JPS6066309A - Magnetic head - Google Patents

Magnetic head

Info

Publication number
JPS6066309A
JPS6066309A JP17476883A JP17476883A JPS6066309A JP S6066309 A JPS6066309 A JP S6066309A JP 17476883 A JP17476883 A JP 17476883A JP 17476883 A JP17476883 A JP 17476883A JP S6066309 A JPS6066309 A JP S6066309A
Authority
JP
Japan
Prior art keywords
magnetic
film
head
magnetization
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17476883A
Other languages
Japanese (ja)
Inventor
Masahiko Naoe
直江 正彦
Shozo Ishibashi
正三 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP17476883A priority Critical patent/JPS6066309A/en
Publication of JPS6066309A publication Critical patent/JPS6066309A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/1278Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain a magnetic head which has high magnetization, low coercive force and high corrosion resistance and permits reproduction of a desired magnetization characteristic by forming at least a part of a magnetically permeable layer of a specific alloy. CONSTITUTION:A magnetic head is constructed by depositing a magnetic film 14 consisting of Co-Ta-Zr on a glass substrate S as a main magnetic pole 17 and protecting the same with a holer 18. The main magnetic pole for vertical magnetic recording is thus obtd. The Co-Ta-Zr alloy has high magnetization, low coercive force and high corrosion resistance and permits reproduction of a desired magnetization characteristic. The magnetic film 14 consisting of Co-Ta-Zr is formed on the opposed surfaces on the magnetic gap 20 side of a core material S consisting of ferrite, by which a magnetic head 27 for audio purpose is obtd.

Description

【発明の詳細な説明】 1、産業上の利用分野 本発明は磁気ヘッドに関するものである02、従来技術 従来、磁気テープ、磁気ディスク等の磁気記録媒体は、
ビデオ、オーディオ、ディジタル等の各種電気信号の記
録に幅広く利用されている。 基体王に形成された磁性
層(磁気記録層)の面内長手方向における磁化を用いる
方式においては、新規の磁性体や新しい塗布技術等によ
シ高密度化が計られている。 また一方、近年、磁気記
録の高密度化に伴ない、磁気記録媒体の磁性層の厚さ方
向の磁化(いわゆる垂直磁化)を用いる垂直磁化記録方
式が、最近になって提案されている(例えば、[日経エ
レクトロニクスJ1978年8月7日号A192)oこ
の記録方式によれば、記録波長が短くなるに伴なって媒
体内の残留磁化に作用する反磁界が減少するので、高密
度化にとって好ましい特性を有し、本質的に高密度記録
に適した方式であシ現在実用化に向けて研究が行なわれ
ている。
DETAILED DESCRIPTION OF THE INVENTION 1. Industrial Application Field The present invention relates to a magnetic head. 02. Prior Art Conventionally, magnetic recording media such as magnetic tapes and magnetic disks have been
It is widely used for recording various electrical signals such as video, audio, and digital. In a method that uses magnetization in the in-plane longitudinal direction of a magnetic layer (magnetic recording layer) formed on the base substrate, high density is being achieved by using new magnetic materials and new coating techniques. On the other hand, in recent years, with the increase in the density of magnetic recording, perpendicular magnetization recording methods that use magnetization in the thickness direction of the magnetic layer of a magnetic recording medium (so-called perpendicular magnetization) have recently been proposed (for example, , [Nikkei Electronics J August 7, 1978 issue A192] According to this recording method, as the recording wavelength becomes shorter, the demagnetizing field that acts on the residual magnetization in the medium decreases, which is favorable for increasing the density. This method is inherently suitable for high-density recording, and research is currently being conducted to put it into practical use.

磁気ヘッド材、例えば上記垂直磁化用と[7ての薄膜磁
気ヘッドの磁性膜(透磁層)に要求される物性は、主と
して次の2つがある。
The following two main physical properties are required for the magnetic head material, for example, the magnetic film (permeable layer) for the above-mentioned perpendicular magnetization and the thin film magnetic head.

(1)、飽和磁化(4πMs)が10,000Gaus
s以上であること。
(1), saturation magnetization (4πMs) is 10,000 Gauss
Must be at least s.

(2)、透磁率(μつが5000以上、保磁力(Hc)
が数Oe以下の軟磁性を示すこと。
(2), magnetic permeability (μ 5000 or more, coercive force (Hc)
exhibits soft magnetism of several Oe or less.

