applicant address 2-chome Hatagaya, Shibuya-ku, Tokyo 43rd number 29th name
(037) Representative of Olympus Optical Industry Co., Ltd.
Toshibe Shimoyama 4, Agent 6, Subject of amendment (1) "Claims J" column and "Detailed description of the invention" column ■Drawing 7, Contents of amendment (1) Description The statement in the "Claims" column is amended as shown in the attached sheet. ■ The 8th line of page 7 of the specification is amended as follows. Coat rZr02 with 1On+s#gin and go to nd=8/'' (3) ``2'' described on page 19, line 10 of the specification.
~3nta/sec" is corrected to rQ, 2~0.5 nm7sec". (4) “Refractive index 1” stated on page 19, line 10 of the specification
．． 98J is corrected to have a refractive index of 1.4781. (5) The ``wavy line graph 49'' described on page 23, line 15 of the specification is corrected to ``dashed line graph 53''. ((f) Correct Figure 7 in the drawings as shown in the attached sheet. 8. List of attached documents (1) 1 attached sheet (force correction drawing, 1 attached sheet 2, Claims (1) Synthetic resin optics After cleaning and heat annealing the component surface, pre-coating treatment is performed by ion bombardment in a vacuum, and then a Si film is formed as the first layer on the synthetic resin optical component base material in the same vacuum. 2
A method for coating a synthetic resin optical component, which comprises subsequently forming a 5iOx (X is 1 or more) film as a functional optical film. ■ The synthetic resin optical parts are made of polymethyl methacrylate (PMMA), diethylene glycol bisallyl carbonate (CR-39), polycarbonate (PMMA),
C), polysulfone (PSF), polystyrene (PS
). The method for coating an optical component made of synthetic resin according to claim 1, which is a molded article of styrene-acrylonitrile copolymer resin (As) or styrene-acrylonitrile-butadiene copolymer resin (ABS). (3) The ion bombardment of the coating pretreatment is
3. A method of coating a synthetic resin optical component according to claim 1 or 2, wherein the coating method is carried out by press-sputtering the surface in RF, DC or AC plasma in which an active or inert gas is introduced into a vacuum. (4) The step of forming the Si film as a first layer on the surface of the synthetic resin optical component is a reactive process including introducing an active gas such as 02 and heating and warming the synthetic resin optical component. Claim 1, which is a process of forming by vapor deposition
A method for coating a synthetic resin optical component according to item 1, 2 or 3. (5) Claims 1 and 2, wherein the functional optical film is an antireflection film or a reflection enhancing film. A method for coating a synthetic resin optical component according to item 3 or 4. (Shun) As the anti-reflection film, the first layer is SiO by 02 reactive ion plating, the second layer is SiO by vacuum evaporation without gas inclusion, and the third layer is SiO by 02 reactive ion plating. A method for coating a synthetic resin optical component according to claim 1, 2, 3, 4, or 5, wherein a second cleaning is performed after the heat annealing treatment. A method for coating a synthetic resin optical component according to claim 1. (8) The synthetic resin optical component is cleaned by washing with an alkaline or neutral detergent, followed by water washing, and then with isopropyl alcohol. A method for coating a synthetic resin optical component according to claim 1, which comprises cleaning, and further Freon cleaning and Freon steam cleaning. (2) The second cleaning is performed by ultrasonic cleaning containing Freon, and then by Freon immersion. A method for coating a synthetic resin optical component according to claim 7, wherein cleaning is performed and then freon vapor cleaning is performed. (10) In the ion bombardment treatment before coating, the inside of the vacuum evaporation chamber is -5
A high-vacuum evacuation process section that evacuates to a pressure of 1 Torr or more, and a reaction gas introduction process section that introduces a gas such as 02 at a pressure of 8×10-5 to 3×10-'Torr. A patent claim consisting of an RF, DC, or AC plasma generation process section that generates plasma by applying high frequency to an ion bombardment electrode, and a press battering process section that performs surface modification treatment on synthetic resin optical parts using press sputtering using plasma. A method for coating a synthetic resin optical component according to item 1 or 3. (11) Apply the Si film to the surface of the synthetic resin optical component.
The process of forming a single layer consists of a step in which the plasma is stopped after ion bombardment, and a step in which the Si placed in the carbon liner set in the electron gun hearth is melted using an electron gun in that atmosphere while leaving the 02 gas filled in as is. 5. A method of coating a synthetic resin optical component according to claim 1 or claim 4, which comprises a process section for performing reactive vapor deposition. (12) The first layer of the three layers of anti-reflection coatings has a sealed 02 gas pressure of 8XIO-' to 3XIO'''4Tarr.
