JPH01286478A - Beam uniformizing optical system and manufacture thereof - Google Patents

Beam uniformizing optical system and manufacture thereof

Info

Publication number
JPH01286478A
JPH01286478A JP11468188A JP11468188A JPH01286478A JP H01286478 A JPH01286478 A JP H01286478A JP 11468188 A JP11468188 A JP 11468188A JP 11468188 A JP11468188 A JP 11468188A JP H01286478 A JPH01286478 A JP H01286478A
Authority
JP
Japan
Prior art keywords
light
converged
intensity
surface
stray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11468188A
Inventor
Yukio Kawakubo
Chiyuukou Ko
Yoshihiko Koike
Yoshimasa Kubota
Tsuneyoshi Ohashi
Hiroharu Sasaki
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11468188A priority Critical patent/JPH01286478A/en
Publication of JPH01286478A publication Critical patent/JPH01286478A/en
Application status is Granted legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
    • G03F7/70941Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping

Abstract

PURPOSE:To prevent local ununiform distribution of intensity caused by stray light and to obtain laser light having uniform intensity by arranging a douser having shielding sections and light transmitting holes corresponding respectively to the boundaries and converging faces of a fly-eye lens, on the emission side of the fly-eye lens. CONSTITUTION:A douser 5 is provided with light transmitting holes 5A in the regions corresponding to a light source 3 and with shielding sections 5B in the regions corresponding to stray light 4. The light rays passing the through the light transmitting hole 5A are converged by a condenser lens 7 and focused on a surface to be irradiated 8 to form luminous fluxes 10 having uniform distribution of intensity. The converged light 3 and the stray light 4 are emitted respectively from the light converging surface and the boundaries 2b of each element lens 2a of a fly-eye lens 2. The converged light 3 is allowed to pass through the light transmitting holes 5A while the stray light 4 is blocked by the shielding sections 5B. If the stray light 4 is not blocked and applied to the surface to be irradiated 8, spiking light 11 with be generated. By blocking the stray light 4 with the shielding section 5B, only the converged light 3 is allowed to pass through the transmitting holes 5A to reach the surface to be irradiated 8. Thus, it is possible to obtain laser light having uniform distribution of intensity.
JP11468188A 1988-05-13 1988-05-13 Beam uniformizing optical system and manufacture thereof Granted JPH01286478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11468188A JPH01286478A (en) 1988-05-13 1988-05-13 Beam uniformizing optical system and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11468188A JPH01286478A (en) 1988-05-13 1988-05-13 Beam uniformizing optical system and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH01286478A true JPH01286478A (en) 1989-11-17

Family

ID=14643975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11468188A Granted JPH01286478A (en) 1988-05-13 1988-05-13 Beam uniformizing optical system and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH01286478A (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH049291A (en) * 1990-04-27 1992-01-14 Canon Inc Boring machine by laser
FR2737786A1 (en) * 1995-08-11 1997-02-14 Soc D Production Et De Rech Ap An optical device for homogenising a laser beam
JP2005166871A (en) * 2003-12-02 2005-06-23 Nikon Corp Illumination optical device, projection aligner, exposure method and device manufacturing method
US6991975B1 (en) 1992-06-26 2006-01-31 Semiconductor Energy Laboratory Co., Ltd. Laser process
US7292316B2 (en) 2003-11-12 2007-11-06 Canon Kabushiki Kaisha Illumination optical system and exposure apparatus having the same
JP2010157743A (en) * 2010-01-14 2010-07-15 Nikon Corp Illumination optical apparatus, projection aligner, exposure method, and device manufacturing method
US8523800B2 (en) 2004-08-27 2013-09-03 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8932341B2 (en) 2004-08-27 2015-01-13 Rox Medical, Inc. Method for establishing an artificial arterio-venous fistula
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9468441B2 (en) 2004-08-27 2016-10-18 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH049291A (en) * 1990-04-27 1992-01-14 Canon Inc Boring machine by laser
US6991975B1 (en) 1992-06-26 2006-01-31 Semiconductor Energy Laboratory Co., Ltd. Laser process
US7985635B2 (en) 1992-06-26 2011-07-26 Semiconductor Energy Laboratory Co., Ltd. Laser process
WO1997007423A1 (en) * 1995-08-11 1997-02-27 Societe De Production Et De Recherches Appliquees Optical device for homogenising a laser beam
WO1997007424A1 (en) * 1995-08-11 1997-02-27 Societe De Production Et De Recherches Appliquees Fibre optic device for homogenising a laser beam
US6055346A (en) * 1995-08-11 2000-04-25 Societe De Production Et De Recherches Appliquees Fibre optic device for homogenizing a laser beam
FR2737786A1 (en) * 1995-08-11 1997-02-14 Soc D Production Et De Rech Ap An optical device for homogenising a laser beam
US6014260A (en) * 1995-08-11 2000-01-11 Societe De Production Et De Recherches Appliquees Optical device for homogenizing a laser beam
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US7292316B2 (en) 2003-11-12 2007-11-06 Canon Kabushiki Kaisha Illumination optical system and exposure apparatus having the same
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
JP2005166871A (en) * 2003-12-02 2005-06-23 Nikon Corp Illumination optical device, projection aligner, exposure method and device manufacturing method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10098643B2 (en) 2004-08-27 2018-10-16 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US9510832B2 (en) 2004-08-27 2016-12-06 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US9706997B2 (en) 2004-08-27 2017-07-18 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US8932341B2 (en) 2004-08-27 2015-01-13 Rox Medical, Inc. Method for establishing an artificial arterio-venous fistula
US9820745B2 (en) 2004-08-27 2017-11-21 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US9468441B2 (en) 2004-08-27 2016-10-18 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US8523800B2 (en) 2004-08-27 2013-09-03 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US8734472B2 (en) 2004-08-27 2014-05-27 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US9023097B2 (en) 2004-08-27 2015-05-05 Rox Medical, Inc. Device and method for establishing an artificial arterio-venous fistula
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010157743A (en) * 2010-01-14 2010-07-15 Nikon Corp Illumination optical apparatus, projection aligner, exposure method, and device manufacturing method

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