201118050 六、發明說明： 【發明所屬之技術領域】 本發明係關於-種抗反射膜之破璃基板高溫表面預 處理方法，特別是關於一種於鍍膜前進行高溫表面改質之 一種抗反射膜之玻璃基板高溫表面預處理方法。 【先前技術】 抗反射膜（Anti-reflection film, AR)或抗炫膜（Antiglare film, AG) 的應用 相當廣 泛’從 精密的 光學儀 器到曰 常的光學產品，例如數位相機鏡頭、鏡片、電腦護目鏡及 觸控面板與各種顯示器等光學元件。另外還有CuInSe2薄 膜太1%畦/也、A?、明及震飾用之冷光燈、醫療照明、低損耗 雷射鏡及拋物面鏡遮板等皆須利用抗反射膜，來降低光線 的反射。以顯示益面板為例，一般而言，外界的光線並無 法全部進入顯示器，例如液晶顯示器（LCD)會有4%左右 的反射’減少面板的反射，除了可提高肉眼觀看的品質外 ，更能夠提高顯示器的色彩鮮明度及減少視覺死角。因此 ，目前業界不論是使用CRT、LCD或是PDP等顯示器的 各種資訊通訊產品及電視，皆會運用抗反射膜來降低反射 的情況。 習用之抗反射犋之玻璃基板表面預處理方法包含一 電聚表面處理步驟及—錄膜步驟。 習用之抗反射瞑之破璃基板表面預處理方法中之電 漿表面處理步驟’係在鍍膜前利用電漿表面處理技術進行 一基板的表面改質。電漿源係以射頻電漿、微波電漿及離 201118050 子束A擊為主。这些電裝源需在直 -般壓力為，使放^ :錢環境下操作( ，藉此降低電漿㈣間的碰撞機率，=於]_伏特(v) 高動能入射至該基板表面，進行&子能攜帶較 理步驟主要利用電漿進行該基板表面改電漿表面處 成化學活性種及紫外線效應貝电漿反應會造 面產生自域(freei.adiea】)7 4線會使該基板表 習用之抗反射叙麵基板表面 膜步驟，可採用物理蒸氣 方法中之鍍 η ·. '、’ 積法（Physical Vapor ，P。咖n，綱、化學氣相沈積法(chem腦口201118050 VI. Description of the Invention: [Technical Field] The present invention relates to a high temperature surface pretreatment method for a glass substrate of an antireflection film, and more particularly to an antireflection film for high temperature surface modification prior to coating High temperature surface pretreatment method for glass substrates. [Prior Art] Anti-reflection film (AR) or Antiglare film (AG) is widely used from precision optical instruments to optical products such as digital camera lenses, lenses, and computers. Optical components such as goggles and touch panels and various displays. In addition, CuInSe2 film is too 1% 畦 / also, A?, cold light for bright and shock decoration, medical lighting, low-loss laser mirror and parabolic mirror shield, etc. must use anti-reflection film to reduce light reflection . Taking the display panel as an example, in general, the outside light cannot enter the display. For example, a liquid crystal display (LCD) has a reflection of about 4% 'reducing the reflection of the panel, in addition to improving the quality of the naked eye, Improve the color sharpness of the display and reduce the visual dead angle. Therefore, in the industry, whether it is a variety of information communication products and televisions using displays such as CRT, LCD or PDP, anti-reflection films are used to reduce reflection. The conventional anti-reflective ruthenium glass substrate surface pretreatment method comprises an electropolymerization surface treatment step and a film recording step. The surface treatment step of the conventional anti-reflective ruthenium substrate surface pretreatment method is to perform surface modification of a substrate by plasma surface treatment before coating. The plasma source is based on RF plasma, microwave plasma and A shot from 201118050. These electric power sources need to be operated under direct pressure, so that they can operate under the environment of money: (in order to reduce the collision probability between the plasmas (4), = _ volts (v) high kinetic energy is incident on the surface of the substrate, & can carry the rational steps mainly by using plasma to change the surface of the substrate into a chemically active species on the surface of the plasma and the ultraviolet effect of the shell plasma reaction will produce a self-domain (freei.adiea) 7 4 lines will make The surface film step of the anti-reflective surface substrate used in the substrate table can be plated by physical vapor method η ·. ', 'product method (Physical Vapor, P. coffee n, class, chemical vapor deposition method (chem brain mouth)
