JPS6095714A - Manufacture of magnetic head - Google Patents
Manufacture of magnetic headInfo
- Publication number
- JPS6095714A JPS6095714A JP20106283A JP20106283A JPS6095714A JP S6095714 A JPS6095714 A JP S6095714A JP 20106283 A JP20106283 A JP 20106283A JP 20106283 A JP20106283 A JP 20106283A JP S6095714 A JPS6095714 A JP S6095714A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- amorphous alloy
- alloy film
- laser light
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/21—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features the pole pieces being of ferrous sheet metal or other magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は磁気録音、再生装置に利用する磁気−ヘッドの
製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method of manufacturing a magnetic head used in a magnetic recording and reproducing device.
（従来例の構成とその問題点）
従来、ＶＴＲ等の狭トラツク磁気ベッドを製作する際に
は、第１図で示したような方法がとられている。同図（
ａ）において、１はセンダストまたは非晶質合金よりな
るヘッドコア部で、ガラスまたはセラミックよりなる基
板２でザンドイッチされている。３ばギャップ面で、こ
の」二にはス・′ｔ′ッタリノグ法などで所望のギャッ
プ長となる５ＩＯ２などの非磁性体か９被着されてい名
。４は棒状の低融点ガラスであり、ヘッドコア両面より
圧力を加え々から温度をあげ、これを軟化させて接合部
・１′を形成し、磁気ギャップ部を形成し、同図（１）
）で示したような磁気ヘッドを得る。(Structure of a conventional example and its problems) Conventionally, when manufacturing a narrow track magnetic bed for a VTR or the like, a method as shown in FIG. 1 has been used. Same figure (
In a), numeral 1 denotes a head core made of Sendust or an amorphous alloy, which is sandwiched with a substrate 2 made of glass or ceramic. 3. On the gap surface, a non-magnetic material such as 5IO2 is deposited on this 2 part by using the sintering method or the like to obtain a desired gap length. 4 is a rod-shaped low melting point glass, which is softened by applying pressure from both sides of the head core and increasing its temperature to form a joint 1' and a magnetic gap, as shown in the same figure (1).
) to obtain a magnetic head as shown in ().
この製造方法の問題点は、機械的に両コアを押し当てて
接着し、磁気ギャップを形成するため、ギャップ面３の
平面性が少しでも悪いと、所望のギャップ長が得られな
いだけで々く、接着強度も低ヰし、ガ゛ラス接合部４′
に、ひびわれが生じる原因となるという点である。なお
、実際のＶＴＲ磁気ヘッドギャップ部はアノマス角を有
するため、ギャップ面３は約１０°の傾斜角を有してお
り、横から機械的に押すとコアずれがおき、左右のトラ
ックずれが生じやすい欠点があった・
（発明の［」的）
本発明の磁気ヘッド製造方法は、従来例の欠点ｆｘ Ｉ
Ｑ’（消し、接着工程をほとんど用いず、磁気ギャップ
部と、ヘッドコア部を同時に形成することを可能にする
方法を提供することである。The problem with this manufacturing method is that since both cores are mechanically pressed and bonded together to form a magnetic gap, if the flatness of the gap surface 3 is even slightly poor, the desired gap length may not be obtained. The adhesive strength is also low, and the glass joint 4'
The second reason is that it causes cracks. Note that since the actual VTR magnetic head gap has an anomalous angle, the gap surface 3 has an inclination angle of about 10°, and mechanically pushing from the side causes core misalignment, resulting in left and right track misalignment. (Objective of the invention) The magnetic head manufacturing method of the present invention has the drawbacks of the conventional example fx I
It is an object of the present invention to provide a method that makes it possible to form a magnetic gap part and a head core part at the same time without using an adhesive process.
（発明の構成）
本発明の磁気−＼ラド製造方法は、ス・９ツタリング法
または蒸着法などにより、磁気ヘッドのコア４１となる
非晶質合金を作成する際に、レーザー光を同時に照射し
て、その一部を選択的に酸化させながら堆積させ、非晶
質合金内部に非磁性の酸化物層を有する合金膜を作成し
、この酸化物層を磁気ギャップとして用いることにより
磁気−＼、１゛を製作するものである。(Structure of the Invention) The method for producing magnetic/rad according to the present invention involves simultaneous irradiation with laser light when creating an amorphous alloy that will become the core 41 of the magnetic head by the star-cutting method or vapor deposition method. Then, a part of the amorphous alloy is selectively oxidized and deposited to create an alloy film having a nonmagnetic oxide layer inside the amorphous alloy, and by using this oxide layer as a magnetic gap, magnetic 1.
