JPS61110140A - マスクリペア装置 - Google Patents
マスクリペア装置Info
- Publication number
- JPS61110140A JPS61110140A JP59232853A JP23285384A JPS61110140A JP S61110140 A JPS61110140 A JP S61110140A JP 59232853 A JP59232853 A JP 59232853A JP 23285384 A JP23285384 A JP 23285384A JP S61110140 A JPS61110140 A JP S61110140A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- sample
- compound vapor
- compd
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims description 28
- 238000005507 spraying Methods 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims 4
- 230000007547 defect Effects 0.000 abstract description 6
- 238000004891 communication Methods 0.000 abstract description 2
- 238000007664 blowing Methods 0.000 abstract 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- 241001052209 Cylinder Species 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- KGNDCEVUMONOKF-UGPLYTSKSA-N benzyl n-[(2r)-1-[(2s,4r)-2-[[(2s)-6-amino-1-(1,3-benzoxazol-2-yl)-1,1-dihydroxyhexan-2-yl]carbamoyl]-4-[(4-methylphenyl)methoxy]pyrrolidin-1-yl]-1-oxo-4-phenylbutan-2-yl]carbamate Chemical compound C1=CC(C)=CC=C1CO[C@H]1CN(C(=O)[C@@H](CCC=2C=CC=CC=2)NC(=O)OCC=2C=CC=CC=2)[C@H](C(=O)N[C@@H](CCCCN)C(O)(O)C=2OC3=CC=CC=C3N=2)C1 KGNDCEVUMONOKF-UGPLYTSKSA-N 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125833 compound 23 Drugs 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- -1 phosphorus compound Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59232853A JPS61110140A (ja) | 1984-11-05 | 1984-11-05 | マスクリペア装置 |
| PCT/JP1985/000349 WO1986000426A1 (en) | 1984-06-26 | 1985-06-21 | Mask repairing apparatus |
| EP85903053A EP0221184B1 (en) | 1984-06-26 | 1985-06-21 | Mask repairing apparatus |
| DE8585903053T DE3579236D1 (de) | 1984-06-26 | 1985-06-21 | Reparatur von masken. |
| US07/227,469 US4930439A (en) | 1984-06-26 | 1988-08-02 | Mask-repairing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59232853A JPS61110140A (ja) | 1984-11-05 | 1984-11-05 | マスクリペア装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61110140A true JPS61110140A (ja) | 1986-05-28 |
| JPS6319857B2 JPS6319857B2 (enrdf_load_stackoverflow) | 1988-04-25 |
Family
ID=16945838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59232853A Granted JPS61110140A (ja) | 1984-06-26 | 1984-11-05 | マスクリペア装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61110140A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01150139A (ja) * | 1987-11-09 | 1989-06-13 | American Teleph & Telegr Co <Att> | デバイスのマスク修正プロセスとマスク |
| US5591970A (en) * | 1994-09-17 | 1997-01-07 | Kabushiki Kaisha Toshiba | Charged beam apparatus |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320221U (enrdf_load_stackoverflow) * | 1986-07-24 | 1988-02-10 |
-
1984
- 1984-11-05 JP JP59232853A patent/JPS61110140A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01150139A (ja) * | 1987-11-09 | 1989-06-13 | American Teleph & Telegr Co <Att> | デバイスのマスク修正プロセスとマスク |
| US5591970A (en) * | 1994-09-17 | 1997-01-07 | Kabushiki Kaisha Toshiba | Charged beam apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6319857B2 (enrdf_load_stackoverflow) | 1988-04-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |