JPS61162737A - Checking method of performance for foreign matter inspection device - Google Patents

Checking method of performance for foreign matter inspection device

Info

Publication number
JPS61162737A
JPS61162737A JP383385A JP383385A JPS61162737A JP S61162737 A JPS61162737 A JP S61162737A JP 383385 A JP383385 A JP 383385A JP 383385 A JP383385 A JP 383385A JP S61162737 A JPS61162737 A JP S61162737A
Authority
JP
Japan
Prior art keywords
foreign
performance
inspection device
inspected
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP383385A
Other languages
Japanese (ja)
Other versions
JPH067108B2 (en
Inventor
Shoichi Horiuchi
堀内 昭一
Takashi Maruyama
隆 丸山
Minoru Taniguchi
実 谷口
Kazuhide Mukohara
和秀 向原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Ltd
Hitachi Ltd
Original Assignee
Horiba Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Ltd, Hitachi Ltd filed Critical Horiba Ltd
Priority to JP60003833A priority Critical patent/JPH067108B2/en
Publication of JPS61162737A publication Critical patent/JPS61162737A/en
Publication of JPH067108B2 publication Critical patent/JPH067108B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Abstract

PURPOSE:To check the performance of a foreign matter inspection device, by using a reference object to be inspected with the attached position of reference particles known exactly. CONSTITUTION:One sample 2 of objects to be inspected is extracted and the surface thereof is cleaned up. Then, a checkerboard-like scale 3 and numerals 4 indicating coordinates are drawn on the surface thereof by coating or printing. Then, reference particles 6... each with the size of 2mum are attached to desired parts dispersed over the entire surface of the sample two to three per part with a pipet or the like, for example, as shown by the shades in the drawing observing the surface of the sample 2 having the scale 3 and coordinate numerals 4 drawn thereon with a microscope. Then, the positions of the reference particles 6... are read out accurately to be recorded. To check the performance of a foreign matte inspector, a reference object 1 to be inspected is set on a stage thereof to detect the presence and the position of foreign matters on the surface of the object and the results of the detection are compared with the known data.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、特に、半導体ウェハーに回路パターンを焼付
けるために用いられるレティクルやマスクなどの検査対
象物の表面に異物が付着しているか否かの検査を行う場
合等に使用される異物検査装置の性能チェック方法、更
に詳しくは、ステージ上に載置された検査対象物の表面
にレーザービームを照射し、その照射レーザービームの
反射散乱状態を検知することにより、該検査対象物の表
面における異物の有無ならびにその位置を検出するよう
に構成しである異物検査装置の性能チェック方法に関す
る。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention is particularly applicable to detecting whether or not foreign matter is attached to the surface of an object to be inspected, such as a reticle or mask used to print a circuit pattern on a semiconductor wafer. A method for checking the performance of a foreign object inspection device used for inspections, etc., more specifically, a method for irradiating a laser beam onto the surface of an object to be inspected placed on a stage, and measuring the reflection and scattering state of the irradiated laser beam. The present invention relates to a method for checking the performance of a foreign matter inspection device configured to detect the presence or absence of foreign matter on the surface of an object to be inspected and its position.

〔発明の背景〕[Background of the invention]

先ず、従来のこの種の異物検査装置について、レティク
ル表面異物検査装置を例に挙げて説明する。
First, a conventional foreign matter inspection device of this type will be described using a reticle surface foreign matter inspection device as an example.