（発明の実施例）
本発明の一実施例を第２図ないし第４図に」、り説明す
る。(Embodiment of the Invention) An embodiment of the present invention will be explained with reference to FIGS. 2 to 4.
第２図はスパッタリング装置としてし・−ザーを用いた
磁気ヘッドコアの製造方法を示す。同図（ａ）において
、１１はカソード、１２は非晶質合金作成用ターケ゛ッ
１．１３は水冷される基イνポルダー、１４は基板、１
５はベルツヤ−５１６はレーザー光源、１７は集光装置
およびレーザー光取入れ窓、１８はレーザー光を示す。FIG. 2 shows a method of manufacturing a magnetic head core using a laser as a sputtering device. In the same figure (a), 11 is a cathode, 12 is a target for making an amorphous alloy, 13 is a water-cooled base plater, 14 is a substrate, 1
Reference numeral 5 indicates a belt gear, 516 indicates a laser light source, 17 indicates a condenser and a laser light intake window, and 18 indicates a laser light.
基板１４は同図（ｂ）で示すように、あらかじめ巻線窓
１４′が設けられており、レーザー光１８が所望の位置
にあたるようホルダー１３上に固定されている。ペルジ
ャー１５内を損気し、Ａｒガスを導入し、ターケ゛７ト
１２をスパッターして基板１４土に非晶質合金膜を形成
する。本発明では、この時レーザー１８を同時に照射し
、非晶質合金膜の一部を選択的に酸化させｋがら膜を基
板上に形成し、得られた膜の断面が、第３図（ａ）で示
すような構造となるようにする。図において２１は基板
、２２は非晶質合金膜、２３はレーザー光照射により生
じた酸化物層、２４はレーザー光である。第２図および
第３図においてレーザー光は基板面方向に対して角度θ
だけ傾けであるが、これはＶＴＲヘッドの場合アノマス
角と呼ばれ、約１００の傾きを磁気ギャップにつける必
要かあるためである。As shown in FIG. 2B, the substrate 14 is provided with a winding window 14' in advance and is fixed on the holder 13 so that the laser beam 18 hits a desired position. The inside of the Pelger 15 is evacuated, Ar gas is introduced, and the target 7 is sputtered to form an amorphous alloy film on the substrate 14. In the present invention, at this time, the laser 18 is simultaneously irradiated to selectively oxidize a part of the amorphous alloy film to form a film on the substrate, and the cross section of the obtained film is shown in FIG. ) so that the structure is as shown. In the figure, 21 is a substrate, 22 is an amorphous alloy film, 23 is an oxide layer produced by laser beam irradiation, and 24 is a laser beam. In Figures 2 and 3, the laser beam is oriented at an angle θ with respect to the substrate surface direction.
This is called an anomalous angle in the case of a VTR head, and is because it is necessary to set the magnetic gap at an angle of approximately 100 degrees.
第：３図（ｂ）は同図（ａ）の２２および２：３でノド
した部分の代表的な（ｉｏＨｚにおける交流Ｂ・Ｈ曲線
を・示している。同図（ａ）の非晶質合金膜２２は下記
のような組成のものを用いれば同図（ｂ）の：３２で示
すような優れた軟磁気特性を示し、酸化すると非磁性に
なり、そのＢ Ｈ曲線は同図（ｂ）の３３で示すようカ
行性を示し、磁気ヘッドのギャップ部の役割を果たす。Figure 3(b) shows a typical AC BH curve at ioHz of the section cut at 22 and 2:3 in Figure (a). If the alloy film 22 has the following composition, it will exhibit excellent soft magnetic properties as shown by 32 in the figure (b), and will become non-magnetic when oxidized, and its BH curve will be as shown in the figure (b). ), it exhibits magnetic properties as shown by 33, and plays the role of the gap portion of the magnetic head.
なお、このような目的に適する非晶質合金膜には次のよ
うな組成のものが適している。Note that an amorphous alloy film suitable for such a purpose has the following composition.
