JPS61143760A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS61143760A
JPS61143760A JP60271455A JP27145585A JPS61143760A JP S61143760 A JPS61143760 A JP S61143760A JP 60271455 A JP60271455 A JP 60271455A JP 27145585 A JP27145585 A JP 27145585A JP S61143760 A JPS61143760 A JP S61143760A
Authority
JP
Japan
Prior art keywords
image
pattern
reduction
projected
evaluation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60271455A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0227811B2 (zh
Inventor
Sumio Hosaka
純男 保坂
Shinji Kuniyoshi
伸治 国吉
Tsuneo Terasawa
恒男 寺澤
Akihiro Takanashi
高梨　明紘
Toshishige Kurosaki
利栄 黒崎
Yoshio Kawamura
河村　喜雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60271455A priority Critical patent/JPS61143760A/ja
Publication of JPS61143760A publication Critical patent/JPS61143760A/ja
Publication of JPH0227811B2 publication Critical patent/JPH0227811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Holders For Sensitive Materials And Originals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP60271455A 1985-12-04 1985-12-04 縮小投影露光装置 Granted JPS61143760A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60271455A JPS61143760A (ja) 1985-12-04 1985-12-04 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60271455A JPS61143760A (ja) 1985-12-04 1985-12-04 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS61143760A true JPS61143760A (ja) 1986-07-01
JPH0227811B2 JPH0227811B2 (zh) 1990-06-20

Family

ID=17500268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60271455A Granted JPS61143760A (ja) 1985-12-04 1985-12-04 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS61143760A (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0318960U (zh) * 1989-06-29 1991-02-25
US5153916A (en) * 1990-04-20 1992-10-06 Hitachi, Ltd. Method and apparatus for detecting focal plane
JPH08167558A (ja) * 1994-12-15 1996-06-25 Nikon Corp 投影露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0318960U (zh) * 1989-06-29 1991-02-25
US5153916A (en) * 1990-04-20 1992-10-06 Hitachi, Ltd. Method and apparatus for detecting focal plane
JPH08167558A (ja) * 1994-12-15 1996-06-25 Nikon Corp 投影露光装置

Also Published As

Publication number Publication date
JPH0227811B2 (zh) 1990-06-20

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