この種のヘッド材としては、アモルファスCo−Zrが
提案されておシ(第6回日本応用磁気学会[学術講演概
要集J 1982年11月、P39)、4πM8=14
.000Gauss 、 pL −5000Gauss
 (at I MHz )と良好な磁気特性を示すとさ
れている。 ヘッド材は一般に、磁気異方性をなくすた
め、成膜後に熱処理(例えば250°C160分)を施
さねばならガいが、上記した公知のCo −Z rヘッ
ド材は、熱処理によって軟磁性特性が大きく影響される
Amorphous Co-Zr has been proposed as this type of head material (6th Japan Society of Applied Magnetics [Academic Lecture Abstracts J, November 1982, p. 39), 4πM8=14
.. 000 Gauss, pL -5000 Gauss
(at I MHz) and is said to exhibit good magnetic properties. In order to eliminate magnetic anisotropy, head materials generally have to undergo heat treatment (for example, 250°C for 160 minutes) after film formation, but the above-mentioned known Co-Zr head material has soft magnetic properties that can be improved by heat treatment. greatly affected.

即ち、このヘッド材は、磁界中での熱処理を行なう場合
、異方性磁界による磁気異方性の固定化(換言すればH
aの上昇)を防止すべく異方性磁界を制御する必要があ
り、このために回転磁界(例えば2700e)中で熱処
理したシ、或いは磁化困難軸方向の磁界中で熱処理しな
ければならない。
That is, when this head material is subjected to heat treatment in a magnetic field, the magnetic anisotropy is fixed by the anisotropic magnetic field (in other words, H
It is necessary to control the anisotropic magnetic field to prevent this (increase in a), and for this purpose, heat treatment must be performed in a rotating magnetic field (for example, 2700e) or in a magnetic field in the direction of the hard magnetization axis.

こうした熱処理によ、!l)、Co−Zrヘッド材は高
透磁率、低保磁力を示すようになるが、これらの大きさ
や方向の再現性には難がある。 これは、基体とCo−
Zr膜との間の残留ストレスによる異方性が影響してい
るものと考えられ、これが磁化特性の熱的不安定性の主
たる原因であると考えられる0 3、発明の目的 本発明の目的は、高磁化、低保磁力、更には高耐食性を
示し、上述した如き熱処理を施さなくても要求される磁
化特性が再現可能なヘッド材を有する磁気ヘッドを提供
するものである。
Thanks to this heat treatment! l) Co--Zr head material exhibits high magnetic permeability and low coercive force, but the reproducibility of these sizes and directions is difficult. This is because the substrate and Co-
It is believed that the anisotropy due to residual stress between the Zr film and the Zr film is the main cause of the thermal instability of the magnetization characteristics. The object of the present invention is to provide a magnetic head having a head material that exhibits high magnetization, low coercive force, and high corrosion resistance, and can reproduce the required magnetization characteristics without the above-mentioned heat treatment.

4、発明の構成 即ち、本発明は、透磁層の少なくとも一部がコバルト−
タンタル−ジルコニウム合金(以下、Co−Ta−Zr
と記す。)によって形成されていることを特徴とする磁
気ヘッドに係るものである05、実施例 以下、本発明の実施例を図面について詳細に説明する。
4. Structure of the invention, that is, in the present invention, at least a part of the magnetically permeable layer is made of cobalt.
Tantalum-zirconium alloy (hereinafter referred to as Co-Ta-Zr)
It is written as 05, Embodiment Embodiments of the present invention will be described in detail with reference to the drawings.

第1図は、磁気テープ等の磁気記録媒体15を垂直磁気
記録するのに使用する磁気ヘッド16.17を示すもの
である。 このうち、ヘッド16は補助磁極として働ら
き、これに対向配置されるヘッド17は主磁極として機
能せしめられる。
FIG. 1 shows magnetic heads 16 and 17 used for perpendicular magnetic recording on a magnetic recording medium 15 such as a magnetic tape. Of these, the head 16 functions as an auxiliary magnetic pole, and the head 17 placed opposite thereto functions as a main magnetic pole.

ここで特徴的なことは、主磁極17として、ガラス基板
S上にco−Ta−Zrからなる磁性膜14を被着せし
め、これを別のガラス板等の保持具18で保護した構造
のものを使用していることである。
What is characteristic here is that the main magnetic pole 17 has a structure in which a magnetic film 14 made of co-Ta-Zr is deposited on a glass substrate S, and this is protected by a holder 18 such as another glass plate. is that it is using .

磁性B!X14を構成するCo−Ta−Zrは、後述す
ることから明らかなように、飽和磁化が大きくて信号記
録を充分に行なえると同時に、ヘッドに要求される低い
保磁力(Hc)を示す。 従って、そうした磁性膜14
を透磁層として有するヘッドの性能は極めて良好となる
。 しかも、Co−Ta−Zrは耐食性も良好となシ、
これもヘッド特性の向上に寄与している。
Magnetic B! As will be clear from what will be described later, Co--Ta--Zr constituting X14 has a large saturation magnetization and can perform sufficient signal recording, while at the same time exhibiting the low coercive force (Hc) required for the head. Therefore, such a magnetic film 14
The performance of a head having this as a magnetically permeable layer is extremely good. Moreover, Co-Ta-Zr has good corrosion resistance.
This also contributes to improving head characteristics.

なお、例えば、この垂直磁気記録方式においては、補助
磁極16が記録信号によシ励磁され、そこから媒体15
側へ磁界が発生し、これによシ面内方向に主磁極17へ
向けて7ラソクスが集中し、媒体15の磁性層に主磁極
17に対応した磁気記録がなされる。 このために、媒
体15は、支持体21上に軟磁性層(例えばパーマロイ
)22を介して垂直磁化膜(例えばCo−Cr)23を
積層せしめている。
For example, in this perpendicular magnetic recording method, the auxiliary magnetic pole 16 is excited by a recording signal, and the medium 15 is
A magnetic field is generated to the side, and the seven lasoxes are concentrated in the in-plane direction toward the main magnetic pole 17, and magnetic recording corresponding to the main magnetic pole 17 is performed in the magnetic layer of the medium 15. For this purpose, the medium 15 has a perpendicular magnetization film (for example, Co--Cr) 23 laminated on a support 21 with a soft magnetic layer (for example, permalloy) 22 interposed therebetween.

第2図には、本発明が適用可能な例えばオーディオ用の
磁気ヘッド27を示したが、このヘッドでも、例えばフ
ェライトからなるコア材Sの磁気ギヤツブ加側の対向面
にCo −T a −Z rからなる磁性膜14が夫々
形成されている。 なお、ヘッド全面がCo−Ta−Z
rで覆われているヘッドであってもよい。 これらのC
o−Ta−Zrよシ形成されているヘッドは特に高密度
記録に適している。
FIG. 2 shows a magnetic head 27 for audio, for example, to which the present invention can be applied. In this head as well, Co-Ta-Z is applied to the opposing surface of the core material S made of ferrite, on the side where the magnetic gear is applied. A magnetic film 14 made of r is formed respectively. Note that the entire head is made of Co-Ta-Z.
The head may be covered with r. These C
Heads made of o-Ta-Zr are particularly suitable for high-density recording.

また、上記のCo−Ta−Zr磁性膜14は、上記以外
の磁気ヘッド(例えば薄膜ヘッド)にも形成することが
できる。
Further, the Co--Ta--Zr magnetic film 14 described above can also be formed on magnetic heads other than those described above (for example, thin film heads).

次に、上記磁性膜14を構成するCo−Ta−Zrにつ
いて詳述する。
Next, Co--Ta--Zr constituting the magnetic film 14 will be described in detail.

まず、とのCoTa−Zr(実際には三元系アモルファ
ス合金)を後述するRF2極スパッタ装置(第6図)に
よって、Ar圧力5mTorr、堆積速度45〜70A
/min、基体温度1()0℃以下の条件で成膜した。
First, CoTa-Zr (actually a ternary amorphous alloy) was deposited at an Ar pressure of 5 mTorr and a deposition rate of 45 to 70 A using an RF two-pole sputtering device (Fig. 6), which will be described later.
The film was formed under the following conditions: /min, substrate temperature 1()0°C or less.

