JPS6079724A - Rotary processing device - Google Patents

Rotary processing device

Info

Publication number
JPS6079724A
JPS6079724A JP18671283A JP18671283A JPS6079724A JP S6079724 A JPS6079724 A JP S6079724A JP 18671283 A JP18671283 A JP 18671283A JP 18671283 A JP18671283 A JP 18671283A JP S6079724 A JPS6079724 A JP S6079724A
Authority
JP
Japan
Prior art keywords
sample
mask
mounting table
pendulum
placing stand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18671283A
Other languages
Japanese (ja)
Inventor
Shigeto Kumada
熊田　成人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18671283A priority Critical patent/JPS6079724A/en
Publication of JPS6079724A publication Critical patent/JPS6079724A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Clamps And Clips (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the scattering of a sample from a placing stand by a method wherein a mechanism, with which the sample will be fixed or supported, is provided on the circumferential part of the sample-placing stand utilizing the centrifugal force generated when said placing stand is rotated. CONSTITUTION:A mask 1 is placed on a placing stand 6, and when the placing is completed, said placing stand 6 which is connected to a rotary shaft 5 is rotated by driving a motor 13. With the rotation of the placing stand 6, the fixing pawl 11 provided at the upper part is rotated in the center direction of rotation by the centrifugal force which works on the weight 12 provided on the lower part of a pendulum 9. When the placing stand 10 reaches certain rotating speed, the fixing pawl 11 comes in contact with tne non-patterned part (edge part) located on the upper surface of the mask 1, pressed from the direction of the upper surface of the mask 1, and the mask 1 can be fixed before it is scattered.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は試料を回転させながら試料の表面や裏面などを
処理する技術に関するもので、特にマスク等の現象、エ
ツチング、洗浄等の処理をするのに用いて有効な回転処
理技術に関するものである。[Detailed Description of the Invention] [Technical Field] The present invention relates to a technique for processing the front and back surfaces of a sample while rotating the sample, and is particularly applicable to processing such as masking, etching, and cleaning. This paper relates to effective rotation processing technology.

〔背景技術〕[Background technology]

本発明者法試料を回転させながらその表面や裏面を処理
する技術、特に電子部品を製造するために使用するマス
クを現象、エツチング、洗浄等の処理を行なう技術とし
て、第１図及び第２図に示すような技術を開発した。す
なわち、マスク１０角部を十字形に配置した載置台２の
端部３に設けた凹部４に嵌め込んだ状態で、図示しな（
・モータにより回転軸５を回転させ、マスク１の上部に
設けたノズル（図示せず）から現像液、エツチング液、
洗浄液をマスク１の表面忙順次噴出させてマスク１の処
理を行なっていた。しかしながら、このような回転処理
装置（スピンナ）におい又は次のような問題があること
を本発明者は発見した。The inventor's method is a technique for processing the front and back surfaces of a sample while rotating it, particularly for processing masks used for manufacturing electronic parts, such as etching, cleaning, etc., as shown in Figures 1 and 2. We have developed the technology shown below. That is, with the corner of the mask 10 fitted into the recess 4 provided in the end 3 of the mounting table 2 arranged in a cross shape,
・The rotating shaft 5 is rotated by a motor, and developer solution, etching solution,
The mask 1 was processed by sequentially jetting the cleaning liquid over the surface of the mask 1. However, the present inventor discovered that such a rotation processing apparatus (spinner) has the following problem.

すなわち、（１）凹部の壁部が丸くなると、マスクと凹
部の壁面の嵌合性が悪＜’ｆｒす、マスクが回転させら
れた時にマスクに作用する遠心力により載置台からマス
クが飛散してしまう。In other words, (1) when the walls of the recess are rounded, the fit between the mask and the wall of the recess is poor, and when the mask is rotated, centrifugal force acting on the mask may cause the mask to fly off the mounting table. I end up.

（２）マスクな載置台に載せたとき、凹部にマスクの角
部がしっかりと嵌め込まれてぃながった場合載置台が回
転した時にマスクが飛散してしまう。(2) When placed on a mask mounting table, if the corners of the mask are not firmly fitted into the recesses, the mask will scatter when the mounting table rotates.

