JPS6157025A - Manufacture of magnetic head core - Google Patents

Manufacture of magnetic head core

Info

Publication number
JPS6157025A
JPS6157025A JP18129284A JP18129284A JPS6157025A JP S6157025 A JPS6157025 A JP S6157025A JP 18129284 A JP18129284 A JP 18129284A JP 18129284 A JP18129284 A JP 18129284A JP S6157025 A JPS6157025 A JP S6157025A
Authority
JP
Japan
Prior art keywords
electron beam
vapor
vapor depositing
iron
tablet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18129284A
Other languages
Japanese (ja)
Other versions
JPH0243243B2 (en
Inventor
Kumio Nako
久美男 名古
▲かど▼野 勝
Masaru Kadono
Shuhei Tsuchimoto
修平 土本
Mitsuhiko Yoshikawa
吉川 光彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP18129284A priority Critical patent/JPS6157025A/en
Priority to US06/664,425 priority patent/US4592923A/en
Publication of JPS6157025A publication Critical patent/JPS6157025A/en
Publication of JPH0243243B2 publication Critical patent/JPH0243243B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To manufacture a head core having the specified truck width excellent in high frequency characteristic by weighing segment core material consisting of iron, aluminium, and arsenic for the specified ratio, melting it in vacuum during an electron beam vapor depositing process, and forming a film on a board. CONSTITUTION:A heater 2 to heat and hold a vapor depositing substrate at an evaporating temperature and non-magnetic board 3 on which a vapor deposited film are placed in the upper corner of the vacuum bell jar 1. The vapor depositing source position of lower side is an electron beam generating filament 5 and crucible 7 installed in the direction of radiation of the electron beam 6 generated in the filament. In the crucible 7 is a tablet 8 consisting iron 9, aluminium 10, and arsenic 11 which are vapor depositing source material. When the electron beam 6 is radiated to the tablet 8, the elements in that part are spattered for steam current, adhered to the non-magnetic board 3 through a vapor depositing current control shutter 4, forming a vapor deposited film.

Description

【発明の詳細な説明】 :く技術分野〉 ″□木発明は電子ビーム蒸着法等の蒸着技術を用いた磁
気へラドコアの製造方法に関するものであり特に融点及
び蒸気圧の異なる鉄(Fe’)、アルミニウム(A7)
、硅素(Si )等を主成分として有するコアの成膜技
術に関するものである。
[Detailed Description of the Invention] :Technical Field> ``□The invention relates to a method of manufacturing a magnetic helad core using vapor deposition technology such as electron beam vapor deposition, and particularly relates to a method for manufacturing magnetic helad cores using vapor deposition techniques such as electron beam vapor deposition. , aluminum (A7)
, relates to a film forming technology for a core containing silicon (Si 2 ) or the like as a main component.

〈従来技術〉゛ 近年、磁気記録・技術の分野においては情報の多様化に
ともなっでその記録密度の増大を求める要求が強くなり
、このため磁気ヘッドのトラック幅やギャップ長を極力
小きく設定し、高透磁率及び高飽和磁化を有する磁気ヘ
ッドを作製することが必要となってきた。 ・、。
<Prior art> In recent years, in the field of magnetic recording and technology, with the diversification of information, there has been a strong demand for increased recording density. It has become necessary to produce magnetic heads with high magnetic permeability and high saturation magnetization.・、.

従来の磁気ヘッドのコア作製においてけバルク部材をブ
ロック状に切り出し、ダイシングブレード等でトラ・ン
ク幅の形成を施すために30μm以下のトラック幅を形
成する場合、ダイシングブレードからの衝撃によるチッ
ピングやトラック幅の精度が問題となる。また、センダ
ストやアモルファス等の様に超急冷法によるリボン薄帯
をヘッドコアとして用いる場合、コア材を樹脂接着によ
り非磁性基板で挾み込んでいる。樹脂接着は接着層の制
御が困難で一般的には厚くなる傾向にある。
In manufacturing the core of a conventional magnetic head, when a bulk member is cut into blocks and a track width of 30 μm or less is formed using a dicing blade, etc., chipping and tracks due to impact from the dicing blade occur. Width accuracy is an issue. Furthermore, when a ribbon made by an ultra-quenching method such as sendust or amorphous is used as the head core, the core material is sandwiched between nonmagnetic substrates by resin adhesion. With resin adhesives, it is difficult to control the adhesive layer, and the adhesive layer generally tends to be thick.

しか−しなから摺動時の摩耗の影響や耐候性等を考・慮
すると接着層は薄く形成する必要がある。またリボン薄
帯やバルク部材から切削加工によってトラ・ンク幅を形
成する場合、トラック幅の制御等は狭トラツクになる程
困難になる。
However, in consideration of the effects of abrasion during sliding, weather resistance, etc., the adhesive layer must be formed thin. Furthermore, when the track width is formed by cutting from a ribbon or a bulk member, the narrower the track, the more difficult it becomes to control the track width.

一方、電子ビーム蒸着により磁気へラドコアを作製する
場合、蒸着源に多元系の蒸着物質がセットされるが、こ
の多元系の蒸着物質は真空溶解法等で均一に溶融した後
、所定の形状に凝固させたものが蒸着用タブレットとし
て使用されている。
On the other hand, when producing a magnetic rad core by electron beam evaporation, a multi-component evaporation material is set in the evaporation source, but this multi-component evaporation material is uniformly melted using a vacuum melting method, etc., and then formed into a predetermined shape. The solidified product is used as a vapor deposition tablet.

この場合、真空溶解工程を経るのでるつぼ等からの不純
物混入の可能性があり、蒸着形成されるコア部材の純度
が低下するとともにコストも高いものとなる。
In this case, since a vacuum melting process is performed, there is a possibility that impurities may be mixed in from a crucible or the like, which reduces the purity of the core member formed by vapor deposition and increases the cost.

〈発明の目的〉 未発明は、融点及び蒸気圧の異なる鉄、アルミニウム及
び硅素から成るセグメントコア材料を所;、     
定″弊1@”r秤量・電+′″″−4蒸“I 、fu 
ltl“真空溶解した後、基板に成膜することにより上
記従来法の問題点を解消した磁気ヘッドコアの製造方法
を提供することを目的とする。捷だ、本発明の他の目的
は惜産性を有する高透磁率へラドコアを作製することに
ある。
<Object of the invention> The present invention provides a segment core material consisting of iron, aluminum and silicon having different melting points and vapor pressures;
Fixed "we1 @"r Weighing/Electricity +'""-4 Steam "I, fu
It is an object of the present invention to provide a method for manufacturing a magnetic head core that solves the problems of the conventional method described above by forming a film on a substrate after vacuum melting. The objective is to fabricate a rad core with high magnetic permeability.

〈実施例〉 第1図Kl([31は本発明の一実施例の説明に供する
電子ビーム蒸着装置の模式構成図である。
<Example> FIG. 1Kl ([31 is a schematic configuration diagram of an electron beam evaporation apparatus for explaining an example of the present invention.

真空ベルジャ1内の上方には蒸着用基板を蒸着温度に加
熱保持するためのヒータ2と蒸着膜が形成される結晶化
ガラス、セラミック等から成る非磁性基板3が配置され
ている。この非磁性基板3と蒸着源との間KH蒸着気流
の通過を制御するシャッタ4が介設されている。また下
方の蒸着源位置には電子ビーム発生用フィラメント5と
フィラメント5で発生した電子ビーム6の照射方向に配
設されたるつぼ(ハース)7があり、るつぼ7内には蒸
着源材料である鉄、アルミニウム及び硅素から成るタブ
レット8が載置されている。電子ビーム6がタブレット
8に照射されるとその部分の      11元素が蒸
気流となって飛翔し、シャッタ4の開成期間中シャッタ
4を通過して非磁性基板3に被着され、蒸着膜が形成さ
れる。
Arranged above the vacuum belljar 1 are a heater 2 for heating and maintaining a deposition substrate at a deposition temperature, and a nonmagnetic substrate 3 made of crystallized glass, ceramic, etc. on which a deposition film is to be formed. A shutter 4 is interposed between the non-magnetic substrate 3 and the vapor deposition source to control passage of the KH vapor deposition airflow. Further, at the lower evaporation source position, there is an electron beam generating filament 5 and a crucible (hearth) 7 arranged in the irradiation direction of the electron beam 6 generated by the filament 5. , a tablet 8 made of aluminum and silicon is placed. When the electron beam 6 is irradiated onto the tablet 8, the 11 elements in that area fly off as a vapor flow, pass through the shutter 4 during the opening period of the shutter 4, and are deposited on the nonmagnetic substrate 3, forming a vapor deposited film. be done.

るつぼ7内に載置されるタブレット8は第1図β)に示
す如く構成される。即ち、タブレ・ント8の主成分であ
る鉄9.アルミニウム10.硅素11は各々層状に成形
されており、硅素11を中央にしてその両面にアルミニ
ウム10が積層され更にその外側より鉄9で挾持した計
5層措造より成る。
The tablet 8 placed in the crucible 7 is constructed as shown in FIG. 1 β). That is, iron 9. is the main component of Tablet 8. Aluminum 10. The silicon 11 is formed into layers, and consists of a total of five layers, with the silicon 11 in the center, aluminum 10 laminated on both sides, and further sandwiched by iron 9 from the outside.

タブレットをこのように構成することにより鉄9、硅素
11に比し融点か低く蒸気圧の高いアルミ □ニウム1
0が後述する溶融過程で鉄9に固溶する前に蒸発すると
いう現象が起こらず、鉄9.アルミニウム10.硅素1
1の三元素を均一に溶融させることか可能になる。タブ
レ・・ト8の三元素酸 :分は鉄60〜70重量wt%
、アルミニウム3〜6w1%、硅素20〜30wt1の
割合で構成されており、全重量が80〜110gr程度
になるように秤量設定する。この三元素を含有する合金
はセンダストコア材として知られているため高透磁率合
金であり、木実施例においてはとのタブレット8を用い
電子ビーム蒸着によりセンダスト組成又はこれに近い組
成の高透磁率磁性膜を作製する。
By configuring the tablet in this way, aluminum □Nium 1 has a lower melting point and higher vapor pressure than Iron 9 and Silicon 11.
The phenomenon that 0 evaporates before becoming solid solution in iron 9 during the melting process described later does not occur, and iron 9. Aluminum 10. silicon 1
It becomes possible to uniformly melt the three elements of 1. Tablet...8 ternary acid: Iron 60-70wt%
, 3 to 6 wt % of aluminum, and 20 to 30 wt 1 of silicon, and the weight is set so that the total weight is about 80 to 110 gr. The alloy containing these three elements is known as Sendust core material and is therefore a high magnetic permeability alloy.In the wooden example, a high magnetic permeability of Sendust composition or a composition close to this was obtained by electron beam evaporation using a dovetail tablet 8. Fabricate a magnetic film.

電子ビーム蒸着におけるフィラメント5への電力昇圧過
程で鉄9.アルミニウム10.硅素11の突沸を防ぎ、
均一な溶融状態を維持するため。
During electron beam evaporation, iron 9. Aluminum 10. Prevents bumping of silicon 11,
To maintain a uniform melt state.

第2図に示す通電曲線に従って0.5〜IKWで14分
間保持し、タブレット8に対して、電子ビーム真空溶解
を行なう。その後aKW迄1分間に0.1〜0.5KW
の割合で23分間の昇圧を行なう。
According to the energization curve shown in FIG. 2, the tablet 8 is held at 0.5 to IKW for 14 minutes and subjected to electron beam vacuum melting. After that, 0.1-0.5KW per minute until aKW
The pressure was increased for 23 minutes at a rate of .

その結果るつぼ7内で鉄9.アルミニウム10゜硅素1
1の溶融状態が均一に整えられる。その後1分間に2〜
4KWの割合でl0KWまで昇圧する。電子ビーム電力
がl0KWに到達した後、一定時間保持し、非、磁性基
板3を取り出すとこの上に蒸着膜が得られる。得られた
蒸着膜を1分10秒から17分20秒迄の間の各種保持
時間に対応して膜厚1.3μ隣ずつ分割し、順次化学分
析により膜組成変化を調べ、これを成膜時の組成分布例
として第3図に示す。第3図はシャッタ4の開成時間を
設定するための実験データで電子ビーム電力10KWに
到達後の保持時間を1分lO秒〜3分20秒、3分20
秒〜5分50秒、5分50秒〜8分50秒、8分50秒
〜11分50秒、11分50秒〜14分20秒、14分
20秒から17分20秒迄の各々に設定し、各領域をI
、n、1、rv、v、vtとした場合の成膜時の膜組成
を示(7たものである。この様に電子ビーム蒸着にJ?
いては各元素の鋤点や蒸気圧が異なることにより、成膜
に際して膜厚方向に組成分布が生じる。このA;11成
分布に対して木実雄側ではシャッタ4の開閉を制御し第
1図β)に示すタブレ・ント8の構成で第2図に示す電
子ビーム電力昇圧過程を介して電子ビーム蒸着を行□な
い電子ビニム電力10KW到達後のアルミニウムの蒸着
速度が最大に達した時点より3分40秒後から15分4
0秒後までの間のみシャッタ4を□開成し、51Ltn
厚のセンダスト膜を非磁性基板′3土に作製した。シャ
ッタ4の開成期14     間“電+1−”電”°■
到達”“924“分後に開成しその後5〜15分後に閉
成するまでの間とする。5μm厚の膜組成は化学分析に
よりFe85.7wt % 、  S i 9.8 w
t % 、Al4.5wt%であった。この膜を600
℃2時間真空中で熱処理することにより電気比抵抗72
μΩ備、抗持力0.60e、飽和磁束密度11.400
Gを有する非常に優れた磁気特性を有する磁気ヘッドを
作製することができた。X線回折パターンからデバイシ
ェラ−の式を用いて粒径を算出すると30OA”の微細
粒子から構成されていることが判明した。
As a result, iron 9. Aluminum 10° Silicon 1
The melted state of No. 1 is uniformly adjusted. 2 to 1 minute after that
Boost the voltage to 10KW at a rate of 4KW. After the electron beam power reaches 10 KW, it is held for a certain period of time and the non-magnetic substrate 3 is taken out to form a deposited film thereon. The obtained vapor-deposited film was divided into 1.3 μm thick pieces corresponding to various holding times from 1 minute 10 seconds to 17 minutes 20 seconds, and changes in film composition were sequentially investigated by chemical analysis. Fig. 3 shows an example of the composition distribution at the time. Figure 3 shows experimental data for setting the opening time of the shutter 4, which shows the holding time after reaching the electron beam power of 10 KW, from 1 minute 10 seconds to 3 minutes 20 seconds, 3 minutes 20 seconds.
seconds to 5 minutes 50 seconds, 5 minutes 50 seconds to 8 minutes 50 seconds, 8 minutes 50 seconds to 11 minutes 50 seconds, 11 minutes 50 seconds to 14 minutes 20 seconds, and 14 minutes 20 seconds to 17 minutes 20 seconds. Set each area to I
, n, 1, rv, v, vt.
However, due to differences in the plow point and vapor pressure of each element, a compositional distribution occurs in the film thickness direction during film formation. For this A; □ Do not do this for 15 minutes 4 from 3 minutes 40 seconds after the time when the aluminum evaporation rate reaches the maximum after reaching the electronic vinyl power of 10KW.
Shutter 4 is opened only until 0 seconds later, and 51Ltn
A thick sendust film was formed on a non-magnetic substrate '3 soil. During the opening period of shutter 4 14 hours “Electricity + 1-” Electricity”°■
The period is defined as the period from which it opens after 924 minutes and closes after 5 to 15 minutes.The composition of the 5 μm thick film was determined by chemical analysis to be 85.7 wt % Fe and 9.8 w Si.
t % and Al 4.5 wt %. This film is 600
By heat treatment in vacuum for 2 hours at ℃, the electrical resistivity decreased to 72.
μΩ, coercive force 0.60e, saturation magnetic flux density 11.400
A magnetic head having very excellent magnetic properties with G was able to be manufactured. When the particle size was calculated from the X-ray diffraction pattern using the Debye-Scherrer equation, it was found that the particle size was composed of fine particles of 30 OA''.

その結果ドメインの回転が容易になる。木実雄側の方法
で作製したヘッドコア厚膜材料の実効透磁率の周波数特
性を第4図に示す。5MHzの実効透磁率I″1280
0.10MHzの実効透磁率は1400を有し、高周波
帯域で非常に優れたヘッドコア材料であることがわかる
。また木実雄側の製造方法を用いれば、磁束の表皮効果
を考慮し絶縁層(例えばSjO□” 、 AJt203
 )を中間層として有する多層膜構造にすることが容易
であり、高周波特性の優れた所定トラック幅を有するヘ
ッドコアを作製することも可能となる。
As a result, domain rotation becomes easy. FIG. 4 shows the frequency characteristics of the effective magnetic permeability of the head core thick-film material produced by Kimio's method. Effective permeability at 5MHz I″1280
It can be seen that the effective magnetic permeability at 0.10 MHz is 1400, making it an excellent head core material in a high frequency band. Furthermore, if Kinio's manufacturing method is used, an insulating layer (for example, SjO□'', AJt203
) as an intermediate layer, and it is also possible to produce a head core having a predetermined track width with excellent high frequency characteristics.