 得られたCo−Ta−Zr膜にEPMA(エレクトロ
ン・プローブ・マイクロ・アナリシス(X線マイクロア
ナリシスともいう))による組成分析、X線回折による
構造評価を行ない、またその飽和磁化(4πMs)はV
SM(試料振動型磁力計)によシ測定し、保磁力(Hc
)はヒステリシススコープ(10KHy、)によシ測定
した。
The resulting Co-Ta-Zr film was subjected to compositional analysis by EPMA (electron probe microanalysis (also referred to as X-ray microanalysis)) and structural evaluation by X-ray diffraction, and its saturation magnetization (4πMs) was found to be V
Coercive force (Hc
) was measured using a hysteresis scope (10 KHy).

この結果、Co−Ta−Zrgは第3図の如き組成範囲
を有し、飽和磁気歪み(λS)が零となる組成比を示す
ことが分った。 即ち、zrの添加によって膜構造がア
モルファス相となる組成範囲が著しく拡大され、λSが
零となる組成でもCo濃度が95 at % (ato
mic%)までアモルファス状態が得られる。
As a result, it was found that Co-Ta-Zrg has a composition range as shown in FIG. 3, and exhibits a composition ratio at which the saturation magnetostriction (λS) becomes zero. That is, the addition of zr significantly expands the composition range in which the film structure becomes an amorphous phase, and even in the composition where λS is zero, the Co concentration reaches 95 at % (ato
An amorphous state can be obtained up to mic%).

第4図は、Co−Ta−Zr膜の4yrMsの組成依存
性を示す。 これによれば、アモルファス相で得られる
4πMsの最大値はCo濃度95.2at%の膜の約1
6KGauss ″Cある。
FIG. 4 shows the composition dependence of 4yrMs in the Co--Ta--Zr film. According to this, the maximum value of 4πMs obtained in the amorphous phase is about 1 for a film with a Co concentration of 95.2 at%.
There is 6K Gauss ″C.

また、Co−Ta−Zr膜のHcの組成依存性について
も、Hcが最小値をとる組成近傍でλSが零となること
が確認され、内部応力の測定からその組成は圧縮応力が
最小となる組成と一致することが分った。 得られたH
cは数Oe以下であることが確認された。
In addition, regarding the compositional dependence of Hc in the Co-Ta-Zr film, it was confirmed that λS becomes zero near the composition where Hc takes the minimum value, and internal stress measurements show that the compressive stress is the minimum for that composition. It was found that the composition was consistent with the composition. The obtained H
It was confirmed that c was several Oe or less.

また、成膜後のCo−Ta−Zrは上記のようにそのま
までも良好な磁化特性を示すが、既述した如き熱処理を
加えると、温度上昇に従ってHaは徐々に減少するが、
これは内部応力の緩和によるものと考えられる。 更に
温度を高めると、Coa’lf度の大きな膜ではHcが
増大するので、処理温度は350〜400℃以下とする
のがよい。 一方、Co−Ta−Zr膜の結晶化温度は
、Co95atSで480℃、Co 85 at %で
560℃でアシ、二元系のCo−Ta膜よシも大幅に上
昇することも分った。
In addition, Co-Ta-Zr after film formation shows good magnetization characteristics even as it is as described above, but when heat treatment is applied as described above, Ha gradually decreases as the temperature rises.
This is thought to be due to relaxation of internal stress. If the temperature is further increased, Hc will increase in a film with a large Coa'lf degree, so the treatment temperature is preferably 350 to 400°C or less. On the other hand, it was also found that the crystallization temperature of the Co-Ta-Zr film was 480°C for Co95atS and 560°C for Co85at%, and that the crystallization temperature of the binary Co-Ta film also increased significantly.

次に、第1図に示した磁気記録方式において、主磁極の
磁性膜14の厚さを1μm、)ランク幅を500μmと
して、各種の磁性膜(本発明によるCo−Ta−Zrを
はじめ、公知のCo−Zrやパーマロイからなる膜)を
有した磁気ヘッドを夫々用いて得られた再生出力を第5
図に示す。 これによれば、本発明による磁性膜を適用
することによって出力特性が著しく改善されることが明
らかであシ、本発明の優位性を如実に示している。
Next, in the magnetic recording system shown in FIG. 1, the thickness of the magnetic film 14 of the main pole is 1 μm, the rank width is 500 μm, and various magnetic films (including Co-Ta-Zr according to the present invention and other known The reproduction output obtained using each magnetic head with a film made of Co-Zr or permalloy is
As shown in the figure. According to this, it is clear that the output characteristics are significantly improved by applying the magnetic film according to the present invention, clearly demonstrating the superiority of the present invention.