ＣｏａＭａｔＴｂＸｃＲｄ ・・・・ ・・・・・・団
・・・・（１）ただし、Ｍ、Ｔ、ＸおよびＲはそれぞれ
つきに／Ｊ＜す各元素群より選ばれる一種ｔ／こは二組
トリ」二の元素で、 Ｍ ： Ｆｅ ＋ Ｎ＋ １Ｍｎ
＋ Ｃｒ ＋ Ｍｏ ＋ ＷＴ ： Ｔｉ 、 Ｚｒ
、 Ｈｆ 、Ｎｂ 、 ＴａＸ：３４．Ｂ、Ｃ
Ｒ′Ｙおよび希土類元素
であり、１１ ＋ ａ’ ｂ＋ ｃ＋ ｄは各元素の原
子％を示し、それぞれ
であり、かつ
である。CoaMatTbXcRd ......Group...(1) However, M, T, "Two elements, M: Fe + N + 1Mn
+ Cr + Mo + WT: Ti, Zr
, Hf, Nb, TaX: 34. B, C R'Y, and rare earth elements, and 11 + a' b+ c+ d indicates the atomic % of each element, and are respectively.
式（１）、（２）においてＣｏを主成分として含む理由
は、磁歪零系非晶質合金が得られるほか、Ｆｅと異なシ
レーザー光照射によジベルツヤ−内の残留０２ガスと反
応酸化したのち非磁性化しやすいためである。またＮ１
は飽和磁化がホさく、−＼ッドコると非晶質化が困難に
なり、７０％以下では合金膜の飽和磁化が、磁気へラド
コア用としては小さすぎるので７０≦ａ≦９５が望まし
い。（１）式中Ｍは磁歪の調節等に用いる添加物の代表
的にものであるが、あまシ多量に含むと、Ｆｅ ＋ Ｍ
ｎのＪμ合は磁歪が大幅に正にずれるし、Ｎｉ 、 Ｃ
ｒ 、 Ｍｏ’、 Ｗの場合は飽和磁化を劣化させるの
で、添加量は工０原子チを越えないことが望ましい。ま
た（１）式中ＲはＹおよび希土類元素で、これは結晶化
温度を上昇させるのに有効であるが、添加量が５原子％
に越えると軟磁気特性を劣化させるのでｄ≦５が望まし
い。ただしＭ、Ｒは非晶質形成には本質的な元素ではな
いので、これらは必ずしも構成元素として含む必要はな
い。（１）式中ＴとＸは非晶質形成能をもつ元素であり
、いずれか〜方、あるいは両者を原子チで５％以上含む
必要がある。またＴの場合は原子チで２０％を越えると
、捷だ、Ｘの場合は３０ ％を越えると、飽和磁化が犬
’ｌ’ｆｉｊに減少して磁気へ、ドコア拐として不適当
になるので、ｂ≦２０、Ｃ≦３０であることが望ましい
。The reason why Co is included as a main component in formulas (1) and (2) is that in addition to obtaining a magnetostrictive zero-based amorphous alloy, Co is reacted and oxidized with the residual 02 gas in the dowel by irradiation with laser light, which is different from Fe. This is because it is easy to become non-magnetic later. Also N1
The saturation magnetization is low, and if it is -\d, it becomes difficult to make it amorphous, and if it is less than 70%, the saturation magnetization of the alloy film is too small for a magnetic helad core, so 70≦a≦95 is desirable. (1) In the formula, M is a typical additive used to adjust magnetostriction, but if it is included in a large amount, Fe + M
When Jμ of n is applied, the magnetostriction is significantly shifted positively, and Ni, C
Since r, Mo', and W deteriorate the saturation magnetization, it is desirable that the amount added does not exceed 0 atoms. In addition, R in formula (1) is Y and a rare earth element, which is effective in increasing the crystallization temperature, but if the amount added is 5 at%
If it exceeds d≦5, the soft magnetic properties will deteriorate, so it is desirable that d≦5. However, since M and R are not essential elements for forming an amorphous state, they do not necessarily need to be included as constituent elements. (1) In the formula, T and X are elements capable of forming an amorphous state, and it is necessary to contain 5% or more of one or both of them in terms of atoms. In addition, in the case of T, if the atomic value exceeds 20%, the saturation magnetization will decrease to 30%, and in the case of , b≦20, and C≦30.
第３図（ａ）のような形で得られたものは、第４図で示
したような工程を加えることにより、簡単に磁気ヘッド
を作ることができる。図において４１は」二板、４２は
非晶質合金膜、４３は基板、４１′および４３′は巻線
穴、４４は磁気ギャップと々る酸化物層、４５は巻き線
である。上板４１と合金膜面４２は樹脂または低融点ガ
ラスで接着を行なう。A magnetic head obtained in the form shown in FIG. 3(a) can be easily manufactured by adding the steps shown in FIG. 4. In the figure, 41 is a two-plate plate, 42 is an amorphous alloy film, 43 is a substrate, 41' and 43' are winding holes, 44 is an oxide layer with a magnetic gap, and 45 is a winding wire. The upper plate 41 and the alloy film surface 42 are bonded using resin or low melting point glass.
