JPS6070186A - シヤドウマスクの製造方法 - Google Patents

シヤドウマスクの製造方法

Info

Publication number
JPS6070186A
JPS6070186A JP17637983A JP17637983A JPS6070186A JP S6070186 A JPS6070186 A JP S6070186A JP 17637983 A JP17637983 A JP 17637983A JP 17637983 A JP17637983 A JP 17637983A JP S6070186 A JPS6070186 A JP S6070186A
Authority
JP
Japan
Prior art keywords
etching
shadow mask
hole
metal plate
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17637983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0420993B2 (cg-RX-API-DMAC7.html
Inventor
Yasuhisa Otake
大竹　康久
Makoto Harikae
誠 張替
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP17637983A priority Critical patent/JPS6070186A/ja
Publication of JPS6070186A publication Critical patent/JPS6070186A/ja
Publication of JPH0420993B2 publication Critical patent/JPH0420993B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP17637983A 1983-09-26 1983-09-26 シヤドウマスクの製造方法 Granted JPS6070186A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17637983A JPS6070186A (ja) 1983-09-26 1983-09-26 シヤドウマスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17637983A JPS6070186A (ja) 1983-09-26 1983-09-26 シヤドウマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS6070186A true JPS6070186A (ja) 1985-04-20
JPH0420993B2 JPH0420993B2 (cg-RX-API-DMAC7.html) 1992-04-07

Family

ID=16012604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17637983A Granted JPS6070186A (ja) 1983-09-26 1983-09-26 シヤドウマスクの製造方法

Country Status (1)

Country Link
JP (1) JPS6070186A (cg-RX-API-DMAC7.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6386877A (ja) * 1986-09-30 1988-04-18 Toshiba Corp シヤドウマスクの製造方法
JPS63190181A (ja) * 1987-01-30 1988-08-05 Dainippon Printing Co Ltd シヤドウマスクの製造方法
JPH066139U (ja) * 1991-12-09 1994-01-25 有限会社アイビ−工業 洗浄装置
JPH09157867A (ja) * 1995-11-30 1997-06-17 Toppan Printing Co Ltd シャドウマスクの製造方法
US5883012A (en) * 1995-12-21 1999-03-16 Motorola, Inc. Method of etching a trench into a semiconductor substrate
CN121023515A (zh) * 2025-10-31 2025-11-28 寰采星科技(宁波)有限公司 一种金属掩膜板的制作方法及其所得的金属掩膜板

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6386877A (ja) * 1986-09-30 1988-04-18 Toshiba Corp シヤドウマスクの製造方法
JPS63190181A (ja) * 1987-01-30 1988-08-05 Dainippon Printing Co Ltd シヤドウマスクの製造方法
JPH066139U (ja) * 1991-12-09 1994-01-25 有限会社アイビ−工業 洗浄装置
JPH09157867A (ja) * 1995-11-30 1997-06-17 Toppan Printing Co Ltd シャドウマスクの製造方法
US5883012A (en) * 1995-12-21 1999-03-16 Motorola, Inc. Method of etching a trench into a semiconductor substrate
CN121023515A (zh) * 2025-10-31 2025-11-28 寰采星科技(宁波)有限公司 一种金属掩膜板的制作方法及其所得的金属掩膜板

Also Published As

Publication number Publication date
JPH0420993B2 (cg-RX-API-DMAC7.html) 1992-04-07

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