（３）上記（１）（２１に示したごとく、マスクが飛散
してしまうと破損が生じて、経済的にも安全性の面から
も非常に問題となっていた。(3) As shown in (1) (21) above, if the mask is scattered, it will be damaged, which is a serious problem from both an economical and safety standpoint.

以上の問題を解決するため１本発明者は鋭意検討した。In order to solve the above problems, the inventors of the present invention conducted extensive studies.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、試料製確実に載置台に固定または保持
することにより、載置台を回転させたときに試料が載置
台から飛散することを防止できるような回転処理技術を
提供することである。An object of the present invention is to provide a rotation processing technique that can prevent a sample from scattering from the mounting table when the mounting table is rotated by securely fixing or holding the sample on the mounting table. .

本発明の他の目的は、載置台の回転スピードを増大して
も、試料の飛散が防止できかつ安全性のたがい回転処理
技術を提供することである。Another object of the present invention is to provide a safe rotation processing technique that can prevent a sample from scattering even if the rotation speed of the mounting table is increased.

〔発明の概要〕[Summary of the invention]

本−において開示される発明のうち代表的なものの概要
な簡単圧説明すれば下記のとおりである。A brief summary of typical inventions disclosed in this book is as follows.

すなわち、試料を載置する載置台の周辺部に、載置台が
回転したときに、その遠心力を利用して試料を固定また
は保持する機構を設けることにより、試料が載置台から
飛散することを防止できるものである。In other words, by providing a mechanism around the mounting table on which the sample is placed that uses centrifugal force to fix or hold the sample when the mounting table rotates, it is possible to prevent the sample from flying off the mounting table. It is preventable.

〔実施例１〕 第３図は、本発明の一実施例であるスピンナの全体措成
図、第４図及び第５図はその主要部の一部断面図である
。[Embodiment 1] FIG. 3 is an overall schematic diagram of a spinner according to an embodiment of the present invention, and FIGS. 4 and 5 are partial sectional views of its main parts.

６はマスク１等の試料の載置台で十字形に設けられてお
り、その端部７にはマスク１０角部を嵌め込んで支持す
る四部８が設けられている。さらにこの端部７には、ふ
り子状体９が支軸１（ｌ中心にして回転自在に軸支され
ており、その上部には載置台６の回転中心方向に突起し
たマスクの縁部を固定するための固定爪１１が設けられ
、下部にはおもり１２が設けられている。このふり子状
体９は、マスク１の載置時に防げとならないように配置
してあり、支軸１（ｌ中心にふり子状体９を回転させた
とき、固定爪１１がマスク１に尚接するようになってい
る。なお、１３は回転軸５を駆動するスピンモータ、１
４は処理容５．１５は蓋である。この蓋１５には、マス
ク１の表面に現象液、エツチング液、洗浄液ケ噴出する
ためのノズル１６．１７．１８がそれぞれ設けられてい
る。Reference numeral 6 denotes a mounting table for a sample such as the mask 1, which is provided in a cross shape, and has four parts 8 at its ends 7 into which the corners of the mask 10 are fitted and supported. Furthermore, a pendulum-like body 9 is rotatably supported on this end 7 around a support shaft 1 (l), and the edge of the mask that protrudes in the direction of the rotation center of the mounting table 6 is attached to the upper part of the pendulum-like body 9. A fixing claw 11 for fixing is provided, and a weight 12 is provided at the bottom.This pendulum-like body 9 is arranged so as not to prevent the mask 1 from being placed on the support shaft 1 ( When the pendulum-like body 9 is rotated around the center, the fixed claw 11 is still in contact with the mask 1. Reference numeral 13 is a spin motor that drives the rotating shaft 5;
4 is a processing volume. 15 is a lid. The lid 15 is provided with nozzles 16, 17, and 18 for spouting a developing solution, an etching solution, and a cleaning solution onto the surface of the mask 1, respectively.

次に第３図〜第５図を用いて動作な説明する。Next, the operation will be explained using FIGS. 3 to 5.