り上スパッタリング装置を用いた場合について述べ／こ
が蒸着装置を用いた場合も全く同様である。The case where a sputtering device is used will be described above, and the same applies to the case where a vapor deposition device is used.
以下に具体的な拐質、寸法等を適用した実施例を示す。Examples to which specific particles, dimensions, etc. are applied are shown below.
（１）実施例１
水冷された基板ホルダーに取（−１けられた巻き純水を
有するガラス基板上に、Ａｒガス圧４ Ｘ １０ Ｔｏ
ｒｒ で厚さ３０ μｍの非晶質合金膜ＣＯｓ。(1) Example 1 A glass substrate with rolled pure water placed in a water-cooled substrate holder (-1) was heated with an Ar gas pressure of 4 x 10 To
Amorphous alloy film COs with rr and thickness of 30 μm.
５１１１２ Ｍｎ、、、 ｓｉ １０ Ｂ１２をスパッ
タリング法により形成する。このとき同時に波長０８μ
ｍ、出力５ ｍＷの半導体レーザーを用いて、第２図に
示したように基板上の磁気ギャップの位置に連続的に照
射しながら非晶質合金膜を形成する。なおレーザー光の
ビーム径は０．８μｍに絞り、レーザー装置を磁気ギャ
ップの深さ方向に１００μｍ程度往復運動させながら非
晶質合金膜の形成をする、ここで得られた非晶質合金膜
はレーザー光の照射された部分だけ黒く酸化し、その層
の幅は１．０μｍである。このようにして得られたもの
を第４図で示すように接合、巻線をして磁気ヘッドを完
成する。この有効磁気ギャップは測定の結果ｌ、０μｍ
であった。51112 Mn,..., si 10 B12 is formed by sputtering. At this time, the wavelength is 08μ
An amorphous alloy film is formed by continuously irradiating the magnetic gap position on the substrate using a semiconductor laser having a power of 5 mW and an output power of 5 mW, as shown in FIG. The beam diameter of the laser beam is focused to 0.8 μm, and the amorphous alloy film is formed while reciprocating the laser device by about 100 μm in the depth direction of the magnetic gap.The amorphous alloy film obtained here is Only the part irradiated with the laser light is oxidized black, and the width of the layer is 1.0 μm. The thus obtained product is joined and wound as shown in FIG. 4 to complete a magnetic head. This effective magnetic gap is measured as l, 0 μm.
Met.
（２）実施例２
水冷された基板ホルダーに取り付けられた巻き線入を有
する非磁性フェライト基板上に、Ａｒ１ｙ’ス圧４×１
Ｏ−２Ｔｏｒｒで厚さ３０μｍの非晶質合金膜Ｃｏａｏ
’Ｍθ５Ｔ１１５ をスパッタリング法により形成し、
この際、同時に波長０．８μｍ、出力１０ｍＷの半導体
レーザーを用いて、ビーム幅０８μｍ１長さ１０μｍの
レーザー光を照射しながら上記実施例１と同様にビーム
幅がギャッゾ長方向に、ビームの長さ方向がギャップの
深さ方向に一致するようにして非晶質合金膜の作成を行
なう。この場合、連続的にレーザー光を照射すると、酸
化層の幅がぼやけて広くなるので、照射パルス幅４゜秒
、パルス数１鴇として照射を行なう。得られる酸化層の
幅、すなわち磁気ギャップ長は光学的にｉｄｏ、６μｍ
である。得られた非晶質合金膜を用いて、上記実施例１
と同様に磁気ヘッドを完成し、有効磁気ギャップを測定
した結果は０７μｍであった。(2) Example 2 An Ar1y' space pressure of 4 x 1
Amorphous alloy film Coao with a thickness of 30 μm at O-2 Torr
'Mθ5T115 is formed by sputtering method,
At this time, at the same time, using a semiconductor laser with a wavelength of 0.8 μm and an output of 10 mW, while irradiating laser light with a beam width of 08 μm and a length of 10 μm, the beam width was adjusted in the Gyazzo length direction as in Example 1 above. The amorphous alloy film is created so that the direction matches the depth direction of the gap. In this case, if the laser beam is continuously irradiated, the width of the oxide layer becomes blurred and widened, so the irradiation is performed with an irradiation pulse width of 4° seconds and a pulse number of 1. The width of the resulting oxide layer, that is, the magnetic gap length is optically ido, 6 μm.
