JPS606148U - projection exposure equipment - Google Patents

projection exposure equipment

Info

Publication number
JPS606148U
JPS606148U JP9683283U JP9683283U JPS606148U JP S606148 U JPS606148 U JP S606148U JP 9683283 U JP9683283 U JP 9683283U JP 9683283 U JP9683283 U JP 9683283U JP S606148 U JPS606148 U JP S606148U
Authority
JP
Japan
Prior art keywords
projection exposure
exposure equipment
reticle
projection
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9683283U
Other languages
Japanese (ja)
Inventor
圭一 別井
勉 宮下
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP9683283U priority Critical patent/JPS606148U/en
Publication of JPS606148U publication Critical patent/JPS606148U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図Ａは本考案を実施した投影露光装置の構成図、同
図Ｂはこれに使われるマスクの正面図、第２図は別の実
施例の構成図である。 図において、１，６は光源、２．　７．　１４は集光レ
ンズ、３はレティクル、４は投影レンズ、５はウェハ、
８．１６はマスク、１１．　１５．　１８は反射鏡。FIG. 1A is a block diagram of a projection exposure apparatus embodying the present invention, FIG. 1B is a front view of a mask used therein, and FIG. 2 is a block diagram of another embodiment. In the figure, 1 and 6 are light sources; 2. 7. 14 is a condensing lens, 3 is a reticle, 4 is a projection lens, 5 is a wafer,
8.16 is a mask, 11. 15. 18 is a reflective mirror.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ホトレジストを被覆したウェハを規定ピッチ毎の移動が
可能な試料台上にセットすると共に光源よりの光を集光
レンズを通じてレティクルに照射し、該レティクルから
の透過光を投影レンズを用いて縮少し、前記ウェハへの
投影露光を繰返し行うステップアンドレピート方式をと
る露光装置において、該装置に付属して投影レンズを共
用する一識別番号付与用光学系を設けたことを特徴とす
る投影露光装置。A wafer coated with photoresist is set on a sample stage that can be moved at specified pitches, and light from a light source is irradiated onto a reticle through a condensing lens, and transmitted light from the reticle is reduced using a projection lens. A projection exposure apparatus that employs a step-and-repeat method for repeatedly performing projection exposure on a wafer, characterized in that an optical system for assigning an identification number is attached to the apparatus and shares a projection lens.
JP9683283U 1983-06-23 1983-06-23 projection exposure equipment Pending JPS606148U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9683283U JPS606148U (en) 1983-06-23 1983-06-23 projection exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9683283U JPS606148U (en) 1983-06-23 1983-06-23 projection exposure equipment

Publications (1)

Publication Number Publication Date
JPS606148U true JPS606148U (en) 1985-01-17

Family

ID=30230594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9683283U Pending JPS606148U (en) 1983-06-23 1983-06-23 projection exposure equipment

Country Status (1)

Country Link
JP (1) JPS606148U (en)

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