JPS6052246A - Polishing machine - Google Patents

Polishing machine

Info

Publication number
JPS6052246A
JPS6052246A JP58160624A JP16062483A JPS6052246A JP S6052246 A JPS6052246 A JP S6052246A JP 58160624 A JP58160624 A JP 58160624A JP 16062483 A JP16062483 A JP 16062483A JP S6052246 A JPS6052246 A JP S6052246A
Authority
JP
Japan
Prior art keywords
rotary
plate
polishing
workpiece
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58160624A
Other languages
Japanese (ja)
Inventor
Hiromu Watanabe
渡辺 熈
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mabuchi Shoten KK
Original Assignee
Mabuchi Shoten KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mabuchi Shoten KK filed Critical Mabuchi Shoten KK
Priority to JP58160624A priority Critical patent/JPS6052246A/en
Publication of JPS6052246A publication Critical patent/JPS6052246A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

PURPOSE:To polish the entire surface of a workpiece with a uniform degree of accuracy without interrupting the working, by providing, in a conventional polishing machine, adjusting mechanism for adjusting the transfer speed or transfer width of a rotary transfer plate during polishing. CONSTITUTION:In a surface-grinding machine 10 which is used for polishing prisms, lenses, etc., a rotary plate 12 is fitted onto a vertical shaft 14, and is rotated driven thereby. Further, there is provided an adjusting mechanism for adjusting the transfer speed or transfer width of a rotary transfer plate 16 which is arranged above the rotary plate 12. This rotary transfer plate 16 is able to conduct various movements so that it may polish a workpiece 26, uniformly all over the surface thereof with a high degree of accuracy. Further, since it is not necessary to interrupt the working, the working efficiency may be remarkably enhanced.

Description

【発明の詳細な説明】 本発明はプリズム、レンズ等の加工に使用する平面また
は球面研磨様に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a flat or spherical polishing method used for processing prisms, lenses, etc.

この種の研磨機は平面用、球面用ともほぼ同様であって
、通常第1図に示すように構成されている。この平面研
磨機10において、回転板12は垂直な軸14に取付け
られ駆動されて回転する。
This type of polishing machine is almost the same for both flat and spherical surfaces, and is usually constructed as shown in FIG. In this surface polishing machine 10, a rotating plate 12 is attached to a vertical shaft 14 and driven to rotate.

この回転板12の上方に回転移動板16が設けられ、そ
の中央部は球継手18を介して軸2oに支えられ、この
軸20は下方向にカを加えつつ水平方向に移動するよう
駆動される。回転板12の表面には研磨力を有する研磨
器22が形成され、回転移動板16の表面には加工物を
接着剤等で固定する取付部24が形成されている。
A rotationally movable plate 16 is provided above the rotary plate 12, and its central portion is supported by a shaft 2o via a ball joint 18, and this shaft 20 is driven to move horizontally while applying downward force. Ru. A polisher 22 having polishing power is formed on the surface of the rotary plate 12, and a mounting portion 24 for fixing the workpiece with an adhesive or the like is formed on the surface of the rotary moving plate 16.

この取付部24に加工物26を取付け、回転板12を回
転させ、軸2oに下方向のカを加えつつ駆動して回転移
動板16を水平に移動させると、回転移動板16は回転
板12の回転に応じ、球継手18を中心にして回転しな
がら移動し、加工物26の表面は平面に研磨される。
When the workpiece 26 is attached to this attachment part 24, the rotary plate 12 is rotated, and the rotary plate 16 is moved horizontally by applying a downward force to the shaft 2o, the rotary plate 16 is moved horizontally. The workpiece 26 is rotated and moved around the ball joint 18 in accordance with the rotation of the workpiece 26, and the surface of the workpiece 26 is polished to a flat surface.

このとき、回転板12、回転移動板16とも回転するの
であるから当然中心部と外周部で移動速度が異な、す、
加工物26の・研磨仕事量は各部分で異なる。
At this time, since both the rotary plate 12 and the rotationally movable plate 16 rotate, the moving speeds are naturally different between the center and the outer periphery.
The amount of polishing work of the workpiece 26 differs for each part.