It is. Using the obtained amorphous alloy film, the above Example 1
A magnetic head was completed in the same manner as above, and the effective magnetic gap was measured to be 07 μm.
（３）実施例３
実施例２と同様な方法で、巻き線入を有するガラス基板
上にＣ０８６Ｍｎ２Ｎｂ、Ｚｒ３の非晶質合金膜をスパ
ッタリング法により形成し、同時に波長０４μｍ１出力
１．００ ｍＷのヘリウムカドミウムレーザーを用い、
ビーム径を０４μｍにしぼり、照射・やルス幅し。。秒
、・リレス数１鴇として上記実施例２と同じ操作により
厚さ３０μｍの非晶質合金膜を形成磁気ベッドを完成す
る。この有効磁気ギャップ長は測定の結果０３μｍであ
った。(3) Example 3 In the same manner as in Example 2, an amorphous alloy film of C086Mn2Nb and Zr3 was formed by sputtering on a glass substrate with wire windings, and at the same time helium was heated at a wavelength of 04 μm and an output of 1.00 mW. Using a cadmium laser,
The beam diameter was reduced to 04 μm, and the irradiation and lasing width was adjusted. . A 30 μm thick amorphous alloy film was formed by the same operation as in Example 2, with the recess number set at 1 second, and a magnetic bed was completed. The effective magnetic gap length was measured to be 0.3 μm.
実施例３で得られた磁気ヘッド５０個と、第１図で示し
た従来例製作方法によって製作した磁気へ、ド５０個の
比較試験の結果を表に示す。The table shows the results of a comparative test between 50 magnetic heads obtained in Example 3 and 50 magnetic heads manufactured by the conventional manufacturing method shown in FIG.
なお従来例に用いたガラス板、非晶τ↓合金は、実施例
３と同じものを用い、ギヤツプ４Ａとしては５ｉ０２と
低融点ガラスを２層にしたものを使用したＯ
（発明の効果）
本発明の磁気−ベッド製造方法は、極めて高精度な磁気
ギャップを有する磁気ヘッドの製造に有効な方法である
ばかりでなく、コア部を作ると同時に磁気ギャップも作
る方法であるため製造工程が簡略化され原価も丁がるほ
か、アジマス角を有する磁気ギャップも簡単に作成され
る等の種々の効果がある。The glass plate and amorphous τ↓ alloy used in the conventional example were the same as in Example 3, and the gap 4A was made of two layers of 5i02 and low-melting glass. The magnetic bed manufacturing method of the invention is not only an effective method for manufacturing a magnetic head having an extremely high-precision magnetic gap, but also simplifies the manufacturing process because the magnetic gap is created at the same time as the core is created. In addition to reducing the cost, it also has various effects such as easily creating a magnetic gap with an azimuth angle.
第１図は従来例の磁気へ、１・゛製造方法の説明図、第
２図は本発明の一実施例による磁気−ベッドのコア部の
製造方法説明図、第３図は同断面図およびＢ Ｈ特性図
、第４図は同磁気ヘッド製造工程の説明図である。
１・・−＼ラドコツ部、２・・・基板、３・・ギヤツブ
面、４・・低融点ガラス、１１・・・カソード、１２・
・・ターケ８ット、１３・・・基板ホルダー、１４・・
・基板、１４’ 巻ａｍ、１５・・・ペルジャー、１６
・・・レーザー光源、１７・・取入れ窓、工８・・・レ
ーザー光、２１・・・基板、２２・・・非晶質合金膜、
２３・・・酸化物層、２４・・・レーザー光、３２．３
３・・・１３− Ｈｆｉｌｌ線、４１・・・上板、４２
・・・非晶質合金膜、４３・・・基板、４１’ 、 ４
３’・・・巻き線入、４４・・・酸化物層、４５・・・
巻き線。
第１図
（０）
（ｂ）
３
（ｂ）
第３図
第４図FIG. 1 is an explanatory diagram of a method of manufacturing a magnetic bed according to an embodiment of the present invention, and FIG. 3 is a cross-sectional view of the same and The BH characteristic diagram and FIG. 4 are explanatory diagrams of the manufacturing process of the same magnetic head. 1...-\radokotsu part, 2... substrate, 3... gear surface, 4... low melting point glass, 11... cathode, 12...
