JPS61123151A - Production apparatus - Google Patents

Abstract

PURPOSE:To shorten processes for products, to improve yield and to reduce the number of operators by forming a plurality of housing sections, disposing a stocker delivering materials to be treated between the stocker and a conveyor while being faced to a carrying path and controlling each treater, the conveyor, a shifter and the stocker by a controller. CONSTITUTION:A conveyor holding and carrying a plurality of works is arranged onto a carrying path, and controlled by a central controller and moved on the carrying path. The conveyor has wheels 36 in the lower section of a pedestal 35, and is controlled and shifted by radio. A work receiving arm 38 is mounted on the side from a machine body 37 on the pedestal 35, and works 39 carried out of a stocker 28 are placed on the arm 38 and the arm 38 supports the works. The stocker 28 consists of shelves 42 with a plurality of housing sections 41 housing works 39 and a transfer machine 43, which can freely be elevated or lowered and moved right and left, and the transfer machine 43 supplies the conveyor with works 39 by a command from the central controller or houses works in empty housing sections 41 in shelves 42.

Description

Detailed Description of the Invention The present invention provides a processing equipment group (Jo
b-5hop-Type) and each processing equipment group (
A conveying machine (conveying device) for conveying (workpieces) is arranged, and the conveying machine, a group of processing devices, etc. are controlled by automatically determining the processing order, processing conditions, etc. of various types of workpieces from input information, Operate these organically with high efficiency (Flow-3hop-T)
Automated manufacturing equipment that optimizes product management and process control, especially wafer production in the semiconductor industry.
This invention relates to processing equipment for semiconductors (sub-semiconductor thin plates).

Circuit elements used in the assembly of semiconductor devices, ICs (integrated circuits), and LSIs (large-scale integration) are generally made of small semiconductor pieces (vellets). These pellets are great semiconductors! It is obtained by dividing circuit element regions arranged horizontally in one line at the boundary. K to create circuit element regions on a wafer requires an extremely large number of machining processes of 8 fc. For example, a silicon wafer ( Looking at the process of forming a region containing desired impurity atoms, there are (1) a cleaning process of cleaning by cleaning with sea urchins, C2) que...
An oxide film forming step in which an oxide film (3'Oz) is formed on the surface by heat treatment, (3) a resist (photoresist) is applied on the oxide film and dried)I! Cloth process (
4) Exposure step to partially expose the resist, (5) Resist subdivided removal (etching) to partially remove exposed and non-exposed resist, (6) Partial r/c remaining on the oxide film. (8) Resist removal (etching) process to remove the resist remaining on the C7 oxide film from the oxide film part removal (etching) using the resist as a mask to expose the oxide at-removal; (8) using the oxide film as a mask By placing silicon quench in an impurity atmosphere, or by using techniques such as CVD (chemical vapor deposition), vapor deposition, or ion implantation, impurity atoms are deposited on exposed silicon or transferred into the base layer, and heat is applied again. In addition, there is a diffusion process to diffuse impurities to a desired depth, and (9) a removal (etching) process to remove unnecessary oxide films and the like on the surface of the sea urchin.

Furthermore, the technique that starts with the resist coating process and ends with the resist removal process (7) is generally called photoetching technique.
However, this technique is used repeatedly to form circuit elements. In other words, formation of wiring layer other than impurity diffusion,
It is also used to form a holding film for chisel quesion.

In this way, various processes are applied to the sea urchin, and the process sequence for each product differs depending on the product.

The most efficient work format is the so-called 70-shop shop (Flow
-5hop -Type), the work will flow smoothly. However, each product is generally not produced in large quantities to warrant its own equipment layout. Even if such a product existed that could be mass-produced, the development of the semiconductor industry is slow and products change rapidly.As a result, the equipment layout would quickly become obsolete and unusable. Therefore, conventionally, as shown in Figure 1, a4A details that perform common tasks are arranged together.
So-called job shop type (Job-5hOp-T)
``!pe) (In the figure, a plurality of expansion devices 1t-disposed diffusion N2, an ion implantation tile 4 with a plurality of ion implantation devices 3 disposed, a plurality of photoetching devices 5 and an N device 6t-disposed photo Resist presentation 7, multiple vaporization M
CVD evaporation layer 9 with equipment 8 etc. installed, multiple calibration devices! (
Prober) Inspection with 10 placed! 1t11 etc. are arranged. ), and we have no choice but to adopt a method of processing multiple types of work in some stables for each type of e-cup. However, in wave processing, the iB method (dozens of methods)
Since a large number (tens of thousands) of different types (hundreds of types) of workpieces with different characteristics are flowed simultaneously, it is difficult to manage them effectively. As a result, the construction period becomes long and a large number of workers are required. In addition, the work space where sea urchins are processed needs to be kept clean at all times, but as many workers move around in the processing room, clothing (garbage adhering to them) and dirt adhering to the floor, etc., may fly up and scatter. Quest...
becomes contaminated and reduces yield. In particular, as the patterns of circuit elements become finer, highly clean work spaces are required.゛On the other hand, it is difficult for humans to maintain a highly efficient state permanently due to their inherent Kffi, which is also a cause of prolonging the completion time of construction.

