JPS61110137A - Heater for processing solution - Google Patents

Heater for processing solution

Info

Publication number
JPS61110137A
JPS61110137A JP23258884A JP23258884A JPS61110137A JP S61110137 A JPS61110137 A JP S61110137A JP 23258884 A JP23258884 A JP 23258884A JP 23258884 A JP23258884 A JP 23258884A JP S61110137 A JPS61110137 A JP S61110137A
Authority
JP
Japan
Prior art keywords
heater
temperature
liquid level
developer
turned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23258884A
Other languages
Japanese (ja)
Other versions
JPH0242210B2 (en
Inventor
Toshio Kurokawa
俊夫 黒川
Hideo Iwasaki
秀雄 岩崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP23258884A priority Critical patent/JPS61110137A/en
Priority to US06/795,137 priority patent/US4723066A/en
Publication of JPS61110137A publication Critical patent/JPS61110137A/en
Publication of JPH0242210B2 publication Critical patent/JPH0242210B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the need for a liquid level sensor, and to reduce the cost and to facilitate the fittinb by installing a heater and a temperature sensor in the same protection body closely to each other, and detecting a liquid level from temperature variation when the heater is turned on or off. CONSTITUTION:The temperature detecting resistor 18 and heater 20 are embed ded in the protection body 16 made of ceramic closely to each other to consti tute a processing solution heater 14. The output of a heater power circuit 24 is turned on to heata developer 12 by the heater 20 for a specific time, and the temperature of the developer 12 is detected by the temperature detecting resistor 18. This temperature detecting resistor 18 constitutes a bridge circuit 30, the unbalanced voltage of which is inputted to an A/D converter 32, whose output is inputted to a microcomputer 28. Namely, when the rise time in a heater-on state or fall time in a heater-off state is larger than a specific value, it is decided that the liquid level is abnormal. Consequently, a liquid level sensor needs not be provided specially, the cost is reduced, and the fitting and wiring are facilitated.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、処理液を加熱するのみならず、処理液の液温
検出、さらには液レベルをも検出可能な処理液加温ヒー
タに関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a processing liquid heating heater that not only heats the processing liquid but also can detect the temperature of the processing liquid and furthermore detect the liquid level.

〔従来の技術〕[Conventional technology]

例えば、カラーフィルムの現像液の適温は37度乃至3
8度であり、液温を温度センサで検出し、ヒータで現像
液を適宜加熱して液温を適温に保つようになっている。
For example, the optimum temperature for a color film developer is between 37 degrees and 3 degrees.
The liquid temperature is detected by a temperature sensor, and the developer is heated appropriately by a heater to maintain the liquid temperature at an appropriate temperature.

また、処理槽内の現像液のレベルは、現像液のフィルム
への付着、蒸発、液抜は等により低下する。そこで、現
像液の液レベルを液レベルセンサで検出し、異常の場合
には警報を出したりポンプで現像液を補って液レベルを
一定に保つようになっている。
Further, the level of the developer in the processing tank decreases due to adhesion of the developer to the film, evaporation, drainage, etc. Therefore, the liquid level of the developer is detected by a liquid level sensor, and in the event of an abnormality, an alarm is issued or a pump is used to supplement the developer to keep the liquid level constant.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが、温度センサ、液レベルセンサ及びヒータを別
個独立に設けるようになっているので、コスト高となる
とともに、処理槽への取付及び配線が複雑となる。
However, since the temperature sensor, liquid level sensor, and heater are provided separately, the cost is high and the installation to the processing tank and wiring are complicated.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点を解決するために、本発明に係る処理液加温
ヒータでは、ヒータ及び温度センサを保護体に接近させ
て収容し、ヒータのオン又はオフ時の温度変化から液レ
ベルを検出する液レベル判別手段を有している。
In order to solve the above problems, the processing liquid heating heater according to the present invention has a heater and a temperature sensor housed close to the protector, and a liquid that detects the liquid level from the temperature change when the heater is turned on or off. It has level discrimination means.