従来の研磨機は回転移動板J6を単にta動機、エアシ
リンダ等で往復移動させるだけであって、この運動を調
節することはほとんど不可能であり、わずかに軸2oを
駆動するリンクの一部の取付位置を変更して移動幅を変
更することができるだけであった。このため上記の研磨
仕事量の不均一による加工精度の不均一は、加工の途中
で軸20すなわち回転移動板16の移動幅を変更するこ
とにより修正している。この修正方法は加工途中で作業
を止めるので非能率であり、また修正も不十分で、再加
工を必要とすることが多℃\。
In conventional polishing machines, the rotary movable plate J6 is simply reciprocated using a ta-motor, an air cylinder, etc., and it is almost impossible to adjust this movement. It was only possible to change the movement width by changing the mounting position. For this reason, the above-mentioned non-uniformity in processing accuracy due to non-uniformity in the amount of polishing work is corrected by changing the movement width of the shaft 20, that is, the rotary movable plate 16, during processing. This correction method is inefficient because it stops the work in the middle of processing, and the correction is insufficient, often requiring reprocessing.

本発明はこのような不都合を改善し、作業を中止するこ
とな(全面を均一な精度で研磨することができる研磨機
を得ることを目的とするものである。
The object of the present invention is to improve such inconveniences and to provide a polishing machine that can polish the entire surface with uniform accuracy without stopping the work.

すなわち本発明は従来の研磨機に、回転移動板の移動速
度または移動幅を研磨加工中に調節する調節機構を設け
たものである。
That is, the present invention provides a conventional polishing machine with an adjustment mechanism for adjusting the moving speed or moving width of the rotary moving plate during polishing.

この調節機構としては、例えば、軸20をステッピング
モータで駆動し、このステッピングモータをメモリにあ
らかじめ記憶させており・た情報により駆動する機構を
用いることカーできる。
As this adjustment mechanism, for example, a mechanism may be used in which the shaft 20 is driven by a stepping motor and the stepping motor is driven by information stored in advance in a memory.

このメそりには実際に各種の態様で研磨を行ない、加工
物全表面が均一となる回転移動板の移動態様をめ、その
態様を記憶させておく。なおこのような研磨においては
何層精度を理論的に予測することは未だ不可能であり、
最適移動態様は実際に研磨してみなければ知ることはで
きない。
This mesori is actually polished in various manners, and the manner in which the rotationally moving plate is moved so that the entire surface of the workpiece is uniform is determined and the manner is memorized. In addition, it is still impossible to theoretically predict the precision of the number of layers in this type of polishing.
The optimum movement mode cannot be known unless the polishing is actually performed.

本発明による回転移動板の移動の例を第3図〜第6図に
示す。なお第2図に比較のため従来の研磨機の回転移動
板の移動を示す。
Examples of movement of the rotationally movable plate according to the present invention are shown in FIGS. 3 to 6. For comparison, FIG. 2 shows the movement of the rotary moving plate of a conventional polishing machine.

第3図は回転移動板の移動速度をその位IRにより徐々
に変更した例を示す。
FIG. 3 shows an example in which the moving speed of the rotary moving plate is gradually changed by IR.

第4図は回転移動板を数箇所で一時滞溜させる例を示す
FIG. 4 shows an example in which the rotationally movable plate is temporarily retained at several locations.

第5図は回転移動板を数箇所で小幅往復移動させる例を
示す。
FIG. 5 shows an example in which the rotationally movable plate is reciprocated in a small width at several locations.

第6図は回転移動板の往復移動の移動幅を徐々に減少さ
せる例を示す。
FIG. 6 shows an example in which the width of the reciprocating movement of the rotary moving plate is gradually reduced.

上記はいずれも本発明によって実現しつる移動の例を示
したものであり、実際は上述のようにこれらの移動態様
を適宜組合わせて使用する。
All of the above are examples of the crane movement realized by the present invention, and in reality, these movement modes are used in appropriate combinations as described above.

なお本発明は上記の回転移動板が回転板により従属的に
回転させられる研磨機だけでなく、回転移動板自体が独
自に回転駆動される研磨機についても使用されることは
いうまでもない。
It goes without saying that the present invention can be used not only in a polishing machine in which the above-mentioned rotary movable plate is rotated dependently by the rotary plate, but also in a polishing machine in which the rotary movable plate itself is rotationally driven.

