JPS6067671A - 薄膜作成装置 - Google Patents

薄膜作成装置

Info

Publication number
JPS6067671A
JPS6067671A JP17520283A JP17520283A JPS6067671A JP S6067671 A JPS6067671 A JP S6067671A JP 17520283 A JP17520283 A JP 17520283A JP 17520283 A JP17520283 A JP 17520283A JP S6067671 A JPS6067671 A JP S6067671A
Authority
JP
Japan
Prior art keywords
thin film
film forming
chamber
forming apparatus
flexible substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17520283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH02431B2 (enrdf_load_stackoverflow
Inventor
Hideo Mito
三戸　英夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp, Anelva Corp filed Critical Canon Anelva Corp
Priority to JP17520283A priority Critical patent/JPS6067671A/ja
Publication of JPS6067671A publication Critical patent/JPS6067671A/ja
Publication of JPH02431B2 publication Critical patent/JPH02431B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP17520283A 1983-09-24 1983-09-24 薄膜作成装置 Granted JPS6067671A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17520283A JPS6067671A (ja) 1983-09-24 1983-09-24 薄膜作成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17520283A JPS6067671A (ja) 1983-09-24 1983-09-24 薄膜作成装置

Publications (2)

Publication Number Publication Date
JPS6067671A true JPS6067671A (ja) 1985-04-18
JPH02431B2 JPH02431B2 (enrdf_load_stackoverflow) 1990-01-08

Family

ID=15992075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17520283A Granted JPS6067671A (ja) 1983-09-24 1983-09-24 薄膜作成装置

Country Status (1)

Country Link
JP (1) JPS6067671A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61266572A (ja) * 1985-05-21 1986-11-26 Toyoda Gosei Co Ltd スパツタリング装置
JPS6251172U (enrdf_load_stackoverflow) * 1985-09-19 1987-03-30
JPS6255559U (enrdf_load_stackoverflow) * 1985-09-28 1987-04-06
JPS6283471A (ja) * 1985-10-09 1987-04-16 Hitachi Ltd 炭素皮膜形成方法及び装置
EP0205917A3 (en) * 1985-05-21 1989-02-01 Toyoda Gosei Co., Ltd. Sputtering apparatus
JPH06204063A (ja) * 1993-06-14 1994-07-22 Semiconductor Energy Lab Co Ltd 炭素膜がコートされた磁気部材の作製方法
JP2008150677A (ja) * 2006-12-19 2008-07-03 Miyako Roller Industry Co フィルムへの連続コーティング方法及び連続コーティング装置
JP2012188687A (ja) * 2011-03-09 2012-10-04 Toppan Printing Co Ltd 成膜装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61266572A (ja) * 1985-05-21 1986-11-26 Toyoda Gosei Co Ltd スパツタリング装置
EP0205917A3 (en) * 1985-05-21 1989-02-01 Toyoda Gosei Co., Ltd. Sputtering apparatus
JPS6251172U (enrdf_load_stackoverflow) * 1985-09-19 1987-03-30
JPS6255559U (enrdf_load_stackoverflow) * 1985-09-28 1987-04-06
JPS6283471A (ja) * 1985-10-09 1987-04-16 Hitachi Ltd 炭素皮膜形成方法及び装置
JPH06204063A (ja) * 1993-06-14 1994-07-22 Semiconductor Energy Lab Co Ltd 炭素膜がコートされた磁気部材の作製方法
JP2008150677A (ja) * 2006-12-19 2008-07-03 Miyako Roller Industry Co フィルムへの連続コーティング方法及び連続コーティング装置
JP2012188687A (ja) * 2011-03-09 2012-10-04 Toppan Printing Co Ltd 成膜装置

Also Published As

Publication number Publication date
JPH02431B2 (enrdf_load_stackoverflow) 1990-01-08

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