Therefore, by automating each detail of the conventional wafer processing process, work efficiency in each process has been improved.1. We are working to improve yield by maintaining a clean work space. In addition, some efforts are being made to computerize regression management information processing on a mini-scale.

However, even if these devices are automated or computer-controlled for a single process, product management is not sufficient when viewed from the manufacturing route of a single product.

In addition, since sea urchins crawl between each automatic machine or between two processing machines by workers, prevention of wafer contamination cannot be said to be sufficient. In particular, the presence of workers along the moving route of the wafer is a contamination! 't-This is a fatal cause that cannot be adequately prevented.

Therefore, the purpose of the present invention is to prevent contamination of the workpiece by processing the workpiece, such as query processing, in an unmanned device, and to perform a series of operations on the workpiece in an organic manner.
It is possible to shorten the completion time of products, improve yields, and reduce the number of workers by performing product management for a large number of products and many workpieces.

Another object of the present invention is to reduce the area required for installing the equipment by consolidating all of the processing equipment '1#.

Margin below In order to achieve such an object, the present invention has at least one processing device that automatically transports the object to be processed and performs a predetermined process, and each of the processing devices performs different processing on the object to be processed. a plurality of processing departments for processing, a transport path connecting each processing device, a transport device that accommodates and holds the workpiece that moves along the transport path and is transferred to each processing device, and each processing device and the transport device. A transfer device that transfers the workpiece between the two, and a plurality of storage units disposed facing the conveyance path and accommodating the workpiece, and transfers the workpiece between the conveyor and the conveyance device. A stocker, each processing device, and a conveyance device.

It is equipped with a control device that controls a transfer device and a stocker.

Next, the present invention will be explained with reference to the drawings shown in Factor 2 to FIG. 9. 2 to 8 show an embodiment of the present invention. FIG. 2 shows an "aWIi" plan view of a manufacturing apparatus according to the present invention, particularly a wafer processing apparatus. This wafer processing apparatus has a building in which the whole or part of the building is a single apparatus.
Many devices are located inside it. That is,
A conveyance path 12 is arranged in the center of the building along its longitudinal direction. Further, this conveyance path 12 has a number of stopping points (indicated by O marks in the figure) 13. Furthermore, a plurality of processing departments each consisting of a plurality of processing equipment are arranged on both sides of the conveyance path 120. In other words, −@ of the conveyance path 12
The CVD system consists of two automated CVD devices 14.
Processing Department 15. Diffusion Processing Department consisting of 4 automated diffusion devices 16 17. 4 automated diffusion devices 7? , photoresist processing section (exposure processing section) consisting of 18 photoresist processing machines, 19.2 automated machines A7? : An etching processing section 21 consisting of a photoetching device 20 and an ion implantation and processing section 23 consisting of two automated ion implantation devices 22 are arranged side by side.

Further, on the other side of the conveyance path 12, a vapor deposition processing section 25 consisting of two automated vapor deposition devices 24, an inspection processing section 27 consisting of three automated inspection devices 26, and an automated companion stocker 28 are arranged. It is set up. Furthermore, on the back side of the stocker 28, a central information processing @30 consisting of a glass-walled room in which a central u device 29 (computer) is arranged is disposed.

Further, an air conditioning dust removal (air conditioning dust removal) machine room 31 is widely provided on the side of the stocker 28 and the central information processing room 30. Except for this air conditioner! ! A device (not shown) for purifying the air is installed in the 1m machine room 31, and this device cleans the air inside the building's metal body. #We are trying to purify. Particularly in the case of prisoners...an area where soching is not carried out (...the soching area is a maintenance room where each processing device is repaired and adjusted). gA area, each processing device, the front of each processing device, and the conveyance path 12
Each area facing the air has an even higher air cleanliness level of 7c.
Maintained. Note that 32 in the figure indicates j@.

The number of processing equipment in each processing department 17 increases because even for the same processing, the processing atmosphere differs depending on the process, and secondly, the same equipment cannot be used to prevent autodoping. It is determined by considering the balance of each device to ensure smooth flow of indoor metal work.