即ち、第3図に示しているように、検査対象物としての
レティクルaを載置したステージbを一方向(X方向)
へ直線移動させると共に、そのX方向に対して直交する
y方向における所定範囲内で往復直線走査させながら、
前記X方向における適当な角度θ(例えば15度)斜め
上方から前記レティクルaの検査表面にレーザービーム
Cを照射し、その照射レーザービームCの反射散乱状態
を、ステージbの側方上方に設置した光ディテクタd、
dにより検知することによって、前記レティクルaの表
面に異物が有るか否かの検査ならびにその付着位置の検
出を行うのであるが、その検査性能としては、約2μm
程度の極めて微細な異物まで検出可能であることが要求
されるため、実際の検査を行う際には、例えばレーザー
ビームの照射系の調!不良などのために所望の検査性能
を発揮できない状態になっていないかどうか、予めその
検査性能をチェックしておくことが必要である。
That is, as shown in FIG.
While moving linearly to the direction, and scanning in a reciprocating straight line within a predetermined range in the y direction perpendicular to the x direction,
The inspection surface of the reticle a was irradiated with a laser beam C from diagonally above at an appropriate angle θ (for example, 15 degrees) in the X direction, and the reflected and scattered state of the irradiated laser beam C was set on the upper side of the stage b. optical detector d,
By detecting d, it is possible to inspect whether there is a foreign substance on the surface of the reticle a and to detect its adhesion position.The inspection performance is approximately 2 μm.
Since it is required to be able to detect even the smallest foreign matter, when conducting actual inspections, it is necessary to adjust the laser beam irradiation system, for example! It is necessary to check the inspection performance in advance to see if the desired inspection performance cannot be achieved due to defects or the like.

そこで、従来は、前記検査対象物としてのレティクルa
のひとつをサンプルとして抽出し、そのサンプルの表面
の適当な数箇所に、ピペットなどで2μmの標準粒子を
付着させ、かつ、その付着箇所を囲むマーキングをマジ
ック等で描いておき、性能チェックをしようとする異物
検査装置に、前記標準粒子を付着させたサンプルをセッ
トしてその表面における異物の有無ならびにその位置を
検出させ、その検出結果からCRT画面などに異物分布
マツプを作成し、その異物分布マツプと前記サンプルの
マーキング状態とを比較することによって、該異物検査
装置が正常に異物を検出しているか否かを判定する。と
いう手段による異物検査装置の性能チェック方法を輝用
していた。
Therefore, conventionally, the reticle a as the object to be inspected is
Extract one of these as a sample, attach 2 μm standard particles to several appropriate locations on the surface of the sample using a pipette, etc., and draw markings surrounding the attached locations with a marker to check the performance. A sample to which the standard particles have been attached is set in a foreign matter inspection device, and the presence or absence of foreign matter on its surface is detected as well as its position. A foreign matter distribution map is created on a CRT screen etc. from the detection results, and the foreign matter distribution map is created on a CRT screen etc. based on the detection results. By comparing the map with the marking state of the sample, it is determined whether the foreign object inspection device is correctly detecting foreign objects. The method of checking the performance of a foreign substance inspection device by means of this method was used brilliantly.

しかしながら、上記従来方法では、次のような欠点があ
った。
However, the above conventional method has the following drawbacks.

即ち、性能チェック時において、異物検査装置が前記サ
ンプルの表面から検出する異物は、前記標準粒子のみで
はなく他に付着していた異物をも含んでいる可能性があ
り、しかも、前記標準粒子を付着させた位置は大体のと
こ、ろしか判っていな′ いために、異物検査装置によ
り検出された異物が。
That is, during the performance check, the foreign matter detected by the foreign matter inspection device from the surface of the sample may include not only the standard particles but also other foreign matter attached to the sample. Since the location where the foreign matter was deposited was not known, the foreign matter was detected by the foreign matter inspection device.

前記標準粒子そのものなのか、それとも、その標準粒子
の付近に付着している他の異物なのか不明であり、従っ
て、サンプルの表面に付着させた全ての標準粒子が正し
く検出されているかどうかの確実な判定を行うことは不
可能であった。
It is unclear whether it is the standard particle itself or some other foreign substance attached to the vicinity of the standard particle, and therefore it is difficult to be sure that all the standard particles attached to the sample surface are being detected correctly. It was impossible to make a definitive judgment.