DeP〇Slti〇n，⑽)或溶膠凝膠法等。物理蒸氣沈積法為先 將舰材料由固體變成氣態，然後.再沈積於該基板上。化 學氣相沈積法’將氣態鍍膜村料經由化學反應轉變為固態 沈積於該基板上。而溶膠凝曝法則先將麵材料做成勝水 狀，再利用浸泡塗佈方式形成於該基板上。 然而’習用之抗反射膜之玻璃基板表面預處理方法 係利用電f表面處理步驟進彳亍該基板表面改f，電漿設備 價格昂貴且需在真空下進行，造賴造成本無法降低。再 者’高動能電漿粒子隨機入射至該基板表面容易引起該基 板表面受到不均勻的轟擊，易使該基板表面受到不當破 壞’影響鍍膜與該基板間的附著能力。不論採用何種鍍膜 步驟，鍍膜前該基板的表面處理步驟係影響後續鍍膜品質 的關鍵。錢膜前該基板的表面處理步驟係用以提升鍍膜與 该基板間的附著能力。藉由鍍膜前該基板的表面處理步 驟，能夠提升光學元件的顯示品質如輝度與對比度等。唯： 201118050 有透過表面處理步騾，製品的特性及價值才能更充份的發 揮出來。然而，習用電漿表面處理技術，價格昂貴，使鍍 膜製造成本無法降低。 【發明内容】 本發明目的乃改良上述缺點’以提供一種抗反射膜 之玻璃基板高溫表面預處理方法，用以達到增加鍍膜附著 能力者。 本發明次一目的係提供〆種抗反射膜之玻璃基板高 溫表面預處理方法，可降低製造成本者。 根據本發明的抗反射膜i玻璃基板高溫表面預處理 方法’其步驟包含··一預熱表面處理步驟，係將一基板進 行加熱，使該基板表面進行改質；一鍍膜步驟，於該基板 上形成一抗反射膜。 【實施方式】 為讓本發明之上述及其他目的、特徵及優點能更明 顯易懂，下文特舉本發明之較佳實施例，並配合所附圖 式’作禅細說明如下： 。月麥妝第1圖所示，本發明較佳實施例之抗反射膜 之玻璃基板高溫表面預處理方法，係包含—預熱表面處理 步驟S1及一鍍膜步驟S2 ,以製備一鍍膜基板。 5月再麥照第1圖所示’該預熱表面處理步驟S1係將 基板進行加熱，使該基板受熱數小時，藉由均勻預熱處 理使°亥基板表面進行改質。利用該預熱表面處理步驟 S1改變該基板表面之物理或化學性質，使該基板表面形 201118050 熱元二 ’提升後續鍍膜的附著能力。加 度較佳控制於V至二=盤等。其中，加熱溫 間較佳為0.5小時至〇=間’更佳為鐵。加熱時 理步驟幻係於心^切。此外，由於該預熱表面處 溫基板，較佳為—需:擇為-耐高DeP〇Slti〇n, (10)) or a sol-gel method or the like. The physical vapor deposition method first converts the ship material from a solid to a gaseous state and then deposits it on the substrate. The chemical vapor deposition method converts the gaseous coating material into a solid state on the substrate by a chemical reaction. In the sol condensation method, the surface material is first made into a water-like shape, and then formed on the substrate by a dip coating method. However, the conventional glass substrate surface pretreatment method of the anti-reflection film utilizes an electric f surface treatment step to change the surface of the substrate. The plasma device is expensive and needs to be carried out under vacuum, so that the damage cannot be reduced. Furthermore, the random incidence of high kinetic plasma particles onto the surface of the substrate tends to cause uneven bombardment of the surface of the substrate, which may cause the substrate surface to be improperly damaged, thereby affecting the adhesion between the coating and the substrate. Regardless of the coating step, the surface treatment step of the substrate before coating is the key to the subsequent coating quality. The surface treatment step of the substrate before the money film is used to improve the adhesion between the coating and the substrate. By the surface treatment step of the substrate before coating, the display quality of the optical element such as luminance and contrast can be improved. Only: 201118050 Through the surface treatment steps, the characteristics and value of the products can be fully utilized. However, the conventional plasma surface treatment technology is expensive, so that the manufacturing cost of the coating cannot be lowered. SUMMARY OF THE INVENTION An object of the present invention is to improve the above disadvantages to provide a high temperature surface pretreatment method for a glass substrate of an antireflection film for