JPS61116836A - 縮小投影露光方式におけるアライメント方法 - Google Patents

縮小投影露光方式におけるアライメント方法

Info

Publication number
JPS61116836A
JPS61116836A JP59237420A JP23742084A JPS61116836A JP S61116836 A JPS61116836 A JP S61116836A JP 59237420 A JP59237420 A JP 59237420A JP 23742084 A JP23742084 A JP 23742084A JP S61116836 A JPS61116836 A JP S61116836A
Authority
JP
Japan
Prior art keywords
reticle
alignment
pattern
wafer
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59237420A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0516649B2 (enExample
Inventor
Toshihiko Nakada
俊彦 中田
Masataka Shiba
正孝 芝
Yoshisada Oshida
良忠 押田
Yukio Uto
幸雄 宇都
Atsuhiro Yoshizaki
敦浩 吉崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59237420A priority Critical patent/JPS61116836A/ja
Priority to EP85114364A priority patent/EP0182251B1/en
Priority to DE8585114364T priority patent/DE3573864D1/de
Priority to US06/797,131 priority patent/US4725737A/en
Publication of JPS61116836A publication Critical patent/JPS61116836A/ja
Publication of JPH0516649B2 publication Critical patent/JPH0516649B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59237420A 1984-11-13 1984-11-13 縮小投影露光方式におけるアライメント方法 Granted JPS61116836A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59237420A JPS61116836A (ja) 1984-11-13 1984-11-13 縮小投影露光方式におけるアライメント方法
EP85114364A EP0182251B1 (en) 1984-11-13 1985-11-12 Alignment method for reduction projection type aligner
DE8585114364T DE3573864D1 (en) 1984-11-13 1985-11-12 Alignment method for reduction projection type aligner
US06/797,131 US4725737A (en) 1984-11-13 1985-11-12 Alignment method and apparatus for reduction projection type aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59237420A JPS61116836A (ja) 1984-11-13 1984-11-13 縮小投影露光方式におけるアライメント方法

Publications (2)

Publication Number Publication Date
JPS61116836A true JPS61116836A (ja) 1986-06-04
JPH0516649B2 JPH0516649B2 (enExample) 1993-03-05

Family

ID=17015090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59237420A Granted JPS61116836A (ja) 1984-11-13 1984-11-13 縮小投影露光方式におけるアライメント方法

Country Status (1)

Country Link
JP (1) JPS61116836A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04142021A (ja) * 1990-10-02 1992-05-15 Canon Inc 露光装置
US7456966B2 (en) 2004-01-19 2008-11-25 International Business Machines Corporation Alignment mark system and method to improve wafer alignment search range
CN113296354A (zh) * 2020-02-22 2021-08-24 长鑫存储技术有限公司 应用于半导体光刻工艺中的掩膜版及光刻工艺方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989421A (ja) * 1982-11-15 1984-05-23 Canon Inc 位置検出装置
JPS59170841A (ja) * 1983-03-17 1984-09-27 Nippon Seiko Kk 露光装置における位置合わせ装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989421A (ja) * 1982-11-15 1984-05-23 Canon Inc 位置検出装置
JPS59170841A (ja) * 1983-03-17 1984-09-27 Nippon Seiko Kk 露光装置における位置合わせ装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04142021A (ja) * 1990-10-02 1992-05-15 Canon Inc 露光装置
US7456966B2 (en) 2004-01-19 2008-11-25 International Business Machines Corporation Alignment mark system and method to improve wafer alignment search range
CN113296354A (zh) * 2020-02-22 2021-08-24 长鑫存储技术有限公司 应用于半导体光刻工艺中的掩膜版及光刻工艺方法

Also Published As

Publication number Publication date
JPH0516649B2 (enExample) 1993-03-05

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