JPS6051695A - 液相エピタキシャル結晶成長方法とその装置 - Google Patents
液相エピタキシャル結晶成長方法とその装置Info
- Publication number
- JPS6051695A JPS6051695A JP15762683A JP15762683A JPS6051695A JP S6051695 A JPS6051695 A JP S6051695A JP 15762683 A JP15762683 A JP 15762683A JP 15762683 A JP15762683 A JP 15762683A JP S6051695 A JPS6051695 A JP S6051695A
- Authority
- JP
- Japan
- Prior art keywords
- crystal growth
- crystal
- raw material
- substrate
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007791 liquid phase Substances 0.000 title claims description 15
- 238000002109 crystal growth method Methods 0.000 title description 3
- 239000013078 crystal Substances 0.000 claims description 98
- 239000007789 gas Substances 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 34
- 239000002994 raw material Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 9
- 238000002844 melting Methods 0.000 claims description 8
- 230000008018 melting Effects 0.000 claims description 8
- 241000218691 Cupressaceae Species 0.000 claims 1
- 239000002689 soil Substances 0.000 claims 1
- 238000004090 dissolution Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 210000004349 growth plate Anatomy 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000012047 saturated solution Substances 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004943 liquid phase epitaxy Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
- C30B19/062—Vertical dipping system
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15762683A JPS6051695A (ja) | 1983-08-29 | 1983-08-29 | 液相エピタキシャル結晶成長方法とその装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15762683A JPS6051695A (ja) | 1983-08-29 | 1983-08-29 | 液相エピタキシャル結晶成長方法とその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6051695A true JPS6051695A (ja) | 1985-03-23 |
JPH0428678B2 JPH0428678B2 (enrdf_load_stackoverflow) | 1992-05-14 |
Family
ID=15653837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15762683A Granted JPS6051695A (ja) | 1983-08-29 | 1983-08-29 | 液相エピタキシャル結晶成長方法とその装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6051695A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63183275U (enrdf_load_stackoverflow) * | 1987-05-19 | 1988-11-25 | ||
JP2006036614A (ja) * | 2004-07-30 | 2006-02-09 | Shimadzu Corp | 結晶製造方法および結晶製造装置 |
CN102732950A (zh) * | 2012-06-20 | 2012-10-17 | 常州天合光能有限公司 | 一种连续生长准单晶晶体的装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5039875A (enrdf_load_stackoverflow) * | 1973-08-13 | 1975-04-12 | ||
JPS515636A (en) * | 1974-07-04 | 1976-01-17 | Tokyo Gas Co Ltd | Ekitainenryono chitsusosankabutsuteihatsuseinenshohoho |
-
1983
- 1983-08-29 JP JP15762683A patent/JPS6051695A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5039875A (enrdf_load_stackoverflow) * | 1973-08-13 | 1975-04-12 | ||
JPS515636A (en) * | 1974-07-04 | 1976-01-17 | Tokyo Gas Co Ltd | Ekitainenryono chitsusosankabutsuteihatsuseinenshohoho |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63183275U (enrdf_load_stackoverflow) * | 1987-05-19 | 1988-11-25 | ||
JP2006036614A (ja) * | 2004-07-30 | 2006-02-09 | Shimadzu Corp | 結晶製造方法および結晶製造装置 |
CN102732950A (zh) * | 2012-06-20 | 2012-10-17 | 常州天合光能有限公司 | 一种连续生长准单晶晶体的装置 |
CN102732950B (zh) * | 2012-06-20 | 2015-04-15 | 常州天合光能有限公司 | 一种连续生长准单晶晶体的装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0428678B2 (enrdf_load_stackoverflow) | 1992-05-14 |
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