以上のように本発明によれば、回転移動板は各種の移動
を行なうことができるので加工物の全面にわたって均一
かつ高精度の研磨を施すことができる。しかも加工作業
を中断する必要がないので作業能率が著しく向上する特
徴がある。
As described above, according to the present invention, since the rotary movable plate can perform various movements, uniform and highly accurate polishing can be performed over the entire surface of the workpiece. Moreover, since there is no need to interrupt the machining operation, the work efficiency is significantly improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は研磨機の構造を示す正面図、第2図は従来の研
磨機の回転移動板の移動を示すグラフ、第3図〜第6図
は本発明の回転移動板の移動の各種の例を示すグラフで
ある。 10・・・・・・研磨機、12・・・・・回転板、 1
6・・・・・・・・・回転移動板、 22・・・研磨皿
、 26・・・・・・加工物。 特許出願人 株式会社 馬シにリ 商 店 代 理 人 11図 号・2図 第3図
FIG. 1 is a front view showing the structure of the polishing machine, FIG. 2 is a graph showing the movement of the rotary movable plate of a conventional polishing machine, and FIGS. 3 to 6 show various types of movement of the rotary movable plate of the present invention. Figure 2 is a graph showing an example. 10... Polishing machine, 12... Rotating plate, 1
6... Rotating plate, 22... Polishing plate, 26... Workpiece. Patent Applicant Co., Ltd. Umashini Ri Shoten Agent Figure 11 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 1、 回転板と、この回転板に向って押し付げられ、こ
の回転板に沿って移動しつつ回転する回転移動板とを有
し、これら両板の間に加工物を挾んで研磨する研磨機に
おいて、回転移動板の移動速度または移動幅を研磨加工
中に調節する調節機構を設けたことを特徴とする研磨機
1. A polishing machine that has a rotating plate and a rotary moving plate that is pressed toward the rotating plate and rotates while moving along the rotating plate, and polishes a workpiece by sandwiching it between these two plates. A polishing machine characterized by being provided with an adjustment mechanism for adjusting the moving speed or the moving width of the rotary moving plate during polishing.
JP58160624A 1983-09-01 1983-09-01 Polishing machine Pending JPS6052246A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58160624A JPS6052246A (en) 1983-09-01 1983-09-01 Polishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58160624A JPS6052246A (en) 1983-09-01 1983-09-01 Polishing machine

Publications (1)

Publication Number Publication Date
JPS6052246A true JPS6052246A (en) 1985-03-25

Family

ID=15718954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58160624A Pending JPS6052246A (en) 1983-09-01 1983-09-01 Polishing machine

Country Status (1)

Country Link
JP (1) JPS6052246A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257749A (en) * 1985-05-08 1986-11-15 Shibayama Kikai Kk Oscillating spindle shaft in automatic surface grinder for semiconductor wafer
JPS63229256A (en) * 1987-03-17 1988-09-26 Shintou Bureetaa Kk Grinding method and its device
JPH0310752A (en) * 1989-06-02 1991-01-18 Honda Motor Co Ltd Spherical surface grinding method
JPH04129658A (en) * 1990-09-19 1992-04-30 Haruchika Seimitsu:Kk Rocking method and device thereof for polishing bowl in polishing device
JP2007168841A (en) * 2005-12-21 2007-07-05 Japan Crown Cork Co Ltd Screw cap
CN105058196A (en) * 2015-08-25 2015-11-18 欧普康视科技股份有限公司 Polishing machine for novel rigid corneal contact lens

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52116995A (en) * 1976-03-27 1977-09-30 Toshiba Corp Lapping grinder

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52116995A (en) * 1976-03-27 1977-09-30 Toshiba Corp Lapping grinder

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257749A (en) * 1985-05-08 1986-11-15 Shibayama Kikai Kk Oscillating spindle shaft in automatic surface grinder for semiconductor wafer
JPS63229256A (en) * 1987-03-17 1988-09-26 Shintou Bureetaa Kk Grinding method and its device
JPH0575547B2 (en) * 1987-03-17 1993-10-20 Sintobrator Ltd
JPH0310752A (en) * 1989-06-02 1991-01-18 Honda Motor Co Ltd Spherical surface grinding method
JPH04129658A (en) * 1990-09-19 1992-04-30 Haruchika Seimitsu:Kk Rocking method and device thereof for polishing bowl in polishing device
JP2007168841A (en) * 2005-12-21 2007-07-05 Japan Crown Cork Co Ltd Screw cap
CN105058196A (en) * 2015-08-25 2015-11-18 欧普康视科技股份有限公司 Polishing machine for novel rigid corneal contact lens

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