JPH0543470Y2 - - Google Patents
Info
- Publication number
- JPH0543470Y2 JPH0543470Y2 JP1985008990U JP899085U JPH0543470Y2 JP H0543470 Y2 JPH0543470 Y2 JP H0543470Y2 JP 1985008990 U JP1985008990 U JP 1985008990U JP 899085 U JP899085 U JP 899085U JP H0543470 Y2 JPH0543470 Y2 JP H0543470Y2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- charged particle
- particle beam
- linear
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002245 particle Substances 0.000 claims description 15
- 238000007493 shaping process Methods 0.000 claims description 10
- 238000010894 electron beam technology Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Description
【考案の詳細な説明】
［産業上の利用分野］
本考案は製作と直角度の調整が容易な荷電粒子
ビーム装置用整形絞りに関する。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to a shaped aperture for a charged particle beam device that is easy to manufacture and adjust the squareness.
［従来の技術］
電子ビーム描画装置等においては、電子光学系
に矩形又は正方形の孔を有する整形絞りを備え、
断面形状が矩形のビームを材料上に照射するよう
にし、能率的且つ高精度にパターン描画を行なつ
ている。[Prior Art] In an electron beam lithography apparatus, etc., an electron optical system is equipped with a shaped aperture having a rectangular or square hole.
A beam with a rectangular cross section is irradiated onto the material to efficiently and accurately draw patterns.
さて、前記の如き整形絞りの孔は、それに必要
とされる大きさが微細な場合には、通常の機械的
な加工手段によつて穿孔する事が出来ないので、
耐熱性金属板にフオトエツチング処理を施して作
成するのが一般的である。 Now, if the size of the hole required for the shaping aperture is minute, it cannot be made using normal mechanical processing means.
It is generally made by photoetching a heat-resistant metal plate.
所で、フオトエツチング処理における加工精度
を高めるには、穿孔すべき孔の寸法に対し、穿孔
されるべき金属板の厚さを薄くしなければならな
い。しかし、金属板が薄くなると、その機械的強
度が小さいだけではなく、電子ビームの射突によ
る熱的変形或いは焼損等の問題がある。又、この
様なフオトエツチング処理によつて穿孔された孔
は、輪郭が不鮮明である。 However, in order to improve the processing accuracy in the photoetching process, it is necessary to reduce the thickness of the metal plate to be drilled relative to the size of the hole to be drilled. However, when the metal plate becomes thinner, it not only has a lower mechanical strength but also has problems such as thermal deformation or burnout due to the impact of electron beams. Further, the outline of the hole drilled by such photoetching process is unclear.
そこで、例えば、モリブデンの薄板４枚夫々の
一辺をナイフエツジ状に仕上げ、該各ナイフエツ
ジ部分で矩形又は正方形の孔を形成する様に、該
各モリブデン板を組み合せ、順次スポツト溶接し
ている。 Therefore, for example, one side of each of four thin molybdenum plates is finished into a knife edge shape, and the molybdenum plates are combined and sequentially spot welded so that a rectangular or square hole is formed at each knife edge portion.
しかし、このような手作業による整形絞りの製
作では、辺の仕上げ度、辺の真直度，辺の直角度
を高める事は厄介な事であり、歩留りも悪い。 However, in such manual manufacturing of shaping apertures, it is troublesome to improve the finish of the sides, the straightness of the sides, and the squareness of the sides, and the yield is also low.
［考案が解決しようとする問題点］
又、最近、２本の細線（例えば金線）を取付け
台の上に井桁状に両端から張力を加え乍ら張り、
該井桁状に張つた細線の相互位置関係を顕微鏡で
計測し、所定の直角度及び平行度が得られたら、
前記細線取付け台にスポツト溶接等により固定
し、整形絞りとしているものもある。この様な整
形絞りは、例えば、特開昭59−21020号に記載さ
れている。[Problems that the invention aims to solve] Also, recently, two thin wires (for example, gold wires) were strung on a mounting table in a grid pattern while applying tension from both ends.
