JPS604652Y2 - イオンエツチング装置 - Google Patents

イオンエツチング装置

Info

Publication number
JPS604652Y2
JPS604652Y2 JP1976043082U JP4308276U JPS604652Y2 JP S604652 Y2 JPS604652 Y2 JP S604652Y2 JP 1976043082 U JP1976043082 U JP 1976043082U JP 4308276 U JP4308276 U JP 4308276U JP S604652 Y2 JPS604652 Y2 JP S604652Y2
Authority
JP
Japan
Prior art keywords
sample
anode
ion etching
axis
sample stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1976043082U
Other languages
English (en)
Japanese (ja)
Other versions
JPS52133216U (https=
Inventor
啓義 副島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1976043082U priority Critical patent/JPS604652Y2/ja
Publication of JPS52133216U publication Critical patent/JPS52133216U/ja
Application granted granted Critical
Publication of JPS604652Y2 publication Critical patent/JPS604652Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1976043082U 1976-04-06 1976-04-06 イオンエツチング装置 Expired JPS604652Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1976043082U JPS604652Y2 (ja) 1976-04-06 1976-04-06 イオンエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1976043082U JPS604652Y2 (ja) 1976-04-06 1976-04-06 イオンエツチング装置

Publications (2)

Publication Number Publication Date
JPS52133216U JPS52133216U (https=) 1977-10-11
JPS604652Y2 true JPS604652Y2 (ja) 1985-02-12

Family

ID=28502144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1976043082U Expired JPS604652Y2 (ja) 1976-04-06 1976-04-06 イオンエツチング装置

Country Status (1)

Country Link
JP (1) JPS604652Y2 (https=)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3943047A (en) * 1974-05-10 1976-03-09 Bell Telephone Laboratories, Incorporated Selective removal of material by sputter etching

Also Published As

Publication number Publication date
JPS52133216U (https=) 1977-10-11

Similar Documents

Publication Publication Date Title
US4128765A (en) Ion beam machining techniques and apparatus
US20210151283A1 (en) Composite charged particle beam apparatus
CN110355455A (zh) 氩离子切割装置
US3086112A (en) Corpuscular radiation apparatus
KR960006991A (ko) 재료선광(選鑛)의 장치와 그 취급방법
JPS604652Y2 (ja) イオンエツチング装置
WO2017134764A1 (ja) 試料ホルダ、イオンミリング装置、試料加工方法、試料観察方法、及び試料加工・観察方法
JPS63162862A (ja) スパツタ装置
JP2002319365A (ja) ステージ及びfib試料作成装置
JP2000028800A (ja) ビーム照射装置
JPH0933410A (ja) 透過型電子顕微鏡観察用試料の加工方法およびそれに用いるイオンミリング装置
JPH09275097A (ja) 半導体製造装置及び半導体製造方法
JPH06349779A (ja) 基板の表面にパターンを形成する方法
CN221977859U (zh) 一种样品转移装置
EP4484918A2 (en) Sample milling system and apparatus and method for image generation
JP2589139Y2 (ja) ペレットエッチング装置
CN110993475A (zh) 一种用于断口分析的扫描电镜万向转动样品台及扫描电镜
JPS62277731A (ja) ドライエツチング装置
JPH06111749A (ja) イオンミリング装置
JPS6333962Y2 (https=)
JPH0720837Y2 (ja) イオン源
JP2001210265A (ja) 集束イオンビーム装置
JPS5834678Y2 (ja) イオン注入装置
JPH01316472A (ja) ドライエッチング装置
JPS6329230Y2 (https=)