上記した如く、本発明によるCo−Ta−Zr膜は4π
M8が充分に大きく、HCが低くて磁気ヘノもCo−T
a−Zrの組成比の選択によって充分小さく(望ましく
は零となる)できることも分った。
As mentioned above, the Co-Ta-Zr film according to the present invention has a 4π
M8 is large enough, HC is low, and magnetic heno is Co-T.
It has also been found that it can be made sufficiently small (preferably zero) by selecting the composition ratio of a-Zr.

次に1上記のGo−Ta−Zr膜14を成膜する装置を
説明する。
Next, an apparatus for forming the Go-Ta-Zr film 14 described above in 1 will be explained.

第6図に示した装置はRF2極スパッタ装置であって、
反応槽3o内には、基板ホルダー31上の基板Sと、タ
ーゲットホルダー32上のターゲットTとが対向配置さ
れ、ホルダー31と32とのra、’5 Ic、高周波
電源33による高周波電圧を印加し、Arガス34を導
入口35よシ導入しながらスパッタを行なう。
The apparatus shown in FIG. 6 is an RF bipolar sputtering apparatus,
In the reaction tank 3o, a substrate S on a substrate holder 31 and a target T on a target holder 32 are arranged facing each other, and a high frequency voltage is applied to the holders 31 and 32 with ra, '5 Ic, and a high frequency power source 33. , sputtering is performed while introducing Ar gas 34 through the inlet 35.

排ガス36は導出口37よシ排出される。 ターゲット
Tは、第7図に明示するように、複合ターゲットとして
構成され、円盤状のCo板詔上VCTaチップ39とZ
rチップ4oとが放射状の位置関係で配置され、スパッ
タ時のプラズマによってCo及びTa、Zr が夫々所
定量ずつ叩き出され、基板S上にCo−Ta−Zrとし
て堆積する。 この場合のスパッタ条件は、例えばAr
ガス圧=20mTorr。
The exhaust gas 36 is discharged through the outlet 37. As clearly shown in FIG. 7, the target T is configured as a composite target, and includes a VCTa chip 39 on a disk-shaped Co plate and a Z
r chips 4o are arranged in a radial positional relationship, and predetermined amounts of Co, Ta, and Zr are each knocked out by plasma during sputtering, and deposited on the substrate S as Co--Ta--Zr. The sputtering conditions in this case are, for example, Ar
Gas pressure = 20 mTorr.

高周波電力=150W、基板温度==1oo℃であって
よい。
The high frequency power may be 150 W, and the substrate temperature may be 100° C.

第8図は、上記とは異なる対向ターゲットスパッタ装置
を示すものである。
FIG. 8 shows a facing target sputtering apparatus different from the above.

図面において、41は真空槽、42は真空槽41を排気
する真空ポンプ等からなる排気系、43は真空槽1内に
所定のガスを導入してガス圧力を1o 〜10 Tor
r程度に設定するガス導入系である。
In the drawing, 41 is a vacuum chamber, 42 is an exhaust system consisting of a vacuum pump etc. for evacuating the vacuum chamber 41, and 43 is an exhaust system that introduces a predetermined gas into the vacuum chamber 1 to raise the gas pressure to 10 to 10 Torr.
This is a gas introduction system set at approximately r.