〔作 用〕[For production]

温度センサにより処理液の液温を検出し、適温以下とな
った場合にはヒータをオンオフして処理液を加熱し、適
温に保つ。
A temperature sensor detects the temperature of the processing liquid, and if the temperature falls below the appropriate temperature, the heater is turned on and off to heat the processing liquid and maintain it at an appropriate temperature.

ヒータオン時の立上り時間が一定値以下、又はヒータオ
フ時の立下り時間が一定値以上である場合には液レベル
が異常であると判別する。この立上り時間又は立下り時
間は、間接的に測定してもよい。例えば、ヒータオン又
はオフ後一定時間経過したときの温度や温度変化率から
液レベル低下を判別してもよい。
If the rise time when the heater is on is less than a certain value or the fall time when the heater is off is more than a certain value, it is determined that the liquid level is abnormal. This rise time or fall time may be measured indirectly. For example, a drop in the liquid level may be determined from the temperature or temperature change rate when a certain period of time has passed after the heater is turned on or off.

〔実施例〕〔Example〕

図面に従って本発明に係る処理液加温ヒータを現像装置
に用いた実施例を説明する。
An embodiment in which a processing liquid warming heater according to the present invention is used in a developing device will be described with reference to the drawings.

第2図に示す如く、現像槽10内には現像液12が入っ
ており、図示しないフィルムを浸して現像するようにな
っている。
As shown in FIG. 2, a developer tank 10 contains a developer 12, in which a film (not shown) is immersed for development.

現像槽10には処理液加温ヒータ14が挿着されている
。この処理液加温ヒータ14は、jI1図に示す如く、
セラミック製保護体16に測温抵抗体18及びヒータ2
0が接近して埋設されている。
A processing liquid heating heater 14 is inserted into the developing tank 10 . This processing liquid heating heater 14 is, as shown in Fig. jI1,
A resistance temperature detector 18 and a heater 2 are mounted on a ceramic protector 16.
0 are buried close together.

この第1実施例では、測温抵抗体18はヒータ20の上
方に配設されている。
In this first embodiment, the temperature measuring resistor 18 is arranged above the heater 20.

現像槽10内の現像液は、ポンプ22を介して補充され
るようになっている。
The developer in the developer tank 10 is replenished via a pump 22.

ヒータ20及びポンプ22の電力は、それぞれヒータ電
源回路24及びポンプ電源回路26から供給されている
。ヒータ電源回路24及びポンプ電源回路の出力電圧は
マイクロコンピュータ28によりスイッチングされるよ
うになっている。
Power for the heater 20 and pump 22 is supplied from a heater power supply circuit 24 and a pump power supply circuit 26, respectively. The output voltages of the heater power supply circuit 24 and the pump power supply circuit are switched by a microcomputer 28.

測温抵抗体18はブリッジ回路30を構成しており、そ
の不平衡電圧がλ/D変換器32に入力されてデジタル
信号に変換され、次いでマイクロコンピュータ28に入
力されている。ブリッジ回路30の入力電圧はマイクロ
コンピュータ28から供給されている。
The temperature measuring resistor 18 constitutes a bridge circuit 30, and its unbalanced voltage is input to a λ/D converter 32, converted to a digital signal, and then input to the microcomputer 28. The input voltage of the bridge circuit 30 is supplied from the microcomputer 28.

また、マイクロコンピュータ28には、現像液12の液
し°ベルセンサ34.36からの信号が入力されており
、それぞれ低レベル及び高レベルを検出するようになっ
ている。
The microcomputer 28 also receives signals from the liquid level sensors 34 and 36 of the developer 12, and is designed to detect a low level and a high level, respectively.

次に、上記の如く構成された第1実施例の作用を、第3
図に示す制御フローチャートに従って説明する。
Next, the operation of the first embodiment configured as described above will be explained in the third embodiment.
The explanation will be given according to the control flowchart shown in the figure.