achieving an increase in coating adhesion. A second object of the present invention is to provide a high temperature surface pretreatment method for a glass substrate of an antireflection film, which can reduce the manufacturing cost. The method for pretreating the high temperature surface of the antireflection film i of the glass substrate according to the present invention comprises the steps of: preheating a surface treatment step of heating a substrate to modify the surface of the substrate; and a coating step on the substrate An anti-reflection film is formed thereon. The above and other objects, features, and advantages of the present invention will become more apparent from the description of the appended claims. In the first embodiment of the present invention, a high temperature surface pretreatment method for a glass substrate of an antireflection film according to a preferred embodiment of the present invention comprises a preheating surface treatment step S1 and a coating step S2 to prepare a coated substrate. In May, the photo-heating surface treatment step S1 heats the substrate, and the substrate is heated for several hours, and the surface of the substrate is modified by uniform preheating treatment. The preheating surface treatment step S1 is used to change the physical or chemical properties of the surface of the substrate so that the surface of the substrate is shaped to enhance the adhesion of the subsequent coating. The degree of addition is preferably controlled from V to two = disk or the like. Among them, the heating temperature is preferably from 0.5 hours to 〇 = between, and more preferably iron. The heating process is magical on the heart. In addition, since the preheating surface is at a temperature of the substrate, it is preferred that:
板表面進彳憤質，熱元件即可使該基 面預處理方法可降明之抗反射膜之破璃基板高溫表 理，倍 务低衣造成本。再者，藉由均勻預熱處 破壞的^技面均勻受熱，因此可降低該基板受到不當 此外’進行該預熱表面處理步驟s]後，較佳另將該 土反4 口p至至溫後，再進行該鍍膜步驟。 =再I照第1圖所示，該鍍膜步驟S2，係、在經過表 =文貝的。玄基板上形成一抗反射膜或一抗炫膜。該鍍膜步 驟S2係於該預熱表面處理步驟S1完成後進行。 本發明之该鍍膜步驟S2不限定為何種鍍膜技術，一 般鑛膜技㈣可。其巾，—般賴賊主要可分為氣體成 膜技術或液體成膜技術兩種。 氣體成膜技術包含(a)物理蒸氣沈積法(PVD)及(b)化 學氣相沈積法(CVD)。物理蒸氣沈積法包含⑴熱蒸發蒸鍍 法（Theimal Evaporation Deposition) ; (Π)電漿滅鍍法 (Plasma Sputtering Deposition)及（iii)離子束濺鍍法（ι〇η Beam Sputtering Deposition，IBSD)。其中，物理蒸氣沈積 法係為先將薄膜材料由固體變成氣態，使薄膜的氣態原[ 201118050 子、分子或離子穿過真空抵達該基板表面，然後將薄膜材 料沈積在該基板上漸漸形成薄膜。化學氣相沈積法係利用 膜材料之氣體化合物在高溫經由化學反應生成膜之固體物 質而沈積在該基板上的一種長膜方法。 液體成膜技術係利用浸泡鍍膜技術，主要包含：（a) 酸蝕法，將一矽酸鹽類玻璃基板在酸類稀溶液中浸蝕，在 該玻璃基板表面上生成不穩定的矽酸(HjiO3),加熱後脫 水形成一 Si〇2薄膜，然後烘烤，使該玻璃基板表面生成 一氧化石夕。（b)溶膠凝膠·法，將金屬之有機溶液做成膠水 狀，利用浸泡拉起法或塗佈旋轉離心法把溶膠塗佈在該基 板上，經加熱(一般用紫外光UV照射）而成一透明薄膜， 例如形成 Al2〇3、Zr02 ' Hf02、Y2〇3、In2〇3、Sn〇2、The surface of the board is irritated, and the thermal element can make the surface pretreatment method reduce the high temperature of the anti-reflective film of the anti-reflection film, and the low-cost clothing is caused by the low-cost coating. Furthermore, the technical surface destroyed by the uniform preheating is uniformly heated, so that the substrate can be reduced improperly. In addition, after the preheating surface treatment step s], the soil is preferably inverted to the temperature. Thereafter, the coating step is performed. = I, as shown in Fig. 1, the coating step S2, after passing