ターゲット電極は、ターゲットホルダー44にょシ、C
o−Ta−Zrからなる一対のターゲットT】、T2を
互いに隔てて平行に対向配置した対向ターゲット電極と
して構成されている。 これらのターゲット間には、磁
界発生手段(図示せず)による磁界が形成される。 一
方、磁性薄膜を形成すべき基体Sは、基体ホルダ〜45
によって、上記対向ターゲット間の側方に垂直に配置さ
れる。 このように構成されたスパッタ装置において、
平行に対向し合った両夕〜ゲッ) T1、T2の各表面
と垂直方向に磁界を形成し、この磁界にょシ陰極降下部
(即ち、ターグツ)TIT2間に発生したプラズi雰囲
気と各ターグツ)T1及びT2との間の領域)での電界
で加速されたスパッタガスイオンのターゲント表面に対
する衝けで放出されたγ電子をターゲット間の空間にと
じ込め、対向した他方のターゲット方向へ移動させる。
The target electrode is attached to the target holder 44, C
A pair of targets T] and T2 made of o-Ta-Zr are arranged as opposed target electrodes in parallel with each other and separated from each other. A magnetic field is generated between these targets by magnetic field generating means (not shown). On the other hand, the substrate S on which the magnetic thin film is to be formed is held in the substrate holder ~ 45
is arranged vertically laterally between the opposing targets. In the sputtering apparatus configured in this way,
A magnetic field is formed in the direction perpendicular to the surfaces of T1 and T2, which face each other in parallel. The γ electrons emitted by the impact of the sputtering gas ions accelerated by the electric field on the target surface in the region between T1 and T2 are trapped in the space between the targets and moved toward the other opposing target.

 他方のターゲット表面へ移動したγ電子は、その近傍
の陰極降下部で反射される。 こうして、γ電子はター
ゲットTI T2間において磁界に束縛されながら往復
運動を繰返すことになる。 この往復運動の間に、γ電
子は中性の雰囲気ガスと衝突して雰囲気ガスのイオンと
電子とを生成させ、これらの生成物がターゲットからの
γ電子の放出と雰囲気ガスのイオン化を促進させる。 
従って、ターゲラ)T+−T2 間の空間には高密度の
プラズマが形成され、これに伴なってターゲット物質が
充分にスパッタされ、側方の基体S上に磁性材料として
堆積してゆくことになる。
The γ electrons that have moved to the other target surface are reflected at the cathode fall section nearby. In this way, the γ electrons repeatedly move back and forth between the targets TIT2 while being constrained by the magnetic field. During this reciprocating motion, the γ electrons collide with the neutral atmospheric gas to generate ions and electrons of the atmospheric gas, and these products promote the release of γ electrons from the target and the ionization of the atmospheric gas. .
Therefore, high-density plasma is formed in the space between T+ and T2, and the target material is sufficiently sputtered and deposited as a magnetic material on the side substrate S. .

この対向ターゲットスパッタ装置は、他の飛翔手段に比
べて、高速スパッタによる高堆積速度の製膜が可能であ
シ、また基体がプラズマに直接曝されることがなく、低
い基体温度での製膜が可能である等のことから、垂直磁
化膜を形成するのに有利である。 しかも、対向ターゲ
ット間ノくツタ装置によって飛翔した磁性膜材料の基板
への入射エネルギーは、通常のスノくツタ装置のものよ
りも小さいので、材料が所望の方向へ方向性を以って堆
積し易く、垂直磁化記録に適した構造の膜をイ()易く
なる。
Compared to other flying methods, this facing target sputtering device is capable of forming films at high deposition rates through high-speed sputtering, and the substrate is not directly exposed to plasma, allowing film formation at low substrate temperatures. This method is advantageous for forming a perpendicularly magnetized film. In addition, the incident energy of the magnetic film material that is ejected between the opposing targets by the Nokutsuta device onto the substrate is smaller than that of the normal Nokutsuta device, so the material can be deposited directionally in the desired direction. This makes it easier to create a film with a structure suitable for perpendicular magnetization recording.

以上、本発明を例示しだが、上述の例は木発Iy]の技
術的思想に基いて更に変形が可能である。
The present invention has been described above as an example, but the above-mentioned example can be further modified based on the technical idea of Kihatsu Iy].

例えば、ヘッドの構造やCoTa−Zr膜の成11へ方
法は種々変更してよい。 ヘッドの透磁1曽は、Co−
Ta−Zr膜と他の磁性膜との組合せ構造で形成するこ
ともできる。 また、記録されるべき3体の磁性層は塗
布型のCo−Crであってよく、Baフェライト等の公
知の材質からなっていてもよい。
For example, the structure of the head and the method of forming the CoTa-Zr film 11 may be changed in various ways. The magnetic permeability of the head is Co-
It can also be formed with a combination structure of a Ta-Zr film and other magnetic films. Further, the three magnetic layers to be recorded may be coated Co--Cr, or may be made of a known material such as Ba ferrite.