...Turke 8t, 13...Substrate holder, 14...
・Substrate, 14' volume am, 15...Pelger, 16
...Laser light source, 17.Intake window, Process 8.Laser light, 21.Substrate, 22.Amorphous alloy film,
23... Oxide layer, 24... Laser light, 32.3
3...13-Hfill line, 41...Top plate, 42
...Amorphous alloy film, 43...Substrate, 41', 4
3'...Windling included, 44...Oxide layer, 45...
winding wire. Figure 1 (0) (b) 3 (b) Figure 3 Figure 4
Claims (1)
ッドのコア部とする軟磁性非晶質合金膜を基板上に形成
する際に、同時にレーザー光を磁気ギヤツノを形成する
所定の位置に照射してその位置の軟磁性非晶り４合金膜
を酸化し、磁気ヘッドのコア部とギャップ部とを同時に
形成することを特徴とする磁気ヘッドの製造方法。 （２ｊ Ａｉｌ記非晶質合金膜として、次式で表わされ
る組成を有するものを用いることを特徴とする特許請求
のｉ’ｌｉｔ＋囲第（１）間第載の磁気ヘッドの製造方
法。 ＣｏａＭａｌＴｂＸｃＲｄ ただし、Ｍ、Ｔ、Ｘ、Ｒはそれぞれつきに示す各元素群
より選ばれる一種または二種以上の元素であり、 Ｍ ： Ｆｅ 、 Ｎｉ 、 Ｍｎ 、 Ｃｒ 、 Ｍ
ｏ 、 ＷＴ ： Ｔｉ 、Ｚｒ 、Ｈｆ 、Ｎｂ 、
ＴａＸ：Ｓｉ、Ｂ、Ｃ Ｒ：Ｙおよび希土類元素 寸たａ、ａ′、ｂ、ｃ、ｄ（ｌ−ｉ各元素の原子％１示
し、それぞれ ７０≦ａ≦９５ ０≦ａ′≦１０ ０≦ｂ≦２０ ０≦Ｃ≦３０ ０≦ｄ≦５ であり、かつ ａ ＋ａ′十ｂ −１−ｃ ＋ｄ ＝ １．、００５≦
ｂ 十〇≦３０ である。(1) When forming the soft magnetic amorphous alloy film that will become the core of the magnetic head on the substrate by sputtering or vapor deposition, at the same time, a laser beam is irradiated to the predetermined position where the magnetic gear horn will be formed. 1. A method of manufacturing a magnetic head, which comprises oxidizing a soft magnetic amorphous 4-alloy film at a location to form a core portion and a gap portion of the magnetic head at the same time. (2j Ail) A method for manufacturing a magnetic head according to item (1) of claim i'lit+, characterized in that an amorphous alloy film having a composition represented by the following formula is used. CoaMalTbXcRd However, , M, T, X, and R are one or more elements selected from each element group shown below, M: Fe, Ni, Mn, Cr, M
o, WT: Ti, Zr, Hf, Nb,
TaX: Si, B, CR R: Y and rare earth elements a, a', b, c, d (l-i atomic % of each element is shown in 1, each 70≦a≦95 0≦a'≦10 0 ≦b≦20 0≦C≦30 0≦d≦5, and a + a′ b −1−c +d = 1., 005≦
b 10≦30.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20106283A JPS6095714A (en) | 1983-10-28 | 1983-10-28 | Manufacture of magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20106283A JPS6095714A (en) | 1983-10-28 | 1983-10-28 | Manufacture of magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6095714A true JPS6095714A (en) | 1985-05-29 |
| JPS6362805B2 JPS6362805B2 (en) | 1988-12-05 |
Family
ID=16434746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20106283A Granted JPS6095714A (en) | 1983-10-28 | 1983-10-28 | Manufacture of magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6095714A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62145522A (en) * | 1985-12-20 | 1987-06-29 | Hitachi Ltd | Thin film magnetic head |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7181455B2 (en) * | 2018-11-13 | 2022-12-01 | 日本電信電話株式会社 | Blockchain system, approval terminal, user terminal, history management method, and history management program |
-
1983
- 1983-10-28 JP JP20106283A patent/JPS6095714A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62145522A (en) * | 1985-12-20 | 1987-06-29 | Hitachi Ltd | Thin film magnetic head |
| JPH0531201B2 (en) * | 1985-12-20 | 1993-05-12 | Hitachi Ltd |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6362805B2 (en) | 1988-12-05 |
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