〔発明の目的〕[Purpose of the invention]

本発明は、かかる従来実情に鑑みてなされたものであっ
て、その目的は、サンプルの表面に付着させた標準粒子
の実際9位置と、異物検査装置による検出位置との対応
を正確に判定できるようにすることにより、たとえサン
プルの表面に標準粒子以外の他の異物が付着している場
合であっても、サンプルの表面に付着させた全ての標準
粒子が正しく検出されているかどうかの判定、ひいては
、異物検査装置の性能のチェックを確実かつ容易に行え
る方法を提供せんとすることにある。
The present invention has been made in view of the conventional situation, and its purpose is to accurately determine the correspondence between the nine actual positions of standard particles attached to the surface of a sample and the positions detected by a foreign object inspection device. By doing this, it is possible to determine whether all standard particles attached to the sample surface are correctly detected, even if foreign substances other than standard particles are attached to the sample surface. Furthermore, it is an object of the present invention to provide a method that can reliably and easily check the performance of a foreign substance inspection device.

〔発明の概要〕[Summary of the invention]

上記目的を達成するために1本発明による異物検査装置
の性能チェック方法は、検査対象物のひとつのサンプル
の表面に碁盤状の目盛と座標を示す数値を描き、その目
盛と座標数値を描かれたサンプルの表面を顕微鏡で見な
がら標準粒子を付着させ、かつ、その付着位置を確認し
ておくことにより、標準粒子の付着位置に関するデータ
が既知とされた基準検査対象物を製作しておき、性能チ
ェックをしようとす、る異物検査装置に前記基準検査対
象物をセットしてその表面における異物の有無ならびに
位置を検出させ、その検出結果と前記既知のデータとを
比較することにより、該異物検査装置が正常に検査対象
物の表面における異物を検出しているか否かを判定する
、という手段を採用している点に特徴がある。
In order to achieve the above object, a method for checking the performance of a foreign substance inspection device according to the present invention is to draw a checkerboard-like scale and numerical values indicating coordinates on the surface of one sample of the object to be inspected, and draw the scale and coordinate numerical values. By attaching standard particles to the surface of a sample with a microscope and confirming the adhesion position, a reference test object with known data regarding the adhesion position of the standard particles is prepared. The reference object to be inspected is set in a foreign object inspection device that is going to perform a performance check, and the foreign object is detected by detecting the presence and location of foreign objects on its surface, and comparing the detection results with the known data. A feature of this method is that it employs a method of determining whether or not the inspection device is correctly detecting foreign matter on the surface of the object to be inspected.

かかる本発明によれば、標準粒子の付着位置が正確に判
っている基準検査対象物を用いて異物検査装置の性能を
チェックするようにしているので、たとえその基準検査
対象物の表面に前記標準粒子以外の他の異物が付着して
いたとしても、前記標準粒子の既知の位置と検出された
異物の測定位置とを対比することによって、全ての標準
粒子が正しく積出されているかどうかを確実かつ容易に
判定でき、もって、従来の方法に比べて、異物検査装置
の性能チェックを格段に正確に行える。しかも、前記標
準検査対象物の表面には碁盤状の目盛と座標を示す数値
を描いておくようにしているので、1a微鏡で見ながら
その表面の所望の位置に標準粒子を付着させたり、また
、その位置を正確にH4取ったりする際に、その作業を
容易に行うことができると共に、その位置読み取り精度
を高いものにできる。
According to the present invention, the performance of the foreign matter inspection device is checked using a reference inspection object on which the adhesion position of the standard particles is known accurately, so even if the surface of the reference inspection object is Even if foreign matter other than particles is attached, it is ensured that all standard particles are loaded correctly by comparing the known position of the standard particle with the measured position of the detected foreign matter. Moreover, it can be easily determined, and as a result, the performance of the foreign object inspection device can be checked much more accurately than conventional methods. Moreover, since a checkerboard-shaped scale and numerical values indicating coordinates are drawn on the surface of the standard inspection object, standard particles can be attached to desired positions on the surface while viewing with the 1a microscope, Further, when accurately measuring the position H4, the work can be easily carried out, and the accuracy of reading the position can be made high.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明に係る異物検査装置の性能チェック方法の
具体的実施例を図面(第1図および第2図)に基づいて
説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A specific embodiment of a method for checking the performance of a foreign substance inspection apparatus according to the present invention will be described below with reference to the drawings (FIGS. 1 and 2).

