JPH0562877B2 - - Google Patents
Info
- Publication number
- JPH0562877B2 JPH0562877B2 JP23477784A JP23477784A JPH0562877B2 JP H0562877 B2 JPH0562877 B2 JP H0562877B2 JP 23477784 A JP23477784 A JP 23477784A JP 23477784 A JP23477784 A JP 23477784A JP H0562877 B2 JPH0562877 B2 JP H0562877B2
- Authority
- JP
- Japan
- Prior art keywords
- frame difference
- motion vector
- weighting coefficient
- data
- regions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000033001 locomotion Effects 0.000 claims description 69
- 239000013598 vector Substances 0.000 claims description 58
- 238000001514 detection method Methods 0.000 claims description 13
- 238000012935 Averaging Methods 0.000 claims description 10
- 230000015654 memory Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000013075 data extraction Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004091 panning Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59234777A JPS61113376A (ja) | 1984-11-07 | 1984-11-07 | テレビジヨン信号の動き検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59234777A JPS61113376A (ja) | 1984-11-07 | 1984-11-07 | テレビジヨン信号の動き検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61113376A JPS61113376A (ja) | 1986-05-31 |
| JPH0562877B2 true JPH0562877B2 (enrdf_load_stackoverflow) | 1993-09-09 |
Family
ID=16976204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59234777A Granted JPS61113376A (ja) | 1984-11-07 | 1984-11-07 | テレビジヨン信号の動き検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61113376A (enrdf_load_stackoverflow) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7602470B2 (en) | 2004-08-19 | 2009-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8902401B2 (en) | 2006-05-09 | 2014-12-02 | Carl Zeiss Smt Gmbh | Optical imaging device with thermal attenuation |
| US8937704B2 (en) | 2003-07-31 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a resistivity sensor |
| US8941810B2 (en) | 2005-12-30 | 2015-01-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9182222B2 (en) | 2004-12-10 | 2015-11-10 | Asml Netherlands B.V. | Substrate placement in immersion lithography |
| US9256136B2 (en) | 2010-04-22 | 2016-02-09 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply |
| US9429495B2 (en) | 2004-06-04 | 2016-08-30 | Carl Zeiss Smt Gmbh | System for measuring the image quality of an optical imaging system |
| US9436095B2 (en) | 2004-01-20 | 2016-09-06 | Carl Zeiss Smt Gmbh | Exposure apparatus and measuring device for a projection lens |
| US9477160B2 (en) | 2003-05-13 | 2016-10-25 | Asml Netherland B.V. | Lithographic apparatus and device manufacturing method |
| US9568841B2 (en) | 2003-08-29 | 2017-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10162274B2 (en) | 2006-08-31 | 2018-12-25 | Nikon Corporation | Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07105949B2 (ja) * | 1989-03-20 | 1995-11-13 | 松下電器産業株式会社 | 画像の動きベクトル検出装置および揺れ補正装置 |
| JPH0832048B2 (ja) * | 1990-01-23 | 1996-03-27 | 日本ビクター株式会社 | 動きベクトル検出装置 |
| KR950014862B1 (ko) * | 1992-02-08 | 1995-12-16 | 삼성전자주식회사 | 움직임추정방법 및 그 장치 |
-
1984
- 1984-11-07 JP JP59234777A patent/JPS61113376A/ja active Granted
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9477160B2 (en) | 2003-05-13 | 2016-10-25 | Asml Netherland B.V. | Lithographic apparatus and device manufacturing method |
| US8937704B2 (en) | 2003-07-31 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a resistivity sensor |
| US9285686B2 (en) | 2003-07-31 | 2016-03-15 | Asml Netherlands B.V. | Lithographic apparatus involving an immersion liquid supply system with an aperture |
| US9568841B2 (en) | 2003-08-29 | 2017-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US9436095B2 (en) | 2004-01-20 | 2016-09-06 | Carl Zeiss Smt Gmbh | Exposure apparatus and measuring device for a projection lens |
| US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9429495B2 (en) | 2004-06-04 | 2016-08-30 | Carl Zeiss Smt Gmbh | System for measuring the image quality of an optical imaging system |
| US9104117B2 (en) | 2004-07-07 | 2015-08-11 | Bob Streefkerk | Lithographic apparatus having a liquid detection system |
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9097992B2 (en) | 2004-08-19 | 2015-08-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7602470B2 (en) | 2004-08-19 | 2009-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9488923B2 (en) | 2004-08-19 | 2016-11-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9507278B2 (en) | 2004-08-19 | 2016-11-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9182222B2 (en) | 2004-12-10 | 2015-11-10 | Asml Netherlands B.V. | Substrate placement in immersion lithography |
| US8941810B2 (en) | 2005-12-30 | 2015-01-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9436096B2 (en) | 2005-12-30 | 2016-09-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8947631B2 (en) | 2005-12-30 | 2015-02-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8902401B2 (en) | 2006-05-09 | 2014-12-02 | Carl Zeiss Smt Gmbh | Optical imaging device with thermal attenuation |
| US10162274B2 (en) | 2006-08-31 | 2018-12-25 | Nikon Corporation | Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method |
| US9256136B2 (en) | 2010-04-22 | 2016-02-09 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61113376A (ja) | 1986-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |