JPS5885339U - Reduction projection exposure equipment - Google Patents
Reduction projection exposure equipmentInfo
- Publication number
- JPS5885339U JPS5885339U JP18116481U JP18116481U JPS5885339U JP S5885339 U JPS5885339 U JP S5885339U JP 18116481 U JP18116481 U JP 18116481U JP 18116481 U JP18116481 U JP 18116481U JP S5885339 U JPS5885339 U JP S5885339U
- Authority
- JP
- Japan
- Prior art keywords
- projection exposure
- photomask
- reduction
- pattern
- reduction projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は、従来のパターン検出光学系を含む縮小投影露
光装置の概念図、第２図は、本考案によるパターン検出
光学系を含む縮小投影露光装置の概念図である。
１・・・・・・レティクル、２・・・・・・２・・・・
・・縮小レンズ、３・・・・・・ウェーハ、４．９・・
・・・・ライトガイド、５・・・・・・ハーフミラ−１
６，１１・・・・・・集光レンズ、７゜１’０． １２
． １５・・・・・・ミラー、８・・・・・・レティク
ル上の基準パターン、１３・・・・・・対物レンズ、１
４・・・・・・投影レンズ、１６・・・・・・パターン
検出器。FIG. 1 is a conceptual diagram of a reduction projection exposure apparatus including a conventional pattern detection optical system, and FIG. 2 is a conceptual diagram of a reduction projection exposure apparatus including a pattern detection optical system according to the present invention. 1...Reticle, 2...2...
...Reducing lens, 3...Wafer, 4.9...
...Light guide, 5...Half mirror-1
6, 11...Condensing lens, 7°1'0. 12
．． 15...Mirror, 8...Reference pattern on reticle, 13...Objective lens, 1
4... Projection lens, 16... Pattern detector.
Claims (1)
ーハ面に転写する縮小投影露光装置において、上記ホト
マスク上の上記パターン周辺に位置合せの基準となる基
準パターンをもうけ、かつ、上記基準パターンと上記縮
小レンズの入射とを結ぶ光軸上であって上記ホトマスク
と上記縮小レンズとの間にハーフミラ−を設けてなるこ
とを特徴とする縮小投影露光装置。 ２ 上記ホトマスクおよび゛上記縮小レンズとを介して
上記ウェーハ上の位置合せパターンを照明する光学系と
、上記ウェーハ面からの反射光を縮小レンズのみを介し
て検出する光学系とを備えてなる第１項の縮小投影露光
装置。 ３ 上記ホトマスクと上記縮小レンズとの間に上記ホト
マスク上の位置合せ用パターンの位置を検出する光学系
を備えてなる第１項の縮小投影露光装置。[Claims for Utility Model Registration] 1. In a reduction projection exposure apparatus that transfers a pattern on a photomask onto a wafer surface via a reduction lens, a reference pattern is provided around the pattern on the photomask as a reference for alignment, and A reduction projection exposure apparatus characterized in that a half mirror is provided between the photomask and the reduction lens on an optical axis connecting the reference pattern and the incidence of the reduction lens. 2. An optical system comprising an optical system that illuminates the alignment pattern on the wafer through the photomask and the reduction lens, and an optical system that detects reflected light from the wafer surface only through the reduction lens. 1. Reduction projection exposure device. 3. The reduction projection exposure apparatus according to item 1, further comprising an optical system between the photomask and the reduction lens for detecting the position of the alignment pattern on the photomask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18116481U JPS5885339U (en) | 1981-12-07 | 1981-12-07 | Reduction projection exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18116481U JPS5885339U (en) | 1981-12-07 | 1981-12-07 | Reduction projection exposure equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5885339U true JPS5885339U (en) | 1983-06-09 |
Family
ID=29978398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18116481U Pending JPS5885339U (en) | 1981-12-07 | 1981-12-07 | Reduction projection exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5885339U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60168112A (en) * | 1984-02-13 | 1985-08-31 | Nippon Kogaku Kk <Nikon> | Focusing device of projecting device |
-
1981
- 1981-12-07 JP JP18116481U patent/JPS5885339U/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60168112A (en) * | 1984-02-13 | 1985-08-31 | Nippon Kogaku Kk <Nikon> | Focusing device of projecting device |
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