through the table = Wenbei. An anti-reflection film or an anti-foam film is formed on the substrate. This coating step S2 is performed after the completion of the preheating surface treatment step S1. The coating step S2 of the present invention is not limited to what kind of coating technology, and general mineral film technology (4) is acceptable. Its towel, the general thief can be divided into two kinds of gas film forming technology or liquid film forming technology. Gas film forming techniques include (a) physical vapor deposition (PVD) and (b) chemical vapor deposition (CVD). Physical vapor deposition methods include (1) Thermal Evaporation Deposition; (Plasma Sputtering Deposition) and (iii) Ion Beam Sputtering Deposition (IBSD). Among them, the physical vapor deposition method is to first change the film material from a solid to a gaseous state, so that the gaseous precursor of the film [201118050, molecules or ions pass through the vacuum to reach the surface of the substrate, and then the film material is deposited on the substrate to form a film. The chemical vapor deposition method is a long film method in which a gas compound of a film material is deposited on a substrate by a chemical reaction to form a solid substance of a film at a high temperature. The liquid film forming technology utilizes the immersion coating technology, which mainly comprises: (a) etching method, etching a monosilicate glass substrate in an acid dilute solution, and generating unstable tannic acid (HjiO3) on the surface of the glass substrate. After heating, it is dehydrated to form a Si〇2 film, which is then baked to form a oxidized stone on the surface of the glass substrate. (b) sol-gel method, the organic solution of the metal is made into a glue, and the sol is coated on the substrate by a soaking pull method or a coating spin centrifugation method, and heated (usually irradiated with ultraviolet light UV) Forming a transparent film, for example, forming Al2〇3, Zr02 'Hf02, Y2〇3, In2〇3, Sn〇2
Ta〇5 ' 〇0,或Fe2〇3等金屬氧化物薄膜。其中，溶膠凝膠 法具有製備成本低、可用於大面積或複雜曲面鍍膜、薄膜 厚度容易控制與薄膜純度高等優點。其可在玻璃、高分子 與金屬該基板表面任意鍍覆單成份或多成分氧化物膜、有 機膜或有機無機混細，因此，成為—種常被採用的錢膜 技術。 現行抗反射膜之玻璃基板高溫表面預處理方法中之 鐘=步驟S2仍是以昂貴的麵法為主流，若能以低成本 的浸泡鍍膜技術(dip-Coating)例如溶膠凝膠法來製作相關 抗反射膜，將能進一步降低製造成本。因此，本發明之該 鑛膜步驟S2較㈣制浸泡舰技術來製備抗反射膜。 詳細方法為，將該基板置人-賴材射，賴膜材料較 佳為膠水狀之有機溶液，使雜赌_著於該基板表面 201118050 ，將該基綠置於麵難射5分駐丨小時後取出， 光源照射形成一透明薄膜。本發明藉由該預 熱^步驟S1 ’使液態鑛膜材料在該基板表面之接 觸r小’減少錄膜在該基板表面之表面張力，因此在進 打該鍍^步驟S2時，可增加鑛膜與該基板間的附著能力 ’進而提升鍍膜品f。利用該賴表面處理步驟S1去除 該基板表輪質，並使絲板表㈣成—親水表面，使該 基^親水'H提升。尤其是，當該鍍膜步驟幻選擇為浸泡 鑛膜技術時，藉由本發明之該賴表面處理步驟si進行 土板表φ改貝’使液體在該基板表面之表面張力減小， 藉由減/錄板之水滴角，可進—步提升液體鍍膜與該基 板間的附著能力，使鍍膜品質提升。 匕外為了進一步移除该基板表面的雜質，本發明 之抗反射骐之玻璃基板高溫表面預處理方法於完成上^之 預熱表面處理步驟S1彳4，較佳係另對該基板進行超音波 =洗，接著再進行該鍍膜步驟S2，以使該基板的潔淨度 提升。其巾超音波清洗可進—步細分為脫脂、潤洗及切水 三個程序，分別於不同水槽中進行。脫脂目的為移除該基 ^表面油脂，脫脂處理槽溫度為55度’脫脂處理槽内包 含去離子水及鹼性脫脂劑，執行脫脂時間較佳為2至3分 在里接著潤洗該基板，將該基板於室溫去離子水槽中清洗 約2至3分鐘後取出。切水為將該基板於溫度為&度之 去離子水槽中清洗約2至3分鐘，然後再缓慢將該基板移 出至此元成超音波清洗。該基板較佳係另於9〇至 〇 C下進行乾燥’執行乾燥時間較佳為$分鐘，接著腾 201118050 δ亥基板冷卻至室溫。如此’可使該基板表面更乾淨。 請參照第2圖所示，為經由不同表面處理技術後之 該基板表面性質測試比較圖。測試改質後該基板表面特性 的方法為將液體滴於改質後之該基板上，利用水滴角量測 儀器測量水滴角（或稱接觸角）。水滴角係指於液體、固體 、氣體等表面之交接處，液面切線與固體面(例如該基板) 之夾角。本發明利甩水滴角量測儀器，量測液體在該基板 上的角度，其中水滴角度越大，表示液體與該基板間的附 著力愈差。將經由本發明之該預熱表面處理步驟S1處理 過之5亥基板與習用經由電漿表面處理之該基板進行比較。 