JPS61120010A - 磁性塗膜の膜厚測定方法 - Google Patents

磁性塗膜の膜厚測定方法

Info

Publication number
JPS61120010A
JPS61120010A JP59242747A JP24274784A JPS61120010A JP S61120010 A JPS61120010 A JP S61120010A JP 59242747 A JP59242747 A JP 59242747A JP 24274784 A JP24274784 A JP 24274784A JP S61120010 A JPS61120010 A JP S61120010A
Authority
JP
Japan
Prior art keywords
magnetic coating
ray
intensity
magnetic
film thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59242747A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0347681B2 (https=
Inventor
Kazuo Ogasa
和男 小笠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59242747A priority Critical patent/JPS61120010A/ja
Publication of JPS61120010A publication Critical patent/JPS61120010A/ja
Publication of JPH0347681B2 publication Critical patent/JPH0347681B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP59242747A 1984-11-16 1984-11-16 磁性塗膜の膜厚測定方法 Granted JPS61120010A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59242747A JPS61120010A (ja) 1984-11-16 1984-11-16 磁性塗膜の膜厚測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59242747A JPS61120010A (ja) 1984-11-16 1984-11-16 磁性塗膜の膜厚測定方法

Publications (2)

Publication Number Publication Date
JPS61120010A true JPS61120010A (ja) 1986-06-07
JPH0347681B2 JPH0347681B2 (https=) 1991-07-22

Family

ID=17093657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59242747A Granted JPS61120010A (ja) 1984-11-16 1984-11-16 磁性塗膜の膜厚測定方法

Country Status (1)

Country Link
JP (1) JPS61120010A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6423105A (en) * 1987-07-17 1989-01-25 Japan Aviation Electron Film thickness evaluating device
US7362454B2 (en) 2005-01-21 2008-04-22 Hitachi Global Storage Technologies Netherlands B.V. Method and system for measuring overcoat layer thickness on a thin film disk
JP2008209176A (ja) * 2007-02-26 2008-09-11 Fujitsu Ltd 試料分析装置及び試料分析方法
JP2021096214A (ja) * 2019-12-13 2021-06-24 日立金属株式会社 非破壊測定方法、非破壊測定システム、非破壊測定用プログラムおよび記録媒体
KR20220032712A (ko) * 2020-09-08 2022-03-15 주식회사 포스코 강판 코팅층 두께 측정 장치

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6423105A (en) * 1987-07-17 1989-01-25 Japan Aviation Electron Film thickness evaluating device
US7362454B2 (en) 2005-01-21 2008-04-22 Hitachi Global Storage Technologies Netherlands B.V. Method and system for measuring overcoat layer thickness on a thin film disk
JP2008209176A (ja) * 2007-02-26 2008-09-11 Fujitsu Ltd 試料分析装置及び試料分析方法
JP2021096214A (ja) * 2019-12-13 2021-06-24 日立金属株式会社 非破壊測定方法、非破壊測定システム、非破壊測定用プログラムおよび記録媒体
KR20220032712A (ko) * 2020-09-08 2022-03-15 주식회사 포스코 강판 코팅층 두께 측정 장치

Also Published As

Publication number Publication date
JPH0347681B2 (https=) 1991-07-22

Similar Documents

Publication Publication Date Title
US4865445A (en) Apparatus for detecting faults on the surface of a resist master disc and measuring the thickness of the resist coating layer
US4269515A (en) Electro-optical system for inspecting printed circuit boards
EP0250764B1 (en) Film thickness measuring method and device therefor
JPS61120010A (ja) 磁性塗膜の膜厚測定方法
JPH0322922B2 (https=)
EP3540416A2 (en) X-ray utilized compound measuring apparatus
US5400380A (en) Dynamic alloy correction gauge
US5020356A (en) Method and apparatus for measuring characteristics of a multilayer product
JP3333940B2 (ja) X線を使用して層の厚みを測定する装置の較正装置および較正方法
JP2945537B2 (ja) 半田付け検査方法及び装置
JP2591911Y2 (ja) 塗工量計
EP0128922A1 (en) PROCESS FOR PRODUCING A RADIOLOGICAL IMAGE OF AN OBJECT, PREFERABLY USED IN MATERIAL TESTS, AS WELL AS A MECHANISM FOR PUTTING IT INTO PRACTICE.
JPS61250508A (ja) 膜厚測定装置
JPH03148056A (ja) 全反射螢光x線分析装置
JPH01219529A (ja) 応力測定方法及び応力測定装置
JPS62118243A (ja) 表面欠陥検査装置
JP2002213935A (ja) 膜厚測定方法
JPS61119388A (ja) 高エネルギ密度ビ−ムのビ−ム照射位置検出方法
JPH04113206A (ja) 測定装置における検量線校正方法
JPS6398550A (ja) 軟x線領域のエクザフス装置
JPH028242B2 (https=)
JPS62255807A (ja) 膜厚測定装置
Rogers X-Ray Inspection Moves into Process Control
Clark et al. Toward more precise beam position measurements
Fessenden et al. Toward More Precise Beam Positron Measurements