また、Co、Ta、Zrに加えて第4の元素を添加して
もよい。
Further, a fourth element may be added in addition to Co, Ta, and Zr.

6、発明の作用効果 本発明は上述の如く、ヘッドの透磁層としてCo−Ta
−Zr合金からなるものを用いているので、特にZrの
含有によって、4πM8 が大きく、■■Cも安定でか
つ小さくなシ、高磁化、低保磁力(更には高透磁率)の
磁性膜が再現性良く作成可能なヘッドを得ることができ
る。
6. Effects of the Invention As described above, the present invention uses Co-Ta as the magnetically permeable layer of the head.
- Since a Zr alloy is used, due to the Zr content, 4πM8 is large, ■■C is stable and small, and a magnetic film with high magnetization and low coercive force (and high permeability) is created. A head that can be manufactured with good reproducibility can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の実施例を示すものであって、第1図は磁
気ヘッドによる記録時の概略図、第2図は他のヘッド構
成を示す概略図、第3図はCo−Ta−Zrの三角組成
図、第4図はZrによる飽和磁化特性の変化を示すグラ
フ、 第5図は各種ヘッド材の磁気ヘッドによる再生出力を示
すグラフ、 第6図はCo−Ta−Zr膜を作成するスパッタ装置の
概略断面図、 第7図はターゲットの平面図、 第8図は他のスパッタ装置の概略断面図である。 なお、図面に示された符号において、 14−−−−−−−磁性膜(透磁層) 15−−−−−一磁気記録媒体 16−−−−−−一補助磁極 17、−−−、−一主磁極 加−−一一一一一磁気ギャップ s −−−−−一基板 TXTIXT2−−−−−−一ターゲットである。 代理人 弁理士 逢 坂 宏 (他)名)第1図 第2閉 4πMs Zr (a↑1%) 第5図 記動じ掘度(Aロビー/Vインチ)
The drawings show embodiments of the present invention, in which FIG. 1 is a schematic diagram of a magnetic head during recording, FIG. 2 is a schematic diagram of another head configuration, and FIG. 3 is a Co-Ta-Zr head configuration. Triangular composition diagram, Figure 4 is a graph showing changes in saturation magnetization characteristics due to Zr, Figure 5 is a graph showing reproduction output by magnetic heads of various head materials, Figure 6 is sputtering to create Co-Ta-Zr film. FIG. 7 is a schematic sectional view of the apparatus, FIG. 7 is a plan view of the target, and FIG. 8 is a schematic sectional view of another sputtering apparatus. In addition, in the symbols shown in the drawings, 14-------- Magnetic film (permeable layer) 15-- Magnetic recording medium 16-------- One auxiliary magnetic pole 17, --- , -1 main magnetic pole addition -11111 magnetic gap s -------1 substrate TXTIXT2 -------1 target. Agent: Hiroshi Aisaka, Patent Attorney (and others) Figure 1, Figure 2, Closed 4πMs Zr (a↑1%) Figure 5, Depth of movement (A lobby/V inch)

Claims (1)

【特許請求の範囲】[Claims] 1、透磁層の少なくとも一部がコバルト−タンタル−ジ
ルコニウム合金によって形成されていることを特徴とす
る磁気ヘッド。
1. A magnetic head characterized in that at least a portion of the magnetically permeable layer is formed of a cobalt-tantalum-zirconium alloy.
JP17476883A 1983-09-21 1983-09-21 Magnetic head Pending JPS6066309A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17476883A JPS6066309A (en) 1983-09-21 1983-09-21 Magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17476883A JPS6066309A (en) 1983-09-21 1983-09-21 Magnetic head

Publications (1)

Publication Number Publication Date
JPS6066309A true JPS6066309A (en) 1985-04-16

Family

ID=15984328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17476883A Pending JPS6066309A (en) 1983-09-21 1983-09-21 Magnetic head

Country Status (1)

Country Link
JP (1) JPS6066309A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06103513A (en) * 1992-09-16 1994-04-15 Victor Co Of Japan Ltd Composite magnetic head

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Manufacture of amorphous thin film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (en) * 1981-08-11 1983-02-18 Hitachi Ltd Manufacture of amorphous thin film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06103513A (en) * 1992-09-16 1994-04-15 Victor Co Of Japan Ltd Composite magnetic head

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