The mutual positional relationship of the thin wires stretched in the shape of parallel grids is measured with a microscope, and when the specified perpendicularity and parallelism are obtained,
Some are fixed to the thin wire mounting base by spot welding or the like to form a shaped diaphragm. Such a shaping aperture is described, for example, in Japanese Patent Laid-Open No. 59-21020.
しかし、顕微鏡を使用し乍ら細線を所定の直角
度及び平行度が得られるように井桁状に張る作業
は非常に厄介で、神経の使う作業である。又、細
線取付け台に溶接等により固定してしまうので、
一度固定すると何等かの原因で直角度等を低下し
た時に再調整が困難である。 However, using a microscope, it is extremely troublesome and nerve-wracking work to stretch thin wires in a grid pattern so as to obtain predetermined perpendicularity and parallelism. Also, since it is fixed to the thin wire mounting base by welding etc.
Once fixed, it is difficult to readjust if the perpendicularity etc. decreases for some reason.
本考案はこの様な問題を解決する事を目的とし
たものである。 The present invention is aimed at solving such problems.
［問題点を解決するための手段］
本考案は、中央部に荷電粒子ビーム通過孔を有
する第１，第２のホルダを有しており、該第１，
第２のホルダ各々には該ビーム通過孔の少なくと
も一部を横切り且つ夫々に線状の荷電粒子ビーム
遮蔽部材を張架した時に該遮蔽部材の一部がホル
ダ表面より突出する様な２本の平行な溝が刻設さ
れており、該各張架された荷電粒子ビーム遮蔽部
材が各ホルダのサイドで、該ホルダのサイドに取
付け取外し自在なストツパにより固定されてお
り、該第１，第２のホルダは該２対の線状荷電粒
子ビーム遮蔽部材が井桁状に交差するように重ね
られており、該２対の線状荷電粒子ビーム遮蔽部
材で囲まれた矩形領域以外を通過する荷電粒子ビ
ームを遮蔽するための遮蔽板が前記各ホルダ間に
備えられていることを特徴としている。[Means for solving the problems] The present invention has first and second holders having a charged particle beam passage hole in the center, and the first and second holders have a charged particle beam passage hole in the center.
Each of the second holders has two wires extending across at least a portion of the beam passage hole and such that when a linear charged particle beam shielding member is stretched, a portion of the shielding member protrudes from the surface of the holder. Parallel grooves are carved, and each of the stretched charged particle beam shielding members is fixed on the side of each holder by a stopper that can be attached and detached to the side of the holder, and the first and second In the holder, the two pairs of linear charged particle beam shielding members are stacked so as to intersect in a grid pattern, and charged particles that pass through a rectangular area other than the rectangular area surrounded by the two pairs of linear charged particle beam shielding members The present invention is characterized in that a shielding plate for shielding the beam is provided between each of the holders.
［実施例］
第１図ａ，ｂ及びｃは本考案の一実施例の分解
図であり、第２図はその組立図である。図中１，
１′は中央部に電子ビーム通過孔２，２′が開けら
れたホルダである。３ａ，３ｂ，３a′，３b′はそ
の距離が少なくとも前記電子ビーム通過孔２，
２′の直径より小さい平行溝である。４ａ，４ｂ，
４a′，４b′は該各溝に線状遮蔽部材５ａ，５ｂ，
５a′，５b′が張架された時に、該各線状遮蔽部材
を該各溝にビスB1，B2，B3，B4，B1′，B2′，
B3′，B4′により固定する為のストツパである。
前記平行溝３ａ，３ｂ，３a′，３b′の深さ及び幅
は、線状遮蔽部材を張架した時に、該線状遮蔽部
材がホルダ表面より僅かに突出する程度になつて
いる。[Embodiment] Figures 1a, b and c are exploded views of an embodiment of the present invention, and Figure 2 is an assembled view thereof. 1 in the figure,
Reference numeral 1' denotes a holder with electron beam passage holes 2, 2' opened in the center. 3a, 3b, 3a', 3b' are at least the distance from the electron beam passing hole 2,
It is a parallel groove smaller than the diameter of 2'. 4a, 4b,
4a', 4b' are linear shielding members 5a, 5b,
When 5a' and 5b' are stretched, each linear shielding member is inserted into each groove with screws B 1 , B 2 , B 3 , B 4 , B 1 ′, B 2 ′,
This is a stopper for fixing by B 3 ′ and B 4 ′.