, evaporation rate 0.2-0.5 ns/s 9 mechanical film thickness 4
5 +s, refractive index 1.478, and the second layer film was formed at a vacuum level LX of 10-5 to 2 ! I■
, is formed to have a refractive index of 1.88, and the third layer film is filled with 02
Gas pressure axio-5~3XIO-'Torr, deposition rate 0.2~0.5 ns/sec9 Mechanical film thickness 1B0 nm,
A method of coating a synthetic resin optical component according to claim 1 or 6, wherein the optical component is formed to have a refractive index of 1.478. (13) The second layer film has a vacuum degree of lXl0-5 to 2×1
13. The method of coating a synthetic resin optical component according to claim 12, wherein the coating is performed at a deposition rate of 1 to 2 nm at a deposition rate of 1 to 2 nm/2 layers, a thickness of 40 nm, and a refractive index of 1.85.

Claims (13)

[Claims] (1) After cleaning and heating annealing the surface of the synthetic resin optical component, pre-coating treatment is performed by ion bombardment in a vacuum, and after that, a Si coating is applied to the synthetic resin optical component base material in the same vacuum. A film is formed as the first layer, and then SiO_x (x is 1 or more) as a functional optical film.
A method for coating optical parts made of synthetic resin, characterized by forming a film. (2) The synthetic resin optical parts are made of polymethyl methacrylate (PMMA), diethylene glycol pisallyl carbonate (CR-39), polycarbonate (PC
), polysulfone (PSF), polystyrene (PS)
The method for coating a synthetic resin optical component according to claim 1, which is a molded article of styrene-acrylonitrile copolymer resin (AS) or styrene-acrylonitrile-butadiene copolymer resin (ABS). (3) The ion bombardment of the coating pretreatment is
Claim 1 is a method of coating a synthetic resin optical component according to claim 2, wherein the coating method is carried out by pre-sputtering the surface in RF, DC or AC plasma in which an active or inert gas is introduced into a vacuum. (4) The step of forming the Si film as a first layer on the surface of the synthetic resin optical component is a reactive process including conditions of introducing an active gas such as O_2 and heating and warming the synthetic resin optical component. Claim 1, which is a process of forming by vapor deposition
A method for coating a synthetic resin optical component according to item 1, 2 or 3. (5) The method for coating a synthetic resin optical component according to claim 1, 2, 3, or 4, wherein the functional optical film is an antireflection film or a reflection enhancing film. (6) As the anti-reflection film, SiO is added to the first layer with O_2
Reactive ion plating, vacuum evaporation of SiO without gas inclusion in the second layer, O_2 reactive ion plating of SiO in the third layer to form a three-layer coating.Claims 1 and 2, The method for coating a synthetic resin optical component according to item 3, 4, or 5. (7) The method of coating a synthetic resin optical component according to claim 1, wherein a second cleaning is performed after the heat annealing treatment. (8) The cleaning of the synthetic resin optical parts is performed by cleaning with an alkaline or neutral detergent, then with water, then with isopropyl alcohol, and then with Freon cleaning and Freon steam cleaning. Coating method for synthetic resin optical parts described in Section 1. (9) The method for coating a synthetic resin optical component according to claim 7, wherein the second cleaning is performed by ultrasonic cleaning containing Freon, followed by Freon immersion cleaning, and then Freon steam cleaning. . (10) In the ion bombardment process before coating, the inside of the vacuum deposition chamber is heated to 1 to 2 x 10^-^5 Torr.
High frequency is applied to the high vacuum evacuation process section that evacuates to more than r, the reaction gas introduction process section that introduces gas such as O_2 at 8 x 10^-^5 to 3 x 10^-^4 Torr, and the ion bombardment electrode. RF, DC or A to generate plasma
A synthetic resin optical component according to claim 1 or 3, comprising a C plasma generation process section and a pre-sputtering process section for performing surface modification treatment on the synthetic resin optical component by pre-sputtering using plasma. Coating method. (11) The step of forming the Si film as the first layer on the surface of the synthetic resin optical component consists of a process section in which the plasma is stopped after ion bombardment, and an electron gun in the atmosphere with the gas such as O_2 kept as it is. A method for coating a synthetic resin optical component according to claim 1 or 4, comprising a step of melting Si placed in a carbon liner set in an electron gun hearth and performing reactive vapor deposition. (12) The first layer of the three layers of anti-reflection coatings has a sealed O_2 gas pressure of 8 x 10^-^5 to 3 x 10^-^4T.
orr, an evaporation rate of 0.2 to 0.5 nm/sec, a mechanical film thickness of 45 nm, and a refractive index of 1.476; Vapor deposition rate 2-3 nm/sec, mechanical film thickness 40 nm, refractive index 1.98
The third layer film was formed at a sealed O_2 gas pressure of 8×10
^-^5~3x10^-^4Torr, deposition rate 2-3
7. The method of coating a synthetic resin optical component according to claim 1 or 6, wherein the coating method is performed to form a synthetic resin optical component with a refractive index of 1.98 nm/sec, a mechanical film thickness of 160 nm, and a refractive index of 1.98. (13) The second layer film has a degree of vacuum of 1 to 2 x 10^-^5
Torr or more, deposition rate 1-2 nm/sec, mechanical film thickness 4
13. The method of coating a synthetic resin optical component according to claim 12, wherein the coating is formed to have a thickness of 0 nm and a refractive index of 1.85.