JPS61113376A - テレビジヨン信号の動き検出装置 - Google Patents

テレビジヨン信号の動き検出装置

Info

Publication number
JPS61113376A
JPS61113376A JP59234777A JP23477784A JPS61113376A JP S61113376 A JPS61113376 A JP S61113376A JP 59234777 A JP59234777 A JP 59234777A JP 23477784 A JP23477784 A JP 23477784A JP S61113376 A JPS61113376 A JP S61113376A
Authority
JP
Japan
Prior art keywords
frame difference
supplied
circuits
weighting coefficient
integral data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59234777A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562877B2 (enrdf_load_stackoverflow
Inventor
Tetsujiro Kondo
哲二郎 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP59234777A priority Critical patent/JPS61113376A/ja
Publication of JPS61113376A publication Critical patent/JPS61113376A/ja
Publication of JPH0562877B2 publication Critical patent/JPH0562877B2/ja
Granted legal-status Critical Current

Links

JP59234777A 1984-11-07 1984-11-07 テレビジヨン信号の動き検出装置 Granted JPS61113376A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59234777A JPS61113376A (ja) 1984-11-07 1984-11-07 テレビジヨン信号の動き検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59234777A JPS61113376A (ja) 1984-11-07 1984-11-07 テレビジヨン信号の動き検出装置

Publications (2)

Publication Number Publication Date
JPS61113376A true JPS61113376A (ja) 1986-05-31
JPH0562877B2 JPH0562877B2 (enrdf_load_stackoverflow) 1993-09-09

Family

ID=16976204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59234777A Granted JPS61113376A (ja) 1984-11-07 1984-11-07 テレビジヨン信号の動き検出装置

Country Status (1)

Country Link
JP (1) JPS61113376A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217184A (ja) * 1990-01-23 1991-09-24 Victor Co Of Japan Ltd 動きベクトル検出装置
US5157732A (en) * 1989-03-20 1992-10-20 Matsushita Electric Industrial Co., Ltd. Motion vector detector employing image subregions and median values
WO1993016556A1 (en) * 1992-02-08 1993-08-19 Samsung Electronics Co., Ltd. Method and apparatus for motion estimation

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
WO2005071491A2 (en) 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1774405B1 (en) 2004-06-04 2014-08-06 Carl Zeiss SMT GmbH System for measuring the image quality of an optical imaging system
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352440B2 (en) 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
SG182983A1 (en) 2006-08-31 2012-08-30 Nikon Corp Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5157732A (en) * 1989-03-20 1992-10-20 Matsushita Electric Industrial Co., Ltd. Motion vector detector employing image subregions and median values
JPH03217184A (ja) * 1990-01-23 1991-09-24 Victor Co Of Japan Ltd 動きベクトル検出装置
WO1993016556A1 (en) * 1992-02-08 1993-08-19 Samsung Electronics Co., Ltd. Method and apparatus for motion estimation

Also Published As

Publication number Publication date
JPH0562877B2 (enrdf_load_stackoverflow) 1993-09-09

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