第1図は1本発明方法を実施する際に用いられる治具、
即ち、予め既知の位置に標準粒子を付着して構成された
基準検査対象物1の平面図を示している。
FIG. 1 shows a jig used when carrying out the method of the present invention;
That is, it shows a plan view of a reference inspection object 1 configured by attaching standard particles to pre-known positions.

この基準検査対象物1は次のような手順で製作される。This reference inspection object 1 is manufactured by the following procedure.

即ち、先ず、検査対象物(この例では、表裏両面を高度
な平面に研磨された透明ガラス薄板から成るレティクル
)ひとつのサンプル2を抽出し。
That is, first, one sample 2 of the object to be inspected (in this example, a reticle made of a thin transparent glass plate whose front and back surfaces are polished to a highly flat surface) is extracted.

その表裏両面を超純水または超音波により洗浄して、で
きるだけ異物が付着していない清浄な状態とする。
Both the front and back surfaces are cleaned with ultrapure water or ultrasonic waves to keep them as clean as possible from foreign matter.

次に、そのサンプル2の表面に、塗布またはプリントな
ど゛の手段により、図示のような碁盤状の目盛3と座標
を示す数値4とを描く、なお、その碁盤状の目盛3を描
くに際しては、小間隔(この例では5m間隔)毎の線を
細くシ(この例では20μm)、大間隔(この例では2
5I11m間隔)毎の線を太くする(この例では40μ
m)、また、その碁盤状の目盛3の全体を四分する対角
線5゜5も細い線(この例では20μm)で描いておく
Next, on the surface of the sample 2, a checkerboard-shaped scale 3 and numerical values 4 indicating the coordinates as shown are drawn by means such as coating or printing. , make the lines thinner (20 μm in this example) at small intervals (5 m intervals in this example), and make the lines thinner (20 μm in this example) at large intervals (20 μm in this example).
Make the lines thicker at every 5I11m interval (40μ in this example).
m), and a diagonal line 5°5 that divides the entire grid 3 into quarters is also drawn with a thin line (20 μm in this example).

続いて、その目盛3と座標数値4を描かれたサンプル2
の表面を顕微鏡で見ながら1例えば図中斜線で示すよう
に、該サンプルの表面全体に分散する所望の部分に、2
μmの標準粒子6・・をピペット等により複数個(2〜
3個)ずつ付着させる。
Next, sample 2 with scale 3 and coordinate value 4 drawn.
While looking at the surface of the sample with a microscope, apply 2 to desired areas distributed over the entire surface of the sample, for example, as shown by diagonal lines in the figure.
A plurality of μm standard particles 6 (2~
Attach 3 pieces) at a time.

そして、やはりサンプル2の表面を顕微鏡で見ながら、
その付着した全ての(多すぎるときは一部でも可)標準
粒子6・・の位置を、第2図に例示するように、前記碁
盤状の目盛3と座標数値4自体を参考にし、かつ、それ
に対する内挿分割感覚も併用しながら、出来るだけ正確
に読み取って記録する。なお、前記した線の太さの規則
的な変化や対角線の存在が、この読み取り作業を容易か
つ正確に行う上で大きな助けとなる。
Then, while looking at the surface of sample 2 with a microscope,
As illustrated in FIG. 2, the positions of all the attached standard particles 6 (or only some of them if there are too many) are determined by referring to the grid-shaped scale 3 and the coordinate values 4 themselves, and While also using a sense of interpolation and division, read and record as accurately as possible. Note that the regular changes in line thickness and the presence of diagonal lines as described above greatly help in easily and accurately carrying out this reading operation.