モータ１３が停止している状態で、マスク１を手作業あ
るいは機械的に載置台６に載置する。このとき、マスク
１の角部が端部７の凹部８に正確に嵌め込むことが好ま
しい。マスク１の載置が完了すると、モータ１３を駆動
して回転軸５に連結している載置台６を回転させる。序
々にモータ１３の回転数を上げていくと、マスク１が正
確に凹部８に嵌め込まれていない場合は特に強い浮力が
フスクＩＫ生じること釦なり、この浮力がある一定以上
に達するとマスク１が載置台６から飛散してしまう。し
かしながら、第４図及び第５図忙示すヨウに、載置台６
が回転するにつれて、ふり子９０下部に設けたおもり１
２に作用する遠心力により、上部に設けた固定爪１１が
、載置６の回転中心方向に回動し、載置台６がある回転
スピードに達すると固定爪１１がマスク１の上面のパタ
ーンが形成されない部分（縁部）に当接して、マスク１
の上面から押え付け、マスク１が飛散するまえに固定で
きるようになっている。この場合、マスク１が飛散する
地検のある回転スピードに達する前に、固定爪１１がマ
スク１上面に尚接するようにおもりの重量を調節して設
けている。With the motor 13 stopped, the mask 1 is placed on the mounting table 6 manually or mechanically. At this time, it is preferable that the corners of the mask 1 fit into the recesses 8 of the end portions 7 accurately. When the placement of the mask 1 is completed, the motor 13 is driven to rotate the placement table 6 connected to the rotating shaft 5. As the rotation speed of the motor 13 is gradually increased, a particularly strong buoyant force will be generated when the mask 1 is not accurately fitted into the recess 8. When this buoyant force reaches a certain level, the mask 1 will It scatters from the mounting table 6. However, as shown in FIGS. 4 and 5, the mounting table 6
As the pendulum rotates, the weight 1 installed at the bottom of the pendulum 90
Due to the centrifugal force acting on the mask 2, the fixed claw 11 provided on the upper part rotates toward the center of rotation of the mounting table 6. When the mounting table 6 reaches a certain rotation speed, the fixed claw 11 rotates the pattern on the top surface of the mask 1. In contact with the unformed part (edge), mask 1
It is possible to press down from the top surface of the mask 1 and fix it before it scatters. In this case, the weight of the weight is adjusted so that the fixed claw 11 still comes into contact with the upper surface of the mask 1 before the rotation speed reaches a certain rotational speed at which the mask 1 is scattered.

〔実施例２〕 第６図及び第７図はそれぞれ本発明の他の実施例である
スピンナの主要部のザ）親図と側面図である。ここで〔
実施例１〕と同一の部分については説明を省略する。載
置台１９の端部２０＋Ｃは、支軸１０を中心に回転自在
に取り付けられたふり子状体２１が設けられており、そ
の上部には摺動孔２２が、下部にはおもり２３が構成さ
れている。[Embodiment 2] FIGS. 6 and 7 are a parent view and a side view, respectively, of the main parts of a spinner according to another embodiment of the present invention. here〔
Description of the same parts as in Example 1 will be omitted. The end portion 20+C of the mounting table 19 is provided with a pendulum-shaped body 21 rotatably attached around the support shaft 10, with a sliding hole 22 in the upper part and a weight 23 in the lower part. ing.

前記摺動孔２２は摺動ピン２３と嵌合して、ふり子状体
２１の回転運動を直Ｍ運動に変換するようニスライド板
２４に伝達し、このスライド板２４がガイド部２５に沿
ってマスク１とほぼ平行にパターンが形成されていｌｘ
い線部に突出できるように構成されて〜・る。The sliding hole 22 is fitted with the sliding pin 23 to transmit the rotational motion of the pendulum-like body 21 to the Ni-slide plate 24 so as to convert it into direct-M motion, and this sliding plate 24 moves along the guide portion 25. A pattern is formed almost parallel to mask 1.lx
It is configured so that it can protrude into the dark wire section.

