JPS6074619A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS6074619A
JPS6074619A JP58182060A JP18206083A JPS6074619A JP S6074619 A JPS6074619 A JP S6074619A JP 58182060 A JP58182060 A JP 58182060A JP 18206083 A JP18206083 A JP 18206083A JP S6074619 A JPS6074619 A JP S6074619A
Authority
JP
Japan
Prior art keywords
markers
wafer
electron beam
pattern
correction coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58182060A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0325010B2 (enExample
Inventor
Hiroshi Yasuda
洋 安田
Takayuki Miyazaki
宮崎　隆之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58182060A priority Critical patent/JPS6074619A/ja
Publication of JPS6074619A publication Critical patent/JPS6074619A/ja
Publication of JPH0325010B2 publication Critical patent/JPH0325010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58182060A 1983-09-30 1983-09-30 電子ビ−ム露光方法 Granted JPS6074619A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58182060A JPS6074619A (ja) 1983-09-30 1983-09-30 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58182060A JPS6074619A (ja) 1983-09-30 1983-09-30 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS6074619A true JPS6074619A (ja) 1985-04-26
JPH0325010B2 JPH0325010B2 (enExample) 1991-04-04

Family

ID=16111641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58182060A Granted JPS6074619A (ja) 1983-09-30 1983-09-30 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS6074619A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6233427A (ja) * 1985-08-06 1987-02-13 Fujitsu Ltd 電子ビ−ム露光方法
JPS63250817A (ja) * 1987-04-08 1988-10-18 Hitachi Ltd 電子線描画方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6233427A (ja) * 1985-08-06 1987-02-13 Fujitsu Ltd 電子ビ−ム露光方法
JPS63250817A (ja) * 1987-04-08 1988-10-18 Hitachi Ltd 電子線描画方法

Also Published As

Publication number Publication date
JPH0325010B2 (enExample) 1991-04-04

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