JPS611024A - 半導体回路製造装置 - Google Patents

半導体回路製造装置

Info

Publication number
JPS611024A
JPS611024A JP59122491A JP12249184A JPS611024A JP S611024 A JPS611024 A JP S611024A JP 59122491 A JP59122491 A JP 59122491A JP 12249184 A JP12249184 A JP 12249184A JP S611024 A JPS611024 A JP S611024A
Authority
JP
Japan
Prior art keywords
plasma
magnetic field
vessel
torus
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59122491A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0252855B2 (enrdf_load_stackoverflow
Inventor
Shuji Nakao
中尾　修治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59122491A priority Critical patent/JPS611024A/ja
Publication of JPS611024A publication Critical patent/JPS611024A/ja
Publication of JPH0252855B2 publication Critical patent/JPH0252855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP59122491A 1984-06-12 1984-06-12 半導体回路製造装置 Granted JPS611024A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59122491A JPS611024A (ja) 1984-06-12 1984-06-12 半導体回路製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59122491A JPS611024A (ja) 1984-06-12 1984-06-12 半導体回路製造装置

Publications (2)

Publication Number Publication Date
JPS611024A true JPS611024A (ja) 1986-01-07
JPH0252855B2 JPH0252855B2 (enrdf_load_stackoverflow) 1990-11-14

Family

ID=14837155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59122491A Granted JPS611024A (ja) 1984-06-12 1984-06-12 半導体回路製造装置

Country Status (1)

Country Link
JP (1) JPS611024A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722195A (ja) * 1992-03-18 1995-01-24 Internatl Business Mach Corp <Ibm> 高密度プラズマ処理装置
US5505780A (en) * 1992-03-18 1996-04-09 International Business Machines Corporation High-density plasma-processing tool with toroidal magnetic field
JP2002507315A (ja) * 1997-06-26 2002-03-05 アプライド サイエンス アンド テクノロジー，インコーポレイテッド トロイダル低電場反応性ガスソース
JP2014529163A (ja) * 2011-08-01 2014-10-30 プラズマート インコーポレーテッド プラズマ発生装置及びプラズマ発生方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722195A (ja) * 1992-03-18 1995-01-24 Internatl Business Mach Corp <Ibm> 高密度プラズマ処理装置
US5505780A (en) * 1992-03-18 1996-04-09 International Business Machines Corporation High-density plasma-processing tool with toroidal magnetic field
JP2002507315A (ja) * 1997-06-26 2002-03-05 アプライド サイエンス アンド テクノロジー，インコーポレイテッド トロイダル低電場反応性ガスソース
JP2007165304A (ja) * 1997-06-26 2007-06-28 Mks Instruments Inc トロイダル・プラズマ・チャンバ
JP2008218431A (ja) * 1997-06-26 2008-09-18 Mks Instruments Inc トロイダル・プラズマ・チャンバ
JP2014529163A (ja) * 2011-08-01 2014-10-30 プラズマート インコーポレーテッド プラズマ発生装置及びプラズマ発生方法
US9960011B2 (en) 2011-08-01 2018-05-01 Plasmart Inc. Plasma generation apparatus and plasma generation method

Also Published As

Publication number Publication date
JPH0252855B2 (enrdf_load_stackoverflow) 1990-11-14

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