JPS6078456A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS6078456A
JPS6078456A JP58186266A JP18626683A JPS6078456A JP S6078456 A JPS6078456 A JP S6078456A JP 58186266 A JP58186266 A JP 58186266A JP 18626683 A JP18626683 A JP 18626683A JP S6078456 A JPS6078456 A JP S6078456A
Authority
JP
Japan
Prior art keywords
pressure
lens
air
gap
temp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58186266A
Other languages
English (en)
Japanese (ja)
Other versions
JPH04588B2 (https=
Inventor
Shoichi Tanimoto
昭一 谷元
Kazunori Imamura
今村　和則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58186266A priority Critical patent/JPS6078456A/ja
Priority to US06/656,746 priority patent/US4690528A/en
Publication of JPS6078456A publication Critical patent/JPS6078456A/ja
Publication of JPH04588B2 publication Critical patent/JPH04588B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58186266A 1983-10-05 1983-10-05 投影露光装置 Granted JPS6078456A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58186266A JPS6078456A (ja) 1983-10-05 1983-10-05 投影露光装置
US06/656,746 US4690528A (en) 1983-10-05 1984-10-01 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58186266A JPS6078456A (ja) 1983-10-05 1983-10-05 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6078456A true JPS6078456A (ja) 1985-05-04
JPH04588B2 JPH04588B2 (https=) 1992-01-08

Family

ID=16185274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58186266A Granted JPS6078456A (ja) 1983-10-05 1983-10-05 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6078456A (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6167036A (ja) * 1984-09-10 1986-04-07 ゼネラルシグナルジャパン株式会社 投影露光装置における投影倍率の補償方法及びその装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPH0542970U (ja) * 1991-11-15 1993-06-11 三菱重工業株式会社 冷凍装置の乾燥剤
JPH0855792A (ja) * 1995-07-17 1996-02-27 Canon Inc 素子製造方法
JPWO2003025987A1 (ja) * 2001-09-14 2005-01-06 株式会社ニコン 鏡筒及び露光装置並びにデバイスの製造方法
JP2005303303A (ja) * 2004-04-09 2005-10-27 Carl Zeiss Smt Ag 結像性能の最適化方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6167036A (ja) * 1984-09-10 1986-04-07 ゼネラルシグナルジャパン株式会社 投影露光装置における投影倍率の補償方法及びその装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPH0542970U (ja) * 1991-11-15 1993-06-11 三菱重工業株式会社 冷凍装置の乾燥剤
JPH0855792A (ja) * 1995-07-17 1996-02-27 Canon Inc 素子製造方法
JPWO2003025987A1 (ja) * 2001-09-14 2005-01-06 株式会社ニコン 鏡筒及び露光装置並びにデバイスの製造方法
JP2005303303A (ja) * 2004-04-09 2005-10-27 Carl Zeiss Smt Ag 結像性能の最適化方法

Also Published As

Publication number Publication date
JPH04588B2 (https=) 1992-01-08

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