ところで、上記標準粒子6・・の位置の読み取り作業の
前または後で、サンプル2の表面に透明な保護膜(この
場合ペリクル膜)(図示せず)を被着させておけば、そ
の基準検査対象物1を何度も繰り返して使えるという利
点があると共に、通常のペリクル膜付きレティクルに対
してより実情に即した検査を行える利点がある。
By the way, if a transparent protective film (in this case, a pellicle film) (not shown) is applied to the surface of the sample 2 before or after reading the position of the standard particle 6, the standard inspection can be performed. There is an advantage that the object 1 can be used repeatedly, and there is also an advantage that inspection can be carried out more in line with the actual situation than with a normal reticle with a pellicle film.

次に、上記のようにして製作された治具、つまり、標準
粒子6・・を茅め付着されると共に、その付着位置に関
するデータが既知とされた基準検査対象物1を用いて、
異物検査装置の性能をチェックする方法について説明す
る。
Next, using the jig manufactured as described above, that is, the reference inspection object 1 on which the standard particles 6 are applied and the data regarding the adhesion positions are known,
A method for checking the performance of a foreign matter inspection device will be explained.

なお1図示してはいないが、その異物検査装置は、ステ
ージ上に載置された検査対象物の表面にレーザービーム
を照射し、その照射レーザービームの反射散乱状態を検
知することにより、該検査対象物の表面における異物の
有無ならびにその位置を検出するように構成されている
ものである。
Although not shown in the figure, the foreign matter inspection device irradiates the surface of the inspection object placed on a stage with a laser beam and detects the reflection and scattering state of the irradiated laser beam. It is configured to detect the presence or absence of foreign matter on the surface of an object and its position.

先ず、性能チェックをしようとする異物検査装置のステ
ージに前記基準検査対象物1をセットして、その表面に
おける異物の有無と位置とを検出させ、次に、その検出
結果と前記既知のデータとを比較して、少なくとも、前
記予め付着された標準粒子6・・の既知位置に相当する
位置の全てにおいて、異物が有ることが検出されていれ
ば、その異物検査装置は正常に異物を検出していると判
定し、実際の異物検査作業に移り、また、検出されなけ
ればならない標準粒子6・・の一部または全部の位置に
おいて、異物が有ることが検出されていなければ、該異
物検査装置の検査性能には問題があると判定し、その原
因を究明して、例えば、レーザービーム照射系の調整等
の善後策を講するのである。
First, the reference inspection object 1 is set on the stage of a foreign object inspection device whose performance is to be checked, and the presence or absence and position of foreign objects on its surface are detected, and then the detection results are combined with the known data. If the presence of foreign matter is detected at least at all positions corresponding to the known positions of the standard particles 6 attached in advance, then the foreign matter inspection device has successfully detected the foreign matter. If it is determined that there is a foreign substance and the presence of foreign substances is not detected at some or all of the positions of the standard particles 6 that must be detected, the foreign substance inspection device moves on to the actual foreign substance inspection work. It is determined that there is a problem with the inspection performance, the cause is investigated, and corrective measures are taken, such as adjusting the laser beam irradiation system.