温度Tを読込み(ステップ10・0)、T≧37.5℃
ならばステップ100へ戻り、T(37,5℃ならばヒ
ータ電源回路24の出力をオンし、ヒータ20で現像液
12を加熱する(ステップ104)。
Read temperature T (step 10.0), T≧37.5℃
If so, the process returns to step 100, and if the temperature is T (37.5° C.), the output of the heater power supply circuit 24 is turned on and the developer 12 is heated by the heater 20 (step 104).

次いで、第4図(4)に示す如く、to  (6)経過
するのを待って(ステップ106)、ヒータ電源回路2
4の出力をオフする(ステップ108)。
Next, as shown in FIG. 4 (4), after waiting for to (6) to elapse (step 106), the heater power supply circuit 2
4 is turned off (step 108).

このto(8)の加熱により、第4図(B)に示す如く
、測温抵抗体18の位置における温度が上昇する。
Due to this heating to(8), the temperature at the position of the resistance temperature detector 18 rises as shown in FIG. 4(B).

第4図(B)において、実線は現像液L2の液レベルが
測温抵抗体18の位置よりも高い場合(以下、これを満
レベルという)の温度変化を示しており、一点鎖線は現
像液12の液レベルが測温抵抗体18の位置よりも低い
場合(以下、これを空レベルという)の温度変化を示し
ている。すなわち、保護体14は空レベルのときよりも
満レベルのときの方が速く冷却される(立下り時間が短
い)。
In FIG. 4(B), the solid line shows the temperature change when the liquid level of the developer L2 is higher than the position of the resistance temperature sensor 18 (hereinafter referred to as the full level), and the dashed line shows the temperature change of the developer L2. 12 shows a temperature change when the liquid level is lower than the position of the resistance temperature detector 18 (hereinafter referred to as an empty level). That is, the protector 14 is cooled faster when the level is full than when it is empty (the falling time is shorter).

次いで、温度Tを読込み、この値をT1とする(ステッ
プ110)。次いで、jlsI!le経過するのを待っ
て(ステップ112、第4図(A)参照)、温度Tを読
込み、この値をT、とする(ステップu4\次いで、T
、−T、)K(Kは一定値)の場合、すなわち保護体1
4の冷却速度が速い場合には、満レベルと判断し、tt
sllc経過するのを待って(ステップ118、第4図
■参照)、先頭のステップ100へ戻る。T、−T、≦
にの場合、すなわ翫保護体16の冷却速度が遅い場合に
は、空レベルと判別し、図示しないアラームをオンして
現像処理を中止する(ステップ120)。
Next, the temperature T is read and this value is set as T1 (step 110). Next, jlsI! Wait for e to elapse (step 112, see FIG. 4(A)), read the temperature T, and set this value as T (step u4\Then, T
, -T, )K (K is a constant value), that is, the protector 1
If the cooling rate in step 4 is fast, it is determined that the level is full, and tt
Wait until sllc has elapsed (step 118, see Figure 4 (■)), and then return to step 100 at the beginning. T, −T, ≦
In this case, that is, if the cooling rate of the rod protector 16 is slow, it is determined that the level is empty, an alarm (not shown) is turned on, and the developing process is stopped (step 120).

なお、図示しないタイマ割込処理ルーチンによす、液レ
ベルセンサ34がオフシ、低レベル力検出された場合に
は、ポンプ電源回路26の出力をオンする。液レベルセ
ンサ36がオンジ、高レベルが検出された場合にはポン
プ電源回路26の出力をオフする。この場合、補充され
る現像液の流量は小さく、現像@12が洩れている場合
には、この補充を行っても上記空レベルが検出されるよ
うになっている。また、ポンプ22が故障し、長時間経
過した場合も空レベルが検出される。
Note that when the liquid level sensor 34 is off and low level force is detected according to a timer interrupt processing routine (not shown), the output of the pump power supply circuit 26 is turned on. When the liquid level sensor 36 detects a high level, the output of the pump power supply circuit 26 is turned off. In this case, the flow rate of the developer to be replenished is small, and if the developer@12 is leaking, the empty level will be detected even if this replenishment is performed. Furthermore, if the pump 22 fails and a long period of time has elapsed, the empty level is also detected.

