JPS5894254U - Optical device for electron beam holography - Google Patents

Optical device for electron beam holography

Info

Publication number
JPS5894254U
JPS5894254U JP18806381U JP18806381U JPS5894254U JP S5894254 U JPS5894254 U JP S5894254U JP 18806381 U JP18806381 U JP 18806381U JP 18806381 U JP18806381 U JP 18806381U JP S5894254 U JPS5894254 U JP S5894254U
Authority
JP
Japan
Prior art keywords
optical device
electron beam
lens
electron
beam holography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18806381U
Other languages
Japanese (ja)
Other versions
JPS6333472Y2 (en
Inventor
強 松田
外村 彰
潤二 遠藤
長我部 信行
Original Assignee
株式会社日立製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日立製作所 filed Critical 株式会社日立製作所
Priority to JP18806381U priority Critical patent/JPS5894254U/en
Publication of JPS5894254U publication Critical patent/JPS5894254U/en
Application granted granted Critical
Publication of JPS6333472Y2 publication Critical patent/JPS6333472Y2/ja
Granted legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、従来の電子線ホログラフィ−用光学装置の例
を示す図、第2図は、従来装置の例において、電子線プ
リズムの位置とホログラムに記録できる試料領域の大き
さの関係を示す図、第3図は本考案の一実施例を示す図
である。 12・・・電界放射形電子銃、2・・・コンデンサレン
ズ、3・・・試料、4・・・対物レンズ、5・・・中間
レンズ、8・・・電子線プリズム、10・・・投射レン
女、11・・・フィルム。
Fig. 1 shows an example of a conventional optical device for electron beam holography, and Fig. 2 shows the relationship between the position of the electron beam prism and the size of the sample area that can be recorded in a hologram in an example of the conventional device. FIG. 3 is a diagram showing an embodiment of the present invention. 12... Field emission type electron gun, 2... Condenser lens, 3... Sample, 4... Objective lens, 5... Intermediate lens, 8... Electron beam prism, 10... Projection Ren woman, 11...film.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子銃およびコンデンサレンズより成る照射系部と、対
物レンズ、中間レンズおよび投射レンズより成る拡大レ
ンズ系とで構成された電子光学装置において、試料と電
子線プリズムとの間に2個以上の電子レンズが配置され
たことを特徴とする電子線ホログラフィ−用光学装置。
In an electron optical device consisting of an irradiation system section consisting of an electron gun and a condenser lens, and a magnifying lens system consisting of an objective lens, an intermediate lens, and a projection lens, two or more electron lenses are provided between the sample and the electron beam prism. 1. An optical device for electron beam holography, characterized in that: is arranged.
JP18806381U 1981-12-18 1981-12-18 Optical device for electron beam holography Granted JPS5894254U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18806381U JPS5894254U (en) 1981-12-18 1981-12-18 Optical device for electron beam holography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18806381U JPS5894254U (en) 1981-12-18 1981-12-18 Optical device for electron beam holography

Publications (2)

Publication Number Publication Date
JPS5894254U true JPS5894254U (en) 1983-06-25
JPS6333472Y2 JPS6333472Y2 (en) 1988-09-06

Family

ID=30102875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18806381U Granted JPS5894254U (en) 1981-12-18 1981-12-18 Optical device for electron beam holography

Country Status (1)

Country Link
JP (1) JPS5894254U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007115409A (en) * 2004-03-31 2007-05-10 Institute Of Physical & Chemical Research Electron beam interference device and electron microscope
JP2007335083A (en) * 2006-06-12 2007-12-27 Hitachi Ltd Electron beam holography observing device
JP4807592B2 (en) * 2005-02-21 2011-11-02 国立大学法人京都工芸繊維大学 Electron microscope and compound irradiation lens

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007115409A (en) * 2004-03-31 2007-05-10 Institute Of Physical & Chemical Research Electron beam interference device and electron microscope
JP4807592B2 (en) * 2005-02-21 2011-11-02 国立大学法人京都工芸繊維大学 Electron microscope and compound irradiation lens
JP2007335083A (en) * 2006-06-12 2007-12-27 Hitachi Ltd Electron beam holography observing device

Also Published As

Publication number Publication date
JPS6333472Y2 (en) 1988-09-06

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