〔発明の効果〕〔Effect of the invention〕

以上詳述したところから明らかなように1本発明に係る
異物検査装置の性能チェック方法によれば、標準粒子の
付着位、置が正確に判っている基準検査対象物を予め製
作しておき、その基準検査対象物を用いて異物検査装置
の性能をチェックするようにしたから、たとえその基準
検査対象物の表面に前記標準粒子以外の他の異物が付着
していたとしても、前記標準粒子の既知の位置と検出さ
れた異物の測定位置とを対比することにより、該基準検
査対象物の表面に付着させた全ての標準粒子が正しく検
出されているかどうかの判定、ひいては、異物検査装置
の性能のチェックを確実かつ容易に行えるを確実かつ容
易に判定でき、従って、従来方法に比べて、微小異物検
査装置の性能チェックを格段に正確に行うことができる
。更に、前記標準検査対象物の表面には碁盤状の目盛と
座標を示す数値を描いておくようにしたので、顕微鏡で
見ながらその表面の所望の位置に標準粒子の付着させた
り、また、その位置を正確に読み取ったりする際に、そ
の作業を容易に行うことができると共に、その位置読み
取り精度を高いものにできる。
As is clear from the detailed description above, according to the method for checking the performance of a foreign particle inspection device according to the present invention, a reference inspection object on which the adhesion position and position of standard particles are accurately known is manufactured in advance; Since the performance of the foreign matter inspection device is checked using the reference inspection object, even if foreign matter other than the standard particles is attached to the surface of the reference inspection object, the standard particle By comparing the known position and the measured position of the detected foreign object, it is possible to determine whether all the standard particles attached to the surface of the reference inspection object are correctly detected, and by extension, the performance of the foreign object inspection device. It is possible to reliably and easily determine whether the check can be performed reliably and easily, and therefore, the performance of the micro foreign object inspection apparatus can be checked much more accurately than with conventional methods. Furthermore, since a checkerboard-shaped scale and numerical values indicating the coordinates are drawn on the surface of the standard inspection object, it is possible to attach the standard particles to the desired position on the surface while viewing it with a microscope, and to When accurately reading a position, the work can be easily performed and the position reading accuracy can be increased.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第子図は、本発明方法に係る異物検査装置
の性能チェック方法の具体的実施例を示し、第1図は本
発明方法を実施する際に用いる治具の全体平面図、そし
て、第2図は位置読み取り要領を説明するために要部を
拡大して示した平面図である。 また、第3図は、背景技術を説明するための要部の斜視
図である。 1・・・基準検査対象物、2・・・サンプル、3・・・
碁盤状の目盛、4・・・座標を示す数値、5・・・対角
線、6・・・標準粒子。
Fig. 1 and the sub-figures show a specific example of the method for checking the performance of a foreign object inspection device according to the method of the present invention, and Fig. 1 is an overall plan view of a jig used when carrying out the method of the present invention; , FIG. 2 is a plan view showing an enlarged main part in order to explain the position reading procedure. Moreover, FIG. 3 is a perspective view of essential parts for explaining the background technology. 1... Standard inspection object, 2... Sample, 3...
Checkerboard-shaped scale, 4... Numerical values indicating coordinates, 5... Diagonal line, 6... Standard particle.

Claims (1)