〈発明の効果〉 以上詳細に説明した如く、本発明は資源として豊富で、
安価な鉄、アルミニウム、硅素を各々秤量し、同−真空
中内で不純物混入がほとんどない電子ビーム真空溶解技
術と蒸着速度が早い電子ビーム真空蒸着技術とを駆使す
ることにより磁気特性の優れたヘッドコア材料を作製す
るものであり、 狭ギャップ、狭トラ・ンクのヘッド作
製が容易となり、記録密度が増々向上する傾向にあるデ
ジタルオーディオ用ヘッド、高品質VTR用ヘッドの製
作に際して非常に有効である。また本発明の製造方法は
量産に適し、安価な磁気ヘッドを大量に生 。
<Effects of the Invention> As explained in detail above, the present invention has abundant resources,
A head core with excellent magnetic properties was created by weighing inexpensive iron, aluminum, and silicon, and using electron beam vacuum melting technology in which there is almost no contamination of impurities in a vacuum, and electron beam vacuum evaporation technology that has a high deposition rate. This method facilitates the production of heads with narrow gaps and narrow trunks, and is extremely effective in the production of digital audio heads and high-quality VTR heads, whose recording densities are increasing. Furthermore, the manufacturing method of the present invention is suitable for mass production and can produce a large amount of inexpensive magnetic heads.

産することができる。      、can be produced.      ,

【図面の簡単な説明】[Brief explanation of drawings]

第1図(Al(Blは本発明の一実施例の説明に供する
電子ビーム蒸着装置の模式構成図である。 第2図は電子ビーム蒸着における電力操作曲線 。 を示す説明図である。 第3図は成膜された蒸着膜の蒸着時間に対応する膜厚方
向の組成分布図である。 第4図は未発明により得られた磁気へ、ラドコアの実効
透磁率の周波数特性を示す特性図である。 1・・・真ゆベルジャ 3・・・非磁性基板4・・・シ
ャッタ   5・・・フィラメント6・・・電子ビーム
  7・・・るつぼ8・・・タブレット 代理人 弁理士 福 士 愛 彦(他2名)(JIXI
  q−多v−,1(:@ 旬
FIG. 1 (Al (Bl) is a schematic configuration diagram of an electron beam evaporation apparatus used to explain an embodiment of the present invention. FIG. 2 is an explanatory diagram showing a power operation curve in electron beam evaporation. The figure is a composition distribution diagram in the film thickness direction corresponding to the deposition time of the deposited film. Figure 4 is a characteristic diagram showing the frequency characteristics of the effective magnetic permeability of Radcore to magnetism obtained by the uninvented method. Yes. 1... Mayu Belljar 3... Non-magnetic substrate 4... Shutter 5... Filament 6... Electron beam 7... Crucible 8... Tablet agent Patent attorney Aihiko Fukushi (2 others) (JIXI
q−multiv−,1(:@shun

Claims (1)

【特許請求の範囲】 1、硅素とアルミニウムの積層体を両面方向より鉄層で
挾持した蒸着源材料を蒸着源位置に配置し、電子ビーム
蒸着用電力の昇圧過程で前記蒸着源材料を溶融した後、
引き続いて電子ビーム蒸着により前記蒸着源材料を成分
とする磁気ヘッドコア膜を形成することを特徴とする磁
気ヘッドコアの製造方法。 2、蒸着源材料を鉄60〜70wt%、アルミニウム3
〜6wt%、硅素20〜30%の割合で構成した特許請
求の範囲第1項記載の磁気ヘッドコアの製造方法。
[Claims] 1. A evaporation source material in which a laminate of silicon and aluminum is sandwiched between iron layers from both sides is placed at the evaporation source position, and the evaporation source material is melted in the process of increasing the power for electron beam evaporation. rear,
A method of manufacturing a magnetic head core, comprising subsequently forming a magnetic head core film containing the deposition source material by electron beam evaporation. 2. Evaporation source material: iron 60-70wt%, aluminum 3
The method for manufacturing a magnetic head core according to claim 1, wherein the silicon content is 6 wt% and 20 to 30% silicon.
JP18129284A 1983-10-24 1984-08-28 Manufacture of magnetic head core Granted JPS6157025A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP18129284A JPS6157025A (en) 1984-08-28 1984-08-28 Manufacture of magnetic head core
US06/664,425 US4592923A (en) 1983-10-24 1984-10-24 Production method of a high magnetic permeability film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18129284A JPS6157025A (en) 1984-08-28 1984-08-28 Manufacture of magnetic head core

Publications (2)

Publication Number Publication Date
JPS6157025A true JPS6157025A (en) 1986-03-22
JPH0243243B2 JPH0243243B2 (en) 1990-09-27

Family

ID=16098129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18129284A Granted JPS6157025A (en) 1983-10-24 1984-08-28 Manufacture of magnetic head core

Country Status (1)

Country Link
JP (1) JPS6157025A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69319881T2 (en) * 1993-02-16 1999-04-15 Sacchettificio Nationale G. Corazza S.P.A., Ponte San Nicolo, Padova Device for sealing bags

Also Published As

Publication number Publication date
JPH0243243B2 (en) 1990-09-27

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