次に動作を説明する。第６図に示すように、回転軸５が
回転していないとき、すなわち載置台１９が回転してい
ないときは、ふり子状体２１の下部のおもり２３０作用
で、スライド板２４はガイド部２５内に収納されている
。この状態でマスク１を載置台１９ＦＣ載せ、載置完了
後回転軸５により回転させる。回転スピードが増すにつ
れて、おもり２３に作用する遠心力が増加して、おもり
２３が支軸１０を中心に回動して外側に移動する１、そ
うすると、おもり２３と反対側、っまり摺動孔２２が設
けであるふり子状体２１の上部は内側に移動し、それに
つれて摺動孔２２と嵌合している摺動ピン２３の作用で
、スライド板２４がガイド部２５に沿ってマスク１上簡
に突出してマスクの縁部処達する。このため、マスク１
が浮力により浮き上がってきても、スライド板２４で保
持され、飛散するようなことは起こらな℃・。Next, the operation will be explained. As shown in FIG. 6, when the rotating shaft 5 is not rotating, that is, when the mounting table 19 is not rotating, the slide plate 24 is moved toward the guide portion 25 by the action of the weight 230 at the bottom of the pendulum-like body 21. It is stored inside. In this state, the mask 1 is mounted on the mounting table 19FC, and after the mounting is completed, it is rotated by the rotating shaft 5. As the rotational speed increases, the centrifugal force acting on the weight 23 increases, causing the weight 23 to rotate around the support shaft 10 and move outward1.Then, on the side opposite to the weight 23, the entire sliding hole The upper part of the pendulum-like body 21 , where 22 is provided, moves inward, and as it moves, the sliding plate 24 moves along the guide part 25 to move the mask 1 due to the action of the sliding pin 23 that fits into the sliding hole 22 . It protrudes from the top and reaches the edges of the mask. For this reason, mask 1
Even if it floats up due to buoyancy, it will be held by the slide plate 24 and will not fly away.

〔効果〕〔effect〕

（１）試料を載置する載置台の周辺部に、遠心力を利用
して試料を保持または固定でき、る機構を設けることに
より、試料を回転させたときに載置台から試料が飛散す
ることを防止できるという効果が得られる。(1) By providing a mechanism that can hold or fix the sample using centrifugal force around the periphery of the mounting table on which the sample is placed, it is possible to prevent the sample from scattering from the mounting table when the sample is rotated. This has the effect of preventing

（２）試料を載置する載置台の端部Ｋ、その端部に設け
た支軸を中心にして載置台の回転中心方向に回動できる
ふり子状体を設け、前記ふり子状体の下部にはおもりを
、上部には試料に当接できるように形成した固定爪を設
けることにより、載置台の回転スピードが上昇して試料
の浮力が増大しても、おもりに作用する遠心力もそれ釦
つれて増大するので、試料を前記固定爪で固定する力も
大きくなり、試料が飛散することを完全圧防止できると
いう効果が得られる。(2) A pendulum-like body that can rotate in the direction of the rotation center of the stage is provided at the end K of the stage on which the sample is placed, and a pendulum-like body that can rotate in the direction of the rotation center of the stage about a support shaft provided at the end; By installing a weight at the bottom and a fixing claw formed so that it can contact the sample at the top, even if the rotation speed of the mounting table increases and the buoyancy of the sample increases, the centrifugal force acting on the weight will not change. Since the pressure increases gradually, the force for fixing the sample with the fixing claw also increases, resulting in the effect that the pressure can completely prevent the sample from scattering.

（３）　試料を載置する載置台の端部に試けた支軸を中
心にして、載置台の回転中心方向に回動できるふり子状
体を設け、そのふり子状体に遠心力が加わって℃・ると
きに連動して、試料上面に突出するスライド板を設ける
ことにより、試料が回転しているときに、試料が飛散す
るのを防止できると℃・う効果が得られる。(3) A pendulum-like body that can rotate in the direction of the rotation center of the stage is provided at the end of the stage on which the sample is placed, and centrifugal force is applied to the pendulum-like body around a supporting shaft. By providing a slide plate that protrudes from the top surface of the sample in conjunction with the rotation of the sample, it is possible to prevent the sample from scattering while the sample is rotating.

以上本発明者によってなされた発明を実施例にもとづき
具体的に説明したが１本発明は上記実施例に限定される
ものではなく、その要旨を逸脱しない範囲で種々変更可
能である。たとえば、本実施例においては、試料はマス
クであったが、つ工−ハでも良く、それ以外の種々のも
のに用℃・ることかできる。また、載置台を十字形状と
し、その端部にて試料な固定または保持するようにして
いるが、載置台の形状や、遠心力により試料夕固定また
は保持する機構の数は４個に限定されるものではなく、
試料の形状に合わせ１設ける。Although the invention made by the present inventor has been specifically described above based on examples, the present invention is not limited to the above-mentioned examples, and various changes can be made without departing from the gist thereof. For example, in this example, the sample was a mask, but it may also be a mask, or it may be used for various other items. In addition, the mounting table is shaped like a cross, and the sample is fixed or held at its end, but the shape of the mounting table and the number of mechanisms for fixing or holding the sample due to centrifugal force are limited to four. rather than something that
Provide one according to the shape of the sample.

さらに、ふり子状体の爪、摺動孔、おもりなどの形状は
種々に変更できる。また、載置台や固定または保持でき
る機構等は、耐薬品性が強（、マスクに傷をつきにくい
ふっ素樹脂あるいは、表面をふっ素樹脂でコーティング
したものを使用すると良い。Furthermore, the shapes of the claws, sliding holes, weights, etc. of the pendulum-like body can be changed in various ways. In addition, it is best to use a fluororesin or one whose surface is coated with a fluororesin that has strong chemical resistance (i.e., does not easily scratch the mask) for the mounting table and the mechanism that can fix or hold it.

〔利用分野〕[Application field]

以上の説明では主として本発明圧よってなされた発明ｔ
その背景となった利用分野である電子部品を製造するど
きに使用するマスクの現像、エツチング、洗浄するだめ
の回転処理技術に適用した場合について説明したが、そ
れに限定されるものではなく、たとえば、半導体ウェー
ハや半導体分野以外の物品の表面処理を回転させながら
行なうものには適用できる。In the above explanation, the inventions mainly based on the present invention are described.
Although we have explained the case in which it is applied to the rotation processing technology for developing, etching, and cleaning masks used in manufacturing electronic components, which is the field of application behind this, it is not limited to this, for example, The present invention can be applied to surface treatments of semiconductor wafers and articles other than those in the semiconductor field while rotating them.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図、第２図はそれぞれ本発明者が考えたスピンナの
概略図及びその■−Ｉ線断面図、第３図は本発明の一実
施例であるスピンナの全体構成図、 第４図、２ｇ５図は本発明の一実施例であるスピンナの
主要部の一部断面図、 第６図、第７図はそれぞれ本発明の他の実施例の斜視図
とその側面図である。 １・・・マスク、２，６．１９・・・載置台、３，７゜
２０・・・端部、４，８・・・凹部、５・・・回転軸、
’９．２１・・・ふり子状体、１０・・・支軸、１１・
・・爪、１２．２３・・・おもり、１３・・・スピンモ
ータ、１４・・・収理容器、１５・・・蓋、１６，１７
．１８・・・ノズル、２２・・・摺動孔、２３・・・摺
動ビン、２４・・・スライド板、２５・・・ガイド部。 第　１　図 − 第　２　図 第　３　図 ＼。 】 第　４　図 ／／ ／／ 第　５　図1 and 2 are a schematic diagram and a sectional view taken along the line ■-I of a spinner devised by the present inventor, respectively, FIG. 3 is an overall configuration diagram of a spinner that is an embodiment of the present invention, and FIG. 2g5 is a partial sectional view of the main part of a spinner according to an embodiment of the present invention, and FIGS. 6 and 7 are a perspective view and a side view of other embodiments of the present invention, respectively. 1... Mask, 2, 6. 19... Mounting table, 3, 7° 20... End, 4, 8... Recess, 5... Rotating shaft,
'9.21... Pendulum-like body, 10... Support shaft, 11.
...Claw, 12.23 ... Weight, 13 ... Spin motor, 14 ... Storage container, 15 ... Lid, 16, 17
．． 18... Nozzle, 22... Sliding hole, 23... Sliding bottle, 24... Slide plate, 25... Guide portion. Figure 1 - Figure 2 Figure 3\. ] Figure 4 // // Figure 5

Claims (1)

【特許請求の範囲】 １、試料を載置する載置台と、前記載置台の周辺部であ
って、その載置台を回転させた時に、試料が飛散するこ
とを防止するために、遠心力を利用して試料を固定また
は保持できる機構を設けたことを特徴とする回転処理装
置。 ２、前記機構は、載置台の周辺部に軸支され、載置台の
回転中心方向に回動するふり子状体からなり、前記のふ
り子状体の上部忙は試料を固定する固定爪が、下部には
おもりが設けられていることを特徴とする特許請許の範
囲第１項記載の回転処理装置。 ３、前記機構は、載置台の周辺部に軸支され、載置台の
回転中心方向に回動するふり子状体と、その上部にはふ
り子の運動に連動し、試料上面にスライド自在に突出可
能なスライド部材及びそのガイド部材が設けられ、その
下部にはおもりが設けられていることを特徴とする特許
請求の範囲第１項記載の回転処理装置。[Claims] 1. A mounting table on which a sample is placed and a peripheral area of the mounting table, which is provided with a centrifugal force to prevent the sample from scattering when the mounting table is rotated. A rotary processing device characterized by being equipped with a mechanism that can be used to fix or hold a sample. 2. The mechanism consists of a pendulum-like body that is pivotally supported around the periphery of the mounting table and rotates in the direction of the rotation center of the mounting table, and the upper part of the pendulum-like body has a fixing claw that fixes the sample. The rotary processing apparatus according to claim 1, characterized in that a weight is provided at the lower part. 3. The mechanism includes a pendulum-like body that is pivotally supported around the periphery of the mounting table and rotates in the direction of the rotation center of the mounting table, and a pendulum-like body on the top that is linked to the movement of the pendulum and can be slid onto the top surface of the sample. 2. The rotary processing apparatus according to claim 1, further comprising a projectable slide member and its guide member, and a weight provided at a lower portion thereof.
JP18671283A 1983-10-07 1983-10-07 Rotary processing device Pending JPS6079724A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18671283A JPS6079724A (en) 1983-10-07 1983-10-07 Rotary processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18671283A JPS6079724A (en) 1983-10-07 1983-10-07 Rotary processing device

Publications (1)

Publication Number Publication Date
JPS6079724A true JPS6079724A (en) 1985-05-07

Family

ID=16193317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18671283A Pending JPS6079724A (en) 1983-10-07 1983-10-07 Rotary processing device

Country Status (1)

Country Link
JP (1) JPS6079724A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63185029A (en) * 1987-01-28 1988-07-30 Hitachi Ltd Wafer treatment apparatus
US4817556A (en) * 1987-05-04 1989-04-04 Varian Associates, Inc. Apparatus for retaining wafers
JPH02278713A (en) * 1989-04-19 1990-11-15 Tokyo Electron Ltd Resist processor
US5040484A (en) * 1987-05-04 1991-08-20 Varian Associates, Inc. Apparatus for retaining wafers
US5318634A (en) * 1987-03-31 1994-06-07 Epsilon Technology, Inc. Substrate supporting apparatus
US5591113A (en) * 1994-10-31 1997-01-07 Cobe Laboratories, Inc. Centrifugally assisted centrifuge bowl mount
JPH09121U (en) * 1996-09-19 1997-03-11 沖電気工業株式会社 Single wafer spin dryer
US5658231A (en) * 1995-09-21 1997-08-19 Haemonetics Corporation Mechanism for securing a separation bowl to a mechanical chuck

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63185029A (en) * 1987-01-28 1988-07-30 Hitachi Ltd Wafer treatment apparatus
JPH0573245B2 (en) * 1987-01-28 1993-10-14 Hitachi Ltd
US5318634A (en) * 1987-03-31 1994-06-07 Epsilon Technology, Inc. Substrate supporting apparatus
US4817556A (en) * 1987-05-04 1989-04-04 Varian Associates, Inc. Apparatus for retaining wafers
US5040484A (en) * 1987-05-04 1991-08-20 Varian Associates, Inc. Apparatus for retaining wafers
JPH02278713A (en) * 1989-04-19 1990-11-15 Tokyo Electron Ltd Resist processor
US5591113A (en) * 1994-10-31 1997-01-07 Cobe Laboratories, Inc. Centrifugally assisted centrifuge bowl mount
US5658231A (en) * 1995-09-21 1997-08-19 Haemonetics Corporation Mechanism for securing a separation bowl to a mechanical chuck
JPH09121U (en) * 1996-09-19 1997-03-11 沖電気工業株式会社 Single wafer spin dryer

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