第A組係為經由本發明之該預熱表面處理步驟處理過 之該基板。第B組、第c組及第D組分別為習用經由電 漿表面處理之該基板。於第A至D組該基板上分別滴一 滴液體，觀察水滴變化並做比較。其中，第B組之該基 板表面經由電漿處理時間為1〇秒、，測得之水滴角角度約 為10度，第C組之該基板表面經由電漿處理時間為2〇 秒，測得之水料肖度約為8度；第D組之該基板表面 經由錢處理時間為3〇秒，測得之水滴角角度約為6度 由第2 g可知II由本發日月之該預熱表面處理步驟μ 處理過之該基㈣A⑽水滴角小於5度。本發明（第h ^測得之水滴角角度tbf用經由電絲面處理之該基板( ^ B至^組）皆小’即使經由電漿表面處理30秒之水滴 箱if第考D、且)仍比本發明大。結果表示，經由本發明該 步驟所形成之親水表面，使在該基板表面之 表張力減小，進而可增加液體與該基板間的附著能 201118050 力本叙明係以一預熱表面處理步驟，來進行均勻該基板 表面的改質，使本發明進一步進行鍍膜步驟時，可降低鍍 膜與該基板間的接觸角，增加鍍膜與該基扳間的附著力。 。此外，本發明僅需簡單便宜的加熱元件即可達到比習用 電漿表面處理為佳的效果。因此，本發明可，以克服上述 因電漿表面處理步驟無法提升鍍膜與該基板間的附著能力 且設備成本昂貴之缺點。該預熱表面處理步驟應用於抗反A metal oxide film such as Ta〇5' 〇0, or Fe2〇3. Among them, the sol-gel method has the advantages of low preparation cost, can be used for coating of large-area or complex curved surfaces, easy control of film thickness, and high purity of the film. It can be arbitrarily plated with a single-component or multi-component oxide film, an organic film or an organic-inorganic alloy on the surface of glass, polymer and metal. Therefore, it is a commonly used money film technology. The current anti-reflective film glass substrate high-temperature surface pretreatment method clock = step S2 is still based on the expensive surface method, if it can be produced by low-cost dip-coating technology such as sol-gel method The anti-reflection film will further reduce the manufacturing cost. Therefore, the mineral film step S2 of the present invention produces an antireflection film in comparison with the (4) soaking ship technology. The detailed method is that the substrate is placed on the substrate, and the film material is preferably a glue-like organic solution, so that the gambling is on the surface of the substrate 201118050, and the base green is placed on the surface and is difficult to shoot for 5 minutes. After an hour, the light source is irradiated to form a transparent film. The invention reduces the surface tension of the recording film on the surface of the substrate by the preheating step S1 'the contact r of the liquid mineral film material on the surface of the substrate, so that the mineral can be increased when the plating step S2 is performed. The adhesion ability between the film and the substrate further enhances the coated product f. The surface of the substrate is removed by the surface treatment step S1, and the surface of the silk sheet is made into a hydrophilic surface to raise the hydrophilic 'H. In particular, when the coating step is magically selected as the soaking film technology, the surface of the substrate is reduced by the surface treatment step si of the present invention, so that the surface tension of the liquid on the surface of the substrate is reduced by The water drop angle of the recording board can further improve the adhesion between the liquid coating and the substrate, so as to improve the coating quality. In order to further remove impurities on the surface of the substrate, the high-temperature surface pretreatment method of the anti-reflective ruthenium glass substrate of the present invention is completed by the preheating surface treatment step S1 彳 4, preferably by ultrasonically superposing the substrate. = washing, and then the coating step S2 is performed to improve the cleanliness of the substrate. Ultrasonic cleaning of the towel can be subdivided into three procedures: degreasing, rinsing and water cutting, respectively, in different water tanks. The purpose of degreasing is to remove the surface grease, the temperature of the degreasing tank is 55 degrees. The degreasing tank contains deionized water and an alkaline degreaser, and the degreasing time is preferably 2 to 3 minutes. The substrate was washed in a room temperature deionized water bath for about 2 to 3 minutes and then taken out. The water is cut for about 2 to 3 minutes in the deionized water bath at a temperature of & degree, and then the substrate is slowly removed to the element for ultrasonic cleaning. Preferably, the substrate is dried at 9 Torr to 〇 C. The drying time is preferably carried out for $ minutes, and then the substrate is cooled to room temperature. This can make the surface of the substrate cleaner. Referring to Figure 2, a comparison chart of the surface properties of the substrate after different surface treatment techniques is shown. The surface property of the substrate after the modification is tested by dropping the liquid onto the modified substrate, and measuring the water drop angle (or contact angle) by using a water drop angle measuring instrument. The angle of water droplets refers to the intersection of a liquid tangential line and a solid surface (for example, the substrate) at the intersection of a liquid, a solid, a gas, or the like. According to the present invention, the water drop angle measuring instrument measures the angle of the liquid on the substrate, wherein the larger the water drop angle, the worse the adhesion between the liquid and the substrate. The substrate which was treated by the preheating surface treatment step S1 of the present invention was compared with the substrate which was conventionally treated by plasma surface treatment. Group A is the substrate treated by the preheating surface treatment step of the present invention. Groups B, C, and D are the substrates that have been conventionally treated by plasma. A drop of liquid was dropped on the substrate of Groups A to D to observe changes in water droplets and compare them. Wherein, the surface of the substrate of the group B is treated by a plasma treatment time of 1 sec., and the measured angle of the water droplet angle is about 10 degrees, and the surface of the substrate of the group C is measured by a plasma treatment time of 2 sec. The water material has a shake of about 8 degrees; the surface of the substrate of the group D is treated by a money processing time of 3 sec., and the measured angle of the water droplet is about 6 degrees. The second g is known to be II. The surface treatment step μ treated the base (4) A (10) water droplet angle is less than 5 degrees. According to the present invention, the water droplet angle tbf measured by the h^th is small by the substrate treated by the wire surface (^B to ^ group), even if the water droplet surface is treated by the plasma surface for 30 seconds, the first test D, and) Still larger than the present invention. The results show that the hydrophilic surface formed by the step of the present invention reduces the surface tension on the surface of the substrate, thereby increasing the adhesion between the liquid and the substrate. 201118050 The present invention is characterized by a preheating surface treatment step. In order to uniformly modify the surface of the substrate, when the coating step is further performed in the present invention, the contact angle between the plating film and the substrate can be lowered, and the adhesion between the plating film and the substrate can be increased. . In addition, the present invention requires only a simple and inexpensive heating element to achieve a better surface finish than conventional plasma. Therefore, the present invention can overcome the above disadvantages in that the surface treatment step of the plasma cannot improve the adhesion between the plating film and the substrate, and the equipment is expensive. The preheating surface treatment step is applied to the anti-reverse
射膜之玻碣基板高溫表面預處理方法可使鍍膜品質提升及 降低製造成本。 、 本發明之抗反射膜之玻璃基板高溫表面預處理方法 ，利用該預熱表面處理步驟S1均勻加熱該基板，避免該 基板表面因不均勻的轟擊而使該基板表面受到不當破壞，" 错由降低鍍膜在該基板上的表面張力，達到提升錢膜與該 基板間的附著能力及有效控制鍍膜品質之功效。 本發明之抗反射膜之玻璃基板高溫表面預處理方法 ’利用該雜表面處理步驟以加熱方式進行職板 表面改質’使用設備便宜，進而達到降低製造成本^ 雖然本發明已利用上述較佳實施觸示，秋其 用以岐本發明，任何㈣此技藝者在不脫離杯明 :和範圍之内’相對上述實關崎各種更動與修改^ ，發明所倾之髓㈣，因此顿明之健範 附之申請專利範圍所界定者為準。 見後 201118050 【圖式簡單說明】 第1圖：本發明抗反射膜之玻璃基板高溫表面預處理 方法之步驟流程圖。 第2圖：本發明校佳實施例與習用電漿表面處理水滴 角比較圖。 【主要元件符號說明】 (無）The high temperature surface pretreatment method of the glass substrate of the film can improve the quality of the coating and reduce the manufacturing cost. The method for pretreating a high temperature surface of a glass substrate of the antireflection film of the present invention, wherein the substrate is uniformly heated by the preheating surface treatment step S1 to prevent the surface of the substrate from being improperly damaged due to uneven bombardment, " By reducing the surface tension of the coating on the substrate, the adhesion between the money film and the substrate can be improved and the coating quality can be effectively controlled. The high-temperature surface pretreatment method for the glass substrate of the anti-reflection film of the present invention uses the hetero-surface treatment step to perform surface modification of the surface by heating. The use equipment is inexpensive, thereby reducing the manufacturing cost. Although the present invention has utilized the above-described preferred implementation. Touch, Qiu Qi used to smash the invention, any (four) this artist does not leave the cup Ming: and within the scope of 'relative to the above-mentioned real Guanqi various changes and modifications ^, the invention of the essence of the marrow (four), so the Ming Mingzhi The scope defined in the patent application is subject to change. See later 201118050 [Simplified description of the drawings] Fig. 1 is a flow chart showing the steps of the method for pretreating the high temperature surface of the glass substrate of the antireflection film of the present invention. Fig. 2 is a comparison of the water droplet angles of the preferred embodiment of the present invention and the conventional plasma surface treatment. [Main component symbol description] (none)