次に、本発明の第2実施例を説明する。Next, a second embodiment of the present invention will be described.

この第2実施例では、第5図に示す如く、処理液加温ヒ
ータ14の測温抵抗体18がヒータ20に近設されてい
る。したがって、ヒータ20のオン時又はオフ時の温度
の立上り又は立下りの速さが、空レベルと満レベルとで
第1実施例の場合よりも大きく異なり、より正確に液レ
ベルを判別できる。
In this second embodiment, as shown in FIG. 5, the temperature measuring resistor 18 of the processing liquid heating heater 14 is placed close to the heater 20. Therefore, the speed at which the temperature rises or falls when the heater 20 is on or off differs greatly between the empty level and the full level compared to the first embodiment, and the liquid level can be determined more accurately.

なお、温度センサは測温抵抗体に限らず、サーミスタや
熱電対等であってもよい。
Note that the temperature sensor is not limited to a resistance temperature detector, but may be a thermistor, a thermocouple, or the like.

〔発明の効果〕〔Effect of the invention〕

本発明に係る処理液加温ヒータでは、ヒータ及び温度セ
ンサを同一の保護体に収容しているので、コストを低減
可能であり、しかも処理槽への取付及び配線が簡単であ
る。
In the processing liquid heating heater according to the present invention, since the heater and the temperature sensor are housed in the same protector, costs can be reduced, and installation and wiring to the processing tank are simple.

また、温度センサはヒータに接近しており、ヒータのオ
ン又はオフ時の温度変化から液レベルを検出するように
なっているので、別個に液レベルセンサを設ける必要が
なく、更にコストを低減可能であり、しかも処理槽への
取付及び配線が簡単であるという優れた効果を有する。
In addition, the temperature sensor is close to the heater and detects the liquid level from the temperature change when the heater is on or off, so there is no need to provide a separate liquid level sensor, further reducing costs. Moreover, it has the excellent effect of being easy to attach to the processing tank and to easily wire.

【図面の簡単な説明】[Brief explanation of drawings]

ローチャート、第4図(人)はヒータのオンオフをポス
である。 14・・・処理液加温センサ 16・・・保護体 18・・・測温抵抗体 20・・・ヒータ 代理人 弁理士 中 島    淳 第1図 第2図 第3図
Low chart, Figure 4 (person) shows the heater being turned on and off. 14... Processing liquid heating sensor 16... Protector 18... Resistance temperature sensor 20... Heater representative Patent attorney Atsushi Nakajima Figure 1 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 処理液を加熱するヒータと、処理液の温度を検出する温
度センサと、ヒータ及び温度センサを接近させて収容す
る保護体と、ヒータのオン又はオフ時の温度変化から液
レベルを検出する液レベル判別手段と、を有する処理液
加温ヒータ。
A heater that heats the processing liquid, a temperature sensor that detects the temperature of the processing liquid, a protector that houses the heater and temperature sensor in close proximity, and a liquid level that detects the liquid level from temperature changes when the heater is on or off. A processing liquid heating heater having a determining means.
JP23258884A 1984-11-05 1984-11-05 Heater for processing solution Granted JPS61110137A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP23258884A JPS61110137A (en) 1984-11-05 1984-11-05 Heater for processing solution
US06/795,137 US4723066A (en) 1984-11-05 1985-11-05 Apparatus for heating processing liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23258884A JPS61110137A (en) 1984-11-05 1984-11-05 Heater for processing solution

Publications (2)

Publication Number Publication Date
JPS61110137A true JPS61110137A (en) 1986-05-28
JPH0242210B2 JPH0242210B2 (en) 1990-09-21

Family

ID=16941711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23258884A Granted JPS61110137A (en) 1984-11-05 1984-11-05 Heater for processing solution

Country Status (1)

Country Link
JP (1) JPS61110137A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817947A (en) * 1981-07-23 1983-02-02 安永 延正 Prefabricated house

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817947A (en) * 1981-07-23 1983-02-02 安永 延正 Prefabricated house

Also Published As

Publication number Publication date
JPH0242210B2 (en) 1990-09-21

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