6 locations corresponding to the stopping points in l9, transportation s & 12!
l:? At one end of cα, a tube-ding station (■-ding position device) and an unloading/message station (unloading station) for loading and unloading the workpiece are arranged. Then, the workpiece is supplied (carried in) to the loading station as shown by the dashed line arrow. i) Processing equipment! After being taken to the automatic fishing station in the first section and cleaned up as required, it was returned to the unloading mess section. The stopped cotton waste 13 also faces the stocker 281C.

On the other hand, on the conveyance path 12, there is a workpiece (in this case, a
%ii accommodated cartridges, such as Que^t-25
A transport device (!i (transport machine) 23 is disposed that holds and transports a plurality of known transport 1-trilles stored in parallel rows. For example, four transport devices are disposed in this transport device f133. , each is controlled by the arrow control device 29 and the conveyance path 12
Up t - Move. The primary conveyance path 120 has conveyance at both ends.
A station standby station 34 is provided so that an unused transport device f133 is placed on standby. Conveying device 33
As shown in FIGS. 5 to 7, it has wheels 36t at the bottom of the base 35 and moves under wireless control.

A workpiece receiving arm 38 is provided on the side of the machine 37 on the 1 fc s pedestal 35, and as shown in FIG.
As shown in Figure 6-5, it is transferred to the loading station 40 of the processing device. (At the unloading station: 6 stations receive and take the workpieces. These transfer devices may be generally known devices and mechanisms, and are provided, for example, on each processing device side.) Therefore, the arm 38 of the workpiece receiver is also rotated by t on the pedestal 35.

Big, 1I12! The S device 33 moves along the conveyance path 12 while detecting the tape attached along the conveyance path 12 optically, magnetically, mechanically, etc. The vehicle is designed to pass a stop point 13 on a road 12 and proceed to the destination TiC.

As shown in FIGS. 3 and 4, the stocker 28 stores the workpiece 3.
9t - A shelf 42 having a plurality of accommodating parts 41, and a transformer 7 that can be raised and lowered and moved left and right on the front surface of the shelf 42.
It will consist of 7 aircraft and 43 aircraft.

Then, in response to a command from the central controller 290, the transfer machine 43 takes out the workpiece 39t from a predetermined position on the shelf 42 and transfers it to the transfer device fi! 33, or hold the workpiece 39 held by the transport device 933 and store it in the storage section 41 of the shelf. Note that all information about the works 39 to be placed on the shelves is controlled by the central control device 29.

next,! Referring to the 8g 70-chart, I will explain the process. First, the entire workpiece (processed product volume and loft) stored in the stocker is confirmed (one-by-one product management). Once the type (product) is confirmed, the process flow is determined, so it becomes clear which process to perform next. In addition, the current Pl:mulberry status of each processing device in each processing department is confirmed, and its margin change and work-in-progress status are investigated. Furthermore, the priority order of the lofts is determined. Each of these operations is performed based on information stored in the central controller. After that, open line (4
! It checks whether there is a line (0) that can use this line. Furthermore, 1 checks whether this work<e+'t) does not result in the loss of priority 7111,
If there is no damage, the transport device and the transfer machine t-drive will not be ready to transport the workpiece to the predetermined processing device.

On the other hand, in parallel with this, it is checked whether the completed loft can be accommodated or not, and if it is, the conveyance device and the transfer excavator are turned off and the workpiece is accommodated in the storage section 9 41 . After checking all lines, each processing device,
The operation of the transport equipment and transfer machine is controlled while constantly predicting the progress of the work.

The central control unit not only manages the process of workpieces (lots) and products, but also manages the process conditions of each processing device, collects data, and also manages seedance control groups of the processing devices. . In addition, if all the management is performed by a central control unit, the information storage device, the amount of calculation, etc. will increase, and the fc unit will become larger. The device may be built-in, and each work such as calculation, control, etc. may be shared between the device and the central control device.

Such deviation in the actual m direction produces the following effects.

(1) The same type of work for the work is performed in the same processing department's processing department, and the t@ transfer device is used between each processing department, which is a so-called flora shop type.
By arranging these seven-piece products and automatically managing the process control with control@equipment, each processing unit and equipment will operate efficiently, and the loft will be able to work from the desired lot to the desired batch. When completed, it becomes -, so the work efficiency is extremely high. In addition, the computer controls the global conditions, global monitor, etc., resulting in high-quality and stable processing.

(2) Since this device is a 7a-shop type, in which a part of the jog shop type is also adopted, the ground area can be made smaller than that of conventional devices.

(3) In principle, workers are not allowed to enter the kjJ area. Next, contamination of sea urchins is reduced because there are no workers who are the source of large amounts of blood dust.
Yield is improved.

(4) Each processing section C is 6J from the back which is the 1 cutting area of the iris diagram 2! Since the lIA is arranged, high cleanliness and narrow air purification equipment can be made smaller than conventional 9Km.

(5) Since all the work in this machine is automated, the burden on workers is reduced.

Second, the invention is not limited to QK in the above implementation. That is, there may be a larger number of processing departments, and the number of processing devices in each processing department may be different from the number of processing units 11Rj. In addition, in the actual process, the transport unit moves only within the room, but in consideration of connection with other work, it may be possible to move directly into and out of the adjacent building. tfc1 The loading and unloading positions of each processing device are provided at the same end in the actual row, so that one transfer device is used together, but this loading and unloading position is set in an automated processing layer. It may be arranged such that each of the It is divided into two parts. Further, the transfer device is provided with a mechanism for positioning the transfer device and a mechanism for confirming transfer of the workpiece.

Furthermore, when the positioning is performed, the transport device and the processing device may be brought into contact with each other, and information may be exchanged between the two in this state.

``!7t-X transfer device may be of a roller conveyor type, a grip type, etc. Also, the transfer device may be 5K controlled by an M-line method. It can be anything other than the type.

In addition, as shown in FIG.
It is also possible to send the work 'tm in step 4. However, the present invention can be applied to technologies other than wafer processing.

As mentioned above, uninvented! According to the A-manufacturing equipment, product management, process management, processing and transport management, etc. are all carried out by computer, and each processing department is organically controlled, resulting in a smooth flow of work and efficient production from small lots. L<
jm-th processing is performed.

This ninth factor is due to the reduction in processing costs.

1. According to the present invention, the cleaning space and the maintenance space are separated, and the work space f as a cleanliness room is created.
Since it can be made narrower than before, the dust removal device can be made smaller and the installation cost can be reduced.

47'C. According to the present invention, since no worker is present in the work space and the processing conditions of each processing device can be appropriately controlled by a computer, even fine processing can be performed accurately and reliably. Same goes for yield.

First, according to the present invention, the arrangement of processing 4 devices tR4-job'
・Since the shop type and 70-type are connected to form an fc configuration, each workpiece can be flowed efficiently.

In particular, according to this flow shop type, even new product lines can be run as a streamlined line in the same way as old products simply by adding data to the computer circle. Furthermore, even when introducing a new process, it can be smoothly introduced into the production line by handling it as a group of additional equipment. By making it a 1-flow shop type, there are many effects such as being able to reduce the required area.

[Brief explanation of the drawing]

Figure 1 shows the layout of a conventional sea urchin processing vehicle, Drainage 2
0 is a plan view showing an embodiment of the fabrication device of the present invention, FIG. 3 is a front view of the stocker, FIG. 4 is a side sectional view of the stocker, and FIG. 5 is a front view showing the stocker and the conveyor. , Part 6 is a front view showing details of the conveyor and processing equipment,
FIG. 7 is a side view of the conveying machine, FIG. 8 is a flowchart for controlling the process progress, and FIG. 9 is a plan view showing another embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Diffusion chamber, 2... Diffusion chamber, 3... Ion implantation device, 4... Ion implantation chamber, 5... Photo etching device, 6... N optical device, 7...・Photoresist room, 8... Vapor deposition equipment, 9... CVD... Vapor deposition chamber, 1o... Inspection equipment, 11... Inspection room, 12...
・Conveyance path, 13...Stopping point, 14・CVD device, l
5-CV D processing department, 16...diffusion device, 17.
... Diffusion processing department, 18... Photoresist photosensitive equipment, 19... Photosensitive processing department, 20... Photo etching! Direct, 21... Etching processing department, 22... Ion implantation mH12a... Ion implantation processing department, 24.
... Vapor deposition device, 25... Vapor deposition processing department, 26... Inspection device, 27... Inspection processing department, 28... Stocker, 29... Central control device, 30... Central information processing room , 31...4 dust removal machine room, 32...engineering, 33...
・Transportation device, 34...Transportation device standby station 11 characters 2, 35...Pedestal, 36...Wheels, 37...Main body, 38゛...Work receiving ff arm, 39... Work, 40...Loading station, 41...
Storage section, 42... Shelf, 43... 77 transformers, 4
4...Processing department.

Claims (1)

[Claims] 1. Each has at least one processing device that automatically transports the processed material and performs the prescribed processing, and connects each processing device with multiple processing departments that each perform different processing on the processed material. a conveyance path; a conveyance device that accommodates and holds objects to be processed that move along the conveyance path and are moved to each processing device;
A transfer device that transfers the objects to be processed between each processing device and the transport device, and a plurality of storage sections arranged facing the transfer path and accommodating the objects to be processed, and between the transfer device and the transfer device. A manufacturing apparatus comprising: a stocker for delivering and receiving objects to be processed; and a control apparatus for controlling each of the processing apparatuses, a transport apparatus, a transfer apparatus, and the stocker.