JPS61125043U - - Google Patents
Info
- Publication number
- JPS61125043U JPS61125043U JP899085U JP899085U JPS61125043U JP S61125043 U JPS61125043 U JP S61125043U JP 899085 U JP899085 U JP 899085U JP 899085 U JP899085 U JP 899085U JP S61125043 U JPS61125043 U JP S61125043U
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle beam
- holders
- pairs
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Description
第1図a,b及びcは本考案の整形用絞りの構
成要素の一例を示すための図、第2図は各要素を
組み合わせて製作された本考案の一実施例として
の荷電ビーム装置用整形絞りを示すための図であ
る。
1,1′:ホルダ、2,2′:電子ビーム通過
孔、3a,3b,3a′,3b′:平行溝、4a
,4b,4a′,4b′:ストツパ、5a,5b
,5a′,5b′:線状遮蔽部材、6:ビーム通
過防止用薄膜絞り、7:孔。
Figures 1a, b, and c are diagrams showing an example of the constituent elements of the shaping aperture of the present invention, and Figure 2 is a diagram for a charged beam device as an embodiment of the present invention manufactured by combining each element. It is a figure for showing a shaping aperture. 1, 1': Holder, 2, 2': Electron beam passing hole, 3a, 3b, 3a', 3b': Parallel groove, 4a
, 4b, 4a', 4b': Stopper, 5a, 5b
, 5a', 5b': linear shielding member, 6: thin film diaphragm for preventing beam passage, 7: hole.
Claims (1)
第2のホルダを有しており、該第1、第2のホル
ダの各々には該ビーム通過孔の少なくとも一部を
横切る様に2本の平行な溝が刻設されており、該
2本の溝の各々には線状の荷電粒子ビーム遮蔽部
材が張架されており、該第1、第2のホルダは該
2対の線状荷電粒子ビーム遮蔽部材が井桁状に交
差するように重ねられており、該該2対の線状荷
電ビーム遮蔽部材で囲まれた矩形領域以外を通過
する荷電ビームを遮蔽するための遮蔽板が備えら
れていることを特徴とする荷電粒子ビーム装置用
整形絞り。 a first having a charged particle beam passage hole in the center;
a second holder, each of the first and second holders having two parallel grooves cut across at least a portion of the beam passage hole; A linear charged particle beam shielding member is stretched over each of the grooves, and the first and second holders are stacked so that the two pairs of linear charged particle beam shielding members intersect in a grid pattern. and a shield plate for shielding a charged beam passing through a region other than a rectangular area surrounded by the two pairs of linear charged beam shielding members. Aperture.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985008990U JPH0543470Y2 (en) | 1985-01-25 | 1985-01-25 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985008990U JPH0543470Y2 (en) | 1985-01-25 | 1985-01-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61125043U true JPS61125043U (en) | 1986-08-06 |
JPH0543470Y2 JPH0543470Y2 (en) | 1993-11-02 |
Family
ID=30488782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985008990U Expired - Lifetime JPH0543470Y2 (en) | 1985-01-25 | 1985-01-25 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0543470Y2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5921020A (en) * | 1982-07-27 | 1984-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Molding diaphragm for charged beam exposure device |
-
1985
- 1985-01-25 JP JP1985008990U patent/JPH0543470Y2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5921020A (en) * | 1982-07-27 | 1984-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Molding diaphragm for charged beam exposure device |
Also Published As
Publication number | Publication date |
---|---|
JPH0543470Y2 (en) | 1993-11-02 |
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