【特許請求の範囲】 1、ステージ上に載置された検査対象物の表面にレーザ
ービームを照射し、その照射レーザービームの反射散乱
状態を検知することにより、該検査対象物の表面におけ
る異物の有無ならびにその位置を検出するように構成し
てある異物検査装置の性能をチェックする方法であつて
、前記検査対象物のひとつのサンプルの表面に碁盤状の
目盛と座標を示す数値を描き、その目盛と座標数値を描
かれたサンプルの表面を顕微鏡で見ながら標準粒子を付
着させ、かつ、その付着位置確認しておくことにより、
標準粒子の付着位置に関するデータが既知とされた基準
検査対象物を製作したおき、性能チェックをしようとす
る異物検査装置に前記基準検査対象物をセットしてその
表面における微小異物の有無ならびに位置を検出させ、
その検出結果と前記既知のデータとを比較することによ
り、該異物検査装置が正常に検査対象物の表面における
異物を検出しているか否かを判定する、という手段によ
ることを特徴とする異物検査装置の性能チェック方法。 2、前記碁盤状の目盛を描くに際し、小間隔毎の線を細
くし、大間隔毎の線を太くする特許請求の範囲第1項に
記載の異物検査装置の性能チェック方法。 3、前記碁盤状の目盛にその全体を四分する対角線も描
いておく特許請求の範囲第1項または第2項に記載の異
物検査装置の性能チェック方法。 4、前記基準検査対象物の製作時における標準粒子の位
置の読み取り手順の前または後で、該基準検査対象物の
表面に透明な保護膜を被着させておく特許請求の範囲第
1項または第3項の何れかに記載の異物検査装置の性能
チェック方法。
[Claims] 1. By irradiating a laser beam onto the surface of an object to be inspected placed on a stage and detecting the state of reflection and scattering of the irradiated laser beam, foreign matter on the surface of the object to be inspected can be detected. A method of checking the performance of a foreign object inspection device configured to detect the presence and location of foreign objects, which involves drawing a checkerboard-shaped scale and numerical values indicating coordinates on the surface of one sample of the object to be inspected. By adhering standard particles to the surface of the sample with scales and coordinate values drawn on it using a microscope, and confirming the adhesion position,
A reference test object for which data regarding the adhesion position of standard particles is known is manufactured, and the reference test object is set in a foreign material inspection device for performance checking to determine the presence and location of minute foreign objects on its surface. let it be detected,
A foreign object inspection characterized in that it is determined whether or not the foreign object inspection device normally detects foreign objects on the surface of the object to be inspected by comparing the detection result with the known data. How to check equipment performance. 2. The method for checking the performance of a foreign substance inspection device according to claim 1, wherein when drawing the grid-like scale, the lines for each small interval are made thinner, and the lines for each large interval are made thicker. 3. The method for checking the performance of a foreign substance inspection device according to claim 1 or 2, wherein diagonal lines dividing the entire grid into quarters are also drawn on the grid-like scale. 4. A transparent protective film is coated on the surface of the reference test object before or after the step of reading the position of the standard particle during the production of the reference test object, or A method for checking the performance of a foreign matter inspection device according to any one of Item 3.
JP60003833A 1985-01-11 1985-01-11 Foreign substance inspection device performance check method Expired - Lifetime JPH067108B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60003833A JPH067108B2 (en) 1985-01-11 1985-01-11 Foreign substance inspection device performance check method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60003833A JPH067108B2 (en) 1985-01-11 1985-01-11 Foreign substance inspection device performance check method

Publications (2)

Publication Number Publication Date
JPS61162737A true JPS61162737A (en) 1986-07-23
JPH067108B2 JPH067108B2 (en) 1994-01-26

Family

ID=11568193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60003833A Expired - Lifetime JPH067108B2 (en) 1985-01-11 1985-01-11 Foreign substance inspection device performance check method

Country Status (1)

Country Link
JP (1) JPH067108B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63238454A (en) * 1987-03-27 1988-10-04 Hitachi Ltd Foreign matter inspecting apparatus
EP0727659A2 (en) * 1995-02-14 1996-08-21 Seiko Instruments Inc. Method and apparatus for analyzing minute foreign substances, and process for manufacturing semiconductor or LCD elements
JP2008008805A (en) * 2006-06-30 2008-01-17 Hitachi High-Technologies Corp Optical defect inspection device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450976A (en) * 1990-06-15 1992-02-19 Hitachi Koki Co Ltd Developing device for electrophotographic device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450976A (en) * 1990-06-15 1992-02-19 Hitachi Koki Co Ltd Developing device for electrophotographic device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63238454A (en) * 1987-03-27 1988-10-04 Hitachi Ltd Foreign matter inspecting apparatus
EP0727659A2 (en) * 1995-02-14 1996-08-21 Seiko Instruments Inc. Method and apparatus for analyzing minute foreign substances, and process for manufacturing semiconductor or LCD elements
EP0727659A3 (en) * 1995-02-14 1998-03-04 Seiko Instruments Inc. Method and apparatus for analyzing minute foreign substances, and process for manufacturing semiconductor or LCD elements
US6124142A (en) * 1995-02-14 2000-09-26 Seiko Instruments, Inc. Method for analyzing minute foreign substance elements
US6355495B1 (en) 1995-02-14 2002-03-12 Mitsubishi Denki Kabushiki Kaisha Method and apparatus for analyzing minute foreign substance, and process for semiconductor elements or liquid crystal elements by use thereof
JP2008008805A (en) * 2006-06-30 2008-01-17 Hitachi High-Technologies Corp Optical defect inspection device

Also Published As

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JPH067108B2 (en) 1994-01-26

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