The depth and width of the parallel grooves 3a, 3b, 3a', and 3b' are such that when the linear shielding member is stretched, the linear shielding member slightly protrudes from the holder surface.
第１図ｃの６は前記ホルダ１，１′の間に配置
されるビーム通過防止薄膜絞りを示すもので、こ
の絞りは後述するように２対の線状遮蔽部材５
ａ，５ｂ，５a′，５b′が井桁状に交差するように
保持された際に、この２対の線状遮蔽部材によつ
て囲まれた矩形以外を通過する電子線を遮蔽する
ためのものである。この絞りには矩形の孔７が設
けられているが、前述した要請を満たすため、こ
の矩形の辺の長さは２本の線状遮蔽部材間の内側
エツジ間隔より長く、外側エツジ間隔より短くさ
れている。 Reference numeral 6 in FIG. 1c indicates a thin film diaphragm for preventing beam passage, which is disposed between the holders 1 and 1', and this diaphragm consists of two pairs of linear shielding members 5 as will be described later.
When a, 5b, 5a', 5b' are held so as to intersect in a grid pattern, this is for shielding electron beams that pass through areas other than the rectangle surrounded by these two pairs of linear shielding members. It is. This aperture is provided with a rectangular hole 7, and in order to meet the above-mentioned requirements, the length of the sides of this rectangle is longer than the inner edge distance between the two linear shielding members and shorter than the outer edge distance. has been done.
次に組み立て方を説明すると、まず、前記第１
図ａ，ｂに示す様に、ホルダ１，１′の溝３ａ，
３ｂ，３a′，３b′に線状遮蔽部材５ａ，５ｂ，５
a′，５b′を張架し、該線状遮蔽部材の両端に適宜
な加重を掛けておき、この状態で該両端を該ホル
ダのサイドにストツパ４ａ，４ｂ，４a′，４b′を
取付ける事によつて固定する。次に、第２図に示
す様に、ホルダ１の溝が刻設されている面を上に
し、該上面に第１図ｃに示す如きビーム通過防止
薄膜絞り６を載せ、該絞りの上に前記ホルダ１′
の溝が刻設されている面を重ねる。この時、各ホ
ルダ１，１′の溝に張架された２本の線状遮蔽部
材が井桁を形成する様に夫々のホルダの位置を調
整する。 Next, to explain how to assemble it, first, the first
As shown in figures a and b, grooves 3a of holders 1 and 1',
3b, 3a', 3b' have linear shielding members 5a, 5b, 5
a' and 5b' are stretched, an appropriate load is applied to both ends of the linear shielding member, and in this state, stoppers 4a, 4b, 4a', and 4b' are attached to both ends of the holder. Fix by. Next, as shown in FIG. 2, the surface of the holder 1 on which the grooves are carved is placed upward, and a thin film diaphragm 6 for preventing beam passage as shown in FIG. 1c is placed on the upper surface. The holder 1'
Overlap the sides with the grooves carved on them. At this time, the positions of the respective holders 1 and 1' are adjusted so that the two linear shielding members stretched across the grooves of each holder form a grid.
この調整が終了した後、ホルダ１′の周辺に開
けられた捩子穴８ａ，８ｂ，８ｃ，８ｄにビスを
捩込み、ホルダ１′とホルダ１を完全に密着させ、
整形用絞りが出来上がる。この時、前記各ホルダ
の密着すべき面から突出している線状遮蔽部材部
が、該密着により、圧縮変形し、該線状遮蔽部材
と前記ビーム通過防止薄膜絞りの接触面積を増大
させる事になり、井桁部の熱伝導を良くする事が
出来、井桁部の温度上昇を小さく出来る。 After completing this adjustment, screw the screws into the screw holes 8a, 8b, 8c, and 8d drilled around the holder 1', and bring the holders 1' and holders 1 into complete contact.
The shaping aperture is completed. At this time, the linear shielding member protruding from the surface of each holder to be in close contact is compressively deformed due to the close contact, increasing the contact area between the linear shielding member and the beam passage prevention thin film diaphragm. As a result, the heat conduction of the cross section can be improved, and the temperature rise in the cross section can be reduced.
該整形用絞りを電子ビーム描画装置等の電子光
学系に組込めば、電子銃からの電子ビームは該整
形用絞りの井桁部により断面が該井桁状に整形さ
れターゲツトへ照射される。尚、該絞りの井桁部
以外に当つた電子ビームはビーム通過防止薄膜絞
り６によりターゲツト方向に進むのが遮蔽され
る。 When the shaping aperture is incorporated into an electron optical system such as an electron beam lithography device, the cross section of the electron beam from the electron gun is shaped into the parallel cross section by the parallel cross section of the shaping aperture, and the electron beam is irradiated onto the target. Incidentally, the electron beams that hit areas other than the cross section of the diaphragm are blocked from traveling toward the target by the beam-passage preventing thin film diaphragm 6.
［考案の効果］
本考案の整形用絞りは、２つのホルダ夫々に刻
設された平行な２本の溝に線状遮蔽部材を張架
し、この様なホルダを、２対の線状遮蔽部材が井
桁形状を成す様にビーム通過防止薄膜絞りを挾ん
で重なる構成なので、各ホルダの重ね面の加工精
度と溝の加工精度を良くする丈の簡単な作業で、
辺の仕上げ度、辺の真直度，辺の直角度を高める
事が出来、歩留りも良い。又、何等かの原因で直
角度等が低下した時においても、再調整が簡単で
ある。[Effects of the invention] The shaping diaphragm of the present invention has a linear shielding member stretched between two parallel grooves carved in each of two holders, and such a holder is connected to two pairs of linear shielding members. Since the parts are overlapped to form a grid shape with a thin film diaphragm to prevent beam passage, it is a simple work that improves the machining accuracy of the overlapping surfaces of each holder and the machining accuracy of the grooves.
It is possible to improve the finish of the sides, the straightness of the sides, and the squareness of the sides, and the yield is also good. Furthermore, even if the perpendicularity etc. decreases for some reason, readjustment is easy.
第１図ａ，ｂ及びｃは本考案の整形用絞りの構
成要素の一例を示すための図、第２図は各要素を
組み合わせて製作された本考案の一実施例として
の荷電ビーム装置用整形絞りを示すための図であ
る。
１，１′……ホルダ、２，２′……電子ビーム通
過孔、３ａ，３ｂ，３a′，３b′……平行溝、４
ａ，４ｂ，４a′，４b′……ストツパ、５ａ，５
ｂ，５a′，５b′……線状遮蔽部材、６……ビーム
通過防止用薄膜絞り、７……孔。
Figures 1a, b, and c are diagrams showing an example of the constituent elements of the shaping aperture of the present invention, and Figure 2 is a diagram for a charged beam device as an embodiment of the present invention manufactured by combining each element. It is a figure for showing a shaping aperture. 1, 1'...Holder, 2, 2'...Electron beam passing hole, 3a, 3b, 3a', 3b'...Parallel groove, 4
a, 4b, 4a', 4b'... Stoppa, 5a, 5
b, 5a', 5b'... Linear shielding member, 6... Thin film diaphragm for preventing beam passage, 7... Hole.
Claims (1)
第２のホルダを有しており、該第１，第２のホル
ダ各々には該ビーム通過孔の少なくとも一部を横
切り且つ夫々に線状の荷電粒子ビーム遮蔽部材を
張架した時に該遮蔽部材の一部がホルダ表面より
突出する様な２本の平行な溝が刻設されており、
該各張架された荷電粒子ビーム遮蔽部材が各ホル
ダのサイドで、該ホルダのサイドに取付け取外し
自在なストツパにより固定されており、該第１，
第２のホルダは該２対の線状荷電粒子ビーム遮蔽
部材が井桁状に交差するように重ねられており、
該２対の線状荷電粒子ビーム遮蔽部材で囲まれた
矩形領域以外を通過する荷電粒子ビームを遮蔽す
るための遮蔽板が前記各ホルダ間に備えられてい
ることを特徴とする荷電粒子ビーム装置用整形絞
り。 The first one has a charged particle beam passage hole in the center.
a second holder, and when a linear charged particle beam shielding member is stretched across at least a portion of the beam passage hole and stretched across each of the first and second holders, the shielding member There are two parallel grooves that partially protrude from the holder surface.
Each of the suspended charged particle beam shielding members is fixed on the side of each holder by a stopper that can be attached to and detached from the side of the holder, and the first,
In the second holder, the two pairs of linear charged particle beam shielding members are stacked so as to intersect in a grid pattern,
A charged particle beam device characterized in that a shielding plate is provided between each of the holders for shielding a charged particle beam that passes through a region other than a rectangular area surrounded by the two pairs of linear charged particle beam shielding members. For shaping aperture.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985008990U JPH0543470Y2 (en) | 1985-01-25 | 1985-01-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985008990U JPH0543470Y2 (en) | 1985-01-25 | 1985-01-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61125043U JPS61125043U (en) | 1986-08-06 |
| JPH0543470Y2 true JPH0543470Y2 (en) | 1993-11-02 |
Family
ID=30488782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985008990U Expired - Lifetime JPH0543470Y2 (en) | 1985-01-25 | 1985-01-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0543470Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5921020A (en) * | 1982-07-27 | 1984-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Molding diaphragm for charged beam exposure device |
-
1985
- 1985-01-25 JP JP1985008990U patent/JPH0543470Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5921020A (en) * | 1982-07-27 | 1984-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Molding diaphragm for charged beam exposure device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61125043U (en) | 1986-08-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100242926B1 (en) | Charged-particle-beam exposure device | |
| JP2529494B2 (en) | Magnetic head and magnetic head azimuth adjustment method | |
| JP4439203B2 (en) | Multi-face mask device and assembly method thereof | |
| JPH04294044A (en) | Electronic energy filter | |
| US2913551A (en) | Switch group | |
| JPH01286478A (en) | Beam uniformizing optical system and manufacture thereof | |
| JPH0543470Y2 (en) | ||
| JP2001162388A (en) | Method of laser welding for plated steel plate and welding structure | |
| JPS58186141A (en) | Multibeam electron gun and method of assembling same | |
| JP3480829B2 (en) | Particle beam system with dynamic focus coil | |
| JP2017061726A (en) | Metal mask manufacturing method | |
| KR102308090B1 (en) | OLED metal mask and apparatus for manufacturing thereof and method for manufacturing thereof | |
| JPH0631717Y2 (en) | Shaped diaphragm for charged particle beam drawing device | |
| JP2592258B2 (en) | Electron beam exposure system | |
| JPH09102449A (en) | Charged particle beam exposure method and device and molding diaphragm and its manufacture | |
| KR102138797B1 (en) | Producing system of mask integrated frame | |
| JP2834901B2 (en) | Method for manufacturing stem for semiconductor laser device | |
| JPH10125267A (en) | Energy filter | |
| JP2595150B2 (en) | Transmission mask for charged particle beam exposure | |
| JPH0618171B2 (en) | Aperture aperture | |
| KR20070106264A (en) | Yoke and making method the same | |
| JPH0219785Y2 (en) | ||
| JPH03253247A (en) | Manufacture of laminated core | |
| JPH08264129A (en) | Electron gun structure, and its manufacture | |
| JPS618832A